EP1706523A1 - Treatment of crystals in order to avoid light-induced modifications of the refraction index - Google Patents
Treatment of crystals in order to avoid light-induced modifications of the refraction indexInfo
- Publication number
- EP1706523A1 EP1706523A1 EP04786888A EP04786888A EP1706523A1 EP 1706523 A1 EP1706523 A1 EP 1706523A1 EP 04786888 A EP04786888 A EP 04786888A EP 04786888 A EP04786888 A EP 04786888A EP 1706523 A1 EP1706523 A1 EP 1706523A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- crystal
- oxidation
- electrodes
- crystals
- foreign atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 76
- 238000011282 treatment Methods 0.000 title claims abstract description 11
- 238000012986 modification Methods 0.000 title 1
- 230000004048 modification Effects 0.000 title 1
- 238000010521 absorption reaction Methods 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims abstract description 26
- 230000003647 oxidation Effects 0.000 claims abstract description 24
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 24
- 230000003287 optical effect Effects 0.000 claims abstract description 17
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 claims abstract description 6
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims abstract description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 29
- 229910052742 iron Inorganic materials 0.000 claims description 14
- 230000005684 electric field Effects 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims description 2
- 229910001431 copper ion Inorganic materials 0.000 claims 1
- 229910001437 manganese ion Inorganic materials 0.000 claims 1
- 230000000694 effects Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 238000007669 thermal treatment Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 238000000862 absorption spectrum Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000002800 charge carrier Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- UKDIAJWKFXFVFG-UHFFFAOYSA-N potassium;oxido(dioxo)niobium Chemical compound [K+].[O-][Nb](=O)=O UKDIAJWKFXFVFG-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000002269 spontaneous effect Effects 0.000 description 2
- 238000005496 tempering Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005090 crystal field Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- -1 iron ions Chemical class 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000000246 remedial effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/005—Oxydation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/22—Complex oxides
- C30B29/30—Niobates; Vanadates; Tantalates
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
Definitions
- the present invention relates to a method for treating a crystal with non-linear optical properties, in particular a lithium niobate or a lithium tantalate crystal, the crystal having foreign atoms which bring about a specific absorption of incident light, the foreign atoms being converted into a lower valence state by oxidation , so that they subsequently assume a larger, in particular the largest possible, positively charged state.
- a crystal with non-linear optical properties in particular a lithium niobate or a lithium tantalate crystal
- the crystal having foreign atoms which bring about a specific absorption of incident light, the foreign atoms being converted into a lower valence state by oxidation , so that they subsequently assume a larger, in particular the largest possible, positively charged state.
- electro-optic crystals such as the LiNb0 3 - and LiTaCV crystals mentioned, change their refractive index in the case of externally applied or internally constructed electric fields.
- these crystals are ferroelectric; They therefore have a preferred axis ("spontaneous polarization"), the direction of which can be changed (“Poland”).
- Such oxidic crystals are required for a large number of applications in communications technology, for light generation, as data storage and for integrated optics.
- Bragg gratings can be stored holographically in the crystals. These are then used as narrow-band wavelength filters or as reflectors for lasers.
- Frequency conversion in periodically poled material is of particular interest for new, powerful light sources.
- the light is often focused in the material in order to improve the efficiency of the conversion with high light intensities.
- high output powers of the light sources which can be built on the basis of frequency conversion, are desirable.
- they in order to guarantee the reliable functioning of the components, they must be optimized for use with high light intensities.
- Impurities in the crystal are of central importance, which serve as donors or catchers for the required charge carriers, which are known to be provided by doping
- Doping with copper, chromium or manganese is particularly widespread doping with iron, which has proven to be very efficient for the photorefractive effect, which is useful on the one hand for recording volume-phase holograms in the crystals o Refractive index changes can be achieved in a more controlled manner and holograms, such as Bragg gratings, can be saved the more effectively the material reacts to light.
- optical damage leads to a deterioration in the optical crystal properties.
- "Optical damage” does not go hand in hand with mechanical damage, but only causes optical inhomogeneities that influence the propagation of light. As a result, the light can no longer be guided as a result of the damage. It is defocused and losses, especially in waveguides, and one As a result, the light intensity profiles used deteriorate, making the corresponding components inefficient.
- Remedial measures can be taken, among other things, by increasing the dark conductivity. This ensures that no electric fields can build up in the crystal and thus no more photorefractive effect takes place. In this
- the iron occurs in at least the two charge states 2+ and 3+. While iron 3+ as an electron scavenger does not cause absorption in the visible spectral range, iron 2+ as an electron donor leads to a broad absorption band for green to blue light.
- iron 3+ as an electron scavenger does not cause absorption in the visible spectral range
- iron 2+ as an electron donor leads to a broad absorption band for green to blue light.
- tempering in order to change the valence state of the built-in doping centers, it is known to subject the oxidic crystals to thermal treatment at temperatures around 1000 ° C. (“tempering”). For example, tempering in an oxygen atmosphere leads to an oxidation of the crystals which transfers the iron from the valence state 2+ to the state 3+. However, this process cannot take place to any great extent, so that with the known treatment method part of the iron always remains in the state 2+ P03152F. 4th
- the object of the invention is to provide a method which can be implemented inexpensively with simple means and with which the crystals are almost completely oxidized and the residual absorption in the crystals in question here, in particular in lithium niobate or lithium tantalate Can be reduced to a minimum.
- An essential aspect of the invention is to enable the Fermi level in the crystals to be lowered significantly by "assisted" oxidation.
- the invention ultimately lies in the annealing of the highly doped crystals, which is carried out in connection with an electric field during the temp, an additional high voltage of up to 1200 V is applied to the crystal, which sometimes generates currents of more than 10 mA, with which the electrons released during the oxidation are actively removed from the crystal Residual absorption and enriches valence states with little, advantageously none, absorption in the visible spectral range.
- the particular advantage of the invention is thus that the absorption is suppressed while at the same time having a high dark conductivity.
- the advantages of the invention occur particularly with lithium niobate and lithium tantalate crystals appearance.
- the method according to the invention can be used to achieve, for example, Fe 2+ concentrations of less than 1 ⁇ 10 23 m "3.
- concentration of Fe 2+ in particular in the case of high total iron doping, cannot be reduced below values of 4 x 10 24 m "3 .
- the method according to the invention can be used particularly advantageously in connection with the method described in DE 10 300080 A1. Then the foreign atoms are first introduced into the crystal by doping before the supported oxidation process is carried out. The foreign atoms are thus doping elements. It is also advantageous if the doping elements are not converted into any valence state by the supported oxidation according to the invention, but rather into the lowest possible valence state that can be achieved with the means used. Even if this is only possible in a few cases, it is important that the oxidation state achieved has no absorption.
- Ions especially iron ions in a concentration of more than 1 x 10 25 m "3 , are.
- the crystal is arranged between two electrodes, in particular between two metal electrodes, which are connected to a voltage source.
- One of the electrodes can be designed as a corona electrode which is not in contact with the crystal, the corona electrode in particular being connected to the negative pole of the voltage source. In this way, particularly high fields can be generated without contact within the crystal.
- the crystal can simply be clamped between two electrodes.
- a sufficient voltage should be applied between the electrodes. In the case of contacting electrodes, this is in the range of a few volts, in particular approximately 10 V, with corona electrodes
- Voltages of several 100 V, in particular between 800 V and 1200 V, in particular approximately 1000 V, are operated.
- the choice of the voltage is to be made in such a way that the application of the electric field within the crystal leads to currents between 0.01 mA and 15 mA, in particular about 10 mA.
- the application of thermal energy according to the invention within the crystal leads to temperatures between 300 ° C. and 1200 ° C., in particular between 800 ° C. and 900 ° C.
- the time of treatment should be chosen so that the desired effect is achieved.
- the method according to the invention makes it possible to largely completely transfer the iron contained in the crystals to the 3+ charge state. As stated, this valence state does not cause absorption in the visible spectral range. This effectively suppresses absorption while maintaining high dark conductivity. The achieved residual absorption is below 0.4 mm "1 in the described choice of parameters. It is an advantage of the invention that P03152F - 7 -
- FIG. 1 a schematic representation of a device for the thermal and electrical oxidation of a crystal by means of a corona electrode
- FIG. 2 shows a schematic representation of the device for the thermal and electrical oxidation of a crystal by means of metallic electrodes sitting on the crystal surface
- FIG. 3 shows an absorption spectrum of a largely oxidized, highly iron-doped crystal
- Figure 4 an absorption spectrum of a highly iron-doped crystal oxidized by conventional methods.
- a thermal treatment with simultaneously applied voltage in iron-doped LiNb0 3 or LiTa0 3 crystals is used for an almost complete oxidation.
- a voltage is applied to the crystal 1 to be treated.
- the application of the voltage can be accomplished either by a single electrode 2 which is applied to the crystal 1 and by a further corona electrode 3 which is not in contact with the crystal 1. In this case, a voltage of approximately 1000 V is applied.
- electrodes 7, for example made of metal are applied directly to crystal 1. In this example, a voltage of approximately 10 V is sufficient.
- the voltage is made available by a voltage supply 4 which can be switched or regulated.
- a current measuring device 5 enables the currents that occur to be monitored.
- the crystal 1 is then heated to temperatures between 300 and 1250 ° C. while the voltage is applied and is kept at this temperature for a few hours, here 900 minutes. This treatment leads to strong oxidation of the crystal.
- FIG. 3 An example of a corresponding treatment is shown in FIG. 3.
- the absorption coefficient is plotted against the wavelength in the diagram.
- the absorption lies in the wavelength range from 500 nm to 1100 nm below 0.2 mm "1.
- An exception is the absorption band at 482 nm, which results from a forbidden crystal field transition. However, this is much narrower than that usually caused by Fe 2+ Absorption shoulder, as clearly shown in Figure 4.
- Figure 4 shows the absorption spectrum of a comparable crystal with an identical doping amount, which has been subjected to a conventional oxidation treatment. the values for the absorption are below 4 mm "1 .
- the method according to the invention achieves absorption values which are at least one order of magnitude below the values to be provided to date. This results in a significantly reduced optical absorption in the visible spectral range with a very high dark conductivity.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004002109A DE102004002109A1 (en) | 2004-01-14 | 2004-01-14 | Treatment of crystals to avoid light induced refractive index changes |
PCT/DE2004/002176 WO2005068690A1 (en) | 2004-01-14 | 2004-09-30 | Treatment of crystals in order to avoid light-induced modifications of the refraction index |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1706523A1 true EP1706523A1 (en) | 2006-10-04 |
Family
ID=34744745
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP04786888A Withdrawn EP1706523A1 (en) | 2004-01-14 | 2004-09-30 | Treatment of crystals in order to avoid light-induced modifications of the refraction index |
Country Status (5)
Country | Link |
---|---|
US (1) | US7833345B2 (en) |
EP (1) | EP1706523A1 (en) |
JP (1) | JP4638883B2 (en) |
DE (1) | DE102004002109A1 (en) |
WO (1) | WO2005068690A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004002109A1 (en) * | 2004-01-14 | 2005-08-11 | Deutsche Telekom Ag | Treatment of crystals to avoid light induced refractive index changes |
US7228046B1 (en) * | 2005-11-23 | 2007-06-05 | Honeywell International, Inc. | Environmentally stable electro-optic device and method for making same |
DE102006016201A1 (en) | 2006-04-06 | 2007-10-11 | Deutsche Telekom Ag | Treatment of crystals to avoid optical damage |
DE102007004400A1 (en) * | 2007-01-30 | 2008-07-31 | Deutsche Telekom Ag | rystal preparation, particularly lithium niobate or lithium tantalate crystal for use in optical component, involves heating of crystal to temperature at which ions in crystal are movable and result in conductivity |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3346344A (en) * | 1965-07-12 | 1967-10-10 | Bell Telephone Labor Inc | Growth of lithium niobate crystals |
US3700912A (en) * | 1971-05-12 | 1972-10-24 | Bell Telephone Labor Inc | Radiation-resistant linbo{11 and optical devices utilizing same |
US3703328A (en) * | 1971-07-21 | 1972-11-21 | Bell Telephone Labor Inc | Devices utilizing improved linbo' holographic medium |
US3932299A (en) * | 1972-10-30 | 1976-01-13 | Rca Corporation | Method for the reduction of iron in iron-doped lithium niobate crystals |
NL7309022A (en) * | 1972-10-30 | 1974-05-02 | ||
US3799642A (en) * | 1973-03-27 | 1974-03-26 | Rca Corp | Holographic recording on photochromic lithium niobate |
US3846722A (en) * | 1973-04-04 | 1974-11-05 | Westinghouse Electric Corp | Surface wave preselector |
US4396246A (en) * | 1980-10-02 | 1983-08-02 | Xerox Corporation | Integrated electro-optic wave guide modulator |
JPH0597591A (en) * | 1991-10-03 | 1993-04-20 | Hitachi Metals Ltd | Production of lithium niobate single crystal and optical element therefrom |
JPH05105594A (en) * | 1991-10-16 | 1993-04-27 | Hitachi Metals Ltd | Method for producing single crystal of lithium tantalate and optical element |
JPH05105591A (en) * | 1991-10-16 | 1993-04-27 | Hitachi Metals Ltd | Single crystal of lithium niobate and optical element |
US5448447A (en) * | 1993-04-26 | 1995-09-05 | Cabot Corporation | Process for making an improved tantalum powder and high capacitance low leakage electrode made therefrom |
JP2931960B2 (en) * | 1996-07-30 | 1999-08-09 | 科学技術庁無機材質研究所長 | Iron-doped lithium niobate single crystal, heat treatment method thereof, and hologram application element including the single crystal |
US5902519A (en) * | 1997-03-18 | 1999-05-11 | Northrop Grumman Corproation | Process for oxidizing iron-doped lithium niobate |
US6652780B2 (en) * | 1997-03-18 | 2003-11-25 | Northrop Grumman | Process for oxidizing iron-doped lithium niobate |
JP4139881B2 (en) * | 1999-06-24 | 2008-08-27 | 独立行政法人物質・材料研究機構 | Photorefractive material |
JP3728410B2 (en) * | 2001-09-07 | 2005-12-21 | 独立行政法人物質・材料研究機構 | Hologram recording medium pretreatment method |
DE10300080A1 (en) | 2003-01-04 | 2004-07-22 | Deutsche Telekom Ag | Increasing the resistance of crystals to "Optical Damage" |
DE102004002109A1 (en) * | 2004-01-14 | 2005-08-11 | Deutsche Telekom Ag | Treatment of crystals to avoid light induced refractive index changes |
-
2004
- 2004-01-14 DE DE102004002109A patent/DE102004002109A1/en not_active Ceased
- 2004-09-30 US US10/597,199 patent/US7833345B2/en not_active Expired - Fee Related
- 2004-09-30 WO PCT/DE2004/002176 patent/WO2005068690A1/en active Application Filing
- 2004-09-30 JP JP2006548085A patent/JP4638883B2/en not_active Expired - Fee Related
- 2004-09-30 EP EP04786888A patent/EP1706523A1/en not_active Withdrawn
Non-Patent Citations (1)
Title |
---|
See references of WO2005068690A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO2005068690A1 (en) | 2005-07-28 |
JP2007519951A (en) | 2007-07-19 |
JP4638883B2 (en) | 2011-02-23 |
US20070155004A1 (en) | 2007-07-05 |
US7833345B2 (en) | 2010-11-16 |
DE102004002109A1 (en) | 2005-08-11 |
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Inventor name: PEITHMANN, KONRAD Inventor name: BUSE, KARSTEN Inventor name: FALK, MATTHIAS |
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