EP1586951B1 - Method and device for applying an electrophotographic photoreceptor layer onto a substrate - Google Patents
Method and device for applying an electrophotographic photoreceptor layer onto a substrate Download PDFInfo
- Publication number
- EP1586951B1 EP1586951B1 EP20050008089 EP05008089A EP1586951B1 EP 1586951 B1 EP1586951 B1 EP 1586951B1 EP 20050008089 EP20050008089 EP 20050008089 EP 05008089 A EP05008089 A EP 05008089A EP 1586951 B1 EP1586951 B1 EP 1586951B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- coating
- substrate
- supporting member
- substrate supporting
- washing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000000758 substrate Substances 0.000 title claims description 208
- 238000000034 method Methods 0.000 title claims description 27
- 108091008695 photoreceptors Proteins 0.000 title description 36
- 238000000576 coating method Methods 0.000 claims description 275
- 239000011248 coating agent Substances 0.000 claims description 263
- 239000007788 liquid Substances 0.000 claims description 202
- 238000005406 washing Methods 0.000 claims description 108
- 239000002904 solvent Substances 0.000 claims description 13
- 230000002093 peripheral effect Effects 0.000 claims description 10
- 239000011247 coating layer Substances 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 70
- 239000000463 material Substances 0.000 description 30
- 229920005989 resin Polymers 0.000 description 24
- 239000011347 resin Substances 0.000 description 24
- 230000007547 defect Effects 0.000 description 15
- 239000011241 protective layer Substances 0.000 description 12
- 238000011282 treatment Methods 0.000 description 12
- 239000011230 binding agent Substances 0.000 description 10
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 230000002950 deficient Effects 0.000 description 7
- -1 polypropylene Polymers 0.000 description 7
- 238000007789 sealing Methods 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000000945 filler Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000003618 dip coating Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229920005668 polycarbonate resin Polymers 0.000 description 5
- 239000004431 polycarbonate resin Substances 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 3
- 229920000180 alkyd Polymers 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 229920001225 polyester resin Polymers 0.000 description 3
- 239000004645 polyester resin Substances 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 229940097275 indigo Drugs 0.000 description 2
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 2
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000005033 polyvinylidene chloride Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- QLUXVUVEVXYICG-UHFFFAOYSA-N 1,1-dichloroethene;prop-2-enenitrile Chemical compound C=CC#N.ClC(Cl)=C QLUXVUVEVXYICG-UHFFFAOYSA-N 0.000 description 1
- FBNAYEYTRHHEOB-UHFFFAOYSA-N 2,3,5-triphenyl-1,3-dihydropyrazole Chemical compound N1N(C=2C=CC=CC=2)C(C=2C=CC=CC=2)C=C1C1=CC=CC=C1 FBNAYEYTRHHEOB-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- CORZTPYJNUKLJX-UHFFFAOYSA-N 4-[2-[3-[4-(diethylamino)phenyl]-2-pyridin-2-yl-1,3-dihydropyrazol-5-yl]ethenyl]-n,n-diethylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C=CC1=CC(C=2C=CC(=CC=2)N(CC)CC)N(C=2N=CC=CC=2)N1 CORZTPYJNUKLJX-UHFFFAOYSA-N 0.000 description 1
- UZGVMZRBRRYLIP-UHFFFAOYSA-N 4-[5-[4-(diethylamino)phenyl]-1,3,4-oxadiazol-2-yl]-n,n-diethylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C1=NN=C(C=2C=CC(=CC=2)N(CC)CC)O1 UZGVMZRBRRYLIP-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 229910000846 In alloy Inorganic materials 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical class N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 235000019241 carbon black Nutrition 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 239000000788 chromium alloy Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- HVMJUDPAXRRVQO-UHFFFAOYSA-N copper indium Chemical compound [Cu].[In] HVMJUDPAXRRVQO-UHFFFAOYSA-N 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- UHOKSCJSTAHBSO-UHFFFAOYSA-N indanthrone blue Chemical class C1=CC=C2C(=O)C3=CC=C4NC5=C6C(=O)C7=CC=CC=C7C(=O)C6=CC=C5NC4=C3C(=O)C2=C1 UHOKSCJSTAHBSO-UHFFFAOYSA-N 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- ISGXOWLMGOPVPB-UHFFFAOYSA-N n,n-dibenzylaniline Chemical compound C=1C=CC=CC=1CN(C=1C=CC=CC=1)CC1=CC=CC=C1 ISGXOWLMGOPVPB-UHFFFAOYSA-N 0.000 description 1
- CVKIMZDUDFGOLC-UHFFFAOYSA-N n,n-diphenyl-2-(2-phenylethenyl)aniline Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 CVKIMZDUDFGOLC-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- WMHSAFDEIXKKMV-UHFFFAOYSA-N oxoantimony;oxotin Chemical compound [Sn]=O.[Sb]=O WMHSAFDEIXKKMV-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- INAAIJLSXJJHOZ-UHFFFAOYSA-N pibenzimol Chemical class C1CN(C)CCN1C1=CC=C(N=C(N2)C=3C=C4NC(=NC4=CC=3)C=3C=CC(O)=CC=3)C2=C1 INAAIJLSXJJHOZ-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000010349 pulsation Effects 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- CJABVFCUCRAVOK-UHFFFAOYSA-N pyrene-1,2-dione Chemical class C1=C2C(=O)C(=O)C=C(C=C3)C2=C2C3=CC=CC2=C1 CJABVFCUCRAVOK-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000011369 resultant mixture Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 230000001711 saccadic effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0525—Coating methods
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14704—Cover layers comprising inorganic material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14708—Cover layers comprising organic material
- G03G5/14713—Macromolecular material
- G03G5/14747—Macromolecular material obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- G03G5/14756—Polycarbonates
Definitions
- the present invention relates to a method for preparing an electrophotographic photoreceptor. More particularly, the present invention relates to a method for preparing a cylindrical electrophotographic photoreceptor in which a peripheral surface of a cylindrical substrate is coated with a coating liquid by moving a coating head relative to the substrate. In addition, the present invention also relates to a coating device for use in the method. JP-A 2004-279918 serves as a basis for the invention according to the claims.
- Electrophotographic photoreceptors are typically prepared by coating a photosensitive material on a peripheral surface of a cylindrical substrate.
- a dip coating method in which an electroconductive substrate is dipped into a coating liquid vessel containing a photosensitive layer coating liquid and then pulled up is typically used. In this case, the substrate is moved relative to the coating liquid vessel.
- a so-called ring coating method in which a coating head containing a coating liquid is moved along the cylindrical substrate to be coated to reduce the dipping time and uniformize the dipping time for the upper and lower portions of the substrate is used.
- a sealingmember is typically provided between the coating liquid vessel in the coating head and the cylindrical substrate to prevent leakage of the coating liquid from the coating liquid vessel. Therefore, when the coating operation is not performed (i.e., the coating device is in a waiting state), a substrate supporting member, which is configured to hold the cylindrical substrate during coating is performed, is arranged in the coating vessel to prevent leakage of the coating liquid. When coating operation is started, the substrate supporting member is coated with the coating liquid, thereby causing a problem in that a coating liquid residue (i.e., a dried or semi-dried coating liquid) inevitably adheres on the substrate supporting member when coating is continuously performed.
- a coating liquid residue i.e., a dried or semi-dried coating liquid
- JP-A Japanese patent application No.
- JP-A 10-80656 discloses a method in which the coated liquid is uniformly scraped.
- the former method has a drawback in that the thickness of the layer varies when the pump used for feeding the coating liquid causes pulsation.
- the latter method has a drawback in that the gap between the scraper and the surface of the substrate easily varies, resulting in variation of the layer thickness.
- these methods have a drawback in that the coating devices have a complex mechanism and therefore the devices become large in size.
- the uneven layer thickness problem can be solved.
- the coating methods have a drawback in that a coating liquid residue which includes the resin and the filler in the coating liquid is adhered to the substrate supporting member.
- a coating defect is caused.
- Such a coating defect causes a fatal image defect.
- JP-A 2004-279918 proposes to use a washing liquid vessel in which the substrate supporting member is washed.
- the coating defect problem caused by adhesion of coating liquid residues to the photoreceptor cannot be fully solved only by performing such a washing operation.
- the coating liquid includes a filler, a problem in that the filler precipitates in the coating liquid vessel, resulting in formation of residues. These residues cause coating defects, resulting in formation of image defects.
- an object of the present invention is to provide a coating method which solves the above-mentioned problems and by which a layer having good film properties can be formed with hardly causing the coating defects caused by coating liquid residues.
- Another object of the present invention is to provide a coating device which can form a layer having good film properties with hardly causing the coating defects caused by coating liquid residues.
- a method for coating a coating liquid on a cylindrical substrate including:
- the washing liquid is preferably replaced with a fresh washing liquid at a frequency not less than 3 times per a 1 hour coating operation.
- the washing device preferably has a washing element configured to wash the surface of the first substrate supporting member while contacting the surface.
- the washing operation is preferably performed while the surface of the washing liquid in the washing liquid vessel is controlled to be constant.
- the washing liquid preferably includes a solvent of the same kind as that included in the coating liquid.
- the washing operation is preferably performed while irradiating the first substrate supporting member with an ultrasonic wave with a frequency of from 20 to 100 kHz.
- the washing operation is preferably performed while oscillating and/or rotating the first substrate supporting member.
- the washing operation is preferably performed while oscillating and/or rotating the washing device.
- a coating device which includes:
- the washing device preferably includes an overflow wall configured to control the surface of the washing liquid to be constant.
- the transport member holds the upper substrate supporting member with a positional pin, and a holding member.
- each of the upper and lower substrate supporting members has an upper narrow portion and a lower narrow portion thereof, wherein at least one of the upper and lower narrow portions has a recessed portion, and wherein the holding member has a projected portion configured to engage with the recessed portion of the upper substrate supporting member.
- FIG. 1 is a schematic view illustrating the entire of an embodiment of the coating device of the present invention.
- a coating device 100 includes a table 1 and a wall 2 which is located on the table 1 and forms a cylindrical space A.
- a coating liquid is fed by a pump 4 from a coating liquid tank 3 to a coating liquid vessel 51 in a coating head 5, which is located at an upper portion of the space A before a coating operation.
- a ball screw 6 is provided along the wall 2.
- the ball screw 6 is driven by a motor 7.
- an upper substrate supporting member 91 and a lower substrate supporting member 92 are provided to sandwich a cylindrical substrate 8 to be coated.
- the upper substrate supporting member 91 is engaged with a transport member 10, and the lower substrate supporting member 92 is provided on a substrate supporting member table 11.
- a reversing mechanism 12 is provided between the table 1 and the substrate supporting member table 11. The reversing mechanism 12 changes the coated substrate with the following substrate to be coated.
- the coating liquid tank 3 and the coating liquid vessel 51 are connected by a feeding pipe 14 and a collection pipe 15, wherein a valve 13 is provided in the feed pipe 14, to circulate the coating liquid between the coating liquid tank 3 and the coating liquid vessel 51.
- Numeral 16 denotes a washing device configured to wash the substrate supporting members 91 and 92.
- the coating liquid vessel 51 is elevated (i.e., is moved up and down) by the motor 7, and thereby the coating liquid in the coating liquid vessel 51 is coated on the peripheral surface of the cylindrical substrate 8, resulting in formation of a layer constituting an electrophotographic photoreceptor.
- FIG. 2 is an enlarged view illustrating the coating head 5.
- a sealing member 18 is provided in the coating head 5.
- the sealing member 18 is brought into contact with the cylindrical substrate 8.
- the sealing member 18 is brought into contact with the substrate supporting member 91 or 92.
- a coating liquid 17 is prevented from leaking from the coating head 5. Since the coating liquid vessel 51 is always filled with the coating liquid 17 and in addition the coating liquid 17 is circulated, occurrence of residues due to solidification of the coating liquid can be prevented.
- the inner and outer surfaces of the coating liquid vessel 51 are subjected to an electroconductive treatment.
- the sealing member 18 has a circular opening 18a through which the cylindrical substrate 8 is inserted.
- the sealing member 18 is preferably made of a material (such as fluorine-containing resins or rubbers) having a good resistance to the solvent included in the coating liquid 17.
- the coating liquid 17 is circulated by the pump 4.
- the coating liquid vessel 51 includes an overflow wall 19, and an excess of the coating liquid 17 overflows from an overflow surface 21. Therefore, a fresh coating liquid is contained in the coating liquid vessel 51 while the surface of the coating liquid 17 is maintained so as to be a constant level.
- the coating liquid 17 When the coating liquid 17 is not circulated (i.e., the coating liquid remains in the coating liquid vessel 51), solidified residues are formed in the coating liquid vessel 51.
- a cover 20 is provided on the coating head 5. An excess of the coating liquid overflowing from the overflow surface 21 is returned to the coating liquid tank 3 through the collection pipe 15.
- the coating liquid 17 is preferably circulated at a flow rate of from 0.01 to 1 liter/min and preferably from 0.1 to 0.5 liter/min.
- the washing device 16 has an overflow wall 25 from which a washing liquid 33 overflow, and thereby the surface of the washing liquid is controlled so as to be on a constant level. Therefore, the washing device 16 has a constant washing ability, i. e. , the washing device produces a good washing effect.
- the washing device 16 is connected with a washing liquid tank 30 by a washing liquid feed pipe 31 and a washing liquid collection pipe 32. Therefore, an excess of the washing liquid overflowing from the overflow wall 25 is fed through the washing liquid collection pipe 32 and a fresh washing liquid is fed from the washing liquid tank 30 to the washing device 16 through the washing liquid feed pipe 31. Thus, the washing liquid 33 is circulated.
- the washing liquid is preferably circulated at a flow rate of from 0.01 to 10 liter/min.
- a flow rate of from 0.01 to 10 liter/min.
- the flow rate is too low, good circulation effect cannot be produced.
- the flow rate is to high, a problem in that residues of the coating liquid included in the washing liquid are adhered to the substrate supporting members 91 and 92, resulting in formation of coating defects tends to occur.
- a washing element is provided on the inner surface of the overflow wall 25 to wash the surface of the substrate supportingmembers 91 and 92.
- materials for use as the washing element include brushes and sponges. Among these materials, brushes are preferably used because re-adhesion of residues on the surface of the substrate supporting members is hardly caused.
- brushes having polypropylene fibers with a thickness of 0.2 mm are preferably used as the brush.
- the replacement operation is preferably performed at a frequency not less than 3 times, more preferably not less than 5 times and even more preferably not less than 10 times, per a 1 hour coating operation.
- Suitable materials for use as the washing liquid include solvents of the same kind as the solvents included in the coating liquid 17. This is because the residues adhered to the substrate supporting members 91 and 92 can be dissolved and thereby the washing efficiency can be improved.
- Specific examples of the washing materials include tetrahydrofuran, cyclohexanone and methyl ethyl ketone.
- the frequency of the supersonic waves is preferably from 20 to 100 kHz and more preferably from 40 to 70 kHz. When the frequency is too high, a problem in that the surface of the substrate supporting members is damaged tends to occur.
- the substrate supporting members and the washing device 16 is oscillated.
- the residues adhered to the substrate supporting members can be easily removed therefrom, resulting in enhancement of the washing efficiency.
- the oscillation is preferably performed at a speed not lower than 20 mm/sec.
- the oscillation distance is preferably longer than the length of the substrate supporting members 91 and 92.
- the rotation operation can be performed alone but is preferably performed in combination with the oscillation operation.
- the rotation is preferably performed at a speed not less than 10 rpm, and more preferably not less than 60 rpm.
- the rotation may be performed in the same direction but it is preferable to change the rotation direction after every 180-degree rotation.
- FIG. 3A is a schematic view illustrating a holding member 40.
- the holding member 40 holds a substrate supporting member 9 (i.e. , the substrate supporting member 91 or 92) .
- Upper and lower narrow portions 9a of the substrate supporting member 9 have an external diameter smaller than the internal diameter of the substrate 8 by 0.5 mm or less (from about 0.5 mm to about 0.05 mm).
- the substrate supporting member 9 is fixed by inserting a positioning pin 41, which is provided on the transport member 10, into a hole of the substrate supporting member 9. In this case, there is a case where the substrate supporting member 9 swings.
- the holding member 40 is provided.
- the substrate supporting member 9 and the substrate 8 are fixedly supported, and thereby a coating liquid can be well coated on the surface of the substrate 8, and the substrate supporting member 9 can be well washed by the washing device 16.
- the diameter of the positioning pin 41 is preferably smaller than the diameter of the positioning hole of the substrate supporting member 9 by 0.1 to 0.5 mm.
- the length of the positioning pin 41 is preferably one fifth or longer of the length of the substrate supporting member 9.
- a holding member 40' holding the lower narrow portion 9a of the substrate supporting member 9 is moved by the ball screw 6 together with the coating head 5. Therefore, the coating head 5 and the substrate supporting member 9 are raised at the same speed after the coating operation is completed.
- the holding member 40 has a chucking mechanism having two arms. When the substrate supporting member 9 is inserted into the cylindrical substrate 8, the arms of the chuck are opened, and thereby the substrate supporting member 9 is released from holding by the holding member 40.
- FIG. 3B is another embodiment of the holding member 40.
- the a groove 43 is formed on the narrow portion of the substrate supporting member 9, while a projection 42 is formed on the holding member 40 such that the projection 42 can be engaged with the groove 43. Therefore, the substrate supporting member 9 can be further fixedly supported by the holding member 40. Therefore, when the substrate supporting member 9 is washed, movement of the substrate supporting member 9 can be prevented, and thereby the substrate supporting member 9 can be uniformly washed.
- the width of the groove 43 is preferably smaller than the width of the projection 42 by 0.1 to 0.5 mm.
- the external diameter of a wide portion 9b of the substrate supportingmember 9 is preferably the same as that of the substrate 8 at a tolerance of ⁇ 0.5 mm or less.
- the tolerance falls in this range. (i.e., the difference in level between the outer surface of the substrate 8 and the outer surface of the wide portion 9b of the substrate supporting member 9 is small)
- the coating head 5 can be smoothly moved without causing a problem in that the coating liquid can be prevented from leaking when the coating head 5 passes through the joint between the substrate supporting member 9 and the substrate 8.
- the basic coating operations of the coating device of the present invention are the same as those illustrated in FIGs. 4-21 of JP-A 2004-179918 .
- the coating operations are as follows.
- the cylindrical substrate 8 is supplied to the coating device by a transporter (not shown)
- the coating liquid 17 is circulated between the coating liquid vessel 51 and the coating liquid tank 3.
- an end of substrate 8 is set on the upper narrow portion 9a of the lower substrate supporting member 9 (i. e. , 92) and then the lower narrow portion 9a is inserted into the upper substrate supporting member 9 (i. e. , 91).
- the positioning pin 41 of the transport member 10 is inserted into the upper substrate supporting member 9 (i.e.
- the coating head 5 is also lowered while synchronized with the movement of the holding member 40. Then the coating head 5 is lowered until the surface of the coating liquid 17 in the coating vessel 5 reaches the lower substrate supporting member 9 (i.e., 92). Thus, the coating liquid 17 is coated on the entire peripheral surface of the cylindrical substrate 8.
- the upper substrate supporting member 9 (91) is raised to be released from the substrate 8. Then the substrate bearing a coated layer thereon is discharged with a transporter (not shown) so as to be subjected to the next treatment.
- the upper substrate supporting member 9 held by the transport member 10 is lowered so as to be washed by the washing device 16.
- the holding member 40 is also lowered together with the transport member.
- the washed upper substrate supporting member 9 is then set on the substrate supporting member table 11 to serve as a lower substrate supporting member configured to hold the lower end of the next one of the substrate 8.
- the lower substrate supporting member 9 (92) is raised together with the coating head 5 to hold the upper end of the next one of the substrate 8.
- the coating head 5 is lowered while the cylindrical substrate 8 is stopped.
- another method in which the cylindrical substrate 8 is raised while the coating head 5 is stopped can also be used. Namely, one or both of the coating head 5 and the substrate 8 are moved relatively to the other.
- the coating liquid 17. is always circulated.
- a method in which the circulation is stopped during the device is in a waiting state or the coating operation is performed can also be used.
- the coating device two substrate supporting members are used while the positions of the substrate supporting members are exchanged.
- the sealing member 18 prevents leakage of the coating liquid 17 by contacting the cylindrical substrate 8.
- another sealingmember which has an opening slightly larger than the outer diameter of the cylindrical substrate 8 so as not to contact the substrate 8 can also be used. In this case, the coating liquid 17 does not leak from the gap between the sealing member 18 and the cylindrical substrate 8 because of having a surface tension.
- the substrate supporting member 9 is preferably grounded for safty.
- the surface thereof is preferably subjected to an electroconductive treatment using a material such as electroconductive fluorine-containing resins having good resistance to the solvents included in the coating liquid 17.
- the substrate supporting member 9 may be made of a metal subjected to an electroconductive treatment.
- the substrate supporting member 9 may be electrically connected with the substrate 8 by contacting an earth plate (not shown) provided thereon with the substrate 8.
- the substrate supporting member having such an earth plate include members which are made of a material such as aluminum, stainless steels and iron and the surface of which is subjected to a TUFRAM treatment (i.e., a hard alumite layer including a fluorine-containing resin therein) or a Ni-P-PTFE plating treatment, or which is coated with an electroconductive fluorine-containing resin having good resistance to the solvents included in the coating liquid.
- a TUFRAM treatment i.e., a hard alumite layer including a fluorine-containing resin therein
- Ni-P-PTFE plating treatment i.e., Ni-P-PTFE plating treatment
- the materials for use in the cylindrical substrate 8 include drums or sheets made of a metal such as aluminum, copper, iron, zinc and nickel; and drums, plates or sheets which are made of a material such as papers, plastics and glasses and on which a metal such as aluminum, copper, gold, silver, platinum, palladium, titanium, nickel-chromium alloys, stainless steels and copper-indium alloys or an electroconductive metal oxide such as indium oxide and tin oxide is deposited, or an electroconductive layer in which a material such as carbon blacks, indium oxide, tin oxide-antimony oxide powders, metal powders and copper iodide which is dispersed in a binder resin is formed, but are not limited thereto.
- the surface of the substrate 8 can be subjected to various treatments, such as oxidation treatments, treatments using a chemical and coloring treatments, to an extent such that the treatment does not cause any problems concerning image qualities.
- an undercoat layer can be formed on the surface of the cylindrical substrate 8 before the photosensitive layer is formed.
- injection of charges from the substrate to the photosensitive layer can be prevented; the adhesiveness of the photosensitive layer to the substrate 8 can be improved; and reflection of light from the surface of the substrate can be prevented.
- the materials for use in the undercoat layer include known resins such as polyethylene, polypropylene, acrylic resins, methacrylic resins, polyamide resins, vinyl chloride resins, vinyl acetate resins, phenolic resins, epoxy resins, polyester resins, alkyd resins, polycarbonate resins, polyurethane resins, polyimide resins, polyvinylidene chloride resins, polyvinyl acetal resins, vinyl chloride - vinyl acetate copolymers, polyvinyl alcohol, water-soluble polyester resins, nitrocellulose, casein, gelatin, etc.
- the thickness of the undercoat layer is preferably from 0.01 to 10 ⁇ m, and more preferably from 0.3 to 7 ⁇ m.
- a photosensitive layer formed on the surface of the substrate 8 optionally the undercoat layer therebetween by coating a coating liquid.
- the photosensitive layer is not particularly limited and may be a single-layered photosensitive layer or a multi-layered photosensitive layer.
- a multi-layered photosensitive layer including a charge generation layer and a charge transport layer will be explained below.
- the charge generation layer typically include a charge generation material and a binder resin, wherein the charge generation material is dispersed in the binder resin.
- the charge generation materials include pigments and dyes such as azo compounds (e.g., nonoazo dyes, disazo dyes and trisazo dyes), perylene compounds (e.g., perylene acid anhydride and perylene acid imide), indigo compounds (e.g., indigo and thioindigo), polycyclid quinone compounds (e.g., anthraquinones, pyrene quinones and flavanthrones), quinacridone compounds, bisbenzimidazole compounds, indanthrone compounds, squarilium compounds, phthalocyanine compounds (metal-containing phothalocyanine and metal-free phthalocyanine), eutectic complexes of a pyrylium salt compound or a thiopyrylium salt compound with a polycarbonate resin, etc.
- a mixer such as ball mills, attritors and sand mills can be used.
- the charge generation material is dispersed so as to have a volume average particle diameter not greater than 5 ⁇ m, more preferablynot greater than 2 ⁇ m and even more preferably not greater than 0.5 ⁇ m.
- the thickness of the charge generation layer is preferably from 0.1 to 5 ⁇ m, and more preferably from 0.2 to 2 ⁇ m.
- the charge transport layer is typically formed on the charge generation layer by coating a charge transport layer coating liquid which is prepared by dispersing or dissolving a charge transport material and a binder resin in a proper solvent.
- charge transport materials include known charge transport materials such as oxadiazole derivatives (e.g., 2,5-bis(p-diethylaminophenyl)-1,3,4-oxadiazole); pyrazoline derivatives (e.g., 1,3,5-triphenylpyrazoline, and 1-pyridyl-3-(p-diethylaminostyryl)-5-(p-diethylamino-phenyl )pyrazoline); aromatic tertiary amino compounds (e.g., triphenylamine, styryl triphenylamine, and dibenzyl aniline); aromatic tertiary diamino compounds (e.g., N,N-diphenyl-N,N-bis(3-methylphenyl)-1,1-bi
- binder resins for use in the charge transport layer include polycarbonate resins, polyester resins, methacrylic resins, acrylic resins, polyvinyl chloride resins, polyvinylidene chloride resins, polystyrene resins, polyvinyl acetate resins, styrene - butadiene copolymers, vinylidene chloride - acrylonitrile - copolymers, vinyl chloride - vinyl acetate copolymers, vinyl chloride - vinyl acetate - maleic anhydride copolymers, silicone resins, silicone - alkyd resins, phenol - formaldehyde resins, styrene - alkyd resins, poly-N-vinylcarbazole, etc., but are not limited thereto. These resins can be used alone or in combination.
- the weight ratio (CTM/BR) of the charge transport material (CTM) to the binder resin (BR) in the charge transport layer is preferably from 10/1 to 1/5.
- the thickness of the charge transport layer is generally from 5 to 50 ⁇ m and preferably from 10 to 30 ⁇ m.
- a single-layered photosensitive layer is formed by coating a coating liquid which is prepared by, for example, dissolving or dispersing a charge generation material, a charge transport material and a binder resin in a proper solvent, on a substrate or an undercoat layer.
- a protective layer is optionally formed on the charge transport layer or the single-layered photosensitive layer to protect the photosensitive layer and the charge transport layer depending on the image forming apparatus (such as copiers and printers) for which the photoreceptor is used.
- the protective layer is typically formed by coating a protective layer coating liquid which is typically prepared by dissolving or dispersing a charge transport material, a filler and a binder resin in a proper solvent.
- Specific examples of the filler include inorganic fillers such as alumina and titanium oxide; and organic fillers.
- the content of the filler in the protective layer is preferably from 5 to 30 % by weight.
- the thickness of the protective layer is generally from 2 to 10 ⁇ m, and preferably from 4 to 8 ⁇ m.
- coating liquids such as the undercoat layer coating liquid, charge generation layer coating liquid, charge transport layer coating liquid, single-layered photosensitive layer coating liquid and protective layer coating liquid can be coated by the coating method of the present invention.
- FIG. 4 is a schematic view illustrating a conventional coating device.
- the conventional coating device has a structure similar to that of the coating device illustrated in FIG. 1 except that the washing liquid in the washing device 16 is not circulated.
- FIG. 5 is a schematic view illustrating a conventional holding member 44 configured to hold the substrate supporting member.
- the holding member 44 supports the substrate supporting member 9 only by being engaged with the hole in the substrate supporting member 9.
- Charge transport material having the following formula 4 parts Polycarbonate resin 6 parts Cyclohexanone 45 parts Tetrahydrofuran 45 parts Silicone oil 0.001 parts
- the undercoat layer coating liquid prepared above was coated on a peripheral surface of a cylindrical aluminum substrate having a diameter of 30 mm and a length of 340 mm by a dip coating method, followed by drying for 15 minutes at 110 °C. Thus, an undercoat layer having a thickness of 5 ⁇ m was prepared.
- the charge generation layer coating liquid prepared above was coated on the undercoat layer by a dip coating method, followed by drying to prepare a charge generation layer with a thickness of 0.2 ⁇ m.
- the charge transport layer coating liquid was coated on the charge generation layer by a dip coating method, followed by drying to prepare a charge transport layer with a thickness of 23 ⁇ m.
- the protective layer coating liquid was coated on the charge transport layer by the above-mentioned coating method (ring coating method) of the present invention, followed by drying to prepare a protective layer with a thickness of 5 ⁇ m.
- the protective layer was prepared using the ring coating device illustrated in FIG. 1 .
- the amount of the coating liquid contained in the coating liquid vessel was 0.035 liter, and the coating liquid was circulated at a flow rate of 0.01 liter/min. The coating operation was performed continuously.
- the washing operation was performed while the washing liquid in the washing device was circulated at a flow rate of 1 liter/min, and the washing liquid was replaced 20 times per a 1 hour coating operation.
- each of the thus prepared photoreceptors was visually observed to determine whether the photoreceptor has a coating defect caused by residues of the protective layer coating liquid.
- the photoreceptor was determined to be defective.
- the 30 th photoreceptor was the first defective photoreceptor (i.e., the first to 29 th photoreceptors had no defect).
- Example 1 The procedure for preparation and evaluation of the photoreceptor in Example 1 was repeated except that a brush serving as the washing element illustrated in FIG. 1 and having polypropylene fibers with a thickness of 0.2 mm was provided on the inner surface of the vessel of the washing device to wash the substrate supporting members.
- the 87 th photoreceptor was the first defective photoreceptor.
- the 89 th photoreceptor was the first defective photoreceptor.
- Example 3 The procedure for preparation and evaluation of the photoreceptor in Example 3 was repeated except that during the washing operation, the substrate supporting members were oscillated at a speed of 100 mm/s so as to move back and forth 5 times, wherein the moving distance is 100 mm.
- the 102 nd photoreceptor was the first defective photoreceptor.
- Example 4 The procedure for preparation and evaluation of the photoreceptor in Example 4 was repeated except that during the washing operation, the substrate supporting members were rotated in such a way that the rotation direction is changed after every 180 degree rotation.
- Example 1 The procedure for preparation and evaluation of the photoreceptor in Example 1 was repeated except that the washing liquid was circulated at a flow rate of 0.01 liter/min.
- the 8 th photoreceptor was the first defective photoreceptor.
- Example 1 The procedure for preparation and evaluation of the photoreceptor in Example 1 was repeated except the coating device was changed to a conventional coating device illustrated in FIG. 4 without changing the amount (0.035 liter) of the coating liquid in the coating liquid vessel and the flow rate (0.01 liter/min) of the coating liquid, and the washing liquid was not circulated.
- the 5 th photoreceptor was the first defective photoreceptor.
- the coating method and coating device of the present invention By using the coating method and coating device of the present invention, occurrence of coating defects caused by residues adhered to the substrate supporting members can be prevented and in addition the degree of swinging of the substrate supporting members during a coating operation can be reduced. Therefore, a coating film having a uniform thickness and good film properties can be formed. Therefore this method can be preferably used for preparing photoreceptors which have good sensitivity and high resolution.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Coating Apparatus (AREA)
- Photoreceptors In Electrophotography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
- The present invention relates to a method for preparing an electrophotographic photoreceptor. More particularly, the present invention relates to a method for preparing a cylindrical electrophotographic photoreceptor in which a peripheral surface of a cylindrical substrate is coated with a coating liquid by moving a coating head relative to the substrate. In addition, the present invention also relates to a coating device for use in the method.
JP-A 2004-279918 - Electrophotographic photoreceptors are typically prepared by coating a photosensitive material on a peripheral surface of a cylindrical substrate. When such photoreceptors are mass-produced, a dip coating method in which an electroconductive substrate is dipped into a coating liquid vessel containing a photosensitive layer coating liquid and then pulled up is typically used. In this case, the substrate is moved relative to the coating liquid vessel.
- However, the dip coating method has the following drawbacks:
- (1) Since a cylindrical substrate to be coated has to be dipped into a coating liquid vessel so that the entire peripheral surface of the substrate is dipped into the coating liquid vessel, the coating device becomes large in size and a large amount of coating liquid is needed;
- (2) Since the dipping time of the lower portion of a substrate is longer than that of the upper portion thereof, the layer previously formed on the substrate tends to be dissolved by the photosensitive layer coating liquid if the coating liquid includes a solvent dissolving the previously formed layer.
- In attempting to miniaturize the coating device and reduce the amount of the coating liquid used, a so-called ring coating method in which a coating head containing a coating liquid is moved along the cylindrical substrate to be coated to reduce the dipping time and uniformize the dipping time for the upper and lower portions of the substrate is used.
- In such a ring coating method, a sealingmember is typically provided between the coating liquid vessel in the coating head and the cylindrical substrate to prevent leakage of the coating liquid from the coating liquid vessel. Therefore, when the coating operation is not performed (i.e., the coating device is in a waiting state), a substrate supporting member, which is configured to hold the cylindrical substrate during coating is performed, is arranged in the coating vessel to prevent leakage of the coating liquid. When coating operation is started, the substrate supporting member is coated with the coating liquid, thereby causing a problem in that a coating liquid residue (i.e., a dried or semi-dried coating liquid) inevitably adheres on the substrate supporting member when coating is continuously performed.
- Recently, a need exists for high speed and high quality electrophotographic full color image formation. Therefore, the photoreceptor used therefor is required to have a photosensitive layer with a uniform thickness. In attempting to form such a uniform photosensitive layer, published unexamined Japanese patent application No. (hereinafter referred to as JP-A)
05-297606 JP-A 10-80656 - Byusing the coatingmethods disclosed by
JP-As 2004-184722 2004-279918 JP-A 2004-279918 - When the ring coating method mentioned above is used, it is necessary to stop the supply of the coating liquid or to lower the surface of the coating liquid in the coating liquid vessel in order to prevent leakage of the coating liquid from the coating vessel. Even in this case, a small amount of the coating liquid remaining in the coating liquid vessel is solidified, thereby forming coating liquid residues. In addition, when the coating liquid includes a filler, a problem in that the filler precipitates in the coating liquid vessel, resulting in formation of residues. These residues cause coating defects, resulting in formation of image defects.
- Because of these reasons, a need exists for a coatingmethod by which a layer (such as photosensitive layers) having good film properties (such as uniform thickness) can be formed with hardly causing coating defects.
- Accordingly, an object of the present invention is to provide a coating method which solves the above-mentioned problems and by which a layer having good film properties can be formed with hardly causing the coating defects caused by coating liquid residues.
- Another object of the present invention is to provide a coating device which can form a layer having good film properties with hardly causing the coating defects caused by coating liquid residues.
- Briefly these objects and other objects of the present invention as hereinafter will become more readily apparent can be attained by a method for coating a coating liquid on a cylindrical substrate, including:
- inserting first and second substrate supporting members into upper and lower ends of the cylindrical substrate, respectively, to support the substrate while contacting the coating liquid in a coating liquid vessel of a coating head with the first substrate supporting member;
- moving the coating head downward relative to the substrate while contacting the coating liquid with the peripheral surface of the substrate to coat the coating liquid thereon;
- removing the first substrate supporting member from the upper end of the substrate after the surface of the coating liquid reaches the second substrate supporting member;
- removing the substrate bearing a coating layer thereon from the second substrate supporting member; and
- upwardly moving the second substrate supporting member together with the coating head to insert the second substrate supporting member into an upper end of next one of the substrate while transporting the first substrate supporting member to a washing device to wash the first substrate supporting member with a washing liquid contained in the washing device,
- wherein the coating liquid is circulated between the coating head and a coating liquid tank, and wherein the washing liquid is circulated between the washing device and a washing liquid tank at a flow rate of from 0.1 to 10 liter/min.
- The washing liquid is preferably replaced with a fresh washing liquid at a frequency not less than 3 times per a 1 hour coating operation.
- The washing device preferably has a washing element configured to wash the surface of the first substrate supporting member while contacting the surface.
- The washing operation is preferably performed while the surface of the washing liquid in the washing liquid vessel is controlled to be constant.
- The washing liquid preferably includes a solvent of the same kind as that included in the coating liquid.
- The washing operation is preferably performed while irradiating the first substrate supporting member with an ultrasonic wave with a frequency of from 20 to 100 kHz.
- The washing operation is preferably performed while oscillating and/or rotating the first substrate supporting member.
- The washing operation is preferably performed while oscillating and/or rotating the washing device.
- As another aspect of the present invention, a coating device is provided which includes:
- upper and lower substrate supporting members configured to hold upper and lower ends of a cylindrical substrate, respectively;
- a holding member configured to hold the upper substrate supporting member;
- a transport member configured to transport the upper substrate supporting member while holding the upper supporting member;
- a coating head configured to contain a coating liquid in a coating liquid vessel, wherein the coating head is moved relatively to the substrate while contacting the coating liquid with the peripheral surface of the substrate to coat the coating liquid thereon, wherein the coating liquid contacts the upper substrate supporting member before the coating operation and contacts the lower substrate supporting member after the coating operation;
- a coating liquid tank configured to contain the coating liquid therein;
- a washing device configured to wash the upper substrate supporting member, which has been transported by the first transport member, with a washing liquid after performing the coating operation and removing the upper substrate supporting member from the upper end of the cylindrical substrate, wherein the washing operation is performed while moving the lower substrate supporting member together with the coating head to insert the lower substrate supporting member into an upper end of next one of the substrate; and
- a washing liquid tank configured to contain the washing liquid,
- wherein the coating liquid is circulated between the coating head and the coating liquid tank, and wherein the washing liquid is circulated between the washing device and the washing liquid tank at a flow rate of from 0.1 to 10 liter/min.
- The washing device preferably includes an overflow wall configured to control the surface of the washing liquid to be constant.
- It is preferable that the transport member holds the upper substrate supporting member with a positional pin, and a holding member.
- It is preferable for the coating device that each of the upper and lower substrate supporting members has an upper narrow portion and a lower narrow portion thereof, wherein at least one of the upper and lower narrow portions has a recessed portion, and wherein the holding member has a projected portion configured to engage with the recessed portion of the upper substrate supporting member.
- These and other objects, features and advantages of the present invention will become apparent upon consideration of the following description of the preferred embodiments of the present invention taken in conjunction with the accompanying drawings.
- Various other objects, features and attendant advantages of the present invention will be more fully appreciated as the same becomes better understood from the detailed description when considered in connection with the accompanying drawings in which like reference characters designate like corresponding parts throughout and wherein:
-
FIG. 1 is a schematic view illustrating an embodiment of the coating device of the present invention; -
FIG. 2 is an enlarged view illustrating the coating head of the coating device illustrated inFIG. 1 ; -
FIGs. 3A and 3B are schematic views illustrating embodiments of the holding member of the coating device of the present invention; -
FIG. 4 is a schematic view illustrating a conventional coating device; and -
FIG. 5 is a schematic view illustrating a conventional holding member. - The coating method and device of the present invention will be explained in detail referring to drawings.
-
FIG. 1 is a schematic view illustrating the entire of an embodiment of the coating device of the present invention. Acoating device 100 includes a table 1 and awall 2 which is located on the table 1 and forms a cylindrical space A. A coating liquid is fed by apump 4 from acoating liquid tank 3 to acoating liquid vessel 51 in acoating head 5, which is located at an upper portion of the space A before a coating operation. - In the space A, a
ball screw 6 is provided along thewall 2. Theball screw 6 is driven by amotor 7. On a side of the space A opposite to theball screw 6, an uppersubstrate supporting member 91 and a lowersubstrate supporting member 92 are provided to sandwich acylindrical substrate 8 to be coated. - The upper
substrate supporting member 91 is engaged with atransport member 10, and the lowersubstrate supporting member 92 is provided on a substrate supporting member table 11. A reversingmechanism 12 is provided between the table 1 and the substrate supporting member table 11. The reversingmechanism 12 changes the coated substrate with the following substrate to be coated. - The
coating liquid tank 3 and thecoating liquid vessel 51 are connected by a feedingpipe 14 and acollection pipe 15, wherein avalve 13 is provided in thefeed pipe 14, to circulate the coating liquid between thecoating liquid tank 3 and thecoating liquid vessel 51.Numeral 16 denotes a washing device configured to wash thesubstrate supporting members - The coating
liquid vessel 51 is elevated (i.e., is moved up and down) by themotor 7, and thereby the coating liquid in thecoating liquid vessel 51 is coated on the peripheral surface of thecylindrical substrate 8, resulting in formation of a layer constituting an electrophotographic photoreceptor. -
FIG. 2 is an enlarged view illustrating thecoating head 5. In thecoating head 5, a sealingmember 18 is provided. During the coating operation, the sealingmember 18 is brought into contact with thecylindrical substrate 8. In the waiting state, the sealingmember 18 is brought into contact with thesubstrate supporting member coating liquid 17 is prevented from leaking from thecoating head 5. Since thecoating liquid vessel 51 is always filled with thecoating liquid 17 and in addition thecoating liquid 17 is circulated, occurrence of residues due to solidification of the coating liquid can be prevented. The inner and outer surfaces of thecoating liquid vessel 51 are subjected to an electroconductive treatment. - The sealing
member 18 has acircular opening 18a through which thecylindrical substrate 8 is inserted. The sealingmember 18 is preferably made of a material (such as fluorine-containing resins or rubbers) having a good resistance to the solvent included in thecoating liquid 17. Thecoating liquid 17 is circulated by thepump 4. The coatingliquid vessel 51 includes anoverflow wall 19, and an excess of thecoating liquid 17 overflows from anoverflow surface 21. Therefore, a fresh coating liquid is contained in thecoating liquid vessel 51 while the surface of thecoating liquid 17 is maintained so as to be a constant level. - When the
coating liquid 17 is not circulated (i.e., the coating liquid remains in the coating liquid vessel 51), solidified residues are formed in thecoating liquid vessel 51. In order to prevent the solvent included in thecoating liquid 17 from evaporating, acover 20 is provided on thecoating head 5. An excess of the coating liquid overflowing from theoverflow surface 21 is returned to thecoating liquid tank 3 through thecollection pipe 15. - The
coating liquid 17 is preferably circulated at a flow rate of from 0.01 to 1 liter/min and preferably from 0.1 to 0.5 liter/min. - Referring to
FIG. 1 , thewashing device 16 has anoverflow wall 25 from which awashing liquid 33 overflow, and thereby the surface of the washing liquid is controlled so as to be on a constant level. Therefore, thewashing device 16 has a constant washing ability, i. e. , the washing device produces a good washing effect. Thewashing device 16 is connected with awashing liquid tank 30 by a washingliquid feed pipe 31 and a washingliquid collection pipe 32. Therefore, an excess of the washing liquid overflowing from theoverflow wall 25 is fed through the washingliquid collection pipe 32 and a fresh washing liquid is fed from thewashing liquid tank 30 to thewashing device 16 through the washingliquid feed pipe 31. Thus, thewashing liquid 33 is circulated. - The washing liquid is preferably circulated at a flow rate of from 0.01 to 10 liter/min. When the flow rate is too low, good circulation effect cannot be produced. In contrast, when the flow rate is to high, a problem in that residues of the coating liquid included in the washing liquid are adhered to the
substrate supporting members - It is preferable that a washing element is provided on the inner surface of the
overflow wall 25 to wash the surface of the substrate supportingmembers 91 and 92. Specific examples of materials for use as the washing element include brushes and sponges. Among these materials, brushes are preferably used because re-adhesion of residues on the surface of the substrate supporting members is hardly caused. For example, brushes having polypropylene fibers with a thickness of 0.2 mm are preferably used as the brush. - It is preferable to replace the washing liquid with a fresh washing liquid at proper intervals. The replacement operation is preferably performed at a frequency not less than 3 times, more preferably not less than 5 times and even more preferably not less than 10 times, per a 1 hour coating operation.
- Suitable materials for use as the washing liquid include solvents of the same kind as the solvents included in the
coating liquid 17. This is because the residues adhered to thesubstrate supporting members - It is preferable to provide a supersonic generating device (not shown) in the vicinity of the
washing device 16 to irradiate the substrate supporting members to be washed with supersonic waves. The frequency of the supersonic waves is preferably from 20 to 100 kHz and more preferably from 40 to 70 kHz. When the frequency is too high, a problem in that the surface of the substrate supporting members is damaged tends to occur. - In addition, it is preferable that at least one of the substrate supporting members and the
washing device 16 is oscillated. In this case, the residues adhered to the substrate supporting members can be easily removed therefrom, resulting in enhancement of the washing efficiency. The oscillation is preferably performed at a speed not lower than 20 mm/sec. The oscillation distance is preferably longer than the length of thesubstrate supporting members - Further, it is preferable that at least one of the substrate supporting members and the
washing device 16 is rotated. In this case, the residues adhered to the substrate supporting members can be easily removed therefrom, resulting in enhancement of the washing efficiency. The rotation operation can be performed alone but is preferably performed in combination with the oscillation operation. The rotation is preferably performed at a speed not less than 10 rpm, and more preferably not less than 60 rpm. The rotation may be performed in the same direction but it is preferable to change the rotation direction after every 180-degree rotation. -
FIG. 3A is a schematic view illustrating a holdingmember 40. The holdingmember 40 holds a substrate supporting member 9 (i.e. , thesubstrate supporting member 91 or 92) . Upper and lowernarrow portions 9a of thesubstrate supporting member 9 have an external diameter smaller than the internal diameter of thesubstrate 8 by 0.5 mm or less (from about 0.5 mm to about 0.05 mm). By inserting the lowernarrow portion 9a into thesubstrate 8, thesubstrate 8 is fixedly supported by thesubstrate supporting member 9 while saccadic movement of the substrate is prevented. Thesubstrate supporting member 9 is fixed by inserting apositioning pin 41, which is provided on thetransport member 10, into a hole of thesubstrate supporting member 9. In this case, there is a case where thesubstrate supporting member 9 swings. In order to prevent thesubstrate supporting member 9 from swinging, the holdingmember 40 is provided. Thus, thesubstrate supporting member 9 and thesubstrate 8 are fixedly supported, and thereby a coating liquid can be well coated on the surface of thesubstrate 8, and thesubstrate supporting member 9 can be well washed by thewashing device 16. - The diameter of the
positioning pin 41 is preferably smaller than the diameter of the positioning hole of thesubstrate supporting member 9 by 0.1 to 0.5 mm. The length of thepositioning pin 41 is preferably one fifth or longer of the length of thesubstrate supporting member 9. - A holding member 40' holding the lower
narrow portion 9a of thesubstrate supporting member 9 is moved by theball screw 6 together with thecoating head 5. Therefore, thecoating head 5 and thesubstrate supporting member 9 are raised at the same speed after the coating operation is completed. The holdingmember 40 has a chucking mechanism having two arms. When thesubstrate supporting member 9 is inserted into thecylindrical substrate 8, the arms of the chuck are opened, and thereby thesubstrate supporting member 9 is released from holding by the holdingmember 40. -
FIG. 3B is another embodiment of the holdingmember 40. Referring toFIG. 3B , the agroove 43 is formed on the narrow portion of thesubstrate supporting member 9, while aprojection 42 is formed on the holdingmember 40 such that theprojection 42 can be engaged with thegroove 43. Therefore, thesubstrate supporting member 9 can be further fixedly supported by the holdingmember 40. Therefore, when thesubstrate supporting member 9 is washed, movement of thesubstrate supporting member 9 can be prevented, and thereby thesubstrate supporting member 9 can be uniformly washed. The width of thegroove 43 is preferably smaller than the width of theprojection 42 by 0.1 to 0.5 mm. - The external diameter of a
wide portion 9b of thesubstrate supportingmember 9 is preferably the same as that of thesubstrate 8 at a tolerance of ±0.5 mm or less. When the tolerance falls in this range. (i.e., the difference in level between the outer surface of thesubstrate 8 and the outer surface of thewide portion 9b of thesubstrate supporting member 9 is small), thecoating head 5 can be smoothly moved without causing a problem in that the coating liquid can be prevented from leaking when thecoating head 5 passes through the joint between thesubstrate supporting member 9 and thesubstrate 8. - The basic coating operations of the coating device of the present invention are the same as those illustrated in
FIGs. 4-21 ofJP-A 2004-179918 cylindrical substrate 8 is supplied to the coating device by a transporter (not shown), thecoating liquid 17 is circulated between the coatingliquid vessel 51 and thecoating liquid tank 3. After thecylindrical substrate 8 is supplied to the coating device, an end ofsubstrate 8 is set on the uppernarrow portion 9a of the lower substrate supporting member 9 (i. e. , 92) and then the lowernarrow portion 9a is inserted into the upper substrate supporting member 9 (i. e. , 91). Then thepositioning pin 41 of thetransport member 10 is inserted into the upper substrate supporting member 9 (i.e. , 91), and in addition the uppernarrow portion 9a of the upper substrate supporting member 9 (i.e. , 91) is held by the holdingmember 40. In this case, thecoating head 5 is also lowered while synchronized with the movement of the holdingmember 40. Then thecoating head 5 is lowered until the surface of thecoating liquid 17 in thecoating vessel 5 reaches the lower substrate supporting member 9 (i.e., 92). Thus, thecoating liquid 17 is coated on the entire peripheral surface of thecylindrical substrate 8. After the coating operation, the upper substrate supporting member 9 (91) is raised to be released from thesubstrate 8. Then the substrate bearing a coated layer thereon is discharged with a transporter (not shown) so as to be subjected to the next treatment. - Then the upper
substrate supporting member 9 held by thetransport member 10 is lowered so as to be washed by thewashing device 16. In this case, the holdingmember 40 is also lowered together with the transport member. The washed uppersubstrate supporting member 9 is then set on the substrate supporting member table 11 to serve as a lower substrate supporting member configured to hold the lower end of the next one of thesubstrate 8. On the other hand, the lower substrate supporting member 9 (92) is raised together with thecoating head 5 to hold the upper end of the next one of thesubstrate 8. Thus, the positions of thesubstrate supporting members - In the above-mentioned embodiment, the
coating head 5 is lowered while thecylindrical substrate 8 is stopped. However, another method in which thecylindrical substrate 8 is raised while thecoating head 5 is stopped can also be used. Namely, one or both of thecoating head 5 and thesubstrate 8 are moved relatively to the other. - In the above-mentioned coating device, the
coating liquid 17. is always circulated. However, a method in which the circulation is stopped during the device is in a waiting state or the coating operation is performed can also be used. - In the above-mentioned coating device, two substrate supporting members are used while the positions of the substrate supporting members are exchanged. However, it is possible to use three or more substrate supporting members. In this case, the washing operation can be performed in parallel with the coating operation, and thereby the coating efficiency can be enhanced.
- Referring to
FIG. 2 , the sealingmember 18 prevents leakage of thecoating liquid 17 by contacting thecylindrical substrate 8. However, another sealingmember which has an opening slightly larger than the outer diameter of thecylindrical substrate 8 so as not to contact thesubstrate 8 can also be used. In this case, thecoating liquid 17 does not leak from the gap between the sealingmember 18 and thecylindrical substrate 8 because of having a surface tension. - The
substrate supporting member 9 is preferably grounded for safty. In order to ground thesubstrate supporting member 9, the surface thereof is preferably subjected to an electroconductive treatment using a material such as electroconductive fluorine-containing resins having good resistance to the solvents included in thecoating liquid 17. Alternatively, thesubstrate supporting member 9 may be made of a metal subjected to an electroconductive treatment. Alternatively, thesubstrate supporting member 9 may be electrically connected with thesubstrate 8 by contacting an earth plate (not shown) provided thereon with thesubstrate 8. - Specific examples of the substrate supporting member having such an earth plate include members which are made of a material such as aluminum, stainless steels and iron and the surface of which is subjected to a TUFRAM treatment (i.e., a hard alumite layer including a fluorine-containing resin therein) or a Ni-P-PTFE plating treatment, or which is coated with an electroconductive fluorine-containing resin having good resistance to the solvents included in the coating liquid.
- Specific examples of the materials for use in the
cylindrical substrate 8 include drums or sheets made of a metal such as aluminum, copper, iron, zinc and nickel; and drums, plates or sheets which are made of a material such as papers, plastics and glasses and on which a metal such as aluminum, copper, gold, silver, platinum, palladium, titanium, nickel-chromium alloys, stainless steels and copper-indium alloys or an electroconductive metal oxide such as indium oxide and tin oxide is deposited, or an electroconductive layer in which a material such as carbon blacks, indium oxide, tin oxide-antimony oxide powders, metal powders and copper iodide which is dispersed in a binder resin is formed, but are not limited thereto. - The surface of the
substrate 8 can be subjected to various treatments, such as oxidation treatments, treatments using a chemical and coloring treatments, to an extent such that the treatment does not cause any problems concerning image qualities. - In addition, an undercoat layer can be formed on the surface of the
cylindrical substrate 8 before the photosensitive layer is formed. By forming such an undercoat layer, injection of charges from the substrate to the photosensitive layer can be prevented; the adhesiveness of the photosensitive layer to thesubstrate 8 can be improved; and reflection of light from the surface of the substrate can be prevented. - Specific examples of the materials for use in the undercoat layer include known resins such as polyethylene, polypropylene, acrylic resins, methacrylic resins, polyamide resins, vinyl chloride resins, vinyl acetate resins, phenolic resins, epoxy resins, polyester resins, alkyd resins, polycarbonate resins, polyurethane resins, polyimide resins, polyvinylidene chloride resins, polyvinyl acetal resins, vinyl chloride - vinyl acetate copolymers, polyvinyl alcohol, water-soluble polyester resins, nitrocellulose, casein, gelatin, etc. The thickness of the undercoat layer is preferably from 0.01 to 10 µm, and more preferably from 0.3 to 7 µm.
- A photosensitive layer formed on the surface of the
substrate 8 optionally the undercoat layer therebetween by coating a coating liquid. The photosensitive layer is not particularly limited and may be a single-layered photosensitive layer or a multi-layered photosensitive layer. - As an example of the photosensitive layer, a multi-layered photosensitive layer including a charge generation layer and a charge transport layer will be explained below.
- The charge generation layer typically include a charge generation material and a binder resin, wherein the charge generation material is dispersed in the binder resin. Specific examples of the charge generation materials include pigments and dyes such as azo compounds (e.g., nonoazo dyes, disazo dyes and trisazo dyes), perylene compounds (e.g., perylene acid anhydride and perylene acid imide), indigo compounds (e.g., indigo and thioindigo), polycyclid quinone compounds (e.g., anthraquinones, pyrene quinones and flavanthrones), quinacridone compounds, bisbenzimidazole compounds, indanthrone compounds, squarilium compounds, phthalocyanine compounds (metal-containing phothalocyanine and metal-free phthalocyanine), eutectic complexes of a pyrylium salt compound or a thiopyrylium salt compound with a polycarbonate resin, etc. The charge generation layer coating liquid is prepared by dissolving or dispersing such a charge generation material and a binder resin in a proper solvent. The charge generation layer coating liquid can include other additives such as charge transport materials.
- When a charge generation material is dispersed in a binder resin to prepare a charge generation layer coating liquid, a mixer such as ball mills, attritors and sand mills can be used. In this case, the charge generation material is dispersed so as to have a volume average particle diameter not greater than 5 µm, more preferablynot greater than 2 µm and even more preferably not greater than 0.5 µm. The thickness of the charge generation layer is preferably from 0.1 to 5 µm, and more preferably from 0.2 to 2 µm.
- The charge transport layer is typically formed on the charge generation layer by coating a charge transport layer coating liquid which is prepared by dispersing or dissolving a charge transport material and a binder resin in a proper solvent. Specific examples of the charge transport materials include known charge transport materials such as oxadiazole derivatives (e.g., 2,5-bis(p-diethylaminophenyl)-1,3,4-oxadiazole); pyrazoline derivatives (e.g., 1,3,5-triphenylpyrazoline, and 1-pyridyl-3-(p-diethylaminostyryl)-5-(p-diethylamino-phenyl )pyrazoline); aromatic tertiary amino compounds (e.g., triphenylamine, styryl triphenylamine, and dibenzyl aniline); aromatic tertiary diamino compounds (e.g., N,N-diphenyl-N,N-bis(3-methylphenyl)-1,1-biphenyl-4,4'-diam ine) ; etc. These charge transport materials can be used alone or in combination.
- Specific examples of the binder resins for use in the charge transport layer include polycarbonate resins, polyester resins, methacrylic resins, acrylic resins, polyvinyl chloride resins, polyvinylidene chloride resins, polystyrene resins, polyvinyl acetate resins, styrene - butadiene copolymers, vinylidene chloride - acrylonitrile - copolymers, vinyl chloride - vinyl acetate copolymers, vinyl chloride - vinyl acetate - maleic anhydride copolymers, silicone resins, silicone - alkyd resins, phenol - formaldehyde resins, styrene - alkyd resins, poly-N-vinylcarbazole, etc., but are not limited thereto. These resins can be used alone or in combination.
- The weight ratio (CTM/BR) of the charge transport material (CTM) to the binder resin (BR) in the charge transport layer is preferably from 10/1 to 1/5. The thickness of the charge transport layer is generally from 5 to 50 µm and preferably from 10 to 30 µm.
- A single-layered photosensitive layer is formed by coating a coating liquid which is prepared by, for example, dissolving or dispersing a charge generation material, a charge transport material and a binder resin in a proper solvent, on a substrate or an undercoat layer.
- A protective layer is optionally formed on the charge transport layer or the single-layered photosensitive layer to protect the photosensitive layer and the charge transport layer depending on the image forming apparatus (such as copiers and printers) for which the photoreceptor is used. The protective layer is typically formed by coating a protective layer coating liquid which is typically prepared by dissolving or dispersing a charge transport material, a filler and a binder resin in a proper solvent. Specific examples of the filler include inorganic fillers such as alumina and titanium oxide; and organic fillers. The content of the filler in the protective layer is preferably from 5 to 30 % by weight. The thickness of the protective layer is generally from 2 to 10 µm, and preferably from 4 to 8 µm.
- The above-mentioned coating liquids such as the undercoat layer coating liquid, charge generation layer coating liquid, charge transport layer coating liquid, single-layered photosensitive layer coating liquid and protective layer coating liquid can be coated by the coating method of the present invention.
-
FIG. 4 is a schematic view illustrating a conventional coating device. The conventional coating device has a structure similar to that of the coating device illustrated inFIG. 1 except that the washing liquid in thewashing device 16 is not circulated. -
FIG. 5 is a schematic view illustrating a conventional holdingmember 44 configured to hold the substrate supporting member. The holdingmember 44 supports thesubstrate supporting member 9 only by being engaged with the hole in thesubstrate supporting member 9. - Having generally described this invention, further understanding can be obtained by reference to certain specific examples which are provided herein for the purpose of illustration only and are not intended to be limiting. In the descriptions in the following examples, the numbers represent weight ratios in parts, unless otherwise specified.
- The following components were mixed and subjected to a dispersion treatment to prepare an undercoat layer coating liquid.
Melamine resin 5 parts Titanium oxide 20 parts Cyclohexanone 35 parts Methyl ethyl ketone 35 parts -
- Then 40 parts of cyclohexanone and 60 parts of methyl ethyl ketone were mixed with the resultant mixture to prepare a charge generation layer coating liquid.
-
-
- Then 20 parts of cyclohexanone and 65 parts of tetrahydrofuran were mixed with the resultant dispersion to prepare a protective layer coating liquid.
- The undercoat layer coating liquid prepared above was coated on a peripheral surface of a cylindrical aluminum substrate having a diameter of 30 mm and a length of 340 mm by a dip coating method, followed by drying for 15 minutes at 110 °C. Thus, an undercoat layer having a thickness of 5 µm was prepared.
- Then the charge generation layer coating liquid prepared above was coated on the undercoat layer by a dip coating method, followed by drying to prepare a charge generation layer with a thickness of 0.2 µm. In addition, the charge transport layer coating liquid was coated on the charge generation layer by a dip coating method, followed by drying to prepare a charge transport layer with a thickness of 23 µm. Further, the protective layer coating liquid was coated on the charge transport layer by the above-mentioned coating method (ring coating method) of the present invention, followed by drying to prepare a protective layer with a thickness of 5 µm.
- The protective layer was prepared using the ring coating device illustrated in
FIG. 1 . The amount of the coating liquid contained in the coating liquid vessel was 0.035 liter, and the coating liquid was circulated at a flow rate of 0.01 liter/min. The coating operation was performed continuously. - The washing operation was performed while the washing liquid in the washing device was circulated at a flow rate of 1 liter/min, and the washing liquid was replaced 20 times per a 1 hour coating operation.
- Each of the thus prepared photoreceptors was visually observed to determine whether the photoreceptor has a coating defect caused by residues of the protective layer coating liquid. When one or more coating defects with a size not smaller than 0.2 mm caused by residues were observed on a photoreceptor, the photoreceptor was determined to be defective.
- As a result, the 30th photoreceptor was the first defective photoreceptor (i.e., the first to 29th photoreceptors had no defect).
- The procedure for preparation and evaluation of the photoreceptor in Example 1 was repeated except that a brush serving as the washing element illustrated in
FIG. 1 and having polypropylene fibers with a thickness of 0.2 mm was provided on the inner surface of the vessel of the washing device to wash the substrate supporting members. - As a result, the 87th photoreceptor was the first defective photoreceptor.
- The procedure for preparation and evaluation of the photoreceptor in Example 2 was repeated except that the overflow wall was provided in the washing liquid vessel of the washing device to control the level of surface of the washing liquid to be uniform.
- As a result, the 89th photoreceptor was the first defective photoreceptor.
- The procedure for preparation and evaluation of the photoreceptor in Example 3 was repeated except that during the washing operation, the substrate supporting members were oscillated at a speed of 100 mm/s so as to move back and forth 5 times, wherein the moving distance is 100 mm.
- As a result, the 102nd photoreceptor was the first defective photoreceptor.
- The procedure for preparation and evaluation of the photoreceptor in Example 4 was repeated except that during the washing operation, the substrate supporting members were rotated in such a way that the rotation direction is changed after every 180 degree rotation.
- As a result, all the photoreceptors (i.e., the first to 200th photoreceptors) had no defect.
- The procedure for preparation and evaluation of the photoreceptor in Example 1 was repeated except that the washing liquid was circulated at a flow rate of 0.01 liter/min.
- As a result, the 8th photoreceptor was the first defective photoreceptor.
- The procedure for preparation and evaluation of the photoreceptor in Example 1 was repeated except the coating device was changed to a conventional coating device illustrated in
FIG. 4 without changing the amount (0.035 liter) of the coating liquid in the coating liquid vessel and the flow rate (0.01 liter/min) of the coating liquid, and the washing liquid was not circulated. - As a result, the 5th photoreceptor was the first defective photoreceptor.
- By using the coating method and coating device of the present invention, occurrence of coating defects caused by residues adhered to the substrate supporting members can be prevented and in addition the degree of swinging of the substrate supporting members during a coating operation can be reduced. Therefore, a coating film having a uniform thickness and good film properties can be formed. Therefore this method can be preferably used for preparing photoreceptors which have good sensitivity and high resolution.
Claims (12)
- A method for coating a coating liquid (17) on a cylindrical substrate (8), comprising:inserting first and second substrate supporting members (9; 91, 92) into upper and lower ends of the cylindrical substrate, respectively, to support the substrate while contacting the coating liquid in a coating liquid vessel (51) of a coating head (5) with the first substrate supporting member;moving the coating head downward relative to the substrate while contacting the coating liquid with the peripheral surface of the substrate to coat the coating liquid thereon;removing the first substrate supporting member from the upper end of the substrate after the surface of the coating liquid reaches the second substrate supporting member;removing the substrate bearing a coating layer thereon from the second substrate supporting member; andupwardly moving the second substrate supporting member together with the coating head to insert the second substrate supporting member into an upper end of next one of the substrate to be coated while transporting the first substrate supporting member to a washing device (16) to wash the first substrate supporting member with a washing liquid (33) contained in the washing device,wherein the coating liquid is circulated between the coating head and a coating liquid tank (3), and wherein the washing liquid is circulated between the washing device and a washing liquid tank (30) at a flow rate of from 0.1 to 10 liter/min.
- The method according to Claim 1, wherein the washing liquid is replaced with a fresh washing liquid at a frequency not less than 3 times per a 1 hour coating operation.
- The method according to Claim 1 or 2, wherein the washing device comprises a washing element configured to wash the surface of the first substrate supporting member (91) while contacting the surface.
- The method according to any one of Claims 1 to 3, wherein the washing is performed while the surface of the washing liquid (33) in the coating liquid vessel (51) is controlled to be constant.
- The method according to any one of Claims 1 to 4, wherein the washing liquid (33) comprises a solvent of the same kind as that included in the coating liquid.
- The method according to any one of Claims 1 to 5, wherein the washing is performed while irradiating the first substrate supporting member (91) with an ultrasonic wave with a frequency of from 20 to 100 kHz.
- The method according to any one of Claims 1 to 6, wherein the washing is performed while oscillating and/or rotating the first substrate supporting member (91).
- The method according to any one of Claims 1 to 8, wherein the washing is performed while oscillating and/or rotating the washing device (16).
- A coating device (100) comprising:upper and lower substrate supporting members (9; 91, 92) configured to hold upper and lower ends of a cylindrical substrate (8), respectively;a holding member (40) configured to hold the upper substrate supporting member (91);a transport member (10) configured to transport the upper substrate supporting member while holding the upper supporting member;a coating head (5) configured to contain a coating liquid (17) in a coating liquid vessel (51), wherein the coating head is moved relatively to the substrate while contacting the coating liquid with the peripheral surface of the substrate to coat the coating liquid thereon, wherein the coating liquid contacts the upper substrate supporting member before the coating operation and contacts the lower substrate supporting member after the coating operation;a coating liquid tank (3) configured to contain the coating liquid therein;a washing device (16) configured to wash the upper substrate supporting member, which has been transported by the first transport member, with a washing liquid (33) after performing the coating operation and removing the upper substrate supporting member from the upper end of the cylindrical substrate, wherein the washing operation is performed while moving the lower substrate supporting member together with the coating head to insert the lower substrate supporting member into an upper end of next one of the substrate to be coated; anda washing liquid tank (30) configured to contain the washing liquid,wherein the coating liquid is circulated between the coating head and the coating liquid tank, and wherein the washing liquid is circulated between the washing device and the washing liquid tank at a flow rate of from 0.1 to 10 liter/min.
- The coating device according to Claim 9, wherein the washing device comprises an overflow wall (25) configured to control the surface of the washing liquid to be constant.
- The coating device according to Claim 9 or 10, further comprises a holding member (40), wherein the upper substrate supporting member is held by a positional pin (41) of the transport member (10) and the holding member.
- The coating device according to Claim 11, wherein each of the upper and lower substrate supporting members has an upper narrow portion (9a) and a lower narrow portion (9a) thereof, wherein at least one of the upper and lower narrow portions has a recessed portion (43), and wherein the holding member (40) has a projected portion (42) configured to engage with the recessed portion of the upper substrate supporting member (91) .
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004119039 | 2004-04-14 | ||
JP2004119039 | 2004-04-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1586951A1 EP1586951A1 (en) | 2005-10-19 |
EP1586951B1 true EP1586951B1 (en) | 2008-12-24 |
Family
ID=34935120
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP20050008089 Ceased EP1586951B1 (en) | 2004-04-14 | 2005-04-13 | Method and device for applying an electrophotographic photoreceptor layer onto a substrate |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP1586951B1 (en) |
DE (1) | DE602005011882D1 (en) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6245475B1 (en) * | 1999-12-16 | 2001-06-12 | Xerox Corporation | Process of spray forming photoreceptors with ink nozzles |
JP2002072519A (en) * | 2000-09-04 | 2002-03-12 | Sharp Corp | Coating liquid for charge generating layer and organic electrophotogracphic photoreceptor as well as method of manufacturing for the same |
JP2004279918A (en) * | 2003-03-18 | 2004-10-07 | Ricoh Co Ltd | Coating method and coating apparatus for electrophotographic photoreceptor |
-
2005
- 2005-04-13 EP EP20050008089 patent/EP1586951B1/en not_active Ceased
- 2005-04-13 DE DE200560011882 patent/DE602005011882D1/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP1586951A1 (en) | 2005-10-19 |
DE602005011882D1 (en) | 2009-02-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2004079455A1 (en) | Basic material for electrophotographic photosensitive body, process for producing the same and electrophotographic photosensitive body employing it | |
JP2006227179A (en) | Spray coater for electrophotographic photoreceptor and method for manufacturing electrophotographic photoreceptor | |
JP3088645B2 (en) | Electrophotographic photoreceptor and method of manufacturing the same | |
JP4466406B2 (en) | Electrophotographic photoreceptor and image forming apparatus using the photoreceptor | |
EP1586951B1 (en) | Method and device for applying an electrophotographic photoreceptor layer onto a substrate | |
JP4264370B2 (en) | SUBSTRATE FOR ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY, PROCESS FOR PRODUCING THE SUBSTRATE, ELECTROPHOTOGRAPHIC PHOTOSENSITIVE USING THE SUBSTRATE, ELECTROPHOTOGRAPHIC PHOTOSENSITIVE CARTRIDGE USING THE ELECTROPHOTOGRAPHIC PHOTOSENSOR | |
JP2004279918A (en) | Coating method and coating apparatus for electrophotographic photoreceptor | |
JP2005326821A (en) | Coating method and device for electrophotographic photoreceptor | |
JPH0534934A (en) | Electrophotographic sensitive body and production thereof | |
JP2005315963A (en) | Spray coating apparatus for electrophotographic photoreceptor and method for manufacturing electrophotographic photoreceptor | |
JP2004246124A (en) | Honing method and method for manufacturing of electrophotographic photoreceptor | |
JPH07140680A (en) | Production of electrophotographic photoreceptor | |
JP3215294B2 (en) | Apparatus and method for manufacturing organic electrophotographic photoreceptor | |
JPH1063017A (en) | Coating applicator for photosensitive layer | |
JP2005062521A (en) | Electrophotographic photoreceptor | |
JP3658921B2 (en) | Separation / discharge apparatus and separation / discharge method for coated cylindrical substrate | |
JPH05281757A (en) | Method for regenerating electrophotographic sensitive body | |
JP2006065053A (en) | Method for manufacturing electrophotographic photoreceptor, stripping liquid for electrophotographic photoreceptor, and electrophotographic photoreceptor | |
JP2000305287A (en) | Substrate end face treating apparatus of organic photoreceptor producing apparatus and organic photoreceptor as well as its production | |
US20060147824A1 (en) | Lathe surface for coating streak suppression | |
JPH11235543A (en) | Method and device for applying paint to cylindrical base material and production of electrophotographic photoreceptor drum | |
JP2009222845A (en) | Electrophotographic device | |
JP2004258270A (en) | Method for manufacturing photoreceptor, photoreceptor, photoreceptor cartridge, and image forming apparatus | |
JPH10174922A (en) | Coating apparatus and coating method | |
JP2006162670A (en) | Electrophotographic photoreceptor, method for manufacturing electrophotographic photoreceptor, process cartridge, and electrophotographic apparatus |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL BA HR LV MK YU |
|
17P | Request for examination filed |
Effective date: 20051107 |
|
AKX | Designation fees paid |
Designated state(s): DE FR GB |
|
17Q | First examination report despatched |
Effective date: 20080107 |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: EGAWA, GO Inventor name: UMAYAHARA, TATSUSHI Inventor name: SUZUKI, SAKAE Inventor name: IIYAMA, AKIHIRO Inventor name: YAMAGUCHI, YOSHIHIRO Inventor name: HOSOKAWA, KENJI Inventor name: TAKAGI, KIFUKU |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): DE FR GB |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D |
|
REF | Corresponds to: |
Ref document number: 602005011882 Country of ref document: DE Date of ref document: 20090205 Kind code of ref document: P |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed |
Effective date: 20090925 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R082 Ref document number: 602005011882 Country of ref document: DE Representative=s name: MEISSNER BOLTE PATENTANWAELTE RECHTSANWAELTE P, DE Ref country code: DE Ref legal event code: R082 Ref document number: 602005011882 Country of ref document: DE Representative=s name: MEISSNER, BOLTE & PARTNER GBR, DE |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R082 Ref document number: 602005011882 Country of ref document: DE Representative=s name: MEISSNER, BOLTE & PARTNER GBR, DE |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 12 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 13 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 14 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20180321 Year of fee payment: 14 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20180420 Year of fee payment: 14 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20180420 Year of fee payment: 14 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R119 Ref document number: 602005011882 Country of ref document: DE |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20190413 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20191101 Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20190413 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20190430 |