EP1576650A4 - Method for microfabricating structures using silicon-on-insulator material - Google Patents

Method for microfabricating structures using silicon-on-insulator material

Info

Publication number
EP1576650A4
EP1576650A4 EP03754388A EP03754388A EP1576650A4 EP 1576650 A4 EP1576650 A4 EP 1576650A4 EP 03754388 A EP03754388 A EP 03754388A EP 03754388 A EP03754388 A EP 03754388A EP 1576650 A4 EP1576650 A4 EP 1576650A4
Authority
EP
European Patent Office
Prior art keywords
microfabricating
silicon
structures
insulator material
insulator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03754388A
Other languages
German (de)
French (fr)
Other versions
EP1576650A3 (en
EP1576650A2 (en
Inventor
William D Sawyer
Jeffrey T Borenstein
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Charles Stark Draper Laboratory Inc
Original Assignee
Charles Stark Draper Laboratory Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Charles Stark Draper Laboratory Inc filed Critical Charles Stark Draper Laboratory Inc
Publication of EP1576650A2 publication Critical patent/EP1576650A2/en
Publication of EP1576650A3 publication Critical patent/EP1576650A3/en
Publication of EP1576650A4 publication Critical patent/EP1576650A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00555Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
    • B81C1/00563Avoid or control over-etching
    • B81C1/00579Avoid charge built-up
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C3/00Assembling of devices or systems from individually processed components
    • B81C3/001Bonding of two components
EP03754388A 2002-08-15 2003-08-15 Method for microfabricating structures using silicon-on-insulator material Withdrawn EP1576650A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US40379602P 2002-08-15 2002-08-15
US403796P 2002-08-15
PCT/US2003/025435 WO2004017371A2 (en) 2002-08-15 2003-08-15 Method for microfabricating structures using silicon-on-insulator material

Publications (3)

Publication Number Publication Date
EP1576650A2 EP1576650A2 (en) 2005-09-21
EP1576650A3 EP1576650A3 (en) 2005-10-05
EP1576650A4 true EP1576650A4 (en) 2011-06-15

Family

ID=31888282

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03754388A Withdrawn EP1576650A4 (en) 2002-08-15 2003-08-15 Method for microfabricating structures using silicon-on-insulator material

Country Status (3)

Country Link
EP (1) EP1576650A4 (en)
AU (2) AU2003272215B2 (en)
WO (1) WO2004017371A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7381630B2 (en) * 2001-01-02 2008-06-03 The Charles Stark Draper Laboratory, Inc. Method for integrating MEMS device and interposer
US7253083B2 (en) 2005-06-17 2007-08-07 Northrop Grumman Corporation Method of thinning a semiconductor structure
US8735199B2 (en) * 2012-08-22 2014-05-27 Honeywell International Inc. Methods for fabricating MEMS structures by etching sacrificial features embedded in glass
DE102018200371A1 (en) 2018-01-11 2019-07-11 Robert Bosch Gmbh Interposersubstrat, MEMS device and corresponding manufacturing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000007028A1 (en) * 1998-07-31 2000-02-10 Litton Systems, Inc. Micro-mechanical semiconductor accelerometer
WO2002054475A1 (en) * 2001-01-02 2002-07-11 The Charles Stark Draper Laboratory, Inc. Method for microfabricating structures using silicon-on-insulator material

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5488012A (en) * 1993-10-18 1996-01-30 The Regents Of The University Of California Silicon on insulator with active buried regions
JP3319912B2 (en) * 1995-06-29 2002-09-03 株式会社デンソー Pedestal for semiconductor sensor and processing method thereof
US6291875B1 (en) * 1998-06-24 2001-09-18 Analog Devices Imi, Inc. Microfabricated structures with electrical isolation and interconnections
US6002507A (en) * 1998-12-01 1999-12-14 Xerox Corpoation Method and apparatus for an integrated laser beam scanner
US6433401B1 (en) * 1999-04-06 2002-08-13 Analog Devices Imi, Inc. Microfabricated structures with trench-isolation using bonded-substrates and cavities
US6277666B1 (en) * 1999-06-24 2001-08-21 Honeywell Inc. Precisely defined microelectromechanical structures and associated fabrication methods
US6458615B1 (en) * 1999-09-30 2002-10-01 Carnegie Mellon University Method of fabricating micromachined structures and devices formed therefrom
US6431714B1 (en) * 2000-10-10 2002-08-13 Nippon Telegraph And Telephone Corporation Micro-mirror apparatus and production method therefor

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000007028A1 (en) * 1998-07-31 2000-02-10 Litton Systems, Inc. Micro-mechanical semiconductor accelerometer
WO2002054475A1 (en) * 2001-01-02 2002-07-11 The Charles Stark Draper Laboratory, Inc. Method for microfabricating structures using silicon-on-insulator material

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
MOCHIDA Y ET AL: "A micromachined vibrating rate gyroscope with independent beams for the drive and detection modes", SENSORS AND ACTUATORS A, ELSEVIER SEQUOIA S.A., LAUSANNE, CH, vol. 80, no. 2, 1 March 2000 (2000-03-01), pages 170 - 178, XP004192104, ISSN: 0924-4247, DOI: 10.1016/S0924-4247(99)00263-0 *
See also references of WO2004017371A2 *

Also Published As

Publication number Publication date
WO2004017371A2 (en) 2004-02-26
EP1576650A3 (en) 2005-10-05
EP1576650A2 (en) 2005-09-21
AU2009248425A1 (en) 2010-01-07
AU2003272215A1 (en) 2004-03-03
WO2004017371A3 (en) 2005-08-18
AU2003272215B2 (en) 2009-09-10
AU2009248425B2 (en) 2012-12-20
WO2004017371A9 (en) 2004-07-08

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