EP1371745A1 - Méthode et appareil multichambre pour revêtir un substrat en verre avec un multicouche SnO/ZnO/Ag/CrNOx - Google Patents

Méthode et appareil multichambre pour revêtir un substrat en verre avec un multicouche SnO/ZnO/Ag/CrNOx Download PDF

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Publication number
EP1371745A1
EP1371745A1 EP02012818A EP02012818A EP1371745A1 EP 1371745 A1 EP1371745 A1 EP 1371745A1 EP 02012818 A EP02012818 A EP 02012818A EP 02012818 A EP02012818 A EP 02012818A EP 1371745 A1 EP1371745 A1 EP 1371745A1
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EP
European Patent Office
Prior art keywords
sputtering method
layer
zno
sputtering
silver
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
EP02012818A
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German (de)
English (en)
Inventor
Gied Rutten
Valentino Villari
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Scheuten Glasgroep BV
Original Assignee
Scheuten Glasgroep BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Scheuten Glasgroep BV filed Critical Scheuten Glasgroep BV
Priority to DE20221864U priority Critical patent/DE20221864U1/de
Priority to EP02012818A priority patent/EP1371745A1/fr
Priority to AU2003236727A priority patent/AU2003236727A1/en
Priority to PCT/EP2003/006046 priority patent/WO2003104519A1/fr
Publication of EP1371745A1 publication Critical patent/EP1371745A1/fr
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3639—Multilayers containing at least two functional metal layers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C03C17/366—Low-emissivity or solar control coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes

Definitions

  • the invention relates to a method for coating of a substrate with a layer system, one after the Process coated substrate using the layer system is coated, and a device for coating of the layer system.
  • Coated substrates are used in a wide range of technologies Application.
  • the coatings serve the purpose optical and / or chemical or mechanical properties of substrates to improve.
  • the invention relates in particular to transparent Substrates with an at least partially translucent Layer system are provided.
  • glass is here in a general sense Meaning and includes glassy materials like vitro-crystalline substances.
  • At least one layer of a reflective material is usually at least one layer of a reflective material, especially made of silver.
  • the layer is made of reflective material sufficiently thin to be permeable to most Allow rays in the visible region of the spectrum, while most of it reflects infrared radiation becomes.
  • the layer of silver is state of the art surrounded by two more layers that act as sub-blockers and top blockers.
  • the subblocker is under the silver layer on the side facing the substrate and protects the silver before diffusion of foreign atoms that are in the silver store.
  • the top blocker is on the silver layer on the side facing away from the substrate Page. It serves, for example, UV protection and Protection of the silver layer from external chemical and mechanical Impacts.
  • the additional layers protect the reflective Layer physically against abrasion and chemically against Corrosion.
  • a generic substrate is from the German Offenlegungsschrift DE 39 41 027 A1 known. With this coated substrate is a above the glass Layer of titanium dioxide, another layer of Tin oxide and another layer of titanium dioxide arranged.
  • anti-reflective layers are applied, which also reflect infrared light with high efficiency, but additionally reflect light of a wavelength in the visible range. Examples include SnO 2 , TiO 2 , Si 3 N 4 .
  • the anti-reflective silver layer is usually applied by sputtering in a non-reactive oxygen-free atmosphere, such as argon. Sputtering takes place, as shown for example in WO 00/37384, in devices in which the substrate to be coated runs through different sputtering spaces, in which different targets are bombarded in order to detach the coating material, which is then deposited on the substrate.
  • Oxidic and metallic zones are separated from one another by so-called gas separations. This means that there is a change in the composition of the atmosphere in the sputter chamber.
  • sputtering devices are used, in which the substrates are conveyed through the different zones with a conveyor belt, but coating with different layers can also be carried out in only one sputtering chamber, in which the targets and possibly the atmospheric composition are changed.
  • WO 00/37384 discloses a method in which a Silver layer with a top block made of a ZnO ceramic is coated, as well as with the ZnO ceramic layer coated silver layer on one Glass pane. Both the silver layer and the ZnO layer are in a substantially inert atmosphere sputtered on, the oxygen concentration is between 0 and 20%.
  • the silver layer of the with the inventive method coated substrate surprisingly has one Sheet resistance of only 3.7 ohms / sqr compared to one Sheet resistance of 4.2 ohms / sqr according to the state the technology in which a ZnO layer by means of an oxidic sputtered Zn targets is applied.
  • the "low-E" layer systems according to the invention exhibit same silver layer thickness and coloring an increased Transmission of 1-2.5% points. The g-value also increases by approx. 1.5%. The microcrystallinity of the ZnO is improved.
  • a preferably optically transparent substrate 1, which is to be coated with a silver layer 5, is provided with a ceramic ZnO layer 4, which serves as a sub-blocker.
  • the substrate 1, which can optionally already be coated with one or more layers 2, 3, is sputtered using a ceramic ZnO target.
  • Both the ZnO target and the sputtered ZnO layer 4 can have a weight fraction of 0.1-10% of Al s O s .
  • a particularly preferred and optimal ZnO crystal structure for improving the sheet resistance of the silver layer thereon is formed when the stoechiometry between O and Zn is as close as possible to 1, particularly preferably equal to 1. This is achieved by using a pure ceramic ZnO or ZnO / Al 2 O 3 target.
  • the admixture of Al 2 O 3 is advantageous since the cathode becomes conductive when doped with Al 2 O 3 . This is advantageous for the DC operated sputtering process. Undoped ZnO targets can also be used in an AC (medium frequency) process.
  • Sputtering is preferably carried out by means of ion bombardment with argon ions using a PVD process.
  • the argon flows are, for example, in a range of 50-450 st.cm 3 / min.
  • a preferred range is in the order of 100-350 st.cm 3 / min, particularly preferably 150-250 st.cm 3 / min.
  • the optimal ZnO layer thickness is in one range of 3-10 nm, preferably 4 nm, because of this strength the effect according to the invention, namely the reduction the resistance of the silver layer is observed is used and no longer expensive target material must become.
  • the applied layer thickness can of course also be more than 10 nm.
  • the process pressure in the sputtering chamber can be, for example, between 1.0-9.9 x 10 -3 mbar, preferably 2.5-9.0 x 10 -3 mbar.
  • a process pressure of 3.5-8.5 x 10 -3 mbar is particularly preferred.
  • Sputtering of the ZnO layer 4 preferably takes place in the metallic zone, because the advantages according to the invention only occur if there is no influence by oxygen.
  • Top layer (in oxidic zone) Sn / Sn / Sn / Gas separation: Lower blocker / silver / upper blocker: (in metallic zone) ZnO / Ag / NiCr Gas separation: .... further layers optional .... oxidic zone
  • Top layer (oxidic zone) Sn / Sn / Sn / Ti / Gas separation: Lower blocker / silver / upper blocker: (in metallic zone) ZnO / Ag / NiCr Gas separation: 7-8 additional layers of optional oxidic zone.
  • Top layer (oxidic zone) Sn / Sn / Sn / Ti / Ti Gas separation: Lower blocker / silver / upper blocker: (in metallic zone) ZnO / Ag / NiCr Gas separation: 7-8 additional layers of optional oxidic zone.
  • Upper blockers 6 and further layers, which serve as cover layers, are preferably also applied to the silver layer 5.
  • the sputtering methods known to the person skilled in the art can be used for this purpose.
  • blockers known to the person skilled in the art include TiO x , NiCrO x or ZnO or ZnO: Al 2 O 3 .
  • Cover layers are, for example, the upper blocker 6 and additional further layers 7, 8, etc., which represent interference layers.
  • the minimum number of cover layers consists of an upper blocker and one of the interference layers mentioned below. At least one cover layer is preferably applied. However, the top layer has no influence on the improvement of the microcrystallinity of the silver.
  • compositions for the top layer are:
  • Blocker / at least one interference layer Blocker / at least one interference layer:
  • compositions for the cover layer are exemplary of a cover layer which consists of at least one blocker and at least one interference layer.
  • SnO 2 , ZnO or Bi 2 O 3 can be mentioned as examples of interference layers. In practice, however, at least two interference layers are preferably applied.
  • Combinations with Si 3 N 4 and SiO 2 are also possible.
  • all transparent layers can be used that have a refractive index between 1.4 and 2.6.
  • the cover layers or top layers of the layer system can be sputtered on oxidically or nitridically and, if ceramic targets are used, metallically, that is to say without any additional entry of reactive gas.
  • Ceramic targets have the advantage that they have a higher sputtering rate for the same performance and that the theoretically possible refractive index is always formed due to the almost stoichiometric composition of the layer.
  • a particularly great advantage is achieved when a ceramic blocker is used. Just like the ZnO: Al 2 O 3 subblocker, this can be used in the metallic zone.
  • the ideal proportion of oxygen in the target leads to an optimal oxidation and thus an additional 1 to 2% transmission points are obtained with the Low E compared to a metallic blocker.
  • the layer thickness ranges for the top and top layers are preferably between 25 and 65 nm at low-E Layer system and at 12 and 45 nm with a double silver system.
  • Double silver coating systems can also be used according to the same scheme or also multiple silver coating systems are produced in which at least one silver layer layered with ceramic ZnO as a sub-blocker which have the same advantages and referred to as a double or multiple low-E system can be.
  • SnO 2 30-35 nm / ZnO 3-10 nm / Ag 8-18 nm / NiCrO x 2-6 nm / SnO 2 55-65 nm / ZnO: SnO 2 : Al 2 O 3 3-10 nm / Ag 12- 25 nm / NiCrO x 2-6 nm / SnO 2 20 nm / ZnO: SnO 2 : Al 2 O 3 3-10 nm.
  • each interference layer is interchangeable is.
  • TiO x , NiCrO x or ZnO or ZnO: Al 2 O 3 can be used for top blockers.
  • Layers in particular made of TiO 2 , SiO 2 but also NiCrO x , can also be applied by sputtering oxidic ceramics.
  • a suitable device for performing the invention Procedure includes those given below Ingredients.
  • FIG. 2 shows a device according to the invention, in which a transport means 1 for a substrate passes through the sputtering chambers 2 and 3 in the transport direction.
  • Sputter chamber 2 contains a target 4, which consists of ZnO or essentially ZnO.
  • the ZnO target can contain 0 to 10% Al 2 O 3 , but should have a ZnO oxygen ratio of essentially 1 to 1.
  • Sputtering chamber 3 contains a silver target 5.
  • the sputtering chambers 2 and 3 are separated from one another by a gas lock 6 - as a means of separating two sputtering chambers from different gas compositions.
  • Another sputtering chamber 7 adjoins the sputtering chamber 3, which is also separated from the sputtering chamber 3 by a gas lock.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
EP02012818A 2002-06-10 2002-06-10 Méthode et appareil multichambre pour revêtir un substrat en verre avec un multicouche SnO/ZnO/Ag/CrNOx Ceased EP1371745A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE20221864U DE20221864U1 (de) 2002-06-10 2002-06-10 Substrat beschichtet mit einem Schichtsystem
EP02012818A EP1371745A1 (fr) 2002-06-10 2002-06-10 Méthode et appareil multichambre pour revêtir un substrat en verre avec un multicouche SnO/ZnO/Ag/CrNOx
AU2003236727A AU2003236727A1 (en) 2002-06-10 2003-06-10 Method and device for coating a substrate with a layer system (zno+ag) and coated substrate
PCT/EP2003/006046 WO2003104519A1 (fr) 2002-06-10 2003-06-10 Procede et dispositif permettant de recouvrir un substrat au moyen d'un systeme de couches (zno+ag) et substrat ainsi recouvert

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02012818A EP1371745A1 (fr) 2002-06-10 2002-06-10 Méthode et appareil multichambre pour revêtir un substrat en verre avec un multicouche SnO/ZnO/Ag/CrNOx

Publications (1)

Publication Number Publication Date
EP1371745A1 true EP1371745A1 (fr) 2003-12-17

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EP02012818A Ceased EP1371745A1 (fr) 2002-06-10 2002-06-10 Méthode et appareil multichambre pour revêtir un substrat en verre avec un multicouche SnO/ZnO/Ag/CrNOx

Country Status (4)

Country Link
EP (1) EP1371745A1 (fr)
AU (1) AU2003236727A1 (fr)
DE (1) DE20221864U1 (fr)
WO (1) WO2003104519A1 (fr)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1538131A1 (fr) * 2003-12-02 2005-06-08 Scheuten Glasgroep Empilement multicouche à basse émissivité trempable, procédé pour la fabrication et produit en verre à basse émissivité avec systeme multicouche
EP1693351A1 (fr) * 2005-02-21 2006-08-23 INTERPANE Entwicklungs- und Beratungsgesellschaft mbH & Co. KG Revêtement réflecteur de chaleur
WO2010057504A2 (fr) * 2008-11-19 2010-05-27 Scheuten S.A.R.L. Système de serre
DE102004021734B4 (de) * 2004-04-30 2010-09-02 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur kontinuierlichen Beschichtung flacher Substrate mit optisch aktiven Schichtsystemen
EP1851354B2 (fr) † 2005-01-19 2019-03-06 Guardian Glass, LLC Procede de fabrication de revetement de faible teneur en e a l'aide d'une cible contenant du zinc ceramique, et cible utilisee dans ledit procede
WO2021094765A1 (fr) * 2019-11-13 2021-05-20 Pilkington Group Limited Substrat de verre revêtu
US11685688B2 (en) 2018-10-22 2023-06-27 Mimsi Materials Ab Glazing and method of its production
US12017951B2 (en) 2019-11-13 2024-06-25 Pilkington Group Limited Coated glass substrate

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7563347B2 (en) 2004-06-25 2009-07-21 Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) Method of forming coated article using sputtering target(s) and ion source(s) and corresponding apparatus
US7311975B2 (en) 2004-06-25 2007-12-25 Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) Coated article having low-E coating with ion beam treated IR reflecting layer and corresponding method
US9822454B2 (en) * 2006-12-28 2017-11-21 3M Innovative Properties Company Nucleation layer for thin film metal layer formation

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FR2586245A1 (fr) * 1985-08-19 1987-02-20 Nippon Sheet Glass Co Ltd Procede de fabrication d'un verre reflecteur de chaleur
EP0464789A1 (fr) * 1990-07-05 1992-01-08 Asahi Glass Company Ltd. Film à faible émittance
EP0870601A2 (fr) * 1996-04-10 1998-10-14 Saint-Gobain Vitrage Vitrage thermiquement isolant à basse émissivité
US5962115A (en) * 1995-06-08 1999-10-05 Balzers Und Leybold Deutschland Holding Ag Pane of transparent material having a low emissivity
US6336999B1 (en) * 2000-10-11 2002-01-08 Centre Luxembourgeois De Recherches Pour Le Verre Et Al Ceramique S.A. (C.R.V.C.) Apparatus for sputter-coating glass and corresponding method
US20020021495A1 (en) * 2000-07-10 2002-02-21 Lingle Philip J. High durable, low-E, heat treatable layer coating system
US6355334B1 (en) * 1998-10-22 2002-03-12 Saint-Gobain Vitrage Transparent substrate provided with a thin-film stack
US6398925B1 (en) * 1998-12-18 2002-06-04 Ppg Industries Ohio, Inc. Methods and apparatus for producing silver based low emissivity coatings without the use of metal primer layers and articles produced thereby

Family Cites Families (1)

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Publication number Priority date Publication date Assignee Title
GB8900166D0 (en) 1989-01-05 1989-03-01 Glaverbel Glass coating

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2586245A1 (fr) * 1985-08-19 1987-02-20 Nippon Sheet Glass Co Ltd Procede de fabrication d'un verre reflecteur de chaleur
EP0464789A1 (fr) * 1990-07-05 1992-01-08 Asahi Glass Company Ltd. Film à faible émittance
US5962115A (en) * 1995-06-08 1999-10-05 Balzers Und Leybold Deutschland Holding Ag Pane of transparent material having a low emissivity
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EP1538131A1 (fr) * 2003-12-02 2005-06-08 Scheuten Glasgroep Empilement multicouche à basse émissivité trempable, procédé pour la fabrication et produit en verre à basse émissivité avec systeme multicouche
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EP1851354B2 (fr) † 2005-01-19 2019-03-06 Guardian Glass, LLC Procede de fabrication de revetement de faible teneur en e a l'aide d'une cible contenant du zinc ceramique, et cible utilisee dans ledit procede
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WO2010057504A3 (fr) * 2008-11-19 2011-12-08 Scheuten S.A.R.L. Système de serre
US11685688B2 (en) 2018-10-22 2023-06-27 Mimsi Materials Ab Glazing and method of its production
US12006250B2 (en) 2018-10-22 2024-06-11 Mimsi Materials Ab Glazing and method of its production
WO2021094765A1 (fr) * 2019-11-13 2021-05-20 Pilkington Group Limited Substrat de verre revêtu
CN114728841A (zh) * 2019-11-13 2022-07-08 皮尔金顿集团有限公司 涂覆的玻璃基板
US12017951B2 (en) 2019-11-13 2024-06-25 Pilkington Group Limited Coated glass substrate

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DE20221864U1 (de) 2008-10-09

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