EP1318524A3 - X-ray optical system and method for imaging a source - Google Patents

X-ray optical system and method for imaging a source Download PDF

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Publication number
EP1318524A3
EP1318524A3 EP02026625A EP02026625A EP1318524A3 EP 1318524 A3 EP1318524 A3 EP 1318524A3 EP 02026625 A EP02026625 A EP 02026625A EP 02026625 A EP02026625 A EP 02026625A EP 1318524 A3 EP1318524 A3 EP 1318524A3
Authority
EP
European Patent Office
Prior art keywords
ray
source
imaging
optical system
mirrors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP02026625A
Other languages
German (de)
French (fr)
Other versions
EP1318524B1 (en
EP1318524A2 (en
Inventor
Joachim Lange
Detlef Bahr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bruker AXS GmbH
Original Assignee
Bruker AXS GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bruker AXS GmbH filed Critical Bruker AXS GmbH
Publication of EP1318524A2 publication Critical patent/EP1318524A2/en
Publication of EP1318524A3 publication Critical patent/EP1318524A3/en
Application granted granted Critical
Publication of EP1318524B1 publication Critical patent/EP1318524B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Lenses (AREA)

Abstract

Ein Röntgen-optisches System mit zwei Röntgen-Spiegeln (A, B) zum Abbilden einer Röntgen-Quelle (S) auf einen Zielbereich, ist dadurch gekennzeichnet, dass die Röntgen-Spiegel (A, B) abweichend von 90° derart gegeneinander verkippt angeordnet sind, dass der kombinierte Akzeptanzbereich der Röntgen-Spiegel (A, B) an die Form der Röntgen-Quelle (S) und/oder des Zielbereichs angepasst ist. Dadurch wird mit geringen und technischen einfachen Modifikationen problemlos eine Erhöhung der Intensität der fokussierten Röntgen-Strahlung auf der Probe bei gleichbleibender Emissionsleistung der Röntgen-Quelle (S) ermöglicht.

Figure imgaf001
An X-ray optical system with two X-ray mirrors (A, B) for imaging an X-ray source (S) on a target area is characterized in that the X-ray mirrors (A, B) are tilted so as to be tilted 90 ° relative to one another in that the combined acceptance range of the X-ray mirrors (A, B) is adapted to the shape of the X-ray source (S) and / or the target area. As a result, it is possible to increase the intensity of the focused X-ray radiation on the specimen with constant emission power of the X-ray source (S) without problems with small and simple technical modifications.
Figure imgaf001
EP02026625A 2001-12-08 2002-11-29 X-ray optical system and method for imaging a source Expired - Lifetime EP1318524B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10160472A DE10160472B4 (en) 2001-12-08 2001-12-08 X-ray optical system and method for imaging a radiation source
DE10160472 2001-12-08

Publications (3)

Publication Number Publication Date
EP1318524A2 EP1318524A2 (en) 2003-06-11
EP1318524A3 true EP1318524A3 (en) 2007-07-04
EP1318524B1 EP1318524B1 (en) 2009-03-18

Family

ID=7708587

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02026625A Expired - Lifetime EP1318524B1 (en) 2001-12-08 2002-11-29 X-ray optical system and method for imaging a source

Country Status (3)

Country Link
US (1) US6925147B2 (en)
EP (1) EP1318524B1 (en)
DE (1) DE10160472B4 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7280634B2 (en) * 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
DE102005057700A1 (en) 2005-11-25 2007-06-06 Axo Dresden Gmbh X-ray optical element
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
DE102010062472A1 (en) * 2010-12-06 2012-06-06 Bruker Axs Gmbh Dot-dash Converter
US10153062B2 (en) 2015-06-30 2018-12-11 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Illumination and imaging device for high-resolution X-ray microscopy with high photon energy

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5259013A (en) * 1991-12-17 1993-11-02 The United States Of America As Represented By The Secretary Of Commerce Hard x-ray magnification apparatus and method with submicrometer spatial resolution of images in more than one dimension
JPH06294899A (en) * 1993-04-09 1994-10-21 Mc Sci:Kk Curved total reflection mirror camera
WO1995031815A1 (en) * 1994-05-11 1995-11-23 The Regents Of The University Of Colorado Spherical mirror grazing incidence x-ray optics
US5615245A (en) * 1995-02-27 1997-03-25 Japan Atomic Energy Research Institute Monochromator for radiant X-rays
WO1999043009A1 (en) * 1998-02-19 1999-08-26 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
EP0943914A2 (en) * 1998-03-20 1999-09-22 Rigaku Corporation Apparatus for X-ray analysis
US6049588A (en) * 1997-07-10 2000-04-11 Focused X-Rays X-ray collimator for lithography
US6282259B1 (en) * 1999-09-10 2001-08-28 Rigaku/Msc, Inc. X-ray mirror system providing enhanced signal concentration

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6167111A (en) * 1997-07-02 2000-12-26 Canon Kabushiki Kaisha Exposure apparatus for synchrotron radiation lithography
US6014423A (en) * 1998-02-19 2000-01-11 Osmic, Inc. Multiple corner Kirkpatrick-Baez beam conditioning optic assembly
DE19833524B4 (en) * 1998-07-25 2004-09-23 Bruker Axs Gmbh X-ray analyzer with gradient multilayer mirror
US6195410B1 (en) * 1999-01-26 2001-02-27 Focused X-Rays, Llc X-ray interferometer
US6327335B1 (en) * 1999-04-13 2001-12-04 Vanderbilt University Apparatus and method for three-dimensional imaging using a stationary monochromatic x-ray beam
US6625250B2 (en) * 1999-12-20 2003-09-23 Agere Systems Inc. Optical structures and methods for x-ray applications

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5259013A (en) * 1991-12-17 1993-11-02 The United States Of America As Represented By The Secretary Of Commerce Hard x-ray magnification apparatus and method with submicrometer spatial resolution of images in more than one dimension
JPH06294899A (en) * 1993-04-09 1994-10-21 Mc Sci:Kk Curved total reflection mirror camera
WO1995031815A1 (en) * 1994-05-11 1995-11-23 The Regents Of The University Of Colorado Spherical mirror grazing incidence x-ray optics
US5615245A (en) * 1995-02-27 1997-03-25 Japan Atomic Energy Research Institute Monochromator for radiant X-rays
US6049588A (en) * 1997-07-10 2000-04-11 Focused X-Rays X-ray collimator for lithography
WO1999043009A1 (en) * 1998-02-19 1999-08-26 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
EP0943914A2 (en) * 1998-03-20 1999-09-22 Rigaku Corporation Apparatus for X-ray analysis
US6282259B1 (en) * 1999-09-10 2001-08-28 Rigaku/Msc, Inc. X-ray mirror system providing enhanced signal concentration

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SAUNEUF R ET AL: "LARGE-FIELD HIGH-RESOLUTION X-RAY MICROSCOPE FOR STUDYING LASER PLASMAS", REVIEW OF SCIENTIFIC INSTRUMENTS, AIP, MELVILLE, NY, US, vol. 68, no. 9, September 1997 (1997-09-01), pages 3412 - 3420, XP000723533, ISSN: 0034-6748 *

Also Published As

Publication number Publication date
US6925147B2 (en) 2005-08-02
US20030108153A1 (en) 2003-06-12
EP1318524B1 (en) 2009-03-18
DE10160472A1 (en) 2003-06-26
DE10160472B4 (en) 2004-06-03
EP1318524A2 (en) 2003-06-11

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