EP1318524A3 - X-ray optical system and method for imaging a source - Google Patents
X-ray optical system and method for imaging a source Download PDFInfo
- Publication number
- EP1318524A3 EP1318524A3 EP02026625A EP02026625A EP1318524A3 EP 1318524 A3 EP1318524 A3 EP 1318524A3 EP 02026625 A EP02026625 A EP 02026625A EP 02026625 A EP02026625 A EP 02026625A EP 1318524 A3 EP1318524 A3 EP 1318524A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- ray
- source
- imaging
- optical system
- mirrors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003384 imaging method Methods 0.000 title abstract 2
- 230000003287 optical effect Effects 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 238000012986 modification Methods 0.000 abstract 1
- 230000004048 modification Effects 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Lenses (AREA)
Abstract
Ein Röntgen-optisches System mit zwei Röntgen-Spiegeln (A, B) zum Abbilden einer Röntgen-Quelle (S) auf einen Zielbereich, ist dadurch gekennzeichnet, dass die Röntgen-Spiegel (A, B) abweichend von 90° derart gegeneinander verkippt angeordnet sind, dass der kombinierte Akzeptanzbereich der Röntgen-Spiegel (A, B) an die Form der Röntgen-Quelle (S) und/oder des Zielbereichs angepasst ist. Dadurch wird mit geringen und technischen einfachen Modifikationen problemlos eine Erhöhung der Intensität der fokussierten Röntgen-Strahlung auf der Probe bei gleichbleibender Emissionsleistung der Röntgen-Quelle (S) ermöglicht. An X-ray optical system with two X-ray mirrors (A, B) for imaging an X-ray source (S) on a target area is characterized in that the X-ray mirrors (A, B) are tilted so as to be tilted 90 ° relative to one another in that the combined acceptance range of the X-ray mirrors (A, B) is adapted to the shape of the X-ray source (S) and / or the target area. As a result, it is possible to increase the intensity of the focused X-ray radiation on the specimen with constant emission power of the X-ray source (S) without problems with small and simple technical modifications.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10160472A DE10160472B4 (en) | 2001-12-08 | 2001-12-08 | X-ray optical system and method for imaging a radiation source |
DE10160472 | 2001-12-08 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1318524A2 EP1318524A2 (en) | 2003-06-11 |
EP1318524A3 true EP1318524A3 (en) | 2007-07-04 |
EP1318524B1 EP1318524B1 (en) | 2009-03-18 |
Family
ID=7708587
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02026625A Expired - Lifetime EP1318524B1 (en) | 2001-12-08 | 2002-11-29 | X-ray optical system and method for imaging a source |
Country Status (3)
Country | Link |
---|---|
US (1) | US6925147B2 (en) |
EP (1) | EP1318524B1 (en) |
DE (1) | DE10160472B4 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7280634B2 (en) * | 2003-06-13 | 2007-10-09 | Osmic, Inc. | Beam conditioning system with sequential optic |
DE102005057700A1 (en) | 2005-11-25 | 2007-06-06 | Axo Dresden Gmbh | X-ray optical element |
US7920676B2 (en) * | 2007-05-04 | 2011-04-05 | Xradia, Inc. | CD-GISAXS system and method |
DE102010062472A1 (en) | 2010-12-06 | 2012-06-06 | Bruker Axs Gmbh | Dot-dash Converter |
US10153062B2 (en) * | 2015-06-30 | 2018-12-11 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Illumination and imaging device for high-resolution X-ray microscopy with high photon energy |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5259013A (en) * | 1991-12-17 | 1993-11-02 | The United States Of America As Represented By The Secretary Of Commerce | Hard x-ray magnification apparatus and method with submicrometer spatial resolution of images in more than one dimension |
JPH06294899A (en) * | 1993-04-09 | 1994-10-21 | Mc Sci:Kk | Curved total reflection mirror camera |
WO1995031815A1 (en) * | 1994-05-11 | 1995-11-23 | The Regents Of The University Of Colorado | Spherical mirror grazing incidence x-ray optics |
US5615245A (en) * | 1995-02-27 | 1997-03-25 | Japan Atomic Energy Research Institute | Monochromator for radiant X-rays |
WO1999043009A1 (en) * | 1998-02-19 | 1999-08-26 | Osmic, Inc. | Single corner kirkpatrick-baez beam conditioning optic assembly |
EP0943914A2 (en) * | 1998-03-20 | 1999-09-22 | Rigaku Corporation | Apparatus for X-ray analysis |
US6049588A (en) * | 1997-07-10 | 2000-04-11 | Focused X-Rays | X-ray collimator for lithography |
US6282259B1 (en) * | 1999-09-10 | 2001-08-28 | Rigaku/Msc, Inc. | X-ray mirror system providing enhanced signal concentration |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6167111A (en) * | 1997-07-02 | 2000-12-26 | Canon Kabushiki Kaisha | Exposure apparatus for synchrotron radiation lithography |
US6014423A (en) * | 1998-02-19 | 2000-01-11 | Osmic, Inc. | Multiple corner Kirkpatrick-Baez beam conditioning optic assembly |
DE19833524B4 (en) * | 1998-07-25 | 2004-09-23 | Bruker Axs Gmbh | X-ray analyzer with gradient multilayer mirror |
EP1110224A2 (en) * | 1999-01-26 | 2001-06-27 | Focused X-Rays LLC | X-ray interferometer |
US6327335B1 (en) * | 1999-04-13 | 2001-12-04 | Vanderbilt University | Apparatus and method for three-dimensional imaging using a stationary monochromatic x-ray beam |
US6625250B2 (en) * | 1999-12-20 | 2003-09-23 | Agere Systems Inc. | Optical structures and methods for x-ray applications |
-
2001
- 2001-12-08 DE DE10160472A patent/DE10160472B4/en not_active Expired - Fee Related
-
2002
- 2002-11-25 US US10/302,918 patent/US6925147B2/en not_active Expired - Lifetime
- 2002-11-29 EP EP02026625A patent/EP1318524B1/en not_active Expired - Lifetime
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5259013A (en) * | 1991-12-17 | 1993-11-02 | The United States Of America As Represented By The Secretary Of Commerce | Hard x-ray magnification apparatus and method with submicrometer spatial resolution of images in more than one dimension |
JPH06294899A (en) * | 1993-04-09 | 1994-10-21 | Mc Sci:Kk | Curved total reflection mirror camera |
WO1995031815A1 (en) * | 1994-05-11 | 1995-11-23 | The Regents Of The University Of Colorado | Spherical mirror grazing incidence x-ray optics |
US5615245A (en) * | 1995-02-27 | 1997-03-25 | Japan Atomic Energy Research Institute | Monochromator for radiant X-rays |
US6049588A (en) * | 1997-07-10 | 2000-04-11 | Focused X-Rays | X-ray collimator for lithography |
WO1999043009A1 (en) * | 1998-02-19 | 1999-08-26 | Osmic, Inc. | Single corner kirkpatrick-baez beam conditioning optic assembly |
EP0943914A2 (en) * | 1998-03-20 | 1999-09-22 | Rigaku Corporation | Apparatus for X-ray analysis |
US6282259B1 (en) * | 1999-09-10 | 2001-08-28 | Rigaku/Msc, Inc. | X-ray mirror system providing enhanced signal concentration |
Non-Patent Citations (1)
Title |
---|
SAUNEUF R ET AL: "LARGE-FIELD HIGH-RESOLUTION X-RAY MICROSCOPE FOR STUDYING LASER PLASMAS", REVIEW OF SCIENTIFIC INSTRUMENTS, AIP, MELVILLE, NY, US, vol. 68, no. 9, September 1997 (1997-09-01), pages 3412 - 3420, XP000723533, ISSN: 0034-6748 * |
Also Published As
Publication number | Publication date |
---|---|
DE10160472A1 (en) | 2003-06-26 |
US6925147B2 (en) | 2005-08-02 |
US20030108153A1 (en) | 2003-06-12 |
DE10160472B4 (en) | 2004-06-03 |
EP1318524A2 (en) | 2003-06-11 |
EP1318524B1 (en) | 2009-03-18 |
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