EP1310829B1 - Appareil lithographique et méthode de fabrication d'un dispositif - Google Patents

Appareil lithographique et méthode de fabrication d'un dispositif Download PDF

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Publication number
EP1310829B1
EP1310829B1 EP02257697A EP02257697A EP1310829B1 EP 1310829 B1 EP1310829 B1 EP 1310829B1 EP 02257697 A EP02257697 A EP 02257697A EP 02257697 A EP02257697 A EP 02257697A EP 1310829 B1 EP1310829 B1 EP 1310829B1
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EP
European Patent Office
Prior art keywords
frame
optical member
radiation
membrane
projection
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
EP02257697A
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German (de)
English (en)
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EP1310829A1 (fr
Inventor
Dominicus Jacobus Petrus Adrianus Franken
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ASML Netherlands BV
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ASML Netherlands BV
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Publication of EP1310829A1 publication Critical patent/EP1310829A1/fr
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Definitions

  • the present invention relates to a lithographic projection apparatus comprising:
  • patterning means as here employed should be broadly interpreted as referring to means that can be used to endow an incoming radiation beam with a patterned cross-section, corresponding to a pattern that is to be created in a target portion of the substrate; the term “light valve” can also be used in this context.
  • the said pattern will correspond to a particular functional layer in a device being created in the target portion, such as an integrated circuit or other device (see below). Examples of such patterning means include:
  • Lithographic projection apparatus can be used, for example, in the manufacture of integrated circuits (ICs).
  • the patterning means may generate a circuit pattern corresponding to an individual layer of the IC, and this pattern can be imaged onto a target portion (e.g . comprising one or more dies) on a substrate (silicon wafer) that has been coated with a layer of radiation-sensitive material (resist).
  • a target portion e.g . comprising one or more dies
  • a substrate silicon wafer
  • a layer of radiation-sensitive material resist
  • a single wafer will contain a whole network of adjacent target portions that are successively irradiated via the projection system, one at a time.
  • employing patterning by a mask on a mask table a distinction can be made between two different types of machine.
  • each target portion is irradiated by exposing the entire mask pattern onto the target portion in one go; such an apparatus is commonly referred to as a wafer stepper.
  • each target portion is irradiated by progressively scanning the mask pattern under the projection beam in a given reference direction (the "scanning" direction) while synchronously scanning the substrate table parallel or anti-parallel to this direction; since, in general, the projection system will have a magnification factor M (generally ⁇ 1), the speed V at which the substrate table is scanned will be a factor M times that at which the mask table is scanned.
  • M magnification factor
  • a pattern (e.g. in a mask) is imaged onto a substrate that is at least partially covered by a layer of radiation-sensitive material (resist).
  • the substrate Prior to this imaging step, the substrate may undergo various procedures, such as priming, resist coating and a soft bake. After exposure, the substrate may be subjected to other procedures, such as a post-exposure bake (PEB), development, a hard bake and measurement/inspection of the imaged features.
  • PEB post-exposure bake
  • This array of procedures is used as a basis to pattern an individual layer of a device, e.g. an IC.
  • Such a patterned layer may then undergo various processes such as etching, ion-implantation (doping), metallization, oxidation, chemo-mechanical polishing, etc., all intended to finish off an individual layer. If several layers are required, then the whole procedure, or a variant thereof, will have to be repeated for each new layer. Eventually, an array of devices will be present on the substrate (wafer). These devices are then separated from one another by a technique such as dicing or sawing, whence the individual devices can be mounted on a carrier, connected to pins, etc. Further information regarding such processes can be obtained, for example, from the book “Microchip Fabrication: A Practical Guide to Semiconductor Processing", Third Edition, by Peter van Zant, McGraw Hill Publishing Co., 1997, ISBN 0-07-067250-4.
  • the projection system may hereinafter be referred to as the "lens"; however, this term should be broadly interpreted as encompassing various types of projection system, including refractive optics, reflective optics, and catadioptric systems, for example.
  • the radiation system may also include components operating according to any of these design types for directing, shaping or controlling the projection beam of radiation, and such components may also be referred to below, collectively or singularly, as a "lens".
  • the lithographic apparatus may be of a type having two or more substrate tables (and/or two or more mask tables). In such "multiple stage” devices the additional tables may be used in parallel, or preparatory steps may be carried out on one or more tables while one or more other tables are being used for exposures. Twin stage lithographic apparatus are described, for example, in US 5,969,441 and WO 98/40791.
  • wavelengths of the projection beam of radiation it is desirable to reduce the wavelength of the projection beam of radiation. It has been proposed to use wavelengths of less than about 200 nm, for example 193 nm, 157 nm or 126 nm. Further reductions in the wavelength to the range of EUV (extreme ultra-violet radiation, e.g. having a wavelength in the range of 5-20 nm) are envisaged. Such wavelengths in particular are more conveniently focused and controlled by reflective optics, such as mirrors. However, mirrors in lithography apparatus must be positioned to especially high accuracy, as compared to refractive elements, because any rotational orientation errors are magnified by the total downstream optical path length. In any apparatus using very short wavelength radiation, the optical path length may be of the order of 2 m or more.
  • the projection system of a lithographic projection apparatus that is used in "scan mode" (the meaning of "scan mode” has been explained before and will be explained hereafter with reference to the accompanying drawings) and that uses EUV may include six mirrors, for example, for reflecting and thereby projecting the patterned beam onto a target portion of the substrate. In this case, the mirrors are to be positioned relative to each other with an accuracy of about 0.1 nm. It has been proposed before to use a plurality of actuators for adjusting the position and/or orientation of a reflective optical element. For example, a corresponding arrangement is described in EP 1107068 A2. This document describes the use of position sensors to maintain the reflective element stationary in spite of vibrations that might occur.
  • An optical member generally has six independent degrees of freedom (DOF), three transational and three rotational DOF.
  • DOF degrees of freedom
  • the actuators may be piezoelectric, electroresistive or magnetoresistive and act, for example, perpendicularly to a surface of the optical member which extends transversely to the beam of radiation incident at the optical member.
  • the combination of the actuators or the combination of at least one actuator with other moveable devices, such as a gravity compensator might deform the optical member, for example due to excessive and/or undesired differential forces.
  • Mounting frames for lithographic optical members are known from EP-0,620,464A, US 6,147,818A, JP 10-186198A and JP 2001 291665A.
  • EP-0,938,009A is considered as the closest prior art for the present invention and discloses a lithographic projection apparatus comprising a mounting frame with a cut-out area in which an optical element is held by a plurality of tabs which are 8mm long by 30mm wide and are 4mm thick and made of aluminium.
  • EP-1,026,532 discloses a membrane ring with tabs connecting an optical member in a cut-out of a frame to the frame.
  • a lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the substrate, and wherein the radiation system and/or the projection system comprises at least one optical member, which is supported by and connected to said mounting frame, at least part of the optical member being within the frame, which is connected to at least one other component of the radiation system and/or the projection system; wherein the connection between the frame and the optical member comprises a membrane-like portion located in a cut-out area of the frame and held at its outer circumference by the frame, wherein the optical member is connected to a central area of the membrane-like portion, whereby the optical member is supported by the frame and wherein the optical member is not positioned in the cut-out area.
  • the optical member is for example a mirror or a lens.
  • the mounting frame shields the optical member against undesired influences which might be caused and/or transferred by the at least one other component of the lithographic projection apparatus to which the frame is connected.
  • the frame can significantly reduce deformation of the optical member due to the frame's stiffness.
  • the membrane-like portion extends within a plane including its outer circumference and the central area where it is indirectly or directly connected to the optical member.
  • the outer circumference extends along a circular line.
  • the membrane-like portion may be circular.
  • the membrane-like portion comprises a plurality of spokes which extend from the central area to the outer circumference. The spokes may be separate parts of the membrane-like portion or may be connected by at least one further part of the membrane-like portion, for example by a ring-like part at the outer circumference and/or in the central area.
  • the membrane-like portion decouples the optical member from the frame with respect to deformations of the frame that might occur in spite of the frame's stiffness.
  • the membrane-like portion may deform in a first direction perpendicular to a second direction in which the membrane-like portion extends.
  • the membrane-like portion can compensate a deformation of the frame in a direction opposite to the first direction.
  • the optical member stays in place, without deformation or displacement.
  • the membrane-like portion is also able to decouple translation of the frame along a direction perpendicular to the plane of the membrane-like portion.
  • the membrane-like portion is sheet-like, it can decouple the optical member from the frame regarding deformations of the frame in at least (but not only) two rotational degrees of freedom (DOFs) namely the DOFs with respect to two perpendicular rotational axes extending within the plane in which the sheet-like portion extends.
  • DOFs rotational degrees of freedom
  • the membrane-like portion comprises a plurality of spokes, it can decouple the optical member even regarding the rotational DOF with respect to the rotational axis that extends through the center of the spokes perpendicularly to a plane in which and/or along which the spokes extend.
  • the decoupling regarding rotational DOF is particularly useful, if the membrane-like portion is used for connecting the optical member to the frame in order to provide enough stiffness in one or two linear DOFs in which the optical member is to be moved or displaced, but to avoid undesired displacement in the other DOFs.
  • an actuator or an arrangement of plural actuators which causes displacement in the desired DOF might also cause undesired displacement or deformation of the frame in the other DOFs.
  • the frame comprises a plurality of struts which may extend within a plane of the frame within which the optical member is enclosed by the frame.
  • the struts are connected at corners of the frame so as to form a frame structure with at least three corners.
  • the frame structure has exactly three corners where the struts are connected.
  • the frame is particularly stiff and light.
  • the stiffness with respect to undesired forces acting from the outside of the frame in one of the directions of the plane is particularly large.
  • the planar structure allows radiation to be incident at the optical member in a wide sector of directions transverse to the plane in which the struts extend.
  • the frame structure may comprise a corner element which connects two of the struts at one of the corners of the frame structure.
  • the corner element may serve to establish a connection of the frame to the at least one other component of the apparatus.
  • the corner element may be an actuator or part of an actuator for adjusting and/or amending the position of the optical member.
  • the stiffness of the frame can be further improved by a stiffening member for stiffening the frame structure wherein the stiffening member extends between two of the struts which are connected at one of the corners so as to connect the two struts and so as to leave a hollow space in between the two struts, the stiffening member and the corner. Also, it is possible to provide pairs or groups of stiffening members located at the surface of the same hollow space. Further, the stiffness can be improved by providing a member which fills the angle between the two struts in the region of the corner where the two struts are connected.
  • the outer configuration of the struts may be plate-like which means that the outer dimensions are equal to the dimensions of a plate.
  • the struts may be solid or hollow, in order to reduce the weight.
  • the plate-like struts may each extend between two of the corners wherein the widths of the struts in a direction perpendicular to said plane are greater than a thickness of the struts measured in said plane in a direction perpendicular to a line which connects the respective two corners.
  • This construction is light and stiff, not only with respect to directions in the plane of the frame structure, but also with respect to directions transverse to this plane.
  • two struts which are connected to each other have equal lengths and are arranged symmetrically to each other. Most preferably, all side lengths of the frame structure between the corners are equal.
  • a regular and symmetric structure comprises equal stiffnesses with respect to different directions and is particularly stiff.
  • the optical member is preferably connected to the frame structure at respective locations half way between each two of the corners.
  • this embodiment enables to keep the lengths of the connections between the frame structure and the optical member short. A short connection is less likely to deform with large amplitudes.
  • the equally sided frame can effectively decouple the optical member from the at least one other component of the apparatus with respect to deformations, in particular when the other component is connected to the frame at one of the corners.
  • the frame is symmetric to the plane in which the frame extends.
  • the optical member is arranged symmetrically to the plane.
  • a symmetric arrangement is more resistant to undesired de-formations, for example due to changes in temperature.
  • At least one actuator for adjusting the position and/or the orientation of the frame and thereby of the optical member is connected to the frame.
  • a direction or rotational axis of an actuation caused by the actuator is aligned with an axis of symmetry of the frame and/or the actuation direction or rotational axis is part of the plane in which the frame extends.
  • the connection of the actuator to the frame is established at a location which includes a point or area within said plane.
  • a device manufacturing method comprising the steps of:
  • the method includes the step of adjusting the propagation direction of the projection beam of radiation or of the patterned beam by adjusting the position and/or the orientation of the mounting frame, thereby adjusting the position and/or the orientation of the optical member. Due to the stiffness and/or the decoupling effect of the mounting frame that are described above, the position and/or the orientation of the mounting frame can be kept very stable. For example, it is therefore possible to reduce the dimensions of structures which are generated by lithography on a substrate, in particular when short-wave radiation is used, e.g. EUV.
  • the terms "radiation” and “beam” are used to encompass all types of electromagnetic radiation, including ultraviolet radiation (e.g. with a wavelength of 365, 248, 193, 157 or 126 nm) and EUV (extreme ultra-violet radiation, e.g. having a wavelength in the range 5-20 nm), as well as particle beams, such as ion beams or electron beams.
  • ultraviolet radiation e.g. with a wavelength of 365, 248, 193, 157 or 126 nm
  • EUV extreme ultra-violet radiation, e.g. having a wavelength in the range 5-20 nm
  • particle beams such as ion beams or electron beams.
  • Figure 1 schematically depicts a lithographic projection apparatus according to a particular embodiment of the invention.
  • the apparatus comprises:
  • the source LA e.g. an undulator or wiggler provided around the path of an electron beam in a storage ring or synchrotron, or a mercury lamp
  • the source LA produces a beam of radiation.
  • This beam is fed into an illumination system (illuminator) IL, either directly or after having traversed conditioning means, such as a beam expander Ex, for example.
  • the illuminator IL may comprise adjusting means AM for setting the outer and/or inner radial extent (commonly referred to as ⁇ -outer and ⁇ -inner, respectively) of the intensity distribution in the beam.
  • it will generally comprise various other components, such as an integrator IN and a condenser CO.
  • the beam PB reflected by the mask MA has a desired uniformity and intensity distribution in its cross-section.
  • the source LA may be within the housing of the lithographic projection apparatus (as is often the case when the source LA is a mercury lamp, for example), but that it may also be remote from the lithographic projection apparatus, the radiation beam which it produces being led into the apparatus (e.g. with the aid of suitable directing mirrors); this latter scenario is often the case when the source LA is an excimer laser.
  • the current invention and Claims encompass both of these scenarios.
  • the beam PB subsequently intercepts the mask MA, which is held on a mask table MT. After being selectively reflected by the mask MA, the beam PB passes through the lens PL, which focuses the beam PB onto a target portion C of the substrate W. With the aid of the second positioning means (and interferometric measuring means IF), the substrate table WT can be moved accurately, e.g. so as to position different target portions C in the path of the beam PB. Similarly, the first positioning means can be used to accurately position the mask MA with respect to the path of the beam PB, e.g. after mechanical retrieval of the mask MA from a mask library, or during a scan.
  • the mask table MT may just be connected to a short stroke actuator, or may be fixed.
  • the depicted apparatus can be used in two different modes:
  • Figure 2 shows a mounting frame 11 having a triangular frame structure.
  • An optical member 13, in particular a mirror, for refracting and/or reflecting radiation that is incident at the circular surface of the optical member 13 shown in the figure is connected to the mounting frame 11.
  • the optical member 13 may have a concave or convex optical surface and is symmetric to an axis of rotational symmetry extending through the center of its circular cross section.
  • the mounting frame comprises three corner blocks 15 that are positioned at the three corners of the triangular structure.
  • Each corner block 15 connects two plate-like struts 12 which define sides of the triangular structure and connect the two respective corner blocks 15 at their two opposite ends.
  • the lengths of the three struts 12 between the corner blocks 15 are equal and the struts 12 and the corner blocks 15 have identical shapes.
  • each corner block 15 might be connected to or part of an actuator or an arrangement of actuators for adjusting the position of the optical member 13.
  • first and second stiffening members 21, 23 Within the areas of the acute angles at the three corners of the triangular structure there are provided first and second stiffening members 21, 23.
  • first stiffening members 21 are plate-like and extend between the two respective struts 12 which are connected at the respective corner block 15 so as to connect the two struts 12. All locations where the first stiffening members 21 are connected to the struts 12 have the same distance to the respective corner blocks 15. Further, the plate-like first stiffening members 21 extend in vertical direction perpendicular to a plane of symmetry of the frame.
  • This plane of symmetry cuts the frame in an upper and a lower half and extends through all three corner blocks 15.
  • the thickness of the first stiffening members 21, measured in a direction from the respective corner to the center of the optical member 13 is smaller than the thickness of the struts 12 measured in a direction perpendicular to a line that connects two respective corner blocks 15 of the respective strut 12 and which is within or parallel to the plane of symmetry.
  • the thickness of the first and/or second stiffening members 21, 23 and/or of the struts 12 is constant.
  • Each one of the second stiffening members 23 extends within the plane of symmetry between a respective one of the first stiffening members 21 and the respective corner block 15 so as to fill the triangular-shaped gap between the first stiffening member 21 and the corner block 15 and between the two respective struts 12 which are connected at the respective corner block 15.
  • the second stiffening members 23 have the same thickness as the first stiffening members 21. The thickness of the second stiffening members 23 is measured in a direction perpendicular to the plane of symmetry.
  • each group of the corner block 15, of the two respective struts 12 which are connected at the corner block 15 and of the respective first and second stiffening member 21, 23 define two hollow spaces, one on each side of the plane of symmetry.
  • the three upper hollow spaces, which are on the upper side of the plane of symmetry can be recognized from Figure 2. "Upper” and “lower” or “vertical” and “horizontal” are only related to the view shown in Figure 2 and do not limit the possibilities of positioning the mounting frame and the optical member.
  • the plane of symmetry may extend in vertical direction in a projection system of a photographic projection apparatus.
  • the corner blocks 15 define, for example, regions where each at least one actuator for adjusting the position and/or the orientation of the frame and thereby of the optical member is connected to the struts 12.
  • actuators are connected symmetrically to the plane of symmetry that cuts the frame in an upper and a lower half.
  • the height of the struts 12, which is measured in a direction perpendicular to the plane of symmetry, may vary along their extension between the two respective corner blocks 15 which are connected by the respective strut 12.
  • the height of the struts 12 is smallest at one of the corner blocks 15 and increases gradually to an area midway between the corner blocks, which area has a constant height.
  • the strut 12 is symmetric around a central plane perpendicular to the strut and parallel to its height.
  • the struts 12 comprise a cut-out area which is, as shown, preferably of circular shape.
  • the height of the struts 12 is greater so that there is sufficient material on all sides of the cut-out area to ensure the stiffness and stability of the struts 12.
  • the height of the corner blocks would be greater and/or the size of the cut-out areas smaller, the height differences of the struts can be smaller or the height can even be constant.
  • a membrane-like portion 17 is inserted and firmly connected at its outer circumference to the rim of the cut-out area.
  • the membrane-like portions can be sheet-like, but the configuration of the membrane-like portions 17 shown in Figures 2 and 3 is preferred.
  • the membrane-like portions 17 comprise a plurality of spokes 18 (Figure 3) which extend between the rim of the cut-out area and a joint 19 which is part of or a connection to the optical member 13.
  • the number and dimensions of the spokes 18 may vary, and can in particular be adjusted to adjust the decoupling properties of the membrane-like portion 17.
  • decoupling means that the optical member is decoupled from adverse mechanical conditions which may apply to the mounting frame, such as undesired forces that act on the mounting frame 11 or are caused by deformations of the frame.
  • shape of the spoked membrane-like portion can be different, for example, the spokes may be connected to a ring-like portion of the membrane-like portion at the outer and/or inner circumference of the membrane-like portion.
  • the mounting frame 11 and the membrane-like portion 17 may be a single part, for example made of a block of the same material. However, it is preferred that at least the membrane-like portions 17 are manufactured separately from the frame 11 or from parts of the frame 11 and are connected in a later manufacturing step to the frame 11 or parts of the frame 11. Also, parts of the frame 11, such as the struts 12, the corner blocks 15 and the first and second stiffening members 21, 23 can be manufactured separately and jointed together. This applies in particular, if the corner blocks 15 are actuators or part of actuators.
  • One advantage of separately manufacturing the membrane-like portions 17 and/or parts of the frame 11 is that the most appropriate and suitable material and/or manufacturing process can be selected for the respective parts or members. In particular, it may be desirable to choose a specific material for the membran-like portions 17 in order to achieve specific decoupling properties.
  • a preferred material for the frame 11 or for at least the struts 12 is SiC, either as a sole material or in combination with other materials.
  • Other examples of materials for the frame 11, or parts of it, are Invar, stainless steel or ceramic materials, in general.
  • Figure 3 shows a side view of a portion of a mounting frame and of an optical member 13 similar to the arrangement shown in Figure 2.
  • Figure 3 depicts a portion of one of the struts 12 in the region of the cut-out part where the membrane-like portion 17 is located. Behind the membrane-like portion 17 and the joint 19 a portion of the optical member 13 can be seen.
  • the membrane-like portion 17 shown in Figure 3 has a different number of spokes 18 compared to the membrane-like portion 17 shown in Figure 2.
  • Figure 4 shows a top view of an arrangement of an optical member 13 connected to a frame 11 similar to the arrangement shown in Figure 2.
  • the frame 11 shown in Figure 4 does not have first and second stiffening members as the frame 11 shown in Figure 2.
  • the optical member 13 has a regular polygonal shape instead of the circular shape of the optical member 13 shown in Figure 2.
  • the optical member may have a different shape than circular or polygonal, for example elliptical or having a cross section like a banana.

Claims (9)

  1. Appareil de projection lithographique comportant :
    - un système de rayonnement (Ex, IL) pour fournir un faisceau de projection (PB) de rayonnement ;
    - une structure de support (MT) pour supporter des moyens de mise en forme (MA), les moyens de mise en forme servant à mettre en forme le faisceau de projection conformément à un motif voulu ;
    - une table de substrat (WT) pour porter un substrat (W) ;
    - un système de projection (PL) pour projeter le faisceau mis en forme sur une partie cible (C) du substrat,
    dans lequel le système de rayonnement (Ex, IL) et/ou le système de projection (PL) comporte au moins un élément optique (13), qui est supporté par un cadre de montage (11) et relié à celui-ci, au moins une partie de l'élément optique étant à l'intérieur du cadre, qui est relié à au moins un autre composant du système de rayonnement (Ex, IL) et/ou du système de projection (PL) ; caractérisé en ce que :
    la liaison entre le cadre (11) et l'élément optique (13) comporte une partie analogue à une membrane (17) située dans une zone découpée du cadre (11), dans lequel l'élément optique n'est pas positionné dans la zone découpée, dans lequel la partie analogue à une membrane (17) est maintenue à sa circonférence extérieure par le cadre, et dans lequel l'élément optique (13) est relié à une zone centrale (19) de la partie analogue à une membrane (17), l'élément optique étant supporté par le cadre (11).
  2. Appareil selon la revendication 1, dans lequel la partie analogue à une membrane (17) comporte une pluralité de rayons (18) qui s'étendent de la zone centrale (19) à la circonférence extérieure de la partie analogue à une membrane (17).
  3. Appareil selon la revendication 1 ou 2, dans lequel le cadre (11) comporte une pluralité d'entretoises (12) qui sont reliées à des coins du cadre de manière à former une structure de cadre ayant au moins trois coins.
  4. Appareil selon la revendication 1, 2 ou 3, dans lequel toutes les longueurs de côté de la structure de cadre entre les coins sont égales.
  5. Appareil selon l'une quelconque des revendications 1 à 4, dans lequel l'élément optique (13) est relié à la structure de cadre à des emplacements respectifs chacun à mi-chemin entre deux coins.
  6. Appareil selon l'une quelconque des revendications 1 à 5, comportant au moins un actionneur pour ajuster la position et/ou l'orientation du cadre (11) et par conséquent de l'élément optique (13), ledit actionneur étant relié au cadre.
  7. Appareil selon la revendication 6, dans lequel la liaison de l'actionneur au cadre (11) est établie à un emplacement qui comporte un point ou une zone dans un plan de symétrie du cadre (11).
  8. Procédé de fabrication de dispositif comportant les étapes consistant à :
    - fournir un substrat (W) qui est au moins partiellement couvert d'une couche de matériau sensible à un rayonnement ;
    - fournir un faisceau de projection (PB) de rayonnement en utilisant un système de rayonnement (Ex, IL) ;
    - utiliser des moyens de mise en forme (MA) pour doter le faisceau de projection (PB) d'un motif dans sa section transversale ;
    - projeter le faisceau de rayonnement mis en forme sur une partie cible (C) de la couche de matériau sensible à un rayonnement en utilisant un système de projection (PL) ;
    - utiliser au moins un élément optique dudit système de rayonnement (Ex, IL) ou dudit système de projection (PL) ;
    - supporter l'élément optique (13) par un cadre de montage (11) et relier l'élément optique au cadre de montage, au moins une partie de l'élément optique étant dans le cadre, qui est relié à au moins un autre composant du système de rayonnement (Ex, IL) et/ou du système de projection (PL) ; caractérisé en ce que :
    la liaison entre le cadre (11) et l'élément optique (13) comporte une partie analogue à une membrane (17) située dans une zone découpée du cadre (11), dans lequel l'élément optique n'est pas positionné dans la zone découpée, dans lequel la partie analogue à une membrane (17) est maintenue à sa circonférence extérieure par le cadre, et dans lequel l'élément optique (13) est relié à une zone centrale (19) de la partie analogue à une membrane (17), l'élément optique étant supporté par le cadre (11).
  9. Procédé selon la revendication 8, dans lequel la direction de propagation du faisceau de projection de rayonnement ou du faisceau mis en forme est ajustée en ajustant la position et/ou l'orientation du cadre de montage (11), ajustant ainsi la position et/ou l'orientation de l'élément optique (13).
EP02257697A 2001-11-07 2002-11-06 Appareil lithographique et méthode de fabrication d'un dispositif Expired - Fee Related EP1310829B1 (fr)

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DE102015115929B3 (de) * 2015-09-21 2016-10-06 Jenoptik Optical Systems Gmbh Monolithische Linsenfassung
DE102015115931B3 (de) * 2015-09-21 2016-10-27 Jenoptik Optical Systems Gmbh Spannungsentkoppelte monolithische Linsenfassung

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TWI372271B (en) 2005-09-13 2012-09-11 Zeiss Carl Smt Gmbh Optical element unit, optical element holder, method of manufacturing an optical element holder, optical element module, optical exposure apparatus, and method of manufacturing a semiconductor device
DE102011087331A1 (de) * 2011-11-29 2013-01-10 Carl Zeiss Smt Gmbh Temperaturempfindliches optisches Element aus SiSiC-Verbund und Halterung hierfür sowie Verfahren zu seiner Herstellung

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EP0938009A1 (fr) * 1998-02-20 1999-08-25 Carl Zeiss Dispositif optique et appareil d'exposition par projection pour microlithographie avec compensation thermique passive
EP1026532A1 (fr) * 1999-02-03 2000-08-09 Carl Zeiss Ensemble comportant un élément optique et sa monture

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JPH10186198A (ja) * 1996-12-25 1998-07-14 Ushio Inc 平行・真直微動装置およびこれを用いたレンズ鏡筒の微小移動装置
US6147818A (en) * 1998-12-21 2000-11-14 The Regents Of The University Of California Projection optics box
US6496246B1 (en) * 2000-03-15 2002-12-17 Nikon Corporation Optical assembly for an exposure apparatus
DE10039712A1 (de) * 2000-08-14 2002-02-28 Zeiss Carl Vorrichtung zum Verstellen der Lage zweier Bauelemente zueinander

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EP0938009A1 (fr) * 1998-02-20 1999-08-25 Carl Zeiss Dispositif optique et appareil d'exposition par projection pour microlithographie avec compensation thermique passive
EP1026532A1 (fr) * 1999-02-03 2000-08-09 Carl Zeiss Ensemble comportant un élément optique et sa monture

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015115929B3 (de) * 2015-09-21 2016-10-06 Jenoptik Optical Systems Gmbh Monolithische Linsenfassung
DE102015115931B3 (de) * 2015-09-21 2016-10-27 Jenoptik Optical Systems Gmbh Spannungsentkoppelte monolithische Linsenfassung
US10036869B2 (en) 2015-09-21 2018-07-31 Jenoptik Optical Systems Gmbh Monolithic lens mount

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