EP1280615A1 - Method and arrangement for the production of a thin layered structure - Google Patents

Method and arrangement for the production of a thin layered structure

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Publication number
EP1280615A1
EP1280615A1 EP01938206A EP01938206A EP1280615A1 EP 1280615 A1 EP1280615 A1 EP 1280615A1 EP 01938206 A EP01938206 A EP 01938206A EP 01938206 A EP01938206 A EP 01938206A EP 1280615 A1 EP1280615 A1 EP 1280615A1
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EP
European Patent Office
Prior art keywords
carrier
starting material
coating
radiation
coating starting
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Granted
Application number
EP01938206A
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German (de)
French (fr)
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EP1280615B1 (en
Inventor
Kai K. O. BÄR
Rainer Gaus
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Advanced Photonics Technologies AG
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Advanced Photonics Technologies AG
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Priority claimed from DE10024731A external-priority patent/DE10024731A1/en
Application filed by Advanced Photonics Technologies AG filed Critical Advanced Photonics Technologies AG
Publication of EP1280615A1 publication Critical patent/EP1280615A1/en
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • B05D3/0263—After-treatment with IR heaters

Definitions

  • the invention relates to a method for producing a thin layer structure according to the preamble of claim 1 and an arrangement for performing this method.
  • Thin-film structures on large, thin substrates are becoming increasingly important in various fields of technology.
  • thin-film transistor structures such as are used in particular in liquid crystal display arrangements, and other thin-film systems for display units, for example for plasma displays.
  • separator structures of electrochemical elements in particular primary or secondary elements based on lithium (lithium batteries and lithium-ion batteries etc.) and highly differentiated membrane systems for material separation and energy generation, for example fuel cells.
  • a thin coating applied to a thin carrier in an initial state usually has to be converted into a functional layer and firmly connected to the carrier.
  • the important thing here is to run a process with a very high degree of reliability and with the exclusion of damage to the carrier or the coating material with high productivity, ie. H. a high throughput per unit of time.
  • the invention is therefore based on the object of specifying an improved, highly universal and easily adaptable method of the generic type which can be adapted to different types of concrete layer structures and which is characterized by potentially high productivity, simplicity and reliability with extensive exclusion of damage to the coating (s) and / or the carrier.
  • the invention includes the basic idea of converting the respective coating starting material into the functional layer of the layer structure while at the same time being connected to the carrier, electromagnetic radiation in the near infrared range, i. H. in the wavelength range between 0.8 and 1.5 ⁇ m, to be used on the continuously conveyed product. Depending on the specific layer system in different ranks, this causes, in particular, drying and / or crosslinking of the coating starting material, often combined with melting onto the support.
  • the radiation used in accordance with the invention can be generated in a simple and cost-effective manner by high-power halogen lamps operated at elevated operating temperature.
  • both the coating starting material and the carrier have an average thickness in the range between 5 ⁇ m and 500 ⁇ m, in particular between 20 ⁇ m and 200 ⁇ m.
  • various plastic foils in particular PE, PP or PVC foils, or metal foils or fine metal mesh, especially made of aluminum or copper or their alloys, serve as carriers in important applications.
  • the coating starting material is applied in particular in liquid or pasty or also in powder form by means of suitable coating techniques known per se, preferably spun on, rolled on, sprayed on, sprinkled on or inflated.
  • the spectral composition of the processing infrared radiation is preferably adjusted in accordance with the absorption properties of the coating starting material in such a way that it heats up substantially uniformly over its layer thickness, avoiding an inadmissible thermal load on the carrier and also individual areas of the coating.
  • This setting can be made via the operating voltage; Filters can also be used.
  • the radiation power can be adjusted in particular by varying the distance between the radiation source and the surface of the layer structure. The radiation can act directly in the coating or through the carrier or from both sides.
  • a gas flow sweeping over the surface of the applied coating starting material and / or the back surface of the carrier can, on the one hand, equalize the temperature distribution and, if necessary, lower the surface temperature, and on the other hand, the rapid removal of volatile substances Components of the coating starting material can be achieved. This further increases the reliability and efficiency of the method increase.
  • the gas stream air stream is preferably dry and cold and is supplied at high pressure or pulse.
  • a power control based on feedback detector signals for example temperature sensors
  • the proposed method is suitable for the production of thin-film transistor arrangements, in particular for liquid crystal display arrangements, of separator membranes for electrochemical elements, in particular of lithium-ion batteries, for the production of thin-film structures for plasma displays and for the production of membrane structures for fuel cells.
  • a preferred arrangement for carrying out the method comprises, for handling a quasi-endless carrier, a corresponding feed and feed device - which can in particular comprise a carrier supply roll and a roll feed device -, a feed and layer generation device for feeding the coating starting dimension - terials and its layer-forming application on the carrier surface and the NIR irradiation device, which in particular has one or more halogen lamps with a high spectral component in the NIR, with a corresponding power supply.
  • a gas stream generating device for generating and aligning the above-mentioned gas stream and / or a device for power setting or control is additionally provided, the latter preferably comprising means for adjusting the distance between the radiation source and the layer structure.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Drying Of Solid Materials (AREA)
  • Fuel Cell (AREA)
  • Moulding By Coating Moulds (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Oxide Ceramics (AREA)

Abstract

The invention relates to a method for the production of a thin layered structure, comprising a strip-like, flexible, in particular quasi-endless support with at least one functional coating, bonded to the support, with a thickness, in particular, of the order of thickness of the support. Said method comprises the following steps: formation of a base layered structure by layered application of a coating base material on the support and irradiation of the support, coated with a coating base material, with electromagnetic radiation which has an effective component in the near infra-red range for the formation of the functional coating from the coating base material with concomitant linking to the support, by means of a drying and/or thermal cross-linking.

Description

Verfahren und Anordnung zur Herstellung eines dünnen Schichtaufbaus Method and arrangement for producing a thin layer structure
Beschreibungdescription
Die Erfindung betrifft ein Verfahren zur Herstellung eines dünnen Schichtaufbaus nach dem Oberbegriff des Anspruchs 1 sowie eine Anordnung zur Durchführung dieses Verfahrens.The invention relates to a method for producing a thin layer structure according to the preamble of claim 1 and an arrangement for performing this method.
Dünnschichtstrukturen auf großflächigen, dünnen Trägern gewinnen auf verschiedenen Gebieten der Technik zunehmend an Bedeutung. Bekannte und wirtschaftlich höchst bedeutende Beispiele hierfür sind Dünnschicht-Transistorstrukturen, wie sie insbesondere in Flüssigkristall-Anzeigeanordnungen eingesetzt werden, und andere Dünnschichtsysteme für Anzeigeeinheiten, etwa für Plasmadisplays. Weitere technisch und wirtschaftlich bedeutsame Dünnschichtstrukturen sind die Separatorstrukturen von elektrochemischen Elementen, insbesondere Primär- oder Sekundärelementen auf Lithiumbasis (Lithiumbatterien und Lithium-Ionen-Akkus etc.) sowie hoch differenzierte Membransysteme für die Stofftrennung und die Energiegewinnung, beispielsweise Brennstoffzellen.Thin-film structures on large, thin substrates are becoming increasingly important in various fields of technology. Known and economically most important examples of this are thin-film transistor structures, such as are used in particular in liquid crystal display arrangements, and other thin-film systems for display units, for example for plasma displays. Further technically and economically important thin-film structures are the separator structures of electrochemical elements, in particular primary or secondary elements based on lithium (lithium batteries and lithium-ion batteries etc.) and highly differentiated membrane systems for material separation and energy generation, for example fuel cells.
Zur Herstellung derartiger Dünnschichtsysteme muß üblicherweise eine in einem Ausgangszustand auf einen dünnen Träger aufgebrachte dünne Beschichtung in eine funktioneile Schicht umgewandelt und fest mit dem Träger verbunden werden. Es kommt hierbei darauf an, einen mit sehr hoher Zuverlässigkeit und unter Ausschluß von Schädigungen des Trägers oder des Be- schichtungsmaterials ablaufenden Prozeß mit einer hohen Produktivität, d. h. einem hohen Flächendurchsatz pro Zeiteinheit, zu realisieren.To produce such thin-film systems, a thin coating applied to a thin carrier in an initial state usually has to be converted into a functional layer and firmly connected to the carrier. The important thing here is to run a process with a very high degree of reliability and with the exclusion of damage to the carrier or the coating material with high productivity, ie. H. a high throughput per unit of time.
Es sind für die verschiedenen Dünnschichtsysteme der gattungsgemäßen Art, die heute große technische Bedeutung er- langt haben, verschiedenartige Herstellungsverfahren bekannt, die diese Anforderungen nur bedingt erfüllen.It is for the various thin-film systems of the generic type that are of great technical importance today. have known, various manufacturing processes that meet these requirements only conditionally.
Der Erfindung liegt daher die Aufgabe zugrunde, ein verbes- sertes, hochgradig universelles und an verschiedenartige konkrete Schichtstrukturen leicht anpaßbares Verfahren der gattungsgemäßen Art anzugeben, das sich durch potentiell hohe Produktivität, Einfachheit und Zuverlässigkeit bei weitgehendem Ausschluß von Schädigungen der Beschichtung (en) und/oder des Trägers auszeichnet.The invention is therefore based on the object of specifying an improved, highly universal and easily adaptable method of the generic type which can be adapted to different types of concrete layer structures and which is characterized by potentially high productivity, simplicity and reliability with extensive exclusion of damage to the coating (s) and / or the carrier.
Diese Aufgabe wird durch ein Verfahren mit den Merkmalen des Anspruchs 1 gelöst. Eine zweckmäßige Anordnung zur Durchführung dieses Verfahrens ist in Anspruch 17 angegeben.This object is achieved by a method with the features of claim 1. An expedient arrangement for performing this method is specified in claim 17.
Die Erfindung schließt den grundlegenden Gedanken ein, zur Umwandlung des jeweiligen Beschichtungs-Ausgangsmaterials in die funktioneile Schicht des Schichtaufbaus unter gleichzeitiger Verbindung mit dem Träger elektromagnetische Strahlung im Bereich des nahen Infrarot, d. h. im Wellenlängenbereich zwischen 0,8 und 1,5 μm, am kontinuierlich geförderten Produkt einzusetzen. Diese bewirkt - je nach konkretem Schichtsystem in unterschiedlicher Rangigkeit - insbesondere eine Trocknung und/oder Vernetzung des Beschichtungs-Ausgangsmate- rials, vielfach verbunden mit einem Aufschmelzen auf den Träger.The invention includes the basic idea of converting the respective coating starting material into the functional layer of the layer structure while at the same time being connected to the carrier, electromagnetic radiation in the near infrared range, i. H. in the wavelength range between 0.8 and 1.5 μm, to be used on the continuously conveyed product. Depending on the specific layer system in different ranks, this causes, in particular, drying and / or crosslinking of the coating starting material, often combined with melting onto the support.
Die erfindungsgemäß eingesetzte Strahlung läßt sich in einfacher und kostengünstiger Weise durch mit erhöhter Betriebs- temperatur betriebene Halogenlampen hoher Leistung erzeugen.The radiation used in accordance with the invention can be generated in a simple and cost-effective manner by high-power halogen lamps operated at elevated operating temperature.
In bevorzugten Schichtaufbauten haben sowohl das Beschich- tungs-Ausgangsmaterial als auch der Träger eine mittlere Dicke im Bereich zwischen 5 μm und 500 μm, insbesondere zwi- sehen 20 μm und 200 μm. Als Träger dienen in wichtigen Anwendungen insbesondere verschiedene Kunststofffolien, speziell PE-, PP- oder PVC-Fo- lien, oder Metallfolien bzw. feine Metallgewebe, speziell aus Aluminium oder Kupfer oder deren Legierungen. Das Beschich- tungs-Ausgangsmaterial wird insbesondere in flüssiger oder pastöser oder auch in Pulverform mittels geeigneter, an sich bekannter Beschichtungstechniken aufgebracht, bevorzugt auf- geschleudert, aufgewalzt, aufgesprüht, aufgerieselt oder auf- geblasen.In preferred layer structures, both the coating starting material and the carrier have an average thickness in the range between 5 μm and 500 μm, in particular between 20 μm and 200 μm. In important applications, various plastic foils, in particular PE, PP or PVC foils, or metal foils or fine metal mesh, especially made of aluminum or copper or their alloys, serve as carriers in important applications. The coating starting material is applied in particular in liquid or pasty or also in powder form by means of suitable coating techniques known per se, preferably spun on, rolled on, sprayed on, sprinkled on or inflated.
Die spektrale Zusammensetzung der Bearbeitungs-Infrarotstrahlung wird in Abstimmung auf die Absorptionseigenschaften des Beschichtungs-Ausgangsmaterials bevorzugt derart eingestellt, das sich dieses über seine Schichtdicke im wesentlichen gleichmäßig erwärmt, wobei eine unzulässige thermische Belastung des Trägers sowie auch einzelner Bereiche der Beschichtung vermieden wird. Diese Einstellung kann über die Betriebsspannung erfolgen; weiterhin können Filter eingesetzt werden. Die Einstellung der Strahlungsleistung kann insbesondere durch Variation des Abstandes zwischen der Strahlungsquelle und der Oberfläche des Schichtaufbaus erfolgen. Die Strahlung kann direkt in die Beschichtung oder durch den Träger hindurch oder von beiden Seiten einwirken.The spectral composition of the processing infrared radiation is preferably adjusted in accordance with the absorption properties of the coating starting material in such a way that it heats up substantially uniformly over its layer thickness, avoiding an inadmissible thermal load on the carrier and also individual areas of the coating. This setting can be made via the operating voltage; Filters can also be used. The radiation power can be adjusted in particular by varying the distance between the radiation source and the surface of the layer structure. The radiation can act directly in the coating or through the carrier or from both sides.
Durch einen die Oberfläche des aufgebrachten Beschichtungs- Ausgangsmaterials und/oder die rückseitige Oberfläche des Trägers überstreichenden Gasstrom (für den in vielen Anwendungsfällen ein Luftstrom ausreichend ist) kann zum einen eine Vergleichmäßigung der Temperaturverteilung und gegebenenfalls Absenkung der Oberflächentemperatur und zum anderen die schnelle Abführung von flüchtigen Bestandteilen des Be- schichtungs-Ausgangsmaterials erreicht werden. Hierdurch läßt sich die Zuverlässigkeit und Effizienz des Verfahrens weiter erhöhen. Der Gasstrom (Luftstrom) ist vorzugsweise trocken und kalt und wird mit hohem Druck bzw. Impuls zugeführt.A gas flow sweeping over the surface of the applied coating starting material and / or the back surface of the carrier (for which an air flow is sufficient in many applications) can, on the one hand, equalize the temperature distribution and, if necessary, lower the surface temperature, and on the other hand, the rapid removal of volatile substances Components of the coating starting material can be achieved. This further increases the reliability and efficiency of the method increase. The gas stream (air stream) is preferably dry and cold and is supplied at high pressure or pulse.
In einer weiter verfeinerten Verfahrensführung ist eine Leis- tungsregelung auf der Basis von rückgekoppelten Detektorsignalen (beispielsweise von Temperaturfühlern) vorgesehen.In a further refined procedure, a power control based on feedback detector signals (for example temperature sensors) is provided.
Das vorgeschlagene Verfahren eignet sich zur Herstellung von Dünnschicht-Transistoranordnungen, insbesondere für Flüssig- kristalldisplayanordnungen, von Separatormembranen für elektrochemische Elemente, insbesondere von Lithium-Ionen-Akkus, zur Herstellung von Dünnschichtstrukturen für Plasmadisplays und zur Herstellung von Membranstrukturen für Brennstoffzellen.The proposed method is suitable for the production of thin-film transistor arrangements, in particular for liquid crystal display arrangements, of separator membranes for electrochemical elements, in particular of lithium-ion batteries, for the production of thin-film structures for plasma displays and for the production of membrane structures for fuel cells.
Eine bevorzugte Anordnung zur Durchführung des Verfahrens umfaßt zur Handhabung eines quasi-endlosen Trägers eine entsprechende Zuführungs- und Vorschubeinrichtung - die insbesondere eine Träger-Vorratsrolle und eine Walzen-Vorschubein- richtung umfassen kann -, eine Zuführungs- und Schichterzeugungseinrichtung zur Zuführung des Beschichtungs-Ausgangsma- terials und dessen schichtbildender Aufbringung auf die Trägeroberfläche sowie die NIR-Bestrahlungseinrichtung, die insbesondere eine oder mehrere Halogenlampen mit einem hohen spektralen Anteil im NIR aufweist, mit entsprechender Stromversorgung.A preferred arrangement for carrying out the method comprises, for handling a quasi-endless carrier, a corresponding feed and feed device - which can in particular comprise a carrier supply roll and a roll feed device -, a feed and layer generation device for feeding the coating starting dimension - terials and its layer-forming application on the carrier surface and the NIR irradiation device, which in particular has one or more halogen lamps with a high spectral component in the NIR, with a corresponding power supply.
In bevorzugten Ausführungen dieser Anordnung ist zusätzlich eine Gasstrom-Erzeugungseinrichtung zur Erzeugung und Aus- richtung des oben erwähnten Gasstromes und/oder eine Einrichtung zur Leistungseinstellung oder -regelung vorgesehen, wobei die letztere bevorzugt Mittel zur Abstandseinstellung zwischen Strahlungsquelle und Schichtaufbau umfaßt. Die Ausführung der Erfindung ist nicht auf die hier angegebenen Anwendungsfälle und Aspekte beschränkt, sondern auch bei einer Vielzahl von weiteren Anwendungen und mit zusätzlichen Aspekten möglich, deren Auffindung im Rahmen fachgemäßen Handelns liegt. In preferred embodiments of this arrangement, a gas stream generating device for generating and aligning the above-mentioned gas stream and / or a device for power setting or control is additionally provided, the latter preferably comprising means for adjusting the distance between the radiation source and the layer structure. The implementation of the invention is not limited to the use cases and aspects specified here, but is also possible in a large number of further applications and with additional aspects, the finding of which is within the scope of professional action.

Claims

Patentansprücheclaims
1. Verfahren zur Herstellung eines dünnen Schichtaufbaus aus einem bandförmigen, flexiblen, insbesondere quasiendlosen, Träger mit mindestens einer mit dem Träger fest verbundenen funktionalen Beschichtung, die eine insbesondere in der Größenordnung der Dicke des Trägers liegende Dicke hat, g e k e n n z e i c h n e t d u r c h die Schritte: Bildung eines Ausgangs-Schichtaufbaus durch flächiges Auftragen eines Beschichtungs-Ausgangsmaterials auf den Träger und - Bestrahlung des mit dem Beschichtungs-Ausgangsmaterials versehenen Trägers mit elektromagnetischer Strahlung, die einen Wirkanteil im Bereich des nahen Infrarot hat, zur Bildung der funktionalen Beschichtung aus dem Beschichtungs-Ausgangsmaterial bei gleichzeitiger Verbindung mit dem Träger unter Einschluß einer Trocknung und/oder thermischen Vernetzung.1. A method for producing a thin layer structure from a band-shaped, flexible, in particular quasi-endless, carrier with at least one functional coating firmly connected to the carrier, which has a thickness, in particular in the order of the thickness of the carrier, characterized by the steps: formation of an exit -Layer structure by surface application of a coating starting material on the carrier and - irradiation of the carrier provided with the coating starting material with electromagnetic radiation, which has an active component in the near infrared range, to form the functional coating from the coating starting material with simultaneous connection with the carrier including drying and / or thermal crosslinking.
2. Verfahren nach Anspruch 1, d a d u r c h g e k e n n z e i c h n e t, daß die Strahlung einer mit erhöhter Betriebstemperatur betriebenen Halogenlampe eingesetzt wird.2. The method according to claim 1, d a d u r c h g e k e n n z e i c h n e t that the radiation of a halogen lamp operated at elevated operating temperature is used.
3. Verfahren nach Anspruch 1 oder 2, d a d u r c h g e k e n n z e i c h n e t, daß das Beschichtungs-Ausgangsmaterial mit einer mittleren3. The method of claim 1 or 2, d a d u r c h g e k e n n z e i c h n e t that the coating starting material with a medium
Dicke im Bereich zwischen 5 μm und 500 μm, insbesondere zwischen 20 μm und 200 μm, auf einen Träger mit einer mittleren Dicke im Bereich zwischen 5 μm und 500 μm, insbesondere zwischen 20 μm und 200 μm, aufgebracht wird.Thickness in the range between 5 μm and 500 μm, in particular between 20 μm and 200 μm, is applied to a carrier with an average thickness in the range between 5 μm and 500 μm, in particular between 20 μm and 200 μm.
Verfahren nach einem der vorangehenden Ansprüche, d a d u r c h g e k e n n z e i c h n e t, daß als Träger eine Kunststofffolie, insbesondere Polyethy- len-, Polypropylen- oder PVC-Folie, eingesetzt wird.Method according to one of the preceding claims, d a d u r c h g e k e n n z e i c h n e t that a plastic film, in particular polyethylene, polypropylene or PVC film, is used as a carrier.
5. Verfahren nach einem der Ansprüche 1 bis 3, d a d u r c h g e k e n n z e i c h n e t, daß als Träger eine dünne Metallfolie oder ein feines Metallgewebe, insbesondere aus Aluminium oder Kupfer bzw. einer aluminium- bzw. kupferhaltigen Legierung, eingesetzt wird.5. The method according to any one of claims 1 to 3, that a thin metal foil or a fine metal mesh, in particular made of aluminum or copper or an aluminum- or copper-containing alloy, is used as the carrier.
6. Verfahren nach einem der vorangehenden Ansprüche, d a d u r c h g e k e n n z e i c h n e t, daß das Beschichtungs-Ausgangsmaterial in flüssiger oder pastöser Form aufgebracht, insbesondere aufgeschleudert, aufgewalzt oder aufgesprüht, wird.6. The method according to any one of the preceding claims, that the coating starting material is applied in liquid or pasty form, in particular spun on, rolled on or sprayed on.
7. Verfahren nach einem der Ansprüche 1 bis 5, d a d u r c h g e k e n n z e i c h n e t, daß das Beschichtungs-Ausgangsmaterial in Pulverform aufgebracht, insbesondere aufgerieselt oder aufgeblasen, wird.7. The method according to any one of claims 1 to 5, that the coating starting material is applied in powder form, in particular sprinkled or blown, is applied.
8. Verfahren nach einem der vorangehenden Ansprüche, d a d u r c h g e k e n n z e i c h n e t, daß die spektrale Zusammensetzung der Strahlung in Abstimmung auf die Absorptionseigenschaften des Beschichtungs- Ausgangsmaterials und wahlweise des Trägers derart ein- gestellt wird, daß eine im wesentlichen gleichmäßige Durchwärmung über die Schichtdicke des Beschichtungs- Ausgangsmaterials erfolgt.8. The method according to any one of the preceding claims, characterized in that the spectral composition of the radiation is adjusted in accordance with the absorption properties of the coating starting material and optionally the carrier such that a substantially uniform Warming takes place over the layer thickness of the coating starting material.
9. Verfahren nach Anspruch 8, d a d u r c h g e k e n n z e i c h n e t, daß die spektrale Zusammensetzung durch mindestens ein Filter eingestellt wird.9. The method according to claim 8, d a d u r c h g e k e n n z e i c h n e t that the spectral composition is adjusted by at least one filter.
10. Verfahren nach einem der vorangehenden Ansprüche, d a d u r c h g e k e n n z e i c h n e t, daß zur Einstellung der Strahlungsleistung der Abstand zwischen der Strahlungsquelle und der Oberfläche des Be- schichtungs-Ausgangsmaterials variiert wird.10. The method according to any one of the preceding claims, that the distance between the radiation source and the surface of the coating starting material is varied in order to adjust the radiation power.
11. Verfahren nach einem der vorangehenden Ansprüche, d a d u r c h g e k e n n z e i c h n e t, daß die Oberfläche des Beschichtungs-Ausgangsmaterials und/ oder die rückseitige Oberfläche des Trägers mit einem Gasstrom, insbesondere Luftstrom, zur Kühlung und/oder Abführung von flüchtigen Bestandteilen des Beschich- tungs-Ausgangsmaterials überstrichen wird.11. The method according to any one of the preceding claims, characterized in that the surface of the coating starting material and / or the back surface of the carrier with a gas stream, in particular air stream, for cooling and / or removal of volatile constituents of the coating starting material is covered ,
12. Verfahren nach Anspruch 11, d a d u r c h g e k e n n z e i c h n e t, daß ein trockenes, kaltes Gas mit hohem Impuls zugeführt wird.12. The method of claim 11, d a d u r c h g e k e n n z e i c h n e t that a dry, cold gas is supplied with a high momentum.
13. Verfahren nach einem der vorangehenden Ansprüche, d a d u r c h g e k e n n z e i c h n e t, daß ein Träger mit einer funktioneilen Beschichtung zur Herstellung einer Dünnschicht-Transistoranordnung, insbesondere für eine Flüssigkristalldisplayanordnung, versehen wird. 13. The method according to any one of the preceding claims, characterized in that a carrier is provided with a functional coating for producing a thin-film transistor arrangement, in particular for a liquid crystal display arrangement.
14. Verfahren nach einem der Ansprüche 1 bis 12, d a d u r c h g e k e n n z e i c h n e t, daß ein Träger mit einer funktioneilen Beschichtung zur Herstellung einer Separatormembran für ein elektrochemi- sches Element, insbesondere einen Lithium-Ionen-Akku, versehen wird.14. The method according to any one of claims 1 to 12, so that a carrier is provided with a functional coating for producing a separator membrane for an electrochemical element, in particular a lithium-ion battery.
15. Verfahren nach einem der Ansprüche 1 bis 12, d a d u r c h g e k e n n z e i c h n e t, daß ein Träger mit einer funktioneilen Beschichtung zur Herstellung einer Dünnschichtstruktur für eine Plasmadisplayanordnung versehen wird.15. The method according to any one of claims 1 to 12, that a carrier is provided with a functional coating for producing a thin-film structure for a plasma display arrangement.
16. Verfahren nach einem der Ansprüche 1 bis 12, d a d u r c h g e k e n n z e i c h n e t, daß ein Träger mit einer funktioneilen Beschichtung zur Herstellung einer Membranstruktur für eine Brennstoffzelle versehen wird.16. The method according to any one of claims 1 to 12, that a carrier is provided with a functional coating for producing a membrane structure for a fuel cell.
17. Anordnung zur Herstellung eines dünnen Schichtaufbaus aus einem bandförmigen, flexiblen, insbesondere quasiendlosen, Träger mit mindestens einer mit dem Träger fest verbundenen funktionalen Beschichtung, die eine insbesondere in der Größenordnung der Dicke des Trägers liegende Dicke hat, mit den Schritten17. Arrangement for producing a thin layer structure from a band-shaped, flexible, in particular quasi-endless, carrier with at least one functional coating firmly connected to the carrier, which has a thickness, in particular in the order of magnitude of the thickness of the carrier, with the steps
- Bildung eines Ausgangs-Schichtaufbaus durch flächiges Auftragen eines Beschichtungs-Ausgangsmaterials auf den Träger und- Formation of a starting layer structure by surface application of a coating starting material on the carrier and
Bestrahlung des mit dem Beschichtungs-Ausgangsmaterials versehenen Trägers mit elektromagnetischer Strahlung, die einen Wirkanteil im Bereich des nahen Infrarot hat, zur Bildung der funktionalen Beschichtung aus dem Beschichtungs-Ausgangsmaterial bei gleichzeitiger Verbindung mit dem Träger unter Einschluß einer Trocknung und/oder thermischen Vernetzung, mit: einer Zuführungs- und Vorschubeinrichtung für den Träger,Irradiation of the carrier provided with the coating starting material with electromagnetic radiation, which has an active component in the near infrared range, to form the functional coating from the coating starting material while being connected to the carrier, including drying and / or thermal crosslinking, with: a feed and feed device for the carrier,
- einer Zuführungs- und Schichterzeugungseinrichtung zur, insbesondere kontinuierlichen, Zuführung und Aufbringung des Beschichtungs-Ausgangsmaterials auf den Träger und- A supply and layer generation device for, in particular continuous, supply and application of the coating starting material to the carrier and
- einer stromabwärts der Zuführungs- und Schichterzeugungseinrichtung angeordneten und dem mit dem Beschichtungs-Ausgangsmaterial versehenen Träger zugewandten, Strahlung mit einem Wirkanteil im Bereich des nahen Infrarot erzeugenden Bestrahlungseinrichtung.- A radiation arranged downstream of the feed and layer generation device and facing the carrier provided with the coating starting material, with an active component in the region of the near infrared generating radiation device.
18. Anordnung nach Anspruch 17, d a d u r c h g e k e n n z e i c h n e t, daß die Bestrahlungseinrichtung als eine, insbesondere mit erhöhter Betriebstemperatur betriebene, Halogenlampe ausgebildet ist.18. Arrangement according to claim 17, so that the irradiation device is designed as a halogen lamp, in particular operated at an increased operating temperature.
19. Anordnung nach Anspruch 17 oder 18, g e k e n n z e i c h n e t d u r c h eine Gasstrom-Erzeugungseinrichtung zur Erzeugung eines im wesentlichen parallel zur Oberfläche des Schichtaufbaus bzw. des Ausgangs-Schichtaufbaus gerichteten, diesen im Einwirkungsbereich der Bestrahlungseinrichtung überstreichenden, insbesondere trockenem und kalten, Gasstromes mit hohem Impuls.19. Arrangement according to claim 17 or 18, g e k e n n z e i c h n e t d u r c h a gas flow generating device for generating an essentially parallel to the surface of the layer structure or the output layer structure, which overlaps this in the area of action of the radiation device, in particular dry and cold, gas flow with a high pulse.
20. Anordnung nach einem der vorangehenden Ansprüche, g e k e n n z e i c h n e t d u r c h20. Arrangement according to one of the preceding claims, g e k e n n z e i c h n e t d u r c h
Mittel zur Einstellung der Strahlungsleistung, insbeson- dere Verstellmittel zur Präzisionsverstellung mindestens einer Strahlungsquelle der Bestrahlungseinrichtung. Means for setting the radiation power, in particular adjusting means for precision adjustment of at least one radiation source of the radiation device.
1. Anordnung nach einem der Ansprüche 17 bis 20, g e k e n n z e i c h n e t d u r c h eine Regelungseinrichtung zur Regelung der Strahlungsleistung der Bestrahlungseinrichtung. 1. Arrangement according to one of claims 17 to 20, g e k e n n z e i c h n e t d u r c h a control device for controlling the radiation power of the radiation device.
EP01938206A 2000-05-08 2001-05-08 Method and arrangement for the production of a thin layered structure Expired - Lifetime EP1280615B1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE10022223 2000-05-08
DE10022223 2000-05-08
DE10024731A DE10024731A1 (en) 2000-05-08 2000-05-19 Manufacturing arrangement for thin-film layer structure, having supply and layer application arrangement, and near-infrared irradiation arrangement
DE10024731 2000-05-19
PCT/EP2001/005228 WO2001085363A1 (en) 2000-05-08 2001-05-08 Method and arrangement for the production of a thin layered structure

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EP1280615B1 EP1280615B1 (en) 2006-04-19

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KR (1) KR100747722B1 (en)
AT (1) ATE323556T1 (en)
AU (1) AU2001263921A1 (en)
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US7425296B2 (en) 2004-12-03 2008-09-16 Pressco Technology Inc. Method and system for wavelength specific thermal irradiation and treatment
US10857722B2 (en) 2004-12-03 2020-12-08 Pressco Ip Llc Method and system for laser-based, wavelength specific infrared irradiation treatment
US7638780B2 (en) * 2005-06-28 2009-12-29 Eastman Kodak Company UV cure equipment with combined light path

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AU2001263921A1 (en) 2001-11-20
DE20022159U1 (en) 2001-04-05
KR100747722B1 (en) 2007-08-08
ATE323556T1 (en) 2006-05-15
US20030175412A1 (en) 2003-09-18

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