EP1264402B1 - Drive circuit and method for mosfet - Google Patents

Drive circuit and method for mosfet Download PDF

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Publication number
EP1264402B1
EP1264402B1 EP01918992.7A EP01918992A EP1264402B1 EP 1264402 B1 EP1264402 B1 EP 1264402B1 EP 01918992 A EP01918992 A EP 01918992A EP 1264402 B1 EP1264402 B1 EP 1264402B1
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Prior art keywords
gate
semiconductor device
switching means
charge storage
circuit
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EP01918992.7A
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German (de)
French (fr)
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EP1264402A2 (en
Inventor
Barend Visser
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North West University
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North West University
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10Preparation of ozone
    • C01B13/11Preparation of ozone by electric discharge
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10Preparation of ozone
    • C01B13/11Preparation of ozone by electric discharge
    • C01B13/115Preparation of ozone by electric discharge characterised by the electrical circuits producing the electrical discharge
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/04Modifications for accelerating switching
    • H03K17/041Modifications for accelerating switching without feedback from the output circuit to the control circuit
    • H03K17/0412Modifications for accelerating switching without feedback from the output circuit to the control circuit by measures taken in the control circuit
    • H03K17/04123Modifications for accelerating switching without feedback from the output circuit to the control circuit by measures taken in the control circuit in field-effect transistor switches
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/51Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
    • H03K17/56Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
    • H03K17/567Circuits characterised by the use of more than one type of semiconductor device, e.g. BIMOS, composite devices such as IGBT
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/51Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
    • H03K17/56Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
    • H03K17/687Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors

Definitions

  • This invention relates to a circuit and method for improving the switching speed of insulated gate semiconductor devices such as metal oxide field effect transistors (MOSFET's), more particularly power MOSFET's.
  • MOSFET's metal oxide field effect transistors
  • Capacitance inherent in transistor junctions limits the speed at which a voltage within a circuit can switch. It is also well known that the Miller effect has an influence on the capacitance at the gate of devices of the aforementioned kind.
  • Prior art teaches a number of methods of alleviating the Miller effect in high frequency transistor switching circuits, for example by reducing source impedance or reducing feedback capacitance, or both.
  • an output of a MOSFET such as an IRF740 typically switches through 200 volts in a rise time of approximately 27ns at a peak current of 10 amperes and in a fall time of approximately 24ns. These times may be too long for many applications.
  • the insulated gate semiconductor device may be a metal oxide semiconductor field effect transistor (MOSFET), such as a power MOSFET.
  • MOSFET metal oxide semiconductor field effect transistor
  • the insulated gate semiconductor device may be an insulated gate bipolar transistor.
  • the charging pulse may raise the gate voltage of the insulated gate semiconductor device three to four times beyond a maximum rating of the semiconductor device.
  • the switching means may be connected between the charge storage device and the gate of the semiconductor device.
  • the charge storage device may be connected in parallel with the switching means and the insulated gate semiconductor device.
  • the charge storage device may be connected in series with the switching means and the insulated gate semiconductor device.
  • the switching means may be a SIDAC.
  • the switching means may be selected from a break-over diode, a bipolar transistor, a further insulated gate semiconductor device and a high voltage fast switching device.
  • Electronic control means may be provided for the switching means.
  • the charge storage device may comprise a capacitor.
  • An inductor may be provided between the switching means and the gate.
  • an inductor may be connected in series with the switching means.
  • the circuit may be integrated on a single chip.
  • FIG 1 there is shown a basic diagram of a triggering circuit 10 according to the invention for an insulated gate semiconductor device 12 such as a metal oxide semiconductor field effect transistor (MOSFET).
  • MOSFET metal oxide semiconductor field effect transistor
  • a power MOSFET is shown and which is available from International Rectifier under the trademark HEXFET number IRF740.
  • a 10% to 90% rise time of an output voltage is specified in publicly available user data sheets of the device as being about 27ns and a corresponding fall time is specified as being in the order of 24ns. These times may be too long for some applications of the MOSFET.
  • the turn-on delay time is specified at 14ns and the turn-off delay time as 50ns.
  • the triggering circuit 10 comprises a charge storage device in the form of a capacitor 14 having first and second terminals 14.1 and 14.2 respectively.
  • the first terminal 14.1 is connected in a circuit 17 to a fast switching device 16.
  • An optional inductor 18 is connected between the fast switching device 16 and a gate 20 of the MOSFET.
  • the drain and source of the MOSFET are shown at 22 and 24 respectively.
  • the fast switching device 16 may be any suitable device having a switching speed faster than the data sheet specified turn-on delay time and/or turn-off delay time of the MOSFET, preferably better than 2ns.
  • Such devices may include a SIDAC, a break-over diode, a suitably configured bipolar transistor arrangement, or any other suitable fast switching device or circuit.
  • the fast switching device is switched on electronically which rapidly transfers sufficient charge from the capacitor 14 to the gate 20 of the MOSFET, to switch the MOSFET on.
  • Time diagrams for the circuit in figure 1 are shown in figures 3 and 4 .
  • the diagrams in broken lines indicate normal specified operation of the MOSFET 12.
  • diagram 30 in figure 3 shows the gate voltage of the MOSFET during conventional switching on.
  • the MOSFET is switched on at 32 and the diagram illustrates a turn-on delay time of about 34ns.
  • the associated gate current is shown at 34 in figure 4 .
  • the diagrams for the method according to the invention are shown at 36 and 38 in figures 3 and 4 respectively.
  • the aforementioned rapid transfer of charge from capacitor 14 through switch 16 and consequent build up of voltage on the gate of the MOSFET are shown.
  • the subsequent fall in the gate voltage shown at 42 is attributable to the aforementioned Miller effect.
  • the associated current at the gate 20 is shown at 38 in figure 4 . Initially, during the charge transfer stage, the gate current is high and thereafter it drops to a negligible level. It is also believed that with drain currents within the data specification of the MOSFET, switching losses with the switching method and circuit according to the invention are also reduced.
  • the value (C) of the capacitor 14, the voltage (V c ) required on the capacitor before switching and hence the breakthrough voltage of the switching device 16, the gate threshold voltage (V t ) of the MOSFET 12 and the gate charge (Q s ) required for complete switching of the MOSFET are related according to the following equation: C Vc Qs / Vt + C > Vt
  • FIG 2 a circuit diagram of the triggering circuit 10 is shown wherein the first switching device 16 is a SIDAC.
  • a periodic voltage is applied across a capacitor 14, in parallel with a series connection of SIDAC 16 and the gate-source path of a MOSFET 12. Initially, during a first half cycle, the voltage supplied at the input 19 is insufficient to switch the SIDAC 16 on and the capacitor 14 is hence charged up. When the supplied voltage reaches the threshold of the SIDAC 16 it switches on, resulting in a closed circuit from the capacitor 14 to the gate 20 of the MOSFET 12, partially discharging the capacitor 14 and hence charging the gate 20. The result is that a charge will now be shared between the capacitor 14 and the gate 20, so that some voltage, preferably above the gate threshold relative to ground, is applied to the gate.
  • the gate voltage may for short intervals be driven approximately three to four times beyond the maximum gate-to-source voltage rating of some MOSFETs 12 without destroying the device.
  • the gate voltage of the MOSFET, 12 drops to substantially below the threshold voltage of the MOSFET 12 shortly after the charge dissipates from the gate 20 of the MOSFET 12. As a result, the MOSFET 12 will turn off and the drain current will no longer flow.
  • the fast switching means 16 comprises a bipolar transistor arrangement.
  • the voltage waveform at 50 is shown in figure 6 .
  • the voltage waveform at source 24 is shown in figure 7 . From the latter waveform it can be seen at 52 that the source 24 of the aforementioned MOSFET 12 switches between an "off"-state to an "on”-state through about 400V in a rise time t r of about 4ns, which is substantially quicker than the specified rise time of 27ns. Similarly, and as shown at 54 it switches from the "on"-state to the "off”-state in a fall time t f of about 15ns, which is also substantially shorter than a specified fall time of about 24ns.
  • FIG 8 the same triggering circuit 10 is shown for an insulated gate bipolar transistor 60 having a gate 62, a collector 64 and an emitter 66.
  • the transistor is an IRG4PC50W device which is being manufactured and sold by International Rectifier.
  • the waveform at 68 in figure 8 is shown in figure 9 and the waveform at emitter 66 adjacent load 70 is shown in figure 10 .
  • the switching means comprises a low output impedance, high voltage, fast switching driving circuit 116.
  • the device 116 must be able to switch between OV and Vd in a first time period shorter than a specified turn-on delay time of the device 12.
  • Vd is preferably bigger than 20xVt. Devices of this nature are available on the market.

Description

    TECHNICAL FIELD
  • This invention relates to a circuit and method for improving the switching speed of insulated gate semiconductor devices such as metal oxide field effect transistors (MOSFET's), more particularly power MOSFET's.
  • BACKGROUND ART
  • Capacitance inherent in transistor junctions limits the speed at which a voltage within a circuit can switch. It is also well known that the Miller effect has an influence on the capacitance at the gate of devices of the aforementioned kind.
  • Prior art teaches a number of methods of alleviating the Miller effect in high frequency transistor switching circuits, for example by reducing source impedance or reducing feedback capacitance, or both.
  • Even with such improvements, an output of a MOSFET such as an IRF740 typically switches through 200 volts in a rise time of approximately 27ns at a peak current of 10 amperes and in a fall time of approximately 24ns. These times may be too long for many applications.
  • OBJECT OF THE INVENTION
  • Accordingly, it is an object of the present invention to provide a triggering circuit and method for improving the rise and/or fall times of insulated gate semiconductor devices with which the applicant believes the aforementioned disadvantages will at least be alleviated.
  • SUMMARY OF THE INVENTION
  • According to a first aspect of the present invention there is provided a method according to claim 1.
  • The insulated gate semiconductor device may be a metal oxide semiconductor field effect transistor (MOSFET), such as a power MOSFET.
  • Alternatively, the insulated gate semiconductor device may be an insulated gate bipolar transistor.
  • The charging pulse may raise the gate voltage of the insulated gate semiconductor device three to four times beyond a maximum rating of the semiconductor device.
  • The switching means may be connected between the charge storage device and the gate of the semiconductor device.
  • Alternatively, the charge storage device may be connected in parallel with the switching means and the insulated gate semiconductor device.
  • As a further alternative, the charge storage device may be connected in series with the switching means and the insulated gate semiconductor device.
  • The switching means may be a SIDAC.
  • Alternatively, the switching means may be selected from a break-over diode, a bipolar transistor, a further insulated gate semiconductor device and a high voltage fast switching device.
  • Electronic control means may be provided for the switching means.
  • The charge storage device may comprise a capacitor.
  • An inductor may be provided between the switching means and the gate.
  • Alternatively, an inductor may be connected in series with the switching means.
  • The circuit may be integrated on a single chip.
  • According to a second aspect of the invention there is provided a circuit according to claim 16.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • The invention will now be described, by way of example only, with reference to the accompanying drawings wherein:
  • figure 1
    is a basic circuit diagram of a triggering circuit according to the invention for a MOSFET;
    figure 2
    is a diagram of one embodiment of the circuit comprising a SIDAC as fast switching device;
    figure 3
    includes a diagram in dotted lines of gate voltage against time of normal specified operation of the MOSFET and a diagram in solid lines of operation according to the method of the invention;
    figure 4
    includes a diagram in dotted lines of gate current against time of normal specified operation of the MOSFET and a diagram in solid lines of operation according to the method of the invention;
    figure 5
    is a diagram of another embodiment of the circuit according to the invention;
    figure 6
    is a waveform of voltage against time at a first terminal of a charge storage capacitor in figure 5;
    figure 7
    is a waveform of voltage against time at the source of the MOSFET in figure 5;
    figure 8
    is a diagram of a triggering circuit for an insulated gate bipolar transistor;
    figure 9
    is a waveform of voltage against time at a first terminal of a charge storage capacitor in the circuit in figure 8;
    figure 10
    is a waveform of voltage against time at an emitter of the transistor in figure 8; and
    figure 11
    is a basic circuit diagram of yet another embodiment of the triggering circuit.
    DESCRIPTION OF A PREFERRED EMBODIMENT OF THE INVENTION
  • In figure 1, there is shown a basic diagram of a triggering circuit 10 according to the invention for an insulated gate semiconductor device 12 such as a metal oxide semiconductor field effect transistor (MOSFET).
  • In the diagram a power MOSFET is shown and which is available from International Rectifier under the trademark HEXFET number IRF740. A 10% to 90% rise time of an output voltage is specified in publicly available user data sheets of the device as being about 27ns and a corresponding fall time is specified as being in the order of 24ns. These times may be too long for some applications of the MOSFET. The turn-on delay time is specified at 14ns and the turn-off delay time as 50ns.
  • The triggering circuit 10 comprises a charge storage device in the form of a capacitor 14 having first and second terminals 14.1 and 14.2 respectively. The first terminal 14.1 is connected in a circuit 17 to a fast switching device 16. An optional inductor 18 is connected between the fast switching device 16 and a gate 20 of the MOSFET. The drain and source of the MOSFET are shown at 22 and 24 respectively.
  • The fast switching device 16 may be any suitable device having a switching speed faster than the data sheet specified turn-on delay time and/or turn-off delay time of the MOSFET, preferably better than 2ns. Such devices may include a SIDAC, a break-over diode, a suitably configured bipolar transistor arrangement, or any other suitable fast switching device or circuit.
  • To switch the MOSFET on, the fast switching device is switched on electronically which rapidly transfers sufficient charge from the capacitor 14 to the gate 20 of the MOSFET, to switch the MOSFET on.
  • Time diagrams for the circuit in figure 1 are shown in figures 3 and 4. The diagrams in broken lines indicate normal specified operation of the MOSFET 12. Hence, diagram 30 in figure 3 shows the gate voltage of the MOSFET during conventional switching on. The MOSFET is switched on at 32 and the diagram illustrates a turn-on delay time of about 34ns. The associated gate current is shown at 34 in figure 4.
  • The diagrams for the method according to the invention are shown at 36 and 38 in figures 3 and 4 respectively. At 40 in figure 3, the aforementioned rapid transfer of charge from capacitor 14 through switch 16 and consequent build up of voltage on the gate of the MOSFET are shown. The subsequent fall in the gate voltage shown at 42 is attributable to the aforementioned Miller effect. What is clear though is that the device switches on at 44, after a mere 4ns. The associated current at the gate 20 is shown at 38 in figure 4. Initially, during the charge transfer stage, the gate current is high and thereafter it drops to a negligible level. It is also believed that with drain currents within the data specification of the MOSFET, switching losses with the switching method and circuit according to the invention are also reduced.
  • The value (C) of the capacitor 14, the voltage (Vc) required on the capacitor before switching and hence the breakthrough voltage of the switching device 16, the gate threshold voltage (Vt) of the MOSFET 12 and the gate charge (Qs) required for complete switching of the MOSFET are related according to the following equation: C Vc Qs / Vt + C > Vt
    Figure imgb0001
  • In figure 2 a circuit diagram of the triggering circuit 10 is shown wherein the first switching device 16 is a SIDAC.
  • A periodic voltage is applied across a capacitor 14, in parallel with a series connection of SIDAC 16 and the gate-source path of a MOSFET 12. Initially, during a first half cycle, the voltage supplied at the input 19 is insufficient to switch the SIDAC 16 on and the capacitor 14 is hence charged up. When the supplied voltage reaches the threshold of the SIDAC 16 it switches on, resulting in a closed circuit from the capacitor 14 to the gate 20 of the MOSFET 12, partially discharging the capacitor 14 and hence charging the gate 20. The result is that a charge will now be shared between the capacitor 14 and the gate 20, so that some voltage, preferably above the gate threshold relative to ground, is applied to the gate.
  • Using this method, the gate voltage may for short intervals be driven approximately three to four times beyond the maximum gate-to-source voltage rating of some MOSFETs 12 without destroying the device.
  • Similarly, when during the other half cycle the gate voltage exceeds the reverse threshold of the SIDAC 16 and current is conducted in the opposite direction, the gate voltage of the MOSFET, 12 drops to substantially below the threshold voltage of the MOSFET 12 shortly after the charge dissipates from the gate 20 of the MOSFET 12. As a result, the MOSFET 12 will turn off and the drain current will no longer flow.
  • In figure 5, an alternative and self-oscillating triggering circuit for the MOSFET 12 is shown. Components thereof corresponding to components of the circuits in figures 1 and 2 are designated utilizing like reference numerals. In this embodiment, the fast switching means 16 comprises a bipolar transistor arrangement.
  • The voltage waveform at 50 is shown in figure 6. The voltage waveform at source 24 is shown in figure 7. From the latter waveform it can be seen at 52 that the source 24 of the aforementioned MOSFET 12 switches between an "off"-state to an "on"-state through about 400V in a rise time tr of about 4ns, which is substantially quicker than the specified rise time of 27ns. Similarly, and as shown at 54 it switches from the "on"-state to the "off"-state in a fall time tf of about 15ns, which is also substantially shorter than a specified fall time of about 24ns.
  • In figure 8, the same triggering circuit 10 is shown for an insulated gate bipolar transistor 60 having a gate 62, a collector 64 and an emitter 66. The transistor is an IRG4PC50W device which is being manufactured and sold by International Rectifier. The waveform at 68 in figure 8 is shown in figure 9 and the waveform at emitter 66 adjacent load 70 is shown in figure 10.
  • From the latter waveform it can be seen at 72 that the emitter 66 switches between an "off"-state and an "on"-state through about 400V in a rise time t, of about 4ns, which is substantially less than a specified rise time of 33ns.
  • In figure 11 a further embodiment of the triggering circuit is shown. The switching means comprises a low output impedance, high voltage, fast switching driving circuit 116. The device 116 must be able to switch between OV and Vd in a first time period shorter than a specified turn-on delay time of the device 12. Vd is preferably bigger than 20xVt. Devices of this nature are available on the market.
  • It will be appreciated that there are many variations in detail on the triggering circuit and method according to the invention, without departing from the scope of the appended claims.

Claims (16)

  1. A method of using a circuit to drive an insulated gate semiconductor device (12) comprising as a first terminal a gate (20) and at least second and third terminals (22, 24), the circuit comprising a charge storage device (14) and switching means (16, 116) connected in a series circuit to the gate of the semiconductor device to apply from the charge storage device a charging pulse to the gate of the semiconductor device so as to switch the semiconductor device between one of an on state and an off state and the other of the on state and the off state, characterised in that the switching speed of the switching means is less than 2ns whereby the duration of the charging pulse is such that the charging pulse is complete prior to a change in the current flow between the second and third terminals (22, 24) of the semiconductor device and in that the charging pulse applies a voltage to the gate three to four times beyond the gate maximum voltage rating of the semiconductor device.
  2. A method according to claim 1, characterised in that the insulated gate semiconductor device (12) is a metal oxide semiconductor field effect transistor.
  3. A method according to claim 2, characterised in that the metal oxide semiconductor field effect transistor is a power metal oxide semiconductor field effect transistor.
  4. A method according to claim 1, characterised in that the insulated gate semiconductor device (12) is an insulated gate bipolar transistor.
  5. A method according to any preceding claim, characterised in that the charging pulse raises the gate voltage of the insulated gate semiconductor device (12) three to four times beyond a maximum rating of the semiconductor device.
  6. A method according to any preceding claim, characterised in that the switching means (16) is connected between the charge storage device (14) and the gate (20) of the semiconductor device (12).
  7. A method according to any preceding claim, characterised in that a periodic voltage is applied across a capacitor forming the charge storage device (14), in parallel with a series connection of a SIDAC forming the switching means (16) and the gate-source path of a MOSFET forming the semiconductor device (12).
  8. A method according to any one of claims 1 to 6, characterised in that the charge storage device (14) is connected in series with the switching means (16, 116) and the insulated gate semiconductor device (12).
  9. A method according to any preceding claim, characterised in that the switching means (16) is a SIDAC.
  10. A method according to any one of claims 1 to 8, characterised in that the switching means (16) is selected from a break-over diode, a bipolar transistor, a further insulated gate semiconductor device and a high voltage fast switching device (116).
  11. A method according to any preceding claim, characterised in that electronic control means is provided for the switching means (16).
  12. A method according to any preceding claim, characterised in that the charge storage device (14) comprises a capacitor.
  13. A method according to any preceding claim, characterised in that an inductor (18) is provided between the switching means (16, 116) and the gate (20).
  14. A method according to any one of claims 1 to 12, characterised in that an inductor (18) is connected in series with the switching means (16, 116).
  15. A method according to any preceding claim, characterised in that the circuit is integrated on a single chip.
  16. A circuit for driving an insulated gate semiconductor device (12) comprising as a first terminal a gate (20) and at least second and third terminals (22, 24), the circuit comprising a charge storage device (14) and switching means (16, 116) connected in a series circuit to the gate of the semiconductor device to apply from the charge storage device a charging pulse to the gate of the semiconductor device so as to switch the semiconductor device between one of an on state and an off state and the other of the on state and the off state, characterised in that the switching speed of the switching means is less than 2ns whereby the duration of the charging pulse is such that the charging pulse is complete prior to a change in the current flow between the second and third terminals (22, 24) of the semiconductor device and in that the charging pulse applies a voltage to the gate three to four times beyond the gate maximum voltage rating of the semiconductor device.
EP01918992.7A 2000-02-23 2001-02-23 Drive circuit and method for mosfet Expired - Lifetime EP1264402B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP16174333.1A EP3096455A1 (en) 2000-02-23 2001-02-23 Drive circuit and method for mosfet

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ZA200000887 2000-02-23
ZA200000887 2000-02-23
PCT/ZA2001/000024 WO2001063763A2 (en) 2000-02-23 2001-02-23 Drive circuit and method for mosfet

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EP1264402B1 true EP1264402B1 (en) 2016-06-15

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Families Citing this family (4)

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DE10306809A1 (en) 2003-02-18 2004-09-02 Siemens Ag Operation of a half-bridge, in particular a field-effect transistor half-bridge
JP4755455B2 (en) * 2005-07-07 2011-08-24 ローム株式会社 Control circuit for controlling on / off of power transistor, switching regulator using the same, and electronic device
JP4804142B2 (en) * 2005-12-21 2011-11-02 東洋電機製造株式会社 High-speed gate drive circuit
WO2007135584A1 (en) * 2006-05-18 2007-11-29 North-West University Ignition system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1197995A (en) * 1997-09-19 1999-04-09 Origin Electric Co Ltd Method for driving electric field control type semiconductor element and circuit therefor
WO2000050338A1 (en) * 1999-02-24 2000-08-31 Potchefstroom University For Christian Higher Education Method and apparatus for producing ozone

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4912335A (en) * 1988-03-07 1990-03-27 Dionics Inc. Means for rapid charging and dynamic discharging of a capacitively charged electrical device
JP2776517B2 (en) * 1988-09-26 1998-07-16 日本電気株式会社 Semiconductor device
JPH03286619A (en) * 1990-04-02 1991-12-17 Mitsubishi Electric Corp Gate driver circuit for isolation gate type semiconductor device and flash controller using same circuit
JPH05122035A (en) * 1991-05-10 1993-05-18 Fuji Electric Co Ltd Semiconductor device with built-in driving power source
US5504449A (en) * 1992-04-09 1996-04-02 Harris Corporation Power driver circuit
JPH05335911A (en) * 1992-05-28 1993-12-17 Hitachi Ltd Drive circuit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1197995A (en) * 1997-09-19 1999-04-09 Origin Electric Co Ltd Method for driving electric field control type semiconductor element and circuit therefor
WO2000050338A1 (en) * 1999-02-24 2000-08-31 Potchefstroom University For Christian Higher Education Method and apparatus for producing ozone

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MCGINTY, J.: "Application note 24 - Designing with Low-Side MOSFET Drivers"", March 1998 (1998-03-01), MICREL INC, SAN JOSE, CA, US, pages 1 - 4 *

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JP2003524982A (en) 2003-08-19
CN1522495A (en) 2004-08-18
EP3096455A1 (en) 2016-11-23
WO2001063763A3 (en) 2002-06-13
EP1264402A2 (en) 2002-12-11
ES2593907T3 (en) 2016-12-14
WO2001063763A2 (en) 2001-08-30
AU2001246004A1 (en) 2001-09-03

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