EP1157782A3 - Polishing apparatus - Google Patents

Polishing apparatus Download PDF

Info

Publication number
EP1157782A3
EP1157782A3 EP01112002A EP01112002A EP1157782A3 EP 1157782 A3 EP1157782 A3 EP 1157782A3 EP 01112002 A EP01112002 A EP 01112002A EP 01112002 A EP01112002 A EP 01112002A EP 1157782 A3 EP1157782 A3 EP 1157782A3
Authority
EP
European Patent Office
Prior art keywords
workpiece
polishing apparatus
polishing
top ring
rotary transporter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP01112002A
Other languages
German (de)
French (fr)
Other versions
EP1157782B1 (en
EP1157782A2 (en
Inventor
Robert R. Jackson
Tetsuji Togawa
Satoshi Wakabayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of EP1157782A2 publication Critical patent/EP1157782A2/en
Publication of EP1157782A3 publication Critical patent/EP1157782A3/en
Application granted granted Critical
Publication of EP1157782B1 publication Critical patent/EP1157782B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • B24B37/345—Feeding, loading or unloading work specially adapted to lapping

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus includes a turntable having polishing surface, a top ring for holding a workpiece and pressing the workpiece against the polishing surface to polish the workpiece. The polishing apparatus further includes a rotary transporter disposed in a position which can be accessed by the top ring and having a plurality of stages positioned on a predetermined circumference from a center of rotation of the rotary transporter for holding the workpieces. The polishing apparatus further includes a plurality of support tables removably held by the respective stages of the rotary transporter for supporting the workpieces, and a pusher for transferring the workpiece between the support table and the top ring.
EP01112002A 2000-05-23 2001-05-22 Polishing apparatus Expired - Lifetime EP1157782B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/576,717 US6358126B1 (en) 2000-05-23 2000-05-23 Polishing apparatus
US576717 2000-05-23

Publications (3)

Publication Number Publication Date
EP1157782A2 EP1157782A2 (en) 2001-11-28
EP1157782A3 true EP1157782A3 (en) 2004-01-14
EP1157782B1 EP1157782B1 (en) 2006-08-16

Family

ID=24305673

Family Applications (1)

Application Number Title Priority Date Filing Date
EP01112002A Expired - Lifetime EP1157782B1 (en) 2000-05-23 2001-05-22 Polishing apparatus

Country Status (7)

Country Link
US (1) US6358126B1 (en)
EP (1) EP1157782B1 (en)
JP (1) JP4183398B2 (en)
KR (1) KR100726013B1 (en)
DE (1) DE60122236T2 (en)
SG (1) SG99901A1 (en)
TW (1) TW506879B (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001326201A (en) * 2000-05-16 2001-11-22 Ebara Corp Polishing device
TW472636U (en) * 2001-04-03 2002-01-11 Nanya Technology Corp Improvement for chemical mechanical polishing machine
JP3888620B2 (en) * 2002-01-22 2007-03-07 東京エレクトロン株式会社 Substrate delivery position detection method and teaching device in substrate transport apparatus
KR100470230B1 (en) * 2002-02-08 2005-02-05 두산디앤디 주식회사 Chemical Mechanical Polishing Apparatus
JP4197103B2 (en) * 2002-04-15 2008-12-17 株式会社荏原製作所 Polishing equipment
US6780083B2 (en) * 2002-04-19 2004-08-24 Peter Wolters Cmp-Systeme Gmbh & Co. Kg Apparatus and method for the chemical mechanical polishing of the surface of circular flat workpieces, in particular semi-conductor wafers
DE10326472B4 (en) * 2003-06-12 2006-03-09 Hilti Ag Connecting element for connecting a handle with a housing part and a transmission housing of a hand-held electrical device
JP4583207B2 (en) * 2004-03-31 2010-11-17 不二越機械工業株式会社 Polishing equipment
JP4642532B2 (en) * 2005-04-01 2011-03-02 不二越機械工業株式会社 Polishing equipment
JP5155517B2 (en) * 2005-04-21 2013-03-06 株式会社荏原製作所 Wafer delivery apparatus and polishing apparatus
JP2007201417A (en) * 2005-12-28 2007-08-09 Tokyo Electron Ltd Boat for heat treatment and vertical-type heat treatment device
US7536233B1 (en) * 2006-01-30 2009-05-19 Advanced Micro Devices, Inc. Method and apparatus for adjusting processing speeds based on work-in-process levels
JP4926528B2 (en) * 2006-04-19 2012-05-09 昭和電工株式会社 Wet polishing equipment
US11705354B2 (en) 2020-07-10 2023-07-18 Applied Materials, Inc. Substrate handling systems
CN114473847B (en) * 2021-12-29 2023-04-25 华海清科股份有限公司 Rotary wafer interaction system

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5649854A (en) * 1994-05-04 1997-07-22 Gill, Jr.; Gerald L. Polishing apparatus with indexing wafer processing stations
US5679060A (en) * 1994-07-14 1997-10-21 Silicon Technology Corporation Wafer grinding machine
GB2324750A (en) * 1997-04-28 1998-11-04 Nec Corp Automatic wafer polishing apparatus
EP0987084A1 (en) * 1998-03-09 2000-03-22 Ebara Corporation Polishing apparatus
EP1034887A2 (en) * 1999-03-05 2000-09-13 Ebara Corporation Polishing apparatus
JP2000317827A (en) * 1999-03-05 2000-11-21 Ebara Corp Polishing device
EP1080840A2 (en) * 1999-08-30 2001-03-07 Mitsubishi Materials Corporation Polishing apparatus, polishing method and method of conditioning polishing pad

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4944119A (en) 1988-06-20 1990-07-31 Westech Systems, Inc. Apparatus for transporting wafer to and from polishing head
US5549502A (en) * 1992-12-04 1996-08-27 Fujikoshi Machinery Corp. Polishing apparatus
US5804507A (en) 1995-10-27 1998-09-08 Applied Materials, Inc. Radially oscillating carousel processing system for chemical mechanical polishing
US5738574A (en) 1995-10-27 1998-04-14 Applied Materials, Inc. Continuous processing system for chemical mechanical polishing
JP3696690B2 (en) * 1996-04-23 2005-09-21 不二越機械工業株式会社 Wafer polisher system
JPH11204468A (en) 1998-01-09 1999-07-30 Speedfam Co Ltd Surface planarizing apparatus of semiconductor wafer

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5649854A (en) * 1994-05-04 1997-07-22 Gill, Jr.; Gerald L. Polishing apparatus with indexing wafer processing stations
US5679060A (en) * 1994-07-14 1997-10-21 Silicon Technology Corporation Wafer grinding machine
GB2324750A (en) * 1997-04-28 1998-11-04 Nec Corp Automatic wafer polishing apparatus
EP0987084A1 (en) * 1998-03-09 2000-03-22 Ebara Corporation Polishing apparatus
EP1034887A2 (en) * 1999-03-05 2000-09-13 Ebara Corporation Polishing apparatus
JP2000317827A (en) * 1999-03-05 2000-11-21 Ebara Corp Polishing device
EP1080840A2 (en) * 1999-08-30 2001-03-07 Mitsubishi Materials Corporation Polishing apparatus, polishing method and method of conditioning polishing pad

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 14 5 March 2001 (2001-03-05) *

Also Published As

Publication number Publication date
JP4183398B2 (en) 2008-11-19
SG99901A1 (en) 2003-11-27
DE60122236T2 (en) 2007-08-23
EP1157782B1 (en) 2006-08-16
US6358126B1 (en) 2002-03-19
DE60122236D1 (en) 2006-09-28
KR100726013B1 (en) 2007-06-08
TW506879B (en) 2002-10-21
JP2002009021A (en) 2002-01-11
EP1157782A2 (en) 2001-11-28
KR20010107672A (en) 2001-12-07

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