EP1121333A4 - GENERATION OF SILICONE SILICONE WITH THE PREVENTION OF STOPPING - Google Patents
GENERATION OF SILICONE SILICONE WITH THE PREVENTION OF STOPPINGInfo
- Publication number
- EP1121333A4 EP1121333A4 EP99935651A EP99935651A EP1121333A4 EP 1121333 A4 EP1121333 A4 EP 1121333A4 EP 99935651 A EP99935651 A EP 99935651A EP 99935651 A EP99935651 A EP 99935651A EP 1121333 A4 EP1121333 A4 EP 1121333A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- plug
- free system
- silica soot
- creating
- creating silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C03B37/0142—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/50—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with alkali metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/54—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/34—Liquid, e.g. mist or aerosol
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/46—Comprising performance enhancing means, e.g. electrostatic charge or built-in heater
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US9573598P | 1998-08-07 | 1998-08-07 | |
US95735P | 1998-08-07 | ||
PCT/US1999/016176 WO2000007950A1 (en) | 1998-08-07 | 1999-07-16 | Creating silica soot with a plug-free system |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1121333A1 EP1121333A1 (en) | 2001-08-08 |
EP1121333A4 true EP1121333A4 (en) | 2005-03-09 |
Family
ID=22253358
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99935651A Withdrawn EP1121333A4 (en) | 1998-08-07 | 1999-07-16 | GENERATION OF SILICONE SILICONE WITH THE PREVENTION OF STOPPING |
Country Status (9)
Country | Link |
---|---|
EP (1) | EP1121333A4 (zh) |
JP (1) | JP2002522334A (zh) |
KR (1) | KR20010072337A (zh) |
CN (1) | CN1315926A (zh) |
AU (1) | AU765649B2 (zh) |
BR (1) | BR9912803A (zh) |
CA (1) | CA2339576A1 (zh) |
WO (1) | WO2000007950A1 (zh) |
ZA (1) | ZA994173B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6800574B2 (en) | 2001-10-24 | 2004-10-05 | 3M Innovative Properties Company | Glass beads and uses thereof |
US20070240454A1 (en) | 2006-01-30 | 2007-10-18 | Brown David P | Method and apparatus for continuous or batch optical fiber preform and optical fiber production |
US11345606B2 (en) | 2017-02-17 | 2022-05-31 | David Brown | Deposition particles and a method and apparatus for producing the same |
EP3950610A1 (de) * | 2020-08-06 | 2022-02-09 | Heraeus Quarzglas GmbH & Co. KG | Alternative fluorierungsmittel ii: fluosil und sootaufbau |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4230744A (en) * | 1979-02-21 | 1980-10-28 | Corning Glass Works | System for delivering materials to deposition site on optical waveguide blank |
US4735643A (en) * | 1985-08-23 | 1988-04-05 | Licentia Patent-Verwaltungs-Gmbh | Method for producing an aerosol stream |
WO1997022553A1 (en) * | 1995-12-19 | 1997-06-26 | Corning Incorporated | Method and apparatus for forming fused silica by combustion of liquid reactants |
-
1999
- 1999-06-24 ZA ZA9904173A patent/ZA994173B/xx unknown
- 1999-07-16 EP EP99935651A patent/EP1121333A4/en not_active Withdrawn
- 1999-07-16 CA CA002339576A patent/CA2339576A1/en not_active Abandoned
- 1999-07-16 CN CN99810260A patent/CN1315926A/zh active Pending
- 1999-07-16 BR BR9912803-9A patent/BR9912803A/pt not_active Application Discontinuation
- 1999-07-16 AU AU51085/99A patent/AU765649B2/en not_active Ceased
- 1999-07-16 JP JP2000563586A patent/JP2002522334A/ja not_active Withdrawn
- 1999-07-16 WO PCT/US1999/016176 patent/WO2000007950A1/en not_active Application Discontinuation
- 1999-07-16 KR KR1020017001667A patent/KR20010072337A/ko not_active Application Discontinuation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4230744A (en) * | 1979-02-21 | 1980-10-28 | Corning Glass Works | System for delivering materials to deposition site on optical waveguide blank |
US4735643A (en) * | 1985-08-23 | 1988-04-05 | Licentia Patent-Verwaltungs-Gmbh | Method for producing an aerosol stream |
WO1997022553A1 (en) * | 1995-12-19 | 1997-06-26 | Corning Incorporated | Method and apparatus for forming fused silica by combustion of liquid reactants |
Non-Patent Citations (1)
Title |
---|
See also references of WO0007950A1 * |
Also Published As
Publication number | Publication date |
---|---|
AU765649B2 (en) | 2003-09-25 |
ZA994173B (en) | 2000-03-06 |
BR9912803A (pt) | 2001-05-02 |
KR20010072337A (ko) | 2001-07-31 |
CA2339576A1 (en) | 2000-02-17 |
WO2000007950A1 (en) | 2000-02-17 |
EP1121333A1 (en) | 2001-08-08 |
AU5108599A (en) | 2000-02-28 |
CN1315926A (zh) | 2001-10-03 |
JP2002522334A (ja) | 2002-07-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20010207 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
|
AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
RBV | Designated contracting states (corrected) |
Designated state(s): DE FI FR GB IT NL |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20050121 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20050201 |