EP1082627A4 - Kontrollierter phasenunterschied zwischen zwei lichtwellen zum schreiben von bragg-gittern - Google Patents

Kontrollierter phasenunterschied zwischen zwei lichtwellen zum schreiben von bragg-gittern

Info

Publication number
EP1082627A4
EP1082627A4 EP99924590A EP99924590A EP1082627A4 EP 1082627 A4 EP1082627 A4 EP 1082627A4 EP 99924590 A EP99924590 A EP 99924590A EP 99924590 A EP99924590 A EP 99924590A EP 1082627 A4 EP1082627 A4 EP 1082627A4
Authority
EP
European Patent Office
Prior art keywords
beams
phase delay
bragg gratings
controlled phase
writing bragg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP99924590A
Other languages
English (en)
French (fr)
Other versions
EP1082627A1 (de
EP1082627B1 (de
Inventor
Dmitrii Stepanov
Mark Sceats
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Sydney
Original Assignee
University of Sydney
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Sydney filed Critical University of Sydney
Publication of EP1082627A1 publication Critical patent/EP1082627A1/de
Publication of EP1082627A4 publication Critical patent/EP1082627A4/de
Application granted granted Critical
Publication of EP1082627B1 publication Critical patent/EP1082627B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02152—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating involving moving the fibre or a manufacturing element, stretching of the fibre
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02133—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02133—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference
    • G02B6/02138—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference based on illuminating a phase mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B2006/02157—Grating written during drawing of the fibre
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/0482—Interference based printer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Optical Communication System (AREA)
  • Optical Integrated Circuits (AREA)
  • Light Guides In General And Applications Therefor (AREA)
EP99924590A 1998-05-29 1999-05-28 Kontrollierter phasenunterschied zwischen zwei lichtwellen zum schreiben von bragg-gittern Expired - Lifetime EP1082627B1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
AUPP3816A AUPP381698A0 (en) 1998-05-29 1998-05-29 Electro-, magneto- or acousto- optically controlled UV writing set up for bragg grating fabrication
AUPP381698 1998-05-29
PCT/AU1999/000417 WO1999063371A1 (en) 1998-05-29 1999-05-28 Controlled phase delay between beams for writing bragg gratings

Publications (3)

Publication Number Publication Date
EP1082627A1 EP1082627A1 (de) 2001-03-14
EP1082627A4 true EP1082627A4 (de) 2002-03-13
EP1082627B1 EP1082627B1 (de) 2003-03-26

Family

ID=3808063

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99924590A Expired - Lifetime EP1082627B1 (de) 1998-05-29 1999-05-28 Kontrollierter phasenunterschied zwischen zwei lichtwellen zum schreiben von bragg-gittern

Country Status (8)

Country Link
US (3) US7018745B2 (de)
EP (1) EP1082627B1 (de)
JP (1) JP2002517768A (de)
KR (1) KR100758021B1 (de)
AU (1) AUPP381698A0 (de)
CA (1) CA2332992C (de)
DE (1) DE69906282T2 (de)
WO (1) WO1999063371A1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AUPP381698A0 (en) * 1998-05-29 1998-06-25 University Of Sydney, The Electro-, magneto- or acousto- optically controlled UV writing set up for bragg grating fabrication
US6778733B2 (en) 2001-01-05 2004-08-17 Teraxion Inc. Lithographic fabrication of phase mask for fiber Bragg gratings
SE520598C2 (sv) * 2001-03-08 2003-07-29 Proximion Fiber Optics Ab Metod och anordning för fotoinducering av ett gitter i en optisk fiber
NO314677B1 (no) * 2001-06-29 2003-04-28 Optoplan As FBG produksjonssystem
TW582062B (en) * 2001-09-14 2004-04-01 Sony Corp Laser irradiation apparatus and method of treating semiconductor thin film
US6751381B1 (en) 2002-05-24 2004-06-15 Teraxion Inc. Embodying amplitude information into phase masks
AUPS328402A0 (en) * 2002-06-28 2002-07-18 Australian Photonics Pty Limited Writing of photo-induced structures
AU2003900836A0 (en) 2003-02-25 2003-03-13 Redfern Optical Components Pty Ltd Optical structure writing system
US6853772B2 (en) 2003-05-13 2005-02-08 3M Innovative Properties Company Fiber grating writing interferometer with continuous wavelength tuning and chirp capability
US6915044B2 (en) 2003-07-15 2005-07-05 3M Innovative Properties Company Tunable talbot interferometers for fiber bragg grating writing
US7459241B2 (en) * 2003-09-22 2008-12-02 Seagate Technology Llc Rotary apertured interferometric lithography (RAIL)
WO2006000047A1 (en) * 2004-06-25 2006-01-05 Fiberom Pty Ltd Information storage system and method
KR100639038B1 (ko) * 2005-05-18 2006-10-30 전남대학교산학협력단 브래그 격자 형성 장치 및 이에 이용되는 반사 유닛
US7412175B2 (en) 2005-06-20 2008-08-12 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Interferometric polarization control
US8929741B2 (en) * 2007-07-30 2015-01-06 Hewlett-Packard Development Company, L.P. Optical interconnect
US8003280B1 (en) * 2007-10-17 2011-08-23 Robert Andrew Marshall System and method for holographic lithographic production of a photonic crystal
JP6646426B2 (ja) * 2015-12-14 2020-02-14 浜松ホトニクス株式会社 干渉観察装置および干渉観察方法
CN107121585B (zh) * 2017-06-30 2023-08-29 安徽问天量子科技股份有限公司 一种电光相位调制器半波电压测量系统和测量方法
US11585967B2 (en) * 2020-10-15 2023-02-21 Meta Platforms Technologies LLC Apodization of refractive index profile in volume gratings

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997022023A1 (en) * 1995-12-12 1997-06-19 British Telecommunications Public Limited Company Formation of a refractive index grating
DE19605062C1 (de) * 1996-02-12 1997-08-28 Univ Dresden Tech Verfahren zur Erzeugung eines langen Bragg-Gitters in einer optischen Monomodefaser
EP0843186A1 (de) * 1996-11-19 1998-05-20 Nortel Networks Corporation Herstellung von Bragg-Reflexionsgittern in Wellenleitern

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54100752A (en) 1978-01-25 1979-08-08 Mitsubishi Electric Corp Optical device
US4432239A (en) * 1981-12-08 1984-02-21 Bykov Anatoly P Apparatus for measuring deformation
JPH02192114A (ja) * 1989-01-20 1990-07-27 Canon Inc 位置合わせ装置
US4954789A (en) * 1989-09-28 1990-09-04 Texas Instruments Incorporated Spatial light modulator
US5128693A (en) * 1990-09-14 1992-07-07 Nippon Telegraph & Telephone Corporation Information recording apparatus
US5066133A (en) * 1990-10-18 1991-11-19 United Technologies Corporation Extended length embedded Bragg grating manufacturing method and arrangement
US5388173A (en) * 1993-12-20 1995-02-07 United Technologies Corporation Method and apparatus for forming aperiodic gratings in optical fibers
JP3491969B2 (ja) * 1994-06-27 2004-02-03 キヤノン株式会社 変位情報測定装置
JP3492012B2 (ja) * 1995-03-09 2004-02-03 キヤノン株式会社 変位情報検出装置
GB9509874D0 (en) * 1995-05-16 1995-07-12 Univ Southampton Optical waveguide grating
AU711106B2 (en) * 1995-12-01 1999-10-07 University Of Sydney, The Ring interferometer configuration for writing gratings
EP0875013B1 (de) * 1996-01-16 2005-08-10 BRITISH TELECOMMUNICATIONS public limited company Verfahren und vorrichtung zum aufzeichnen eines brechungsindexmusters in einem optischen medium
FR2768819B1 (fr) * 1997-09-25 1999-12-17 Alsthom Cge Alcatel Reseaux de bragg de grande longueur
AUPP381698A0 (en) * 1998-05-29 1998-06-25 University Of Sydney, The Electro-, magneto- or acousto- optically controlled UV writing set up for bragg grating fabrication

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997022023A1 (en) * 1995-12-12 1997-06-19 British Telecommunications Public Limited Company Formation of a refractive index grating
DE19605062C1 (de) * 1996-02-12 1997-08-28 Univ Dresden Tech Verfahren zur Erzeugung eines langen Bragg-Gitters in einer optischen Monomodefaser
EP0843186A1 (de) * 1996-11-19 1998-05-20 Nortel Networks Corporation Herstellung von Bragg-Reflexionsgittern in Wellenleitern

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO9963371A1 *

Also Published As

Publication number Publication date
US7018745B2 (en) 2006-03-28
EP1082627A1 (de) 2001-03-14
KR20010070949A (ko) 2001-07-28
WO1999063371A1 (en) 1999-12-09
CA2332992C (en) 2009-12-22
DE69906282T2 (de) 2004-02-05
US20090121392A1 (en) 2009-05-14
JP2002517768A (ja) 2002-06-18
EP1082627B1 (de) 2003-03-26
US20060147811A1 (en) 2006-07-06
CA2332992A1 (en) 1999-12-09
DE69906282D1 (de) 2003-04-30
AUPP381698A0 (en) 1998-06-25
KR100758021B1 (ko) 2007-09-11
US20030124438A1 (en) 2003-07-03

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