EP0993513A4 - Impedance-assisted electrochemical technique and electrochemistry for removing material, particularly excess emitter material in electron-emitting device - Google Patents
Impedance-assisted electrochemical technique and electrochemistry for removing material, particularly excess emitter material in electron-emitting deviceInfo
- Publication number
- EP0993513A4 EP0993513A4 EP98931401A EP98931401A EP0993513A4 EP 0993513 A4 EP0993513 A4 EP 0993513A4 EP 98931401 A EP98931401 A EP 98931401A EP 98931401 A EP98931401 A EP 98931401A EP 0993513 A4 EP0993513 A4 EP 0993513A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- electrochemistry
- impedance
- electron
- emitting device
- electrochemical technique
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
- H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Cold Cathode And The Manufacture (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US884700 | 1997-06-30 | ||
US884701 | 1997-06-30 | ||
US08/884,701 US6120674A (en) | 1997-06-30 | 1997-06-30 | Electrochemical removal of material in electron-emitting device |
US08/884,700 US5893967A (en) | 1996-03-05 | 1997-06-30 | Impedance-assisted electrochemical removal of material, particularly excess emitter material in electron-emitting device |
PCT/US1998/012801 WO1999000537A1 (en) | 1997-06-30 | 1998-06-29 | Impedance-assisted electrochemical technique and electrochemistry for removing material, particularly excess emitter material in electron-emitting device |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0993513A1 EP0993513A1 (en) | 2000-04-19 |
EP0993513A4 true EP0993513A4 (en) | 2001-04-04 |
EP0993513B1 EP0993513B1 (en) | 2009-01-07 |
Family
ID=27128732
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98931401A Expired - Lifetime EP0993513B1 (en) | 1997-06-30 | 1998-06-29 | Impedance-assisted electrochemical technique and electrochemistry for removing material, particularly excess emitter material in electron-emitting device |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0993513B1 (en) |
JP (1) | JP3648255B2 (en) |
KR (1) | KR100621293B1 (en) |
WO (1) | WO1999000537A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL1014727C2 (en) * | 2000-03-23 | 2001-09-25 | Univ Eindhoven Tech | A method for electrolytically polishing a metal in the presence of an electrolyte composition, as well as a molded article obtained by such a method. |
JP4803998B2 (en) * | 2004-12-08 | 2011-10-26 | ソニー株式会社 | Manufacturing method of field emission type electron-emitting device |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0353099A (en) * | 1989-07-19 | 1991-03-07 | Matsushita Electric Ind Co Ltd | Method for processing ta base material |
WO1995007543A1 (en) * | 1993-09-08 | 1995-03-16 | Silicon Video Corporation | Fabrication and structure of electron-emitting devices having high emitter packing density |
WO1996006443A1 (en) * | 1994-08-18 | 1996-02-29 | Isis Innovation Limited | Field emitter structures |
WO1997009730A2 (en) * | 1995-08-24 | 1997-03-13 | Fed Corporation | Pedestal edge emitter and non-linear current limiters for field emitter displays and other electron source applications |
JPH10140400A (en) * | 1996-11-13 | 1998-05-26 | Ebara Yuujiraito Kk | Electrolyte for electrolytic stripping and electrolytic stripping method |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2928777A (en) * | 1950-12-16 | 1960-03-15 | Electro Process Inc | Electrolytic polishing of metals |
US4385971A (en) * | 1981-06-26 | 1983-05-31 | Rca Corporation | Electrolytic etch for eliminating shorts and shunts in large area amorphous silicon solar cells |
US4629539A (en) * | 1982-07-08 | 1986-12-16 | Tdk Corporation | Metal layer patterning method |
US5766446A (en) * | 1996-03-05 | 1998-06-16 | Candescent Technologies Corporation | Electrochemical removal of material, particularly excess emitter material in electron-emitting device |
-
1998
- 1998-06-29 EP EP98931401A patent/EP0993513B1/en not_active Expired - Lifetime
- 1998-06-29 JP JP50561399A patent/JP3648255B2/en not_active Expired - Fee Related
- 1998-06-29 KR KR1019997012036A patent/KR100621293B1/en not_active IP Right Cessation
- 1998-06-29 WO PCT/US1998/012801 patent/WO1999000537A1/en active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0353099A (en) * | 1989-07-19 | 1991-03-07 | Matsushita Electric Ind Co Ltd | Method for processing ta base material |
WO1995007543A1 (en) * | 1993-09-08 | 1995-03-16 | Silicon Video Corporation | Fabrication and structure of electron-emitting devices having high emitter packing density |
WO1996006443A1 (en) * | 1994-08-18 | 1996-02-29 | Isis Innovation Limited | Field emitter structures |
WO1997009730A2 (en) * | 1995-08-24 | 1997-03-13 | Fed Corporation | Pedestal edge emitter and non-linear current limiters for field emitter displays and other electron source applications |
JPH10140400A (en) * | 1996-11-13 | 1998-05-26 | Ebara Yuujiraito Kk | Electrolyte for electrolytic stripping and electrolytic stripping method |
Non-Patent Citations (3)
Title |
---|
CHEMICAL ABSTRACTS, vol. 129, no. 6, 10 August 1998, Columbus, Ohio, US; abstract no. 73363, KOBAYASHI, NOBUO ET AL: "Electrolytic bath and method for electrolytic peeling" XP002144728 * |
DATABASE WPI Section Ch Week 199116, Derwent World Patents Index; Class E14, AN 1991-112827, XP002144729 * |
See also references of WO9900537A1 * |
Also Published As
Publication number | Publication date |
---|---|
EP0993513B1 (en) | 2009-01-07 |
KR20010014008A (en) | 2001-02-26 |
EP0993513A1 (en) | 2000-04-19 |
JP3648255B2 (en) | 2005-05-18 |
WO1999000537A1 (en) | 1999-01-07 |
KR100621293B1 (en) | 2006-09-13 |
JP2001508834A (en) | 2001-07-03 |
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