EP0770922A4 - Method of removing surface stickiness of relief printing plate made from photosensitive resin - Google Patents

Method of removing surface stickiness of relief printing plate made from photosensitive resin

Info

Publication number
EP0770922A4
EP0770922A4 EP95922752A EP95922752A EP0770922A4 EP 0770922 A4 EP0770922 A4 EP 0770922A4 EP 95922752 A EP95922752 A EP 95922752A EP 95922752 A EP95922752 A EP 95922752A EP 0770922 A4 EP0770922 A4 EP 0770922A4
Authority
EP
European Patent Office
Prior art keywords
printing plate
photosensitive resin
plate made
relief printing
removing surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP95922752A
Other languages
German (de)
French (fr)
Other versions
EP0770922B1 (en
EP0770922A1 (en
Inventor
Andre Dheur
Hiroaki Tomita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Publication of EP0770922A1 publication Critical patent/EP0770922A1/en
Publication of EP0770922A4 publication Critical patent/EP0770922A4/en
Application granted granted Critical
Publication of EP0770922B1 publication Critical patent/EP0770922B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
EP95922752A 1994-07-12 1995-06-23 Method of removing surface stickiness of relief printing plate made from photosensitive resin Expired - Lifetime EP0770922B1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP16007894 1994-07-12
JP16007894A JPH0829970A (en) 1994-07-12 1994-07-12 Method for removing surface stickiness of letterpress made of photosensitive resin
JP160078/94 1994-07-12
PCT/JP1995/001263 WO1996002020A1 (en) 1994-07-12 1995-06-23 Method of removing surface stickiness of relief printing plate made from photosensitive resin

Publications (3)

Publication Number Publication Date
EP0770922A1 EP0770922A1 (en) 1997-05-02
EP0770922A4 true EP0770922A4 (en) 1998-03-18
EP0770922B1 EP0770922B1 (en) 2002-08-28

Family

ID=15707403

Family Applications (1)

Application Number Title Priority Date Filing Date
EP95922752A Expired - Lifetime EP0770922B1 (en) 1994-07-12 1995-06-23 Method of removing surface stickiness of relief printing plate made from photosensitive resin

Country Status (5)

Country Link
EP (1) EP0770922B1 (en)
JP (1) JPH0829970A (en)
DE (1) DE69527965T2 (en)
GB (1) GB2305255B (en)
WO (1) WO1996002020A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6057084A (en) * 1997-10-03 2000-05-02 Fusion Systems Corporation Controlled amine poisoning for reduced shrinkage of features formed in photoresist

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100128A (en) * 1981-12-10 1983-06-14 Teijin Ltd Method for postexposure in liquid
US4415654A (en) * 1982-08-19 1983-11-15 Hercules Incorporated Post-exposure process
US4716094A (en) * 1984-03-13 1987-12-29 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5290304A (en) * 1976-01-24 1977-07-29 Asahi Chemical Ind Photoosensitive resin composition for making flexo graphic printing plate
JPS5660441A (en) * 1979-10-22 1981-05-25 Asahi Chem Ind Co Ltd Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition
JPS6060441A (en) * 1983-09-12 1985-04-08 Matsushita Electric Ind Co Ltd Smoke exhauster
US4680251A (en) * 1984-04-21 1987-07-14 E. I. Du Pont De Nemours And Company Process for the ozone protection of photopolymer flexographic printing plates by treatment with liquid polyethers
JPH073581B2 (en) * 1984-11-16 1995-01-18 旭化成工業株式会社 How to make a photosensitive resin plate
DE3521955A1 (en) * 1985-06-20 1987-01-02 Basf Ag METHOD FOR PRODUCING ADHESIVE-FREE, SMOOTH SURFACES OF PHOTOPOLYMERIZED RELIEF PRINTING FORMS FOR FLEXO PRINTING
US4806506A (en) * 1987-09-14 1989-02-21 E. I. Du Pont De Nemours And Company Process for detackifying photopolymer flexographic printing plates

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100128A (en) * 1981-12-10 1983-06-14 Teijin Ltd Method for postexposure in liquid
US4415654A (en) * 1982-08-19 1983-11-15 Hercules Incorporated Post-exposure process
US4716094A (en) * 1984-03-13 1987-12-29 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 7, no. 202 (P - 221) 7 September 1983 (1983-09-07) *
See also references of WO9602020A1 *

Also Published As

Publication number Publication date
GB9700368D0 (en) 1997-02-26
EP0770922B1 (en) 2002-08-28
WO1996002020A1 (en) 1996-01-25
GB2305255B (en) 1998-03-11
GB2305255A (en) 1997-04-02
JPH0829970A (en) 1996-02-02
DE69527965D1 (en) 2002-10-02
DE69527965T2 (en) 2003-05-28
EP0770922A1 (en) 1997-05-02

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