EP0761721A2 - Process for the preparation of poly-o-hydroxyamides and poly-o-mercaptoamides - Google Patents

Abstract

The prodn. of poly-o-hydroxyamides or poly-o-mercapto- amides (I) comprises reacting a bis-o-aminophenol or bis-o- aminothiophenol (II) with a dicarboxylic acid deriv. of formula (III), in which D = O, S or NH; R1-R5 = H, F, CH3 or CF3, at least one of these gps. being F or CF3 and not more than 2 being CH3 or CF3; R* = (CR2)m or one of the gps. (i)-(xiii), in which R = H, F, CH3 or CF3; m = 1-10; A = (CH2)n, (CF2)p, CMe2, C(CF3)2, CMePh, C(CF3)Ph, C(CF3)C6F5, CPh2, CF2-CF(CF3), CH=CH, CF=CF, C IDENTICAL C, O-C6H4-O, O, S, CO or SO2; n = 0-10; p = 1-10; X = CH or N; T = CH2, CF2, CO, O, S, NH or NMe; Z<1> = CH2 or CHMe and Z<2> = CH or CMe, or Z<1> = CH2 or CHMe and Z<2> = N, or Z<1> = NH or NMe and Z<2> = CH or CMe, or Z<1> = NH or NMe and Z<2> = N; Z<3> = CH, CMe or N; Z<4> = O or S; and in which all the H atoms in any of the aromatic gps. may be replaced by F.

Description

The invention relates to a process for the preparation of poly-o-hydroxyamides (polybenzoxazole precursors) and poly-o-mercaptoamides (polybenzothiazole precursors).

Highly heat-resistant polymers are required in microelectronics, in particular as protective and insulating layers or as dielectrics (see, for example: "SAMPE Journal", Vol. 25 (1989), No. 6, pages 18 to 23, and "Proceedings of the 1992 International Conference on Multichip Modules ", pages 394 to 400). Some of the polymers used, for example homo- and copolymers of aromatic polyethers and precursors of polyimides (PI) and polybenzoxazoles (PBO), have good solubility in organic solvents and good film-forming properties and can be applied to electronic components by means of centrifugal technology (see for example: "High Performance Polymers", Vol. 4 (1992), No. 2, pages 73 to 80, and "Polymers for Advanced Technologies", Vol. 4 (1993), pages 217 to 233).

Polymer precursors of the type mentioned are cyclized by a temperature treatment, ie converted into the corresponding polymers (PI or PBO); this gives the final properties. Because of the cyclization, the hydrophilic groups of the poly-o-hydroxyamide, ie the NH, OH and CO groups, which would have a negative effect on the dielectric properties and water absorption, disappear. This is, for example, an essential advantage of the polybenzoxazoles over the polyimides (with two CO groups per imide unit) and in particular over the hydroxypolyimides (with two CO groups and one OH group per imide unit). In addition, the cyclization is not only for the good dielectric properties and the low Water absorption of the end product is important, but also for its high temperature stability.

PI and PBO precursors can be photosensitive, for example by adding suitable photoactive components, and then structured directly, i.e. without the use of an auxiliary resist. This is important because direct structuring - compared to indirect structuring - offers considerable cost advantages.

In contrast to most photosensitive PI precursors, photosensitive PBO precursors offer the advantages of positive structurability, such as a lower defect density when structuring the so-called "via holes" because, compared to negative-working systems, only a fraction of the area is exposed becomes. When using alkali-soluble PBO precursors there is also the possibility of aqueous alkaline development. After the photostructuring, the cyclization of the precursors takes place by tempering.

Aqueous-alkaline PBO precursors are already known (see: EP-PS 0 023 662, EP-OS 0 264 678 and EP-PS 0 291 779). The photolithographic process used, apart from the cyclization, is the same as in the structuring of known positive resists based on novolaks and quinone azides, a process used in numerous production lines worldwide (see for example: DS Soane and Z. Martynenko "Polymers in Microelectronics - Fundamentals and Applications ", Elsevier, Amsterdam 1989, pages 77 to 124).

The alkali solubility of the PBO precursors is an important prerequisite for their use as a base polymer for photosensitive dielectrics which can be developed in aqueous alkaline. For microelectronic applications, the precursors must be soluble in developers free of metal ions so that such developers are also used in photostructuring can. Developers that contain metal ions can adversely affect the electrical function of the components.

The most common method for producing alkali-soluble PBO precursors, i.e. of poly-o-hydroxyamides, is the reaction of a dicarboxylic acid chloride with a suitable bis-o-aminophenol. A soluble base, such as pyridine, is generally added to trap the hydrogen chloride formed in the reaction (see: EP-OS 0 264 678 and EP-PS 0 291 779). According to this method it is now possible to produce precursors which are soluble in aqueous alkaline developers free of metal ions, but it is disadvantageous that chloride ions remain in the polymer. However, such a polymer cannot be used as a coating material for microelectronic components, because the chloride ions cause corrosion and can therefore seriously impair the function of the components. It is therefore necessary to clean the polymer using an ion exchanger. However, this cleaning is complex and expensive, namely it includes additional process steps, such as the preparation of the ion exchange column, the dissolution of the polymer, the passage of the solution through the column and the washing, as well as the new precipitation and drying.

In the production of poly-o-hydroxyamides, the requirement must also be met that the dicarboxylic acid chloride predominantly reacts with the amino groups of bis-o-aminophenol (with amide formation), but not with its hydroxyl groups (with ester formation), ie the reaction selectivity of amide formation compared to the ester formation must be high. If the ester formation cannot be excluded or strongly suppressed, this leads to insufficiently alkali-soluble polymers. A low reaction selectivity can also lead to gel formation in the polymer solution, the poly-o-hydroxyamide produced then being unfilterable and thus unusable.

Processes for the chloride-free synthesis of poly-o-hydroxyamides - and also of poly-o-mercaptoamides - have also been described. It is known from EP-OS 0 158 726 to react dihydroxy or dimercaptodiamino compounds in the presence of a carbodiimide with a dicarboxylic acid. However, urea residues that remain on the resin due to a rearrangement reaction often cause problems in this reaction. This is because they impair the thermal stability of the polybenzoxazole or polybenzothiazole and the quality of the layers produced therefrom. In addition, the polymers produced by this process are not sufficiently soluble in metal-ion-free aqueous alkaline developers.

An alternative chloride-free production process for poly-o-hydroxyamides consists in reacting the dicarboxylic acid with the bis-o-aminophenol using condensation reagents such as 1-ethoxycarbonyl-2-ethoxy-1,2-dihydroquinoline and 1,1'-carbonyldioxy-di-1 To use 2,3-benzotriazole (see: EP-OS 0 391 196). The polymers produced in this way, however, also show an insufficient solubility in metal-ion-free aqueous alkaline developers.

Processes are also known in which the amide is formed using phosphorus compounds (see: EP-OS 0 481 402, US Pat. No. 4,331,592 and DE-OS 37 16 629). In the case of poly-o-hydroxyamides, such syntheses either lead to cyclized, i.e. alkali-insoluble products or phosphorus-containing, sometimes also chemically bound, residues remain in the polymer, making the polymer unusable for microelectronic applications because of the doping properties of phosphorus. In contrast to ionic impurities, such residues cannot be removed using ion exchangers, for example.

The object of the invention is to provide a cost-effective method with which - by a chloride-free route - poly-o-hydroxyamides and poly-o-mercaptoamides can be produced which are soluble in metal-ion-free aqueous alkaline developers.

wobei folgendes gilt:

• D = O, S oder NH;
• R¹, R², R³, R⁴ und R⁵ sind - unabhängig voneinander - H, F, CH₃ oder CF₃, wobei mindestens einer der Reste R¹ bis R⁵ F bzw. CF₃ ist und höchstens zwei der Reste R¹ bis R⁵ CH₃ bzw. CF₃ sind;
• R* hat folgende Bedeutung:

- (CR₂)_m

mit R = H, F, CH₃ oder CF₃
und m = 1 bis 10;

mit A =

(CH₂)_n, (CF₂)_p, C(CH₃)₂, C(CF₃)₂, C(CH₃)(C₆H₅), C(CF₃)(C₆H₅), C(CF₃)(C₆F₅), C(C₆H₅)₂, CF₂-CF(CF₃), CH=CH, CF=CF, C≡C, O-C₆H₄-O, O, S, CO oder SO₂, wobei n = 0 bis 10 und p = 1 bis 10;

mit

X = CH oder N
R = H, F, CH₃ oder CF₃

und

n = 0 bis 10;

mit

T = CH₂, CF₂, CO, O, S, NH oder N(CH₃);

mit

(a) Z¹ = CH₂ oder CH(CH₃) und Z² = CH oder C(CH₃)
(b) Z¹ = CH₂ oder CH(CH₃) und Z² = N
(c) Z¹ = NH oder N(CH₃) und Z² = CH oder C(CH₃)
(d) Z¹ = NH oder N(CH₃) und Z² = N

mit

(a) Z³ = CH oder C(CH₃)
(b) Z³ = N

mit

(a) Z⁴ = O
(b) Z⁴ = S;

wobei an allen aromatischen Partialstrukturen jeweils sämtliche Wasserstoffatome (H) durch Fluor (F) ersetzt sein können.This is achieved according to the invention in that a bis-o-aminophenol or a bis-o-aminothiophenol is reacted with a dicarboxylic acid derivative of the following structure:

the following applies:

• D = O, S or NH;
• R ¹ , R ² , R ³ , R ⁴ and R ⁵ are - independently of one another - H, F, CH ₃ or CF ₃ , at least one of the radicals R ¹ to R ^{5 being} F or CF ₃ and at most two of the radicals R ¹ to R ^{5 are} CH ₃ and CF ₃ ;
• R * has the following meaning:

- (CR ₂ ) _m

with R = H, F, CH ₃ or CF ₃
and m = 1 to 10;

with A =

(CH ₂ ) _n , (CF ₂ ) _p , C (CH ₃ ) ₂ , C (CF ₃ ) ₂ , C (CH ₃ ) (C ₆ H ₅ ), C (CF ₃ ) (C ₆ H ₅ ), C (CF ₃ ) (C ₆ F ₅ ), C (C ₆ H ₅ ) ₂ , CF ₂ -CF (CF ₃ ), CH = CH, CF = CF, C≡C, OC ₆ H ₄ -O, O , S, CO or SO ₂ , where n = 0 to 10 and p = 1 to 10;

With

X = CH or N
R = H, F, CH ₃ or CF ₃

and

n = 0 to 10;

With

T = CH ₂ , CF ₂ , CO, O, S, NH or N (CH ₃ );

With

(a) Z ¹ = CH ₂ or CH (CH ₃ ) and Z ² = CH or C (CH ₃ )
(b) Z ¹ = CH ₂ or CH (CH ₃ ) and Z ² = N
(c) Z ¹ = NH or N (CH ₃ ) and Z ² = CH or C (CH ₃ )
(d) Z ¹ = NH or N (CH ₃ ) and Z ² = N

With

(a) Z ³ = CH or C (CH ₃ )
(b) Z ³ = N

With

(a) Z ⁴ = O
(b) Z ⁴ = S;

all of the hydrogen atoms (H) on all aromatic partial structures can be replaced by fluorine (F).

The invention solves the problem described above in such a way that special dicarboxylic acid derivatives are used as the dicarboxylic acid component, namely fluorine-containing esters with phenols or corresponding thioesters and amides. Surprisingly, this results in a sufficient selectivity of the amide formation. The polymers made according to the invention, i.e. the poly-o-hydroxy- and poly-o-mercaptoamides, namely, are soluble in metal-ion-free aqueous alkaline developers. In addition, the process according to the invention proceeds without gel formation, so that the polymers mentioned are readily soluble and processable in organic solvents. This method also prevents contamination such as chloride and metal ions and phosphorus compounds.

Special compounds of dicarboxylic acids and phenols, thiophenols and aminobenzenes (anilines) containing F and / or CF ₃ groups are used for the synthesis of the polymers, in particular a fluorophenol, preferably perfluorinated phenol, ie pentafluorophenol. However, derivatives with CH ₃ substituents can also be used. A number of such compounds (esters, thioesters and amides) is the subject of the simultaneously filed German patent application Akt.Z. 195 32 138.3 - "New dicarboxylic acid derivatives" (GR 95 P 3618).

Derivatives of dicarboxylic acids such as 1,3-benzenedicarboxylic acid (isophthalic acid) and diphenyl ether-4,4'-dicarboxylic acid (oxydibenzoic acid) are preferably used for the synthesis of the precursors. However, it is generally possible to use those dicarboxylic acids which are used for the preparation of precursors of the type mentioned.

Particularly suitable bis-o-aminophenols are 2,2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane and 3,3'-dihydroxy-4,4'-diaminodiphenyl. The corresponding bis-o-aminothiophenols are used for the synthesis of poly-o-mercaptoamides. In principle, however, all bis-o-aminophenols and thiophenols can be used which are usually used for the preparation of polybenzoxazole or polybenzothiazole precursors.

The reaction of the dicarboxylic acid derivative with the bis (thio) phenol is advantageously carried out in the presence of a basic catalyst, which is preferably a tertiary amine. Such catalysts are, in particular, pyridine, triethylamine, diazabicyclooctane and polyvinylpyridine. However, other basic catalysts can also be used, preference being given to those which are readily soluble in the solvent used in the synthesis of the precursor, such as N-methylpyrrolidone, or in water or water / alcohol mixtures (precipitant), or such which are completely insoluble, such as cross-linked polyvinyl pyridine.

The reaction temperature in the reaction between the dicarboxylic acid derivative and the (thio) phenol is preferably between 20 and 150 ° C. For the reaction selectivity, it has proven to be advantageous to increase the temperature in stages.

The process according to the invention is therefore advantageously carried out in such a way that the dicarboxylic acid derivative, the bis-o-aminophenol or -thiophenol and a basic catalyst are dissolved in an organic solvent at room temperature, if appropriate at elevated temperature, and then in stages is heated. After the reaction has ended, the reaction solution is allowed to cool to room temperature, then the reaction product is precipitated with a suitable precipitant. After filtration and drying, the precipitated polymer is ready for use. In the method according to the invention, cumbersome cleaning steps, such as cleaning the polymer by means of ion exchangers, are therefore unnecessary.

Suitable solvents are also N-methylpyrrolidone, tetrahydrofuran and N, N-dimethylacetamide. In principle, however, any solvent in which the starting components are readily soluble can be used. Water and mixtures of water with alcohols such as ethanol and isopropanol are particularly suitable as precipitants.

In the process according to the invention - with an excess of bis-o-aminophenol or -thiophenol - the amino end groups of the poly-o-hydroxyamide or mercaptoamide produced can be capped with a dicarboxylic anhydride before the polymer precipitates, i.e. be blocked. For this purpose, cis-5-norbornene-endo-2,3-dicarboxylic anhydride is particularly suitable.

The invention will be explained in more detail using exemplary embodiments.

example 1 Production of a PBO preliminary stage

8.0 g of a diester of isophthalic acid and perfluorophenol, 6.51 g of 2,2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane, 2.53 g are placed in a 250 ml three-necked flask under nitrogen (as a protective gas) Added pyridine and 95 ml of dry N-methylpyrrolidone. This mixture is then stirred at room temperature for 16 hours and then at 90 ° C. for 24 hours and at 120 ° C. for 50 hours. After cooling to room temperature, 0.27 g of cis-5-norbornene-endo-2,3-dicarboxylic acid anhydride, dissolved in 2 ml of N-methylpyrrolidone, are added to block the end groups, and the reaction solution is then added for a further 14 h stirred at room temperature. The light brown reaction solution is then added dropwise, with vigorous stirring, to 10 times the amount of a mixture of four parts by volume of water and one part by volume of isopropanol (as a precipitant). The precipitated polymer is filtered off, washed four times with 200 ml of precipitant and mixed with 1000 ml of precipitant, and then stirred for 16 h. The polymer is subsequently filtered off and then dried for 24 hours at approximately 20 mbar and then for eight days at approximately 2 mbar, in each case at 50 ° C. The yield is 7.0 g.

Example 2 Solubility of the PBO precursor

1 g of the PBO precursor prepared according to Example 1 is dissolved in 3 g of diethylene glycol diethyl ether and the solution is placed in a plastic syringe equipped with a prefilter. Convac, type ST 146) flung. The film formed on the wafer is dried at 120 ° C on a hot plate. After cooling, the wafer coated with the polymer film is immersed in a commercially available metal-ion-free aqueous alkaline developer (NSD-TD, Tokyo Ohka). Here, the polymer film dissolves evenly, ie without cracks and without flaking off. After a short time, the entire polymer film is completely dissolved in the developer. The same result is obtained if a 3% solution of tetramethylammonium hydroxide in distilled water is used instead of the developer mentioned above.

Example 3 Photostructuring of the PBO preliminary stage

0.8 g of the PBO precursor prepared according to Example 1 and 0.2 g of a diester of naphthoquinonediazide-4-sulfonic acid and bisphenol-A (as a photoactive component) are dissolved in 3 g of diethylene glycol diethyl ether. The resist solution obtained is then applied to a silicon wafer in accordance with Example 2 and dried. Then half of the wafer is covered with an aluminum foil and the other half is irradiated with a mercury / xenon lamp. The wafer is then immersed in a commercial developer solution according to Example 2. It is found that only the exposed areas are selectively and evenly removed (positive resist).

Example 4 Production of a PBO preliminary stage

6.0 g of a diester of diphenyl ether-4,4'-dicarboxylic acid and perfluorophenol, 4.1 g of 2,2-bis (3-amino-4-hydroxyphenyl) are placed in a 250 ml three-necked flask under nitrogen (as protective gas). -hexafluoropropane, 2.1 g of triethylamine and 65 ml of dry N-methylpyrrolidone. This mixture is then stirred for 8 hours at room temperature and then for 20 hours at 80 ° C. and for 24 hours at 110 ° C. After cooling to room temperature, 0.17 g of cis-5-norbornene-endo-2,3-dicarboxylic acid anhydride, dissolved in 1 ml of N-methylpyrrolidone, are added to block the end groups, and the reaction solution is then added for a further 14 h at room temperature touched. The light brown reaction solution is then added dropwise, with vigorous stirring, to 10 times the amount of a mixture of four parts by volume of water and one part by volume of isopropanol (as a precipitant). The precipitated polymer is filtered off, washed four times with 200 ml of precipitant and with 1000 ml of precipitant are added, and the mixture is then stirred for 16 h. The polymer is subsequently filtered off and then dried for 24 hours at approximately 20 mbar and then for eight days at approximately 2 mbar, in each case at 50 ° C. The yield is 4.2 g.

Example 5 Solubility of the PBO precursor

If the PBO precursor prepared according to Example 4 is used as in Example 2, the same result is obtained, i.e. the PBO precursor dissolves uniformly in both metal-ion-free aqueous alkaline developers.

Example 6 Photostructuring of the PBO preliminary stage

If the PBO precursor prepared according to Example 4 is used as in Example 3, the same result is obtained, i.e. only the exposed areas are selectively and evenly detached.

Claims (6)

Process for the preparation of poly-o-hydroxyamides and poly-o-mercaptoamides, characterized in that a bis-o-aminophenol or a bis-o-aminothiophenol is reacted with a dicarboxylic acid derivative of the following structure:

the following applies: D = O, S or NH; R ¹ , R ² , R ³ , R ⁴ and R ⁵ are - independently of one another - H, F, CH ₃ or CF ₃ , at least one of the radicals R ¹ to R ^{5 being} F or CF ₃ and at most two of the radicals R ¹ to R ^{5 are} CH ₃ and CF ₃ ; R * has the following meaning: - (CR ₂ ) _m with R = H, F, CH ₃ or CF ₃
and m = 1 to 10;

with A = (CH ₂ ) _n , (CF ₂ ) _p , C (CH ₃ ) ₂ , C (CF ₃ ) ₂ , C (CH ₃ ) (C ₆ H ₅ ), C (CF ₃ ) (C ₆ H ₅ ), C (CF ₃ ) (C ₆ F ₅ ), C (C ₆ H ₅ ) ₂ , CF ₂ -CF (CF ₃ ), CH = CH, CF = CF, C≡C, OC ₆ H ₄ - O, O, S, CO or SO ₂ , where n = 0 to 10 and p = 1 to 10;

with X = CH or N
R = H, F, CH ₃ or CF ₃ and n = 0 to 10;

with T = CH ₂ , CF ₂ , CO, O, S, NH or N (CH ₃ );

with Z ¹ = CH ₂ or CH (CH ₃ ) and Z ² = CH or C (CH ₃ )
Z ¹ = CH ₂ or CH (CH ₃ ) and Z ² = N
Z ¹ = NH or N (CH ₃ ) and Z ² = CH or C (CH ₃ )
Z ¹ = NH or N (CH ₃ ) and Z ² = N

with Z ³ = CH, C (CH ₃ ) or N

with Z ⁴ = O or S; all of the hydrogen atoms (H) on all aromatic partial structures can be replaced by fluorine (F). A method according to claim 1, characterized in that a dicarboxylic acid ester with perfluorophenol is used. A method according to claim 1 or 2, characterized in that the reaction takes place in the presence of a basic catalyst. Process according to claim 3, characterized in that the catalyst is a tertiary amine. Process according to one of claims 1 to 4, characterized in that the reaction is carried out at temperatures of 20 to 150 ° C. A method according to claim 5, characterized in that the temperature is increased in stages.