EP0658812B1 - Rotating exposure apparatus for the preparation of a cylindrical printing screen - Google Patents

Rotating exposure apparatus for the preparation of a cylindrical printing screen Download PDF

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Publication number
EP0658812B1
EP0658812B1 EP94115973A EP94115973A EP0658812B1 EP 0658812 B1 EP0658812 B1 EP 0658812B1 EP 94115973 A EP94115973 A EP 94115973A EP 94115973 A EP94115973 A EP 94115973A EP 0658812 B1 EP0658812 B1 EP 0658812B1
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EP
European Patent Office
Prior art keywords
laser
exposure machine
machine according
rotary exposure
rotary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP94115973A
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German (de)
French (fr)
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EP0658812A1 (en
Inventor
Hans Fischer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schablonentechnik Kufstein GmbH
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Schablonentechnik Kufstein GmbH
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Priority to ES94115973T priority Critical patent/ES2148264T3/en
Publication of EP0658812A1 publication Critical patent/EP0658812A1/en
Application granted granted Critical
Publication of EP0658812B1 publication Critical patent/EP0658812B1/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/18—Coating curved surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/0823—Devices involving rotation of the workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/14—Forme preparation for stencil-printing or silk-screen printing
    • B41C1/145—Forme preparation for stencil-printing or silk-screen printing by perforation using an energetic radiation beam, e.g. a laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/24—Stencils; Stencil materials; Carriers therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Definitions

  • the invention relates to a rotary exposure machine according to the Preamble of claim 1.
  • Round shape means a round screen coated with photopolymer or a flat screen mounted on a carrier tube and also coated with photopolymer.
  • Such a rotary exposure machine is already from EP-A-0 291 137 known.
  • This known rotary exposure machine contains a guide bed, a supported on the guide bed Device for rotatably supporting a round shape, a drive device for rotating the round shape, an optical slide, which is moved along guides when the round shape turns, and a laser to expose one on the surface of the Round shape existing, photosensitive lacquer layer. being the laser optical carriage is taken in front.
  • Another rotary exposure machine is known from EP-A-0 491 368 known. There is also a laser in the cylinder longitudinal direction of the round shape movable, but a carriage carrying the laser on one existing building ceiling above the rotary exposure machine is attached.
  • Another rotary exposure machine of the type mentioned is from the WO-A-86/04549 known.
  • There is a laser beam over one on one Deflecting mirror located on the optical carriage is directed towards a round shape.
  • the laser used to generate the laser beam on the ground stands next to the rotary exposure machine.
  • the invention has for its object the rotary exposure machine of the type mentioned in such a way that they are more compact Has structure.
  • a rotary exposure machine is characterized by this that the guides are attached to the guide bed. This leads to a very compact and low-vibration structure, because the laser can be positioned relatively close to the round shape.
  • the laser beam is the laser via a deflecting mirror from the originally vertical direction in one deflected in the horizontal direction and radially onto the optics Focused on the surface of the round shape. This allows the degree of compactness the rotary exposure machine even further.
  • a round shape 13 is placed in a rotary exposure machine 14 a chuck 15 and a tailstock 16 inserted.
  • a rotary encoder 17 torsionally rigid By the Closing the chuck 15 with the round shape 13 is a rotary encoder 17 torsionally rigid. The latter is one on the right Headstock 18 of the rotary exposure machine 14 arranged.
  • the rotary drive of the round shape 13 and the system parts connected to it is carried out by a main drive motor 19 via a vibration-damped V-belt drive 20.
  • the round shape 13 rotates, an optical carriage 21 along guides 22 using a Feed spindle 23 and a stepper motor 24 coupled thereto emotional.
  • a torsional vibration damper 25 At the right shaft end of the stepper motor 24, a torsional vibration damper 25 put on.
  • the guides 22 and the feed screw 23 are on a guide bed 26 of the rotary exposure machine 14 stored.
  • FIGS. 1 and 2 show an argon laser carried with the optical slide 21 27 is present, the laser beam of which is directed via a deflecting mirror 28 from the originally vertical direction to a horizontal direction is deflected so that it then radially onto the surface via UV optics 29 the round shape 13 is focused.
  • a fixed argon laser 27 is shown, which at the tailstock end of the rotary exposure machine 14 via a Console 30 is attached.
  • the argon laser of course also another UV laser emitting in the range from 200 to 400 nm Find, for example, a rare gas ion laser, a dye or excimer laser, a nitrogen laser, and the like.
  • the laser radiation z. B. over a acousto-optical modulator on or off is preferably quartz glass as an interaction or Use switching medium as this is for light from a wavelength of 200 nm is permeable and also a sufficiently high speed of sound has, which for a sufficiently fast switching of the modulator is required.
  • the most expedient is the 1st order beam Will be used, i.e.
  • the one at the compression zones in the Interaction medium reflected beam because it makes a 0: 100 - Duty cycle of the beam power can be achieved, it is quite but also conceivable, the 0th order beam for surface exposure to use the round shape 13 and the resulting part Pre-crosslinking in places that should remain unexposed to take.
  • the development process for the photopolymers, essentially in removing the uncrosslinked polymers from the Surface film exists, is also capable of being partially networked Jobs.

Abstract

A method according to the invention for the preparation of a screen mesh, in particular for printing textiles, comprises the following steps: a) Production of a hollow-cylindrical round screen (1), b) Application of a photosensitive resist layer (L) to the outer surface of the round screen (1), c) positionally selective exposure of the resist layer (L) using a laser device (27) for the purpose of crosslinking or curing the exposed areas of the resist layer (L) while rotating the round screen (1), and b) development of the exposed resist layer (L) in this way. <IMAGE>

Description

Die Erfindung betrifft eine Rotationsbelichtungsmaschine gemäß dem Oberbegriff des Patentanspruchs 1.The invention relates to a rotary exposure machine according to the Preamble of claim 1.

Unter Rundform versteht man ein mit Photopolymer beschichtetes Rundsieb oder ein auf ein Trägerrohr aufgezogenes und ebenfalls mit Photopolymer beschichtetes Flachsieb. Round shape means a round screen coated with photopolymer or a flat screen mounted on a carrier tube and also coated with photopolymer.

Eine derartige Rotationsbelichtungsmaschine ist bereits aus der EP-A-0 291 137 bekannt. Diese bekannte Rotationsbelichtungsmaschine enthält ein Führungsbett, eine sich am Führungsbett abstützende Einrichtung zur drehbaren Lagerung einer Rundform, eine Antriebseinrichtung zur Drehung der Rundform, einen Optikschlitten, der entlang von Führungen bewegt wird, wenn sich die Rundform dreht, und einen Laser zur Belichtung einer auf der Oberfläche der Rundform vorhandenen, photoempfindlichen Lackschicht. wobei der Laser vorn Optikschlitten mitgenommen wird.Such a rotary exposure machine is already from EP-A-0 291 137 known. This known rotary exposure machine contains a guide bed, a supported on the guide bed Device for rotatably supporting a round shape, a drive device for rotating the round shape, an optical slide, which is moved along guides when the round shape turns, and a laser to expose one on the surface of the Round shape existing, photosensitive lacquer layer. being the laser optical carriage is taken in front.

Aus der EP-A-0 491 368 ist eine weitere Rotationsbelichtungsmaschine bekannt. Dort ist ebenfalls ein Laser in Zylinderlängsrichtung der Rundform bewegbar, wobei ein den Laser tragender Schlitten jedoch an einer oberhalb der Rotationsbelichtungsmaschine vorhandenen Gebäudedecke befestigt ist.Another rotary exposure machine is known from EP-A-0 491 368 known. There is also a laser in the cylinder longitudinal direction of the round shape movable, but a carriage carrying the laser on one existing building ceiling above the rotary exposure machine is attached.

Eine weitere Rotationsbelichtungsmaschine der genannten Art ist aus der WO-A-86/04549 bekannt. Dort wird ein Laserstrahl über einen auf einem Optikschlitten befindlichen Umlenkspiegel auf eine Rundform gerichtet. wobei der zur Erzeugung des Laserstrahls verwendete Laser auf dem Boden neben der Rotationsbelichtungsmaschine steht.Another rotary exposure machine of the type mentioned is from the WO-A-86/04549 known. There is a laser beam over one on one Deflecting mirror located on the optical carriage is directed towards a round shape. the laser used to generate the laser beam on the ground stands next to the rotary exposure machine.

Aus der WO-A-89/11116 geht noch als bekannt hervor, zur Belichtung bei Rundformen auch einen UV-Laser zu verwenden.From WO-A-89/11116 it is still known that the exposure Round shapes also use a UV laser.

Der Erfindung liegt die Aufgabe zugrunde, die Rotationsbelichtungsmaschine der eingangs genannten Art so weiterzubilden, daß sie einen kompakteren Aufbau aufweist.The invention has for its object the rotary exposure machine of the type mentioned in such a way that they are more compact Has structure.

Die Lösung der gestellten Aufgabe ist im kennzeichnenden Teil des Patentanspruchs 1 angegeben. Vorteilhafte Ausgestaltungen der Erfindung sind den Unteransprüchen zu entnehmen. The solution to the problem is in the characterizing part of the claim 1 specified. Advantageous embodiments of the invention are can be found in the subclaims.

Eine Rotationsbelichtungsmaschine nach der Erfindung zeichnet sich dadurch aus, daß die Führungen am Führungsbett angebracht sind. Dies führt zu einem sehr kompakten und gleichzeitig schwingungsarmen Aufbau, da der Laser relativ nah an der Rundform positioniert werden kann.A rotary exposure machine according to the invention is characterized by this that the guides are attached to the guide bed. This leads to a very compact and low-vibration structure, because the laser can be positioned relatively close to the round shape.

Nach einer Ausgestaltung der Erfindung ist der Laserstrahl des Lasers über einen Umlenkspiegel aus der ursprünglich vertikalen Richtung in eine horizontale Richtung umgelenkt und über eine Optik radial auf die Oberfläche der Rundform fokussiert. Dadurch läßt sich der Kompaktheitsgrad der Rotationsbelichtungsmaschine noch weiter erhöhen.According to one embodiment of the invention, the laser beam is the laser via a deflecting mirror from the originally vertical direction in one deflected in the horizontal direction and radially onto the optics Focused on the surface of the round shape. This allows the degree of compactness the rotary exposure machine even further.

Die Erfindung wird nachfolgend unter Bezugnahme auf die Zeichnung näher beschrieben. Es zeigen:

  • Figur 1 eine Rotationsbelichtungsmaschine zur Belichtung einer auf einer Rundform liegenden photoempfindlichen Lackschicht:
  • Figur 2 eine Seitenansicht der Rotationsbelichtungsmaschine nach Figur 1:
  • Figur 3 eine weitere Rotationsbelichtungsmaschine der genannten Art: und
  • Figur 4 eine Seitenansicht der weiteren Belichtungsmaschine nach Figur 3.
    • The invention is described in more detail below with reference to the drawing. Show it:
  • FIG. 1 shows a rotary exposure machine for exposing a photosensitive lacquer layer lying on a round mold:
  • FIG. 2 shows a side view of the rotary exposure machine according to FIG. 1:
  • Figure 3 shows another rotary exposure machine of the type mentioned: and
  • FIG. 4 shows a side view of the further exposure machine according to FIG. 3.

    • Anhand der Figuren 1 bis 4 werden Rotationsbelichtungsmaschinen zur Belichtung mit Hilfe eines Lasers beschrieben. Durch diesen Laser wird eine zu vernetzende Photopolymerschicht punktweise an den musterbedingt zu vernetzenden Stellen belichtet und damit verfestigt. Diese Stellen bleiben später nach der Entwicklung der Photopolymerschicht stehen.Using the figures 1 to 4, rotary exposure machines for Exposure described using a laser. This laser turns one The photopolymer layer to be cross-linked point by point on the pattern exposed to crosslinked areas and thus solidified. These places stop later after the development of the photopolymer layer.

    Eine Rundform 13 wird in eine Rotationsbelichtungsmaschine 14 zwischen ein Spannfutter 15 und einen Reitstock 16 eingelegt. Durch das Schließen des Spannfutters 15 wird mit der Rundform 13 ein Drehlagenencoder 17 drehsteif verbunden. Letzterer ist auf der rechten Seite eines Spindelstocks 18 der Rotationsbelichtungsmaschine 14 angeordnet. Der rotatorische Antrieb der Rundform 13 und der mit dieser verbundenen Anlagenteile erfolgt durch einen Hauptantriebsmotor 19 über einen schwingungsgedämpften Keilriementrieb 20. Während sich die Rundform 13 dreht, wird ein Optikschlitten 21 entlang von Führungen 22 mit Hilfe einer Vorschubspindel 23 und einem mit dieser gekuppelten Schrittmotor 24 bewegt. Am rechten Wellenende des Schrittmotors 24 wird ein Drehschwingungsdämpfer 25 aufgesetzt. Die Führungen 22 und die Vorschubspindel 23 sind an einem Führungsbett 26 der Rotationsbelichtungsmaschine 14 gelagert.A round shape 13 is placed in a rotary exposure machine 14 a chuck 15 and a tailstock 16 inserted. By the Closing the chuck 15 with the round shape 13 is a rotary encoder 17 torsionally rigid. The latter is one on the right Headstock 18 of the rotary exposure machine 14 arranged. The rotary drive of the round shape 13 and the system parts connected to it is carried out by a main drive motor 19 via a vibration-damped V-belt drive 20. While the round shape 13 rotates, an optical carriage 21 along guides 22 using a Feed spindle 23 and a stepper motor 24 coupled thereto emotional. At the right shaft end of the stepper motor 24, a torsional vibration damper 25 put on. The guides 22 and the feed screw 23 are on a guide bed 26 of the rotary exposure machine 14 stored.

    In den Figuren 1 und 2 ist ein mit dem Optikschlitten 21 mitgeführter Argonlaser 27 vorhanden, dessen Laserstrahl über einen Umlenkspiegel 28 aus der ursprünglich vertikalen Richtung in eine horizontale Richtung umgelenkt wird, so daß er dann über eine UV-Optik 29 radial auf die Oberfläche der Rundform 13 fokussiert wird.FIGS. 1 and 2 show an argon laser carried with the optical slide 21 27 is present, the laser beam of which is directed via a deflecting mirror 28 from the originally vertical direction to a horizontal direction is deflected so that it then radially onto the surface via UV optics 29 the round shape 13 is focused.

    Zur Stabilisierung der Schablonenwandung in radialer und tangentialer Richtung können Führungselemente (Rollen. Gleitführungen) vorgesehen werden, jedoch ist dies natürlich nur bei solchen Photopolymeren möglich. welche schon im nicht vernetzten Zustand eine trockene, d. h. feste Oberfläche aufweisen.To stabilize the stencil wall in radial and tangential Directional elements (rollers, sliding guides) can be provided are, of course, this is only possible with such photopolymers. which is already dry in the non-cross-linked state, i.e. H. solid surface exhibit.

    In den Figuren 3 und 4 ist ein ortsfester Argonlaser 27 dargestellt, welcher am reitstockseitigen Ende der Rotationsbelichtungsmaschine 14 über eine Konsole 30 angebracht ist. Anstelle des Argonlasers kann natürlich auch ein anderer im Bereich von 200 bis 400 nm emittierender UV-Laser Verwendung finden, beispielsweise ein Edelgas-Ionen-Laser, ein Farbstoff- oder Excimerenlaser, ein Stickstofflaser, und dergleichen.In Figures 3 and 4, a fixed argon laser 27 is shown, which at the tailstock end of the rotary exposure machine 14 via a Console 30 is attached. Instead of the argon laser, of course also another UV laser emitting in the range from 200 to 400 nm Find, for example, a rare gas ion laser, a dye or excimer laser, a nitrogen laser, and the like.

    Zum Zwecke der punktweisen Belichtung der Oberfläche der Rundform 13 im Fokuspunkt der UV-Optik 29 wird die Laserstrahlung z. B. über einen akustooptischen Modulator ein- oder ausgeschaltet. Für die hier benötigten Zwecke wird man vorzugsweise Quarzglas als Wechselwirkungs- oder Schaltmedium benutzen, da dieses für Licht ab der Wellenlänge von 200 nm durchlässig ist und auch eine ausreichend hohe Schallgeschwindigkeit aufweist, welche für ein hinreichend schnelles Durchschalten des Modulators erforderlich ist. Obwohl am zweckmäßigsten der Strahl 1. Ordnung Verwendung finden wird, also der an den Verdichtungszonen im Wechselwirkungsmedium reflektierte Strahl, weil dadurch ein 0 : 100 - Tastverhältnis der Strahlleistung erreicht werden kann, ist es durchaus aber auch vorstellbar, den Strahl 0. Ordnung für die Oberflächenbelichtung der Rundform 13 heranzuziehen und die dadurch verursachte teilweise Vorvernetzung an den Stellen, die unbelichtet bleiben sollen, in Kauf zu nehmen. Der Entwicklungsprozeß für die Photopolymere, der im wesentlichen in einem Herauslösen der unvernetzten Polymere aus dem Oberflächenfilm besteht, ist durchaus auch in der Lage, teilweise vernetzte Stellen aufzulösen.For the purpose of point-wise exposure of the surface of the round shape 13 at the focal point of the UV optics 29, the laser radiation z. B. over a acousto-optical modulator on or off. For those needed here Purpose is preferably quartz glass as an interaction or Use switching medium as this is for light from a wavelength of 200 nm is permeable and also a sufficiently high speed of sound has, which for a sufficiently fast switching of the modulator is required. Although the most expedient is the 1st order beam Will be used, i.e. the one at the compression zones in the Interaction medium reflected beam because it makes a 0: 100 - Duty cycle of the beam power can be achieved, it is quite but also conceivable, the 0th order beam for surface exposure to use the round shape 13 and the resulting part Pre-crosslinking in places that should remain unexposed to take. The development process for the photopolymers, essentially in removing the uncrosslinked polymers from the Surface film exists, is also capable of being partially networked Jobs.

    Claims (6)

    1. Rotary exposure machine (14), containing:
      a guide bed (26) ;
      a device (15, 16), supported on the guide bed (26), for the rotable mounting of a round mould (13);
      a drive device (19, 20) for rotating the round mould (13);
      an optical slide (21) which is moved along guides (22) as the round mould (13) rotates; and
      a laser (27) for exposing a photosensitive lacquer layer (L) which is present on the surface of the round mould (13), the laser (27) being carried along by the optical slide (21),
      characterized in that the guides (22) are fitted to the guide bed (26).
    2. Rotary exposure machine according to Claim 1, characterized in that a laser beam from the laser (27) is deflected by a deflection mirror (28) from the originally vertical direction into a horizontal direction, and is focused radially by an optical system (29) onto the surface of the round mould (13).
    3. Rotary exposure machine according to Claim 1 or 2, characterized in that the laser (27) is an UV laser emitting in the range from 200 nm to 400 nm.
    4. Rotary exposure machine according to one of Claims 1 to 3, characterized in that the optical slide (21) is moved with the aid of a feed screw (23).
    5. Rotary exposure machine according to Claim 4, characterized in that a stepping motor (24) is coupled to the feed screw (23).
    6. Rotary exposure machine according to Claim 5, characterized in that a torsional-vibration damper (25) is mounted on the free end of the stepping motor (24).
    EP94115973A 1992-10-21 1992-10-21 Rotating exposure apparatus for the preparation of a cylindrical printing screen Expired - Lifetime EP0658812B1 (en)

    Priority Applications (1)

    Application Number Priority Date Filing Date Title
    ES94115973T ES2148264T3 (en) 1992-10-21 1992-10-21 ROTARY EXPOSURE MACHINE FOR THE MANUFACTURE OF A CYLINDRICAL SERIGRAPHY TEMPLATE.

    Applications Claiming Priority (1)

    Application Number Priority Date Filing Date Title
    EP92118032A EP0593806B1 (en) 1992-10-21 1992-10-21 Method for the preparation of a screen mesh for screen printing

    Related Parent Applications (1)

    Application Number Title Priority Date Filing Date
    EP92118032.9 Division 1992-10-21

    Publications (2)

    Publication Number Publication Date
    EP0658812A1 EP0658812A1 (en) 1995-06-21
    EP0658812B1 true EP0658812B1 (en) 2000-05-24

    Family

    ID=8210158

    Family Applications (2)

    Application Number Title Priority Date Filing Date
    EP94115973A Expired - Lifetime EP0658812B1 (en) 1992-10-21 1992-10-21 Rotating exposure apparatus for the preparation of a cylindrical printing screen
    EP92118032A Expired - Lifetime EP0593806B1 (en) 1992-10-21 1992-10-21 Method for the preparation of a screen mesh for screen printing

    Family Applications After (1)

    Application Number Title Priority Date Filing Date
    EP92118032A Expired - Lifetime EP0593806B1 (en) 1992-10-21 1992-10-21 Method for the preparation of a screen mesh for screen printing

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    US (2) US5384007A (en)
    EP (2) EP0658812B1 (en)
    AT (2) ATE216507T1 (en)
    DE (2) DE59209841D1 (en)
    ES (2) ES2174825T3 (en)

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    EP0658812A1 (en) 1995-06-21
    EP0593806B1 (en) 2002-04-17
    ATE193383T1 (en) 2000-06-15
    US5384007A (en) 1995-01-24
    US5443677A (en) 1995-08-22
    DE59209953D1 (en) 2002-05-23
    EP0593806A1 (en) 1994-04-27
    ES2148264T3 (en) 2000-10-16
    ES2174825T3 (en) 2002-11-16
    DE59209841D1 (en) 2000-06-29

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