EP0587032A1 - Integrated capacitive transducer - Google Patents

Integrated capacitive transducer Download PDF

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Publication number
EP0587032A1
EP0587032A1 EP93113955A EP93113955A EP0587032A1 EP 0587032 A1 EP0587032 A1 EP 0587032A1 EP 93113955 A EP93113955 A EP 93113955A EP 93113955 A EP93113955 A EP 93113955A EP 0587032 A1 EP0587032 A1 EP 0587032A1
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EP
European Patent Office
Prior art keywords
electrode
transducer according
plate
electret
membrane
Prior art date
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Granted
Application number
EP93113955A
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German (de)
French (fr)
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EP0587032B1 (en
Inventor
Jean-Marc Moret
Johan Wilhelm Bergqvist
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Safran Colibrys SA
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Centre Suisse dElectronique et Microtechnique SA CSEM
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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R19/00Electrostatic transducers
    • H04R19/005Electrostatic transducers using semiconductor materials
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R19/00Electrostatic transducers
    • H04R19/01Electrostatic transducers characterised by the use of electrets
    • H04R19/016Electrostatic transducers characterised by the use of electrets for microphones
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R25/00Deaf-aid sets, i.e. electro-acoustic or electro-mechanical hearing aids; Electric tinnitus maskers providing an auditory perception
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R25/00Deaf-aid sets, i.e. electro-acoustic or electro-mechanical hearing aids; Electric tinnitus maskers providing an auditory perception
    • H04R25/60Mounting or interconnection of hearing aid parts, e.g. inside tips, housings or to ossicles
    • H04R25/604Mounting or interconnection of hearing aid parts, e.g. inside tips, housings or to ossicles of acoustic or vibrational transducers

Definitions

  • the invention relates to an integrated capacitive transducer and more particularly to such an electret transducer in which the electret exhibits excellent charge retention and in which the charge distribution is homogeneous.
  • Such transducers are in particular intended to be used as a microphone for hearing aids
  • capacitive electret transducers have been proposed. These transducers, which currently dominate the market for hearing aid applications with more than 3 million parts sold per year, are characterized in that they do not require external polarization to function.
  • these transducers can be made of silicon in relatively small dimensions which allow the prostheses in which they are used to be easily miniaturized so that they are easily integrated into the ear.
  • the transducers used in hearing aids currently on the market have dimensions of the order of 3.6 x 3.6 x 2.3 mm3.
  • Teflon ® does not support high temperatures, electrets made using this material are not easily compatible with silicon-based technologies used in the manufacture of the rest of the transducer structure.
  • the capacitive transducer electret comprises a rigid base made of silicon, carried by techniques analogous to those used in the manufacture of semiconductor devices and associated with a Mylar ® sheet (PET) forming the membrane of the transducer.
  • PET Mylar ® sheet
  • the fact of charging the electret before the membrane is attached to the base limits the choice of manufacturing techniques which can be used later in this charging step so as not to deteriorate this charge.
  • the bonding of the membrane to the base must be carried out at low temperature, for example, with an epoxy adhesive.
  • an electret thus formed discharges quickly so that it is necessary to treat the surface of SiO2, for example, by means of silanization in order to reduce the surface conduction and thereby increase charge retention in the SiO2 layer.
  • the result of the latter remains ineffective due to its instability over time.
  • the transducer according to the invention can, if necessary, be recharged, so that its lifetime is considerably increased compared to the electret transducers of the prior art.
  • Another object of the invention is to provide an electret transducer which can be produced using technologies complementary to micromechanics and microelectronics.
  • the charges introduced into the conductive layer are distributed homogeneously in the latter.
  • the conductive layer embedded in an insulating material has good charge retention characteristics.
  • the capacitive transducer 1 generally comprises an upper plate 2 comprising a first electrode 4, an intermediate plate 6 comprising a second fixed electrode 8 (FIG. 3) and a lower plate 10 forming, on the one hand, a support structure for the assembly formed by the two plates 2 and 6 and, on the other hand, a rear chamber 12 of the transducer.
  • the structure comprising the plates 2 and 6, comprising the electrodes 4 and 8, thus forms the capacitive element of the transducer 1.
  • the frame 18 and the electrode 4 advantageously have a monolithic structure and are made of a semiconductor material such as silicon.
  • this monolithic structure advantageously reduces the sensitivity to temperature variations, thereby increasing the reliability of the transducer.
  • the frame 18 and the diaphragm of the transducer can be made in one piece and that the electrode 4 can be attached to the membrane.
  • the materials used for the frame and the membrane are not necessarily electrically conductive.
  • the intermediate plate 6 comprises, in addition to the electrode 8, an electret 30 comprising a first electrically conductive layer 32 embedded in between two layers 34, 36 of an insulating material.
  • the electret 30 extends substantially opposite the membrane 4 of the upper plate 2.
  • the plate 6 comprises a substrate 38 on the surface of which is a second electrically conductive layer forming the second fixed electrode 8.
  • the electret 30 is disposed on the surface of the second electrode 8.
  • the layer of insulating material 34, in direct contact with the second electrode 8 will be called the first insulating layer 34 and the layer of insulating material 36 extending opposite the movable part 4 will be called the second insulating layer 36 .
  • the intermediate plate 6 is connected to the upper plate 2 by a plurality of arms 40a-40h extending from the plate 6 and the end of which is in view of the frame 18 to which they are fixed by means of the spacers 14.
  • the arms 40a-40h are formed by extensions of the substrate 38 which extend respectively from the four corners of the plate 6 and from the middle of the sides of the plate 6.
  • this structure for fixing the intermediate plate 6 to the upper plate by arms contributes to increasing the sensitivity of the transducer 1 by minimizing the parasitic capacity formed by the parts of the fixed plate located in the vicinity of the frame 18.
  • a structure in connection with a membrane 4 having a thickness of the order of 3.65 x 10 ⁇ 6m achieves a sensitivity greater than 10mv / Pa.
  • the second conductive layer or electrode 8 extends over the surface of an arm 40a to form at its end a contact surface 42 of the electrode 8 with the outside.
  • This surface 42 is of course not covered with the insulating layers 34 and 36 and is located opposite the contact window 22a.
  • the substrate 38 is made of lightly p-doped silicon and having a surface orientation ⁇ 100 ⁇
  • the second conductive layer 8 is formed by an n + doped region
  • the first and second insulating layers 34 and 36 are made made of silicon oxide
  • the first conductive layer 32 is made of doped polysilicon.
  • the plate 6 further comprises, in its zone opposite the electrode or movable part 4, a plurality of through holes 44 regularly distributed in rows and columns. These holes 44 reduce the acoustic resistance between the membrane 4 and the plate 6 and provide, in combination with the open space 16, a device for damping the acoustic structure of the transducer 1; which significantly improves the acoustic properties of the latter. It is indeed possible to adjust the frequency response, for example the bandwidth, of the transducer by a judicious arrangement of these holes.
  • the intermediate plate 6 further comprises charging means 46 and means 48 for controlling the charge of the electret 30. Reference will be made more particularly to FIGS. 3, 5 and 6 to describe these means 46 and 48.
  • the charging means 46 of the electret 30 comprise a third electrically conductive layer 50 disposed on the surface of the substrate 38.
  • the layer 50 extends over the arm 40b and is isolated from the second electrode 8 by an excess thickness portion 52 of the first insulating layer 34.
  • the first insulating layer 34 extends and covers part of the layer 50; the part not covered by the latter constituting a contact surface 54, which is arranged opposite the contact window 22b of the frame 18.
  • the first conductive layer 32 and the second insulating layer 36 also extend above the layer 50. In this extension is provided an injection zone 56 in which the thickness of the first insulating layer 34 between the conductive layers 32 and 50 is small.
  • the injection will take place more favorably if the ratio between the capacitor, which is formed by the counter electrode 8, the first insulating layer 34 and the conductive layer 32 and the capacitor, which is formed by the conductive layer 50, said first layer insulating 34 and the conductive layer 32, is large.
  • the charging mechanism of the electret 30 is simpler than in the structures of the prior art and the charge can be easily controlled and possibly adjusted after blow in order to obtain the desired charge density.
  • the charges are distributed uniformly in the insulated conductive layer 32.
  • these charging means simplify the whole process of manufacturing the transducer in that they allow the electret to be charged as the very last operation so that it is possible to carry out wet process steps at high temperature without have to take into account a possible discharge of the electret.
  • the means for controlling the charge 48 of the electret 30 comprise a fourth electrically conductive layer 58 disposed on the surface of the substrate 38.
  • the layer 58 extends over the arm 40c and is isolated from the second electrode 8 by a shoulder 60 of the substrate 38. At this shoulder 60, the substrate 38 is separated from the conductive layer 32 by a thin part 62 of the first insulating layer 34.
  • the first insulating layer 34 is extended and covers part of the layer 58 and leaves a contact surface 64 (disposed opposite the contact window 20c of the contact frame 18).
  • the first conductive layer 32 and the second insulating layer 36 also cover part of the layer 58 so that the conductive layer 32, forming the part which retains the charges of the electret 30, extends at least above the part of lesser thickness 62 and is completely isolated from the outside.
  • the arm 40d comprises a portion of substrate not covered by the insulating layers 34 and 36 forms a contact surface 66 which extends opposite the contact window 20d and which makes it possible to control and fix the potential of the substrate 38.
  • the lower plate 10 forming the means for supporting the capacitive element of the transducer 1 comprises an element of generally flat shape and on one face of which has been formed a cavity forming the rear chamber 12 which is arranged opposite the intermediate plate 6
  • the cavity 12 comprises a shoulder 68 which extends at its periphery substantially opposite the frame 18 of the plate 6 and thus delimits a flange or rib 70 by which the lower plate 10 is connected to the upper plate 2.
  • the plate 10 has a monolithic structure and is, like the frame 18, made of a semiconductor material such as silicon. The fixing of the plate 10 on the frame 18 can thus be achieved by a simple silicon on silicon welding.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Acoustics & Sound (AREA)
  • Signal Processing (AREA)
  • Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)

Abstract

The invention relates to an integrated capacitive transducer (1) comprising: - a membrane including a movable part (4) equipped with an electrode, - a fixed plate (6) including a counter-electrode (8), - a structure (10) for supporting the electrode and the counter-electrode, the said fixed plate (6) further including an electret (30) which extends opposite the said movable part (4) and is separated from the said membrane by an open space (16), the said transducer being characterised in that the said electret (30) includes a first electrically conducting layer (32) embedded in an insulating material (34, 36). The invention applies particularly to hearing aids. <IMAGE>

Description

L'invention concerne un transducteur capacitif intégré et plus particulièrement un tel transducteur à électret dans lequel l'électret présente une excellente rétention de charges et dans lequel la distribution de charges est homogène. De tels transducteurs sont notamment destinés à être utilisés comme microphone pour prothèses auditivesThe invention relates to an integrated capacitive transducer and more particularly to such an electret transducer in which the electret exhibits excellent charge retention and in which the charge distribution is homogeneous. Such transducers are in particular intended to be used as a microphone for hearing aids

Parmi les transducteurs ou microphones utilisés généralement on trouve principalement des transducteurs de type capacitif, piézo-électrique et électro-dynamique. Parmi ceux-ci, les transducteurs de type capacitif se distinguent par leur sensibilité, leur bande passante, leur stabilité et leur faible consommation et sont, pour ces qualités, généralement utilisés dans les appareils auditifs.Among the transducers or microphones generally used, there are mainly transducers of the capacitive, piezoelectric and electro-dynamic type. Among these, capacitive type transducers are distinguished by their sensitivity, bandwidth, stability and low consumption and are, for these qualities, generally used in hearing aids.

Ces transducteurs capacitifs, bien que fonctionnant de façon satisfaisante, présentent l'inconvénient de nécessiter l'utilisation d'une polarisation externe qui doit être relativement élevée, à savoir, de l'ordre de quelques dizaines, voire quelques centaines de volts.These capacitive transducers, although operating satisfactorily, have the drawback of requiring the use of an external polarization which must be relatively high, namely, of the order of a few tens or even a few hundred volts.

Pour pallier cet inconvénient on a proposé des transducteurs capacitifs à électret. Ces transducteurs, qui dominent actuellement le marché pour les applications aux prothèses auditives avec plus de 3 millions de pièces vendues par année, se caractérisent en ce qu'ils ne nécessitent pas de polarisation externe pour pouvoir fonctionner.To overcome this drawback, capacitive electret transducers have been proposed. These transducers, which currently dominate the market for hearing aid applications with more than 3 million parts sold per year, are characterized in that they do not require external polarization to function.

En effet, les charges électriques piégées, de façon quasi-permanente, dans une couche de matériau diélectrique sur un des substrats des électrodes du transducteur, suffisent à fournir la tension de polarisation nécessaire à son fonctionnement.In fact, the electric charges trapped, almost permanently, in a layer of dielectric material on one of the substrates of the electrodes of the transducer, are sufficient to supply the bias voltage necessary for its operation.

De plus, ces transducteurs peuvent être réalisés en silicium dans des dimensions relativement petites qui permettent, aux prothèses dans lesquelles ils sont utilisés, d'être facilement miniaturisées pour qu'elles soient facilement intégrées dans l'oreille. Typiquement, les transducteurs utilisés dans les prothèses auditives actuellement sur le marché ont des dimensions de l'ordre de 3,6 x 3,6 x 2,3 mm³.In addition, these transducers can be made of silicon in relatively small dimensions which allow the prostheses in which they are used to be easily miniaturized so that they are easily integrated into the ear. Typically, the transducers used in hearing aids currently on the market have dimensions of the order of 3.6 x 3.6 x 2.3 mm³.

La fabrication de ces transducteurs capacitifs à électret pose toutefois certains problèmes.The manufacture of these capacitive electret transducers poses certain problems, however.

En effet, les électrets classiques, qui sont généralement formés dans des films de Teflon® (PTFE), présentent l'inconvénient de se décharger notablement au cours du temps. Ce processus de décharge, qui augmente avec la température et l'humidité, diminue la sensibilité du transducteur et affecte sa durée de vie.Indeed, conventional electrets, which are generally formed in films of Teflon ® (PTFE), have the drawback to substantially discharge over time. This discharge process, which increases with temperature and humidity, decreases the sensitivity of the transducer and affects its lifespan.

En l'occurrence, il est nécessaire d'utiliser une couche de Teflon® de quelques 12 micromètres, ce qui diminue les performances générales du transducteur et augmente de façon désavantageuse l'épaisseur de l'ensemble du transducteur.In this case, it is necessary to use a layer of Teflon ® some 12 micrometers, which decreases the overall performance of the transducer and increases disadvantageously the thickness of the transducer assembly.

Par ailleurs, comme le Teflon® ne supporte pas les températures élevées, les électrets réalisés à l'aide de ce matériau sont difficilement compatibles avec les technologies du silicium utilisées dans la fabrication du reste de la structure du transducteur.Furthermore, such as Teflon ® does not support high temperatures, electrets made using this material are not easily compatible with silicon-based technologies used in the manufacture of the rest of the transducer structure.

Une autre approche dite hybride est décrite dans la publication intitulée "Development of an electret microphone in silicon" de A. J. Sprenkels et al., dans la revue Sensors and Actuators, 17(1989) aux pages 509-512.Another so-called hybrid approach is described in the publication entitled "Development of an electret microphone in silicon" by A. J. Sprenkels et al., In the journal Sensors and Actuators, 17 (1989) at pages 509-512.

Dans cette publication, le transducteur capacitif à électret comprend une base rigide en silicium, réalisée par les techniques analogues à celles utilisées pour la fabrication de dispositifs semiconducteurs et associée à une feuille de Mylar® (PETP) qui forme la membrane du transducteur. Une couche de Si0₂, formée à partir de la base et en regard de la membrane, dans laquelle des charges ont été implantées forme l'électret.In this publication, the capacitive transducer electret comprises a rigid base made of silicon, carried by techniques analogous to those used in the manufacture of semiconductor devices and associated with a Mylar ® sheet (PET) forming the membrane of the transducer. A layer of Si0₂, formed from the base and opposite the membrane, in which charges have been implanted, forms the electret.

Cette approche présente, toutefois, encore des inconvénients.This approach, however, still has drawbacks.

En effet, puisque la couche de Si0₂ est isolante, la charge de l'électret doit se faire avant que la membrane soit rapportée sur la base. En outre cette charge doit être effectuée à l'aide de techniques d'implantation coûteuses, telles que l'implantation Corona ou l'implantation à faisceau d'électrons.Indeed, since the layer of Si0₂ is insulating, the charge of the electret must be done before the membrane is brought back on the base. In addition, this charge must be carried out using costly implantation techniques, such as Corona implantation or electron beam implantation.

De plus, le fait de charger l'électret avant que la membrane soit rapportée sur la base limite le choix des techniques de fabrication utilisables ultérieurement à cette étape de charge afin de ne pas détériorer cette charge. En particulier, le collage de la membrane sur la base doit être réalisé à basse température, par exemple, avec une colle epoxy.In addition, the fact of charging the electret before the membrane is attached to the base limits the choice of manufacturing techniques which can be used later in this charging step so as not to deteriorate this charge. In particular, the bonding of the membrane to the base must be carried out at low temperature, for example, with an epoxy adhesive.

Par ailleurs, on constate qu'un électret ainsi formé se décharge rapidement de sorte qu'il est nécessaire de traiter la surface de SiO₂, par exemple, au moyen d'une silanisation afin de réduire la conduction de surface et augmenter par-là même la rétention des charges dans la couche de SiO₂. Cependant, outre l'augmentation du coût de mise en oeuvre de ce traitement, le résultat de ce dernier demeure peu efficace du fait de son instabilité dans le temps.Furthermore, it is found that an electret thus formed discharges quickly so that it is necessary to treat the surface of SiO₂, for example, by means of silanization in order to reduce the surface conduction and thereby increase charge retention in the SiO₂ layer. However, in addition to the increase in the cost of implementing this treatment, the result of the latter remains ineffective due to its instability over time.

Aussi, pour charger uniformément les deux types d'électret mentionnés ci-dessus, il est nécessaire d'utiliser des installations de charge qui puissent balayer la surface de l'électret. Là encore la mise en oeuvre de ces installations est coûteuse et constitue une contrainte de fabrication supplémentaire qu'il est souhaitable d'éliminer.Also, to uniformly charge the two types of electret mentioned above, it is necessary to use charging facilities which can sweep the surface of the electret. Again, the implementation of these installations is expensive and constitutes an additional manufacturing constraint which it is desirable to eliminate.

Enfin, la charge des types d'électret susmentionnés ne peut être ni modifiée, ni contrôlée après sa fabrication de sorte qu'il en résulte une durée de vie limitée de l'électret compte tenu des pertes de charge inévitables au cours du temps.Finally, the charge of the aforementioned types of electret cannot be modified or controlled after its manufacture, so that a lifetime results. limited electret taking into account the inevitable pressure drops over time.

L'invention a donc pour but principal de remédier aux inconvénients de l'art antérieur susmentionné en fournissant un transducteur capacitif à électret intégré, qui présente une structure d'électret permettant d'être chargée électriquement de façon homogène et simple avec de bonnes propriétés de rétention de charge et dont l'état de charge peut-être contrôlé précisément, à la fois au cours et après la fabrication du transducteur.The main object of the invention is therefore to remedy the drawbacks of the aforementioned prior art by providing a capacitive transducer with an integrated electret, which has an electret structure allowing it to be electrically charged in a homogeneous and simple manner with good properties of charge retention and the state of charge of which can be precisely controlled, both during and after the manufacture of the transducer.

Le transducteur selon l'invention peut être, le cas échéant, rechargé, si bien que sa durée de vie est considérablement augmentée par rapport aux transducteurs à électret de l'art antérieur.The transducer according to the invention can, if necessary, be recharged, so that its lifetime is considerably increased compared to the electret transducers of the prior art.

Un autre but de l'invention est de fournir un transducteur à électret pouvant être réalisé en utilisant des technologies complémentaires de la micromécanique et de la microélectronique.Another object of the invention is to provide an electret transducer which can be produced using technologies complementary to micromechanics and microelectronics.

A cet effet, l'invention a pour objet un transducteur capacitif intégré comprenant:

  • une membrane comportant une partie mobile munie d'une électrode,
  • une plaque fixe comportant une contre-électrode,
  • une structure de support de l'électrode et de la contre-électrode,
ladite plaque fixe comportant en outre un électret, qui s'étend en regard de ladite partie mobile, et étant séparée de ladite membrane par un espace ouvert;
ledit transducteur étant caractérisé en ce que ledit électret comporte une couche conductrice noyée dans une matière isolante.To this end, the subject of the invention is an integrated capacitive transducer comprising:
  • a membrane comprising a movable part provided with an electrode,
  • a fixed plate comprising a counter-electrode,
  • a support structure for the electrode and the counter-electrode,
said fixed plate further comprising an electret, which extends opposite said movable part, and being separated from said membrane by an open space;
said transducer being characterized in that said electret comprises a conductive layer embedded in an insulating material.

Ainsi, les charges introduites dans la couche conductrice se distribuent de façon homogène dans celle-ci. De plus, la couche conductrice noyée dans une matière isolante présente de bonnes caractéristiques de rétention de charges.Thus, the charges introduced into the conductive layer are distributed homogeneously in the latter. In addition, the conductive layer embedded in an insulating material has good charge retention characteristics.

D'autres caractéristiques et avantages de l'invention apparaîtront clairement à la lecture de la description qui suit d'un mode de réalisation du transducteur donné à titre d'exemple non limitatif et en liaison avec les dessins annexés parmi lesquels :

  • la figure 1 est une vue schématique de dessus partiellement arrachée du transducteur capacitif à électret intégré selon l'invention;
  • la figure 2 est une coupe schématique selon la ligne II-II de la figure 1;
  • la figure 3 est une vue schématique de dessus de la plaque fixe munie d'un électret et formant contre-électrode dans laquelle les trous et la couche supérieure d'isolant ont été omis;
  • la figure 4 est une coupe partielle schématique agrandie, selon la ligne IV-IV de la figure 3, de la plaque fixe formant contre-électrode munie de l'électret avec la couche supérieure d'isolant;
  • la figure 5 est une coupe partielle schématique agrandie selon la ligne V-V de la figure 3 des moyens d'injection de charges dans l'électret avec la couche supérieure d'isolant; et
  • la figure 6 est une coupe partielle schématique agrandie selon la ligne VI-VI de la figure 3 des moyens de contrôle de l'état de charge de l'électret avec la couche supérieure d'isolant.
Other characteristics and advantages of the invention will appear clearly on reading the following description of an embodiment of the transducer given by way of non-limiting example and in conjunction with the appended drawings among which:
  • Figure 1 is a schematic top view partially cut away of the capacitive transducer with integrated electret according to the invention;
  • Figure 2 is a schematic section along the line II-II of Figure 1;
  • Figure 3 is a schematic top view of the fixed plate provided with an electret and forming a counter electrode in which the holes and the upper layer of insulation have been omitted;
  • Figure 4 is an enlarged schematic partial section along the line IV-IV of Figure 3, of the fixed plate forming a counter electrode provided with the electret with the upper layer of insulator;
  • Figure 5 is an enlarged schematic partial section along the line VV of Figure 3 of the charge injection means in the electret with the upper layer of insulator; and
  • Figure 6 is an enlarged schematic partial section along line VI-VI of Figure 3 of the means of controlling the state of charge of the electret with the upper layer of insulator.

En se référant à la figure 1 on voit une vue en plan partiellement arrachée d'un transducteur capacitif intégré selon l'invention qui est désigné par la référence générale 1. La figure 1 sera mieux comprise en se référant simultanément à la figure 2.Referring to FIG. 1, a plan view is partially broken away of an integrated capacitive transducer according to the invention which is designated by the general reference 1. FIG. 1 will be better understood by referring simultaneously to FIG. 2.

Le transducteur capacitif 1 comprend généralement une plaque supérieure 2 comportant une première électrode 4, une plaque intermédiaire 6 comportant une deuxième électrode fixe 8 (figure 3) et une plaque inférieure 10 formant, d'une part, une structure de support de l'ensemble formé par les deux plaques 2 et 6 et, d'autre part, une chambre arrière 12 du transducteur.The capacitive transducer 1 generally comprises an upper plate 2 comprising a first electrode 4, an intermediate plate 6 comprising a second fixed electrode 8 (FIG. 3) and a lower plate 10 forming, on the one hand, a support structure for the assembly formed by the two plates 2 and 6 and, on the other hand, a rear chamber 12 of the transducer.

La plaque intermédiaire 6 est fixée, au moyen d'une entretoise isolante 14, à la plaque supérieure 2 qui est à son tour fixée par sa périphérie à la structure de support 10. L'entretoise 14 sépare la plaque supérieure 2 de la plaque intermédiaire 6 en ménageant un espace ouvert 16 entre les deux plaques 2 et 6, et isole électriquement les plaques 2 et 6 l'une de l'autre.The intermediate plate 6 is fixed, by means of an insulating spacer 14, to the upper plate 2 which is in turn fixed by its periphery to the support structure 10. The spacer 14 separates the upper plate 2 from the intermediate plate 6 by providing an open space 16 between the two plates 2 and 6, and electrically isolates the plates 2 and 6 from one another.

La structure comprenant les plaques 2 et 6, comportant les électrodes 4 et 8, forme ainsi l'élément capacitif du transducteur 1.The structure comprising the plates 2 and 6, comprising the electrodes 4 and 8, thus forms the capacitive element of the transducer 1.

La plaque supérieure 2 comporte un cadre 18 à l'intérieur duquel s'étend l'électrode 4. Cette électrode est constituée d'une feuille mince, qui est reliée au cadre 18 par un bord intérieur 20. L'électrode 4 forme aussi la partie mobile ou membrane du transducteur 1.The upper plate 2 comprises a frame 18 inside which extends the electrode 4. This electrode consists of a thin sheet, which is connected to the frame 18 by an inner edge 20. The electrode 4 also forms the moving part or membrane of the transducer 1.

Dans l'exemple de réalisation décrit ici, le cadre 18 et l'électrode 4 présentent avantageusement une structure monolithique et sont réalisés en un matériau semiconducteur tel que le silicium.In the embodiment described here, the frame 18 and the electrode 4 advantageously have a monolithic structure and are made of a semiconductor material such as silicon.

On notera au passage que cette structure monolithique diminue de façon avantageuse la sensibilité aux variations de température, augmentant ainsi la fiabilité du transducteur.It will be noted in passing that this monolithic structure advantageously reduces the sensitivity to temperature variations, thereby increasing the reliability of the transducer.

Il va de soi que, selon une variante de l'invention, le cadre 18 et la membrane du transducteur peuvent être réalisés en une seule pièce et que l'électrode 4 peut être rapportée sur la membrane. Dans ce cas les matériaux utilisés pour le cadre et la membrane ne sont pas nécessairement électriquement conducteurs.It goes without saying that, according to a variant of the invention, the frame 18 and the diaphragm of the transducer can be made in one piece and that the electrode 4 can be attached to the membrane. In this case the materials used for the frame and the membrane are not necessarily electrically conductive.

La plaque supérieure 2 comprend, en outre, des fenêtres de contact 22a-22d ménagées dans les coins du cadre 18 pour établir des contacts électriques avec des éléments (décrits ci-après) de la plaque intermédiaire 6. Les bords de ces fenêtres de contact 22a-22d sont revêtus d'une couche de matériau isolant 26a-26d.The upper plate 2 further comprises contact windows 22a-22d formed in the corners of the frame 18 to establish electrical contacts with elements (described below) of the intermediate plate 6. The edges of these contact windows 22a-22d are coated with a layer of insulating material 26a-26d.

Pour la description de la plaque intermédiaire 6 on se référera désormais également aux figures 3 à 6.For the description of the intermediate plate 6, reference will now also be made to FIGS. 3 to 6.

La plaque intermédiaire 6 comprend, outre l'électrode 8, un électret 30 comportant une première couche électriquement conductrice 32 noyée dans entre deux couches 34, 36 d'un matériau isolant. L'électret 30 s'étend sensiblement en regard de la membrane 4 de la plaque supérieure 2.The intermediate plate 6 comprises, in addition to the electrode 8, an electret 30 comprising a first electrically conductive layer 32 embedded in between two layers 34, 36 of an insulating material. The electret 30 extends substantially opposite the membrane 4 of the upper plate 2.

Plus précisément, la plaque 6 comporte un substrat 38 à la surface duquel se trouve une deuxième couche électriquement conductrice formant la deuxième électrode 8 fixe. Dans l'exemple représenté aux figures, l'électret 30 est disposé à la surface de la deuxième électrode 8.More specifically, the plate 6 comprises a substrate 38 on the surface of which is a second electrically conductive layer forming the second fixed electrode 8. In the example shown in the figures, the electret 30 is disposed on the surface of the second electrode 8.

Dans la suite de la description la couche de matériau isolant 34, en contact direct avec la deuxième électrode 8 sera dite première couche isolante 34 et la couche de matériau isolant 36 s'étendant en regard de la partie mobile 4 sera dite deuxième couche isolante 36.In the following description, the layer of insulating material 34, in direct contact with the second electrode 8 will be called the first insulating layer 34 and the layer of insulating material 36 extending opposite the movable part 4 will be called the second insulating layer 36 .

Comme cela ressort plus particulièrement des figures 1 et 3, on voit que la plaque intermédiaire 6 est reliée à la plaque supérieure 2 par une pluralité de bras 40a-40h s'étendant à partir de la plaque 6 et dont l'extrémité se trouve en regard du cadre 18 auquel ils sont fixés par l'intermédiaire des entretoises 14.As can be seen more particularly from FIGS. 1 and 3, it can be seen that the intermediate plate 6 is connected to the upper plate 2 by a plurality of arms 40a-40h extending from the plate 6 and the end of which is in view of the frame 18 to which they are fixed by means of the spacers 14.

Dans l'exemple décrit ici, les bras 40a-40h sont formés par des extensions du substrat 38 qui s'étendent respectivement à partir des quatre coins de la plaque 6 et à partir du milieu des côtés de la plaque 6.In the example described here, the arms 40a-40h are formed by extensions of the substrate 38 which extend respectively from the four corners of the plate 6 and from the middle of the sides of the plate 6.

On remarquera que cette structure de fixation de la plaque intermédiaire 6 à la plaque supérieure par des bras contribue à augmenter la sensibilité du transducteur 1 en réduisant au minimum la capacité parasite formée par les parties de la plaque fixe se trouvant au voisinage du cadre 18. A titre d'exemple, une telle structure en liaison avec une membrane 4 ayant une épaisseur de l'ordre de 3,65 x 10⁻⁶m permet d'atteindre une sensibilité supérieure à 10mv/Pa.It will be noted that this structure for fixing the intermediate plate 6 to the upper plate by arms contributes to increasing the sensitivity of the transducer 1 by minimizing the parasitic capacity formed by the parts of the fixed plate located in the vicinity of the frame 18. For example, such a structure in connection with a membrane 4 having a thickness of the order of 3.65 x 10⁻⁶m achieves a sensitivity greater than 10mv / Pa.

On notera également à ce propos que la deuxième couche conductrice ou électrode 8 s'étend à la surface d'un bras 40a pour former à son extrémité une surface de contact 42 de l'électrode 8 avec l'extérieur. Cette surface 42 n'est bien entendu pas recouverte des couches isolantes 34 et 36 et se trouve en regard de la fenêtre de contact 22a.It will also be noted in this connection that the second conductive layer or electrode 8 extends over the surface of an arm 40a to form at its end a contact surface 42 of the electrode 8 with the outside. This surface 42 is of course not covered with the insulating layers 34 and 36 and is located opposite the contact window 22a.

A titre d'exemple, le substrat 38 est réalisé en silicium légèrement dopé p et présentant une orientation de surface 〈100〉, la deuxième couche conductrice 8 est formée par une région dopée n+, les première et deuxième couches isolantes 34 et 36 sont réalisées en oxyde de silicium, et la première couche conductrice 32 est réalisée en polysilicium dopé.For example, the substrate 38 is made of lightly p-doped silicon and having a surface orientation 〈100〉, the second conductive layer 8 is formed by an n + doped region, the first and second insulating layers 34 and 36 are made made of silicon oxide, and the first conductive layer 32 is made of doped polysilicon.

Comme cela ressort clairement des figures 1 et 2, la plaque 6 comprend, en outre, dans sa zone en regard de l'électrode ou partie mobile 4, une pluralité de trous traversants 44 régulièrement répartis en lignes et en colonnes. Ces trous 44 diminuent la résistance acoustique entre la membrane 4 et la plaque 6 et fournissent, en combinaison avec l'espace ouvert 16, un dispositif d'amortissement de la structure acoustique du transducteur 1; ce qui améliore sensiblement les propriétés acoustiques de ce dernier. Il est en effet possible d'ajuster la réponse en fréquence, par exemple la bande passante, du transducteur par une disposition judicieuse de ces trous.As is clear from Figures 1 and 2, the plate 6 further comprises, in its zone opposite the electrode or movable part 4, a plurality of through holes 44 regularly distributed in rows and columns. These holes 44 reduce the acoustic resistance between the membrane 4 and the plate 6 and provide, in combination with the open space 16, a device for damping the acoustic structure of the transducer 1; which significantly improves the acoustic properties of the latter. It is indeed possible to adjust the frequency response, for example the bandwidth, of the transducer by a judicious arrangement of these holes.

La plaque intermédiaire 6 comprend en outre des moyens de charge 46 et des moyens de contrôle 48 de la charge de l'électret 30. On se référera plus particulièrement aux figures 3, 5 et 6 pour décrire ces moyens 46 et 48.The intermediate plate 6 further comprises charging means 46 and means 48 for controlling the charge of the electret 30. Reference will be made more particularly to FIGS. 3, 5 and 6 to describe these means 46 and 48.

On notera que les couches isolantes 34 et 36 ont été omises dans la figure 3 pour des raisons de clarté.It will be noted that the insulating layers 34 and 36 have been omitted in FIG. 3 for reasons of clarity.

Les moyens de charge 46 de l'électret 30 comprennent une troisième couche électriquement conductrice 50 disposée à la surface du substrat 38. La couche 50 s'étend sur le bras 40b et est isolée de la deuxième électrode 8 par une partie en surépaisseur 52 de la première couche isolante 34. La première couche isolante 34 se prolonge et recouvre une partie de la couche 50; la partie non recouverte de cette dernière constituant une surface de contact 54, qui est disposée en regard de la fenêtre de contact 22b du cadre 18. La première couche conductrice 32 ainsi que la deuxième couche isolante 36 se prolongent également au-dessus de la couche 50. Dans ce prolongement est ménagée une zone d'injection 56 dans laquelle l'épaisseur de la première couche isolante 34 entre les couches conductrices 32 et 50 est faible.The charging means 46 of the electret 30 comprise a third electrically conductive layer 50 disposed on the surface of the substrate 38. The layer 50 extends over the arm 40b and is isolated from the second electrode 8 by an excess thickness portion 52 of the first insulating layer 34. The first insulating layer 34 extends and covers part of the layer 50; the part not covered by the latter constituting a contact surface 54, which is arranged opposite the contact window 22b of the frame 18. The first conductive layer 32 and the second insulating layer 36 also extend above the layer 50. In this extension is provided an injection zone 56 in which the thickness of the first insulating layer 34 between the conductive layers 32 and 50 is small.

Ainsi, pour charger l'électret 30 il suffit d'appliquer une tension entre les surfaces de contact 42 (reliée à la contre-électrode 8) et 54 afin d'injecter, à travers la zone d'injection 56 en oxyde mince, des charges dans la couche 32 en polysilicium.Thus, to charge the electret 30, it suffices to apply a voltage between the contact surfaces 42 (connected to the counter electrode 8) and 54 in order to inject, through the injection zone 56 of thin oxide, charges in layer 32 of polysilicon.

L'injection aura lieu plus favorablement si le rapport entre la capacité, qui est formée par la contre-électrode 8, la première couche isolante 34 et la couche conductrice 32 et la capacité , qui est formée par la couche conductrice 50, ladite première couche isolante 34 et la couche conductrice 32, est grand.The injection will take place more favorably if the ratio between the capacitor, which is formed by the counter electrode 8, the first insulating layer 34 and the conductive layer 32 and the capacitor, which is formed by the conductive layer 50, said first layer insulating 34 and the conductive layer 32, is large.

Ce mécanisme d'injection de charges à travers un oxyde mince est dit de type Fowler-Nordheim et est notamment décrit dans la publication JOURNAL OF APPLIED PHYSICS, VOLUME 40, NUMBER 1 JANUARY 1969, intitulée "Fowler-Nordheim Tunneling into Thermally Grown Sio₂" par M. Lenzlinger et E.H. Snow.This charge injection mechanism through a thin oxide is said to be of the Fowler-Nordheim type and is notably described in the publication JOURNAL OF APPLIED PHYSICS, VOLUME 40, NUMBER 1 JANUARY 1969, entitled "Fowler-Nordheim Tunneling into Thermally Grown Sio₂" by M. Lenzlinger and EH Snow.

Grâce à la structure du transducteur décrite le mécanisme de charge de l'électret 30 est plus simple que dans les structures de l'art antérieur et la charge peut être facilement contrôlée et éventuellement ajustée après coup afin d'obtenir la densité de charges désirée. De plus, les charges se répartissent de façon uniforme dans la couche conductrice 32 isolée. Aussi ces moyens de charge simplifient l'ensemble du procédé de fabrication du transducteur en ce qu'ils permettent de charger l'électret comme toute dernière opération si bien que l'on peut mettre en oeuvre des étapes de procédé humide et à haute température sans avoir à tenir compte d'une éventuelle décharge de l'électret.Thanks to the structure of the transducer described the charging mechanism of the electret 30 is simpler than in the structures of the prior art and the charge can be easily controlled and possibly adjusted after blow in order to obtain the desired charge density. In addition, the charges are distributed uniformly in the insulated conductive layer 32. Also these charging means simplify the whole process of manufacturing the transducer in that they allow the electret to be charged as the very last operation so that it is possible to carry out wet process steps at high temperature without have to take into account a possible discharge of the electret.

Les moyens de contrôle de la charge 48 de l'électret 30 comprennent une quatrième couche électriquement conductrice 58 disposée à la surface du substrat 38. La couche 58 s'étend sur le bras 40c et est isolée de la deuxième électrode 8 par un épaulement 60 du substrat 38. Au niveau de cet épaulement 60, le substrat 38 est séparé de la couche conductrice 32 par une partie de moindre épaisseur 62 de la première couche isolante 34. La première couche isolante 34 se prolonge et recouvre une partie de la couche 58 et laisse une surface de contact 64 (disposée en regard de la fenêtre de contact 20c du cadre de contact 18). La première couche conductrice 32 ainsi que la deuxième couche isolante 36 recouvrent également une partie de la couche 58 de sorte que la couche conductrice 32, formant la partie qui retient les charges de l'électret 30, s'étend au moins au dessus de la partie de moindre épaisseur 62 et soit complètement isolée de l'extérieur.The means for controlling the charge 48 of the electret 30 comprise a fourth electrically conductive layer 58 disposed on the surface of the substrate 38. The layer 58 extends over the arm 40c and is isolated from the second electrode 8 by a shoulder 60 of the substrate 38. At this shoulder 60, the substrate 38 is separated from the conductive layer 32 by a thin part 62 of the first insulating layer 34. The first insulating layer 34 is extended and covers part of the layer 58 and leaves a contact surface 64 (disposed opposite the contact window 20c of the contact frame 18). The first conductive layer 32 and the second insulating layer 36 also cover part of the layer 58 so that the conductive layer 32, forming the part which retains the charges of the electret 30, extends at least above the part of lesser thickness 62 and is completely isolated from the outside.

La structure des moyens de contrôle de la charge 48 forme ainsi un transistor à effet de champ dans lequel la source est formée par la couche conductrice 8, le drain est formé par la couche conductrice 58 et la grille est formée par la couche conductrice 32. Le courant sourcedrain étant fonction entre autres de la charge de la grille (la couche 32), la mesure de ce courant permet de déterminer facilement l'état de charge de l'électret 30 et de le réajuster à l'aide des moyens de charge 46 si cela est nécessaire.The structure of the load control means 48 thus forms a field effect transistor in which the source is formed by the conductive layer 8, the drain is formed by the conductive layer 58 and the gate is formed by the conductive layer 32. The sourcedrain current being a function inter alia of the charge of the grid (the layer 32), the measurement of this current makes it possible to easily determine the state of charge of the electret 30 and readjust it using the load means 46 if necessary.

On notera encore que le bras 40d comprend une partie de substrat non recouverte par les couches isolantes 34 et 36 forme une surface de contact 66 qui s'étend en regard de la fenêtre de contact 20d et qui permet de contrôler et de fixer le potentiel du substrat 38.It will also be noted that the arm 40d comprises a portion of substrate not covered by the insulating layers 34 and 36 forms a contact surface 66 which extends opposite the contact window 20d and which makes it possible to control and fix the potential of the substrate 38.

La plaque inférieure 10 formant les moyens de support de l'élément capacitif du transducteur 1 comprend un élément de forme générale plane et sur une des face duquel a été ménagée une cavité formant la chambre arrière 12 qui est disposée en regard de la plaque intermédiaire 6. La cavité 12 comprend un épaulement 68 qui s'étend à sa périphérie sensiblement en regard du cadre 18 de la plaque 6 et délimite ainsi un rebord ou nervure 70 par lequel la plaque inférieure 10 est reliée à la plaque supérieure 2. La plaque 10 présente une structure monolithique et est, comme le cadre 18, réalisée en un matériau semiconducteur tel que le silicium. La fixation de la plaque 10 sur le cadre 18 peut être ainsi réalisée par une simple soudure silicium sur silicium.The lower plate 10 forming the means for supporting the capacitive element of the transducer 1 comprises an element of generally flat shape and on one face of which has been formed a cavity forming the rear chamber 12 which is arranged opposite the intermediate plate 6 The cavity 12 comprises a shoulder 68 which extends at its periphery substantially opposite the frame 18 of the plate 6 and thus delimits a flange or rib 70 by which the lower plate 10 is connected to the upper plate 2. The plate 10 has a monolithic structure and is, like the frame 18, made of a semiconductor material such as silicon. The fixing of the plate 10 on the frame 18 can thus be achieved by a simple silicon on silicon welding.

Pour fixer les idées, le transducteur de l'invention a des dimensions générales de 2,3 x 2,3 x 1,0 mm³. La surface de la partie mobile est de 2,0 x 2,0 mm², l'épaisseur de la membrane est d'environ 3,65 x 10⁻⁶ m, l'épaisseur de la plaque intermédiaire 6 est d'environ 10 x 10⁻⁶ m, l'épaisseur du film d'air dans l'espace ouvert 14 est d'environ 3 x 10⁻⁶ m, et le volume interne délimité par la cavité 11 est d'environ 5 mm³. Quant aux trous ils ont un diamètre d'environ 30 x 10⁻⁶ m et sont au nombre d'environ 400 par mm² de sorte qu'ils occupent environ 28% de la surface de la membrane.To fix ideas, the transducer of the invention has general dimensions of 2.3 x 2.3 x 1.0 mm³. The surface of the mobile part is 2.0 x 2.0 mm², the thickness of the membrane is approximately 3.65 x 10⁻⁶ m, the thickness of the intermediate plate 6 is approximately 10 x 10⁻⁶ m, the thickness of the air film in the open space 14 is approximately 3 x 10⁻⁶ m, and the internal volume delimited by the cavity 11 is approximately 5 mm³. As for the holes, they have a diameter of approximately 30 x 10⁻⁶ m and are approximately 400 per mm² so that they occupy approximately 28% of the surface of the membrane.

Claims (16)

Transducteur capacitif intégré (1) comprenant: - une membrane comportant une partie mobile (4) munie d'une électrode, - une plaque fixe (6) comportant une contre-électrode (8), - une structure de support (10) de l'électrode et de la contre-électrode, ladite plaque fixe (6) comportant en outre un électret (30) qui s'étend en regard de ladite partie mobile (4) et est séparée de ladite membrane par un espace ouvert (16),
caractérisé en ce que ledit électret (30) comporte une première couche électriquement conductrice (32) noyée dans un matériau isolant (34, 36).
Integrated capacitive transducer (1) comprising: - a membrane comprising a movable part (4) provided with an electrode, - a fixed plate (6) comprising a counter-electrode (8), a support structure (10) for the electrode and the counter-electrode, said fixed plate (6) further comprising an electret (30) which extends opposite said movable part (4) and is separated from said membrane by an open space (16),
characterized in that said electret (30) has a first electrically conductive layer (32) embedded in an insulating material (34, 36).
Transducteur selon la revendication 1, caractérisé en ce qu'il comprend des moyens de charge (46) de l'électret (30) intégrés dans ladite plaque (6).Transducer according to claim 1, characterized in that it comprises charging means (46) for the electret (30) integrated in said plate (6). Transducteur selon la revendication 1 ou 2, caractérisé en ce que ladite plaque (6) comporte un substrat (38) et en ce que ladite contre-électrode comprend une deuxième couche électriquement conductrice (8) disposée sur une face du substrat (38).Transducer according to claim 1 or 2, characterized in that said plate (6) comprises a substrate (38) and in that said counter-electrode comprises a second electrically conductive layer (8) disposed on one face of the substrate (38). Transducteur selon la revendication 3, caractérisé en ce que l'électret (30) est disposé à la surface de ladite contre-électrode (8) et en ce que ladite première couche conductrice (32) est disposée entre une couche de matériau isolant (34) en contact avec la contre-électrode (8) dite première couche isolante et une couche de matériau isolant (36) en regard de la membrane dite deuxième couche isolante.Transducer according to claim 3, characterized in that the electret (30) is disposed on the surface of said counter electrode (8) and in that said first conductive layer (32) is disposed between a layer of insulating material (34 ) in contact with the counter electrode (8) said first insulating layer and a layer of insulating material (36) facing the membrane called second insulating layer. Transducteur selon l'une des revendications 2 à 4, caractérisé en ce que lesdits moyens de charge (46) comprennent une troisième couche électriquement conductrice (50) disposée à la surface dudit substrat (38) et qui est isolée de ladite contre-électrode (8) par une surépaisseur (52) de la première couche isolante (34), et une zone de moindre épaisseur (56) ménagée dans ladite première couche (34) au-dessus de laquelle s'étend la première couche conductrice (32).Transducer according to one of claims 2 to 4, characterized in that said charging means (46) comprise a third electrically conductive layer (50) disposed on the surface of said substrate (38) and which is isolated from said counter-electrode (8) by an excess thickness (52) of the first insulating layer (34), and a zone of reduced thickness (56) formed in said first layer (34) above which s extends the first conductive layer (32). Transducteur selon l'une des revendications 2 à 5, caractérisé en ce qu'il comprend des moyens de contrôle (48) de l'état de charge de l'électret (30) intégrés dans ladite plaque (6).Transducer according to one of claims 2 to 5, characterized in that it comprises means (48) for controlling the state of charge of the electret (30) integrated in said plate (6). Transducteur selon la revendication 6, caractérisé en ce que lesdits moyens de contrôle (48) comprennent une quatrième couche (58) électriquement conductrice disposée à la surface dudit substrat et isolée de ladite contre-électrode par une zone en surépaisseur (60) du substrat (38).Transducer according to claim 6, characterized in that said control means (48) comprise a fourth electrically conductive layer (58) disposed on the surface of said substrate and isolated from said counter-electrode by a region in excess thickness (60) of the substrate ( 38). Transducteur selon l'une quelconque des revendications précédentes caractérisé en ce que ladite plaque fixe (6) est reliée à la membrane (4) par une pluralité de bras (40a - 40h) s'étendant à partir de ladite plaque (6).Transducer according to any one of the preceding claims, characterized in that said fixed plate (6) is connected to the membrane (4) by a plurality of arms (40a - 40h) extending from said plate (6). Transducteur selon l'une quelconque des revendications 4 à 7 en combinaison avec la revendication 8, caractérisé en ce que les deuxième, troisième et quatrième couches conductrices (8, 50, 58) s'étendent chacune au moins sur un des bras de suspension de ladite plaque.Transducer according to any one of Claims 4 to 7 in combination with Claim 8, characterized in that the second, third and fourth conductive layers (8, 50, 58) each extend at least on one of the suspension arms of said plate. Transducteur selon l'une quelconque des revendications précédentes caractérisé en ce que la membrane (4) est reliée à un cadre (18) comprenant des fenêtres de contact (22a - 22d) pour établir un contact isolé de l'électrode (4) et en ce que ladite plaque (6) est fixée, par ses branches (40a - 40h) et au moyen d'entretoise isolante (14), audit cadre (18).Transducer according to any one of the preceding claims, characterized in that the membrane (4) is connected to a frame (18) comprising contact windows (22a - 22d) to establish a contact isolated from the electrode (4) and in that said plate (6) is fixed, by its branches (40a - 40h) and by means of insulating spacer (14), to said frame (18). Transducteur selon l'une des revendications 9 ou 10 caractérisé en ce que les fenêtres de contact (22a - 22d) sont disposées en regard des bras (40a,40b,40c) comportant les deuxième, troisième et quatrième couches conductrices (8, 50, 58).Transducer according to one of claims 9 or 10 characterized in that the contact windows (22a - 22d) are arranged opposite the arms (40a, 40b, 40c) comprising the second, third and fourth conductive layers (8, 50, 58). Transducteur selon l'une des revendications 10 ou 11, caractérisé en ce que le cadre comporte en outre une fenêtre de contact (22d) en regard d'un bras de suspension (40d) pour établir un contact avec le substrat (38).Transducer according to one of claims 10 or 11, characterized in that the frame further comprises a contact window (22d) facing a suspension arm (40d) for establishing contact with the substrate (38). Transducteur selon l'une des revendications 10 à 12 caractérisé en ce que la membrane (4) et le cadre (18) présentent une structure monolithique.Transducer according to one of claims 10 to 12 characterized in that the membrane (4) and the frame (18) have a monolithic structure. Transducteur selon l'une quelconque des revendications précédentes caractérisé en ce que ladite plaque fixe (6) comprend une pluralité de trous traversants (44) régulièrement répartis dans la plaque (6)Transducer according to any one of the preceding claims, characterized in that said fixed plate (6) comprises a plurality of through holes (44) regularly distributed in the plate (6) Transducteur selon l'une quelconque des revendications précédentes caractérisé en ce que lesdits moyens de support (10) comprennent un élément plan muni d'une cavité (12) s'étendant en regard de ladite plaque (6) et dont les bords (70) sont fixés à la périphérie de la membrane (4).Transducer according to any one of the preceding claims, characterized in that said support means (10) comprise a planar element provided with a cavity (12) extending opposite said plate (6) and whose edges (70) are attached to the periphery of the membrane (4). Transducteur selon l'une des revendications 10 ou 15 caractérisé en ce que ladite cavité (12) comprend un épaulement (68) s'étendant à sa périphérie sensiblement en regard dudit cadre (18).Transducer according to one of claims 10 or 15 characterized in that said cavity (12) comprises a shoulder (68) extending at its periphery substantially facing said frame (18).
EP93113955A 1992-09-11 1993-09-01 Integrated capacitive transducer Expired - Lifetime EP0587032B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9210947 1992-09-11
FR9210947A FR2695787B1 (en) 1992-09-11 1992-09-11 Integrated capacitive transducer.

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EP0587032A1 true EP0587032A1 (en) 1994-03-16
EP0587032B1 EP0587032B1 (en) 1998-04-08

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DE (1) DE69317833T2 (en)
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US5677965A (en) 1997-10-14
DE69317833T2 (en) 1998-11-12
JPH06217397A (en) 1994-08-05
EP0587032B1 (en) 1998-04-08
DE69317833D1 (en) 1998-05-14
FR2695787A1 (en) 1994-03-18
FR2695787B1 (en) 1994-11-10

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