EP0450364B1 - Combination shock wave generator - Google Patents

Combination shock wave generator Download PDF

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Publication number
EP0450364B1
EP0450364B1 EP91103996A EP91103996A EP0450364B1 EP 0450364 B1 EP0450364 B1 EP 0450364B1 EP 91103996 A EP91103996 A EP 91103996A EP 91103996 A EP91103996 A EP 91103996A EP 0450364 B1 EP0450364 B1 EP 0450364B1
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EP
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Prior art keywords
shock
shock wave
sources
wave source
source
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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EP91103996A
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German (de)
French (fr)
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EP0450364A3 (en
EP0450364A2 (en
Inventor
Michael Dr. rer. nat. Grünewald
Hans Dr. Rer. Nat. Lobentanzer
Harald Dipl.-Phys. Eizenhöfer
Heribert Dr.Rer.Nat Koch
Friedrich Dr. Ing. Ueberle
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Dornier Medizintechnik GmbH
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Dornier Medizintechnik GmbH
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Publication of EP0450364A3 publication Critical patent/EP0450364A3/en
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    • G—PHYSICS
    • G10—MUSICAL INSTRUMENTS; ACOUSTICS
    • G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
    • G10K9/00—Devices in which sound is produced by vibrating a diaphragm or analogous element, e.g. fog horns, vehicle hooters or buzzers
    • G10K9/12—Devices in which sound is produced by vibrating a diaphragm or analogous element, e.g. fog horns, vehicle hooters or buzzers electrically operated
    • G—PHYSICS
    • G10—MUSICAL INSTRUMENTS; ACOUSTICS
    • G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
    • G10K15/00—Acoustics not otherwise provided for
    • G10K15/04—Sound-producing devices
    • G10K15/043—Sound-producing devices producing shock waves

Definitions

  • the invention relates to a device for generating shock waves according to the preamble of claim 1.
  • Shock waves are understood here as weaker acoustic pressure pulses, the intensity of which is sufficient to cause changes in the bodies of living beings, e.g. the movement of stones or the warming of the tissue.
  • a lithotripter with an area source is known. This is either designed as a self-focusing spherical cap or flat. Imaging systems such as reflectors, lenses or electrical controls of the different zones of the shock wave source are then required for focusing.
  • a lithotripter with two shock wave sources is known from DE-Gm 88 02 995 .
  • shock waves are generated extracorporeally and passed through the skin to the stone, on the other hand, the shock waves are generated at the end of a light guide near the stone.
  • EP 277 489 A describes a lithotripsy work station with two of them independent shock wave sources known to act on the stone from different directions. This device forms the preamble of claim 1.
  • the object of the invention is to improve the fragmentation of human concrements, in particular gallstones.
  • shock wave sources offer the advantages of both types, as long as both sources are operated independently of one another - freedom in the choice of energy or the focus size. If both sources are operated in combination, in particular controlled by a shock circuit with an adjustable time delay, there are further advantages:
  • the variable temporal superimposition of shock waves of different properties can have special effects on that from the other source excited stone occur.
  • a piezo system and an electromagnetic shock wave system are preferably used, both systems being self-focusing - for example arranged on a curved support - or even, the focusing then being carried out by means of aids such as lenses, reflectors or electronically by differently controlling the individual zones of the shock wave sources.
  • the two sources mentioned can be synchronized well in time.
  • the preferred coaxial arrangement leaves the effort involved in location and positioning unchanged compared to a simple source. It is also possible - but not shown - to arrange the sources side by side.
  • the coaxial arrangement of an electromagnetic source (EMSE) on the inside and a piezoelectric one on the outside is favorable, since the larger area is then available to the source with the lower energy density.
  • the electromagnetic source can be self-focusing or can be focused with a lens.
  • the piezo elements are preferably arranged self-focusing on a spherical carrier.
  • a defined time delay between the two shock wave sources can be set electrically for both sources when using a shock circuit or by mechanically adjusting the sources against each other over the then different transit times.
  • a hit control can also be carried out with the combination system. Reflections of the shock wave pulse of one partial shock source on the stone are detected by the other partial shock source.
  • FIG. 1 shows a shock wave source according to the invention, in which a piezoelectric shock wave source P and an electromagnetic shock wave source E are arranged coaxially on the carrier T.
  • the electromagnetic shock wave source E essentially contains the coil S, a membrane in front of it and the lens L necessary for focusing. Both shock wave systems (E, P) emit waves that are focused on one point (focal point F).
  • other components such as the water flow path, a coupling device or systems for locating the calculus and for positioning the shock wave source with respect to the calculus are not shown.
  • the marginal rays of the shock wave fields are shown, which lead from the piezoelectric shock wave source P and from the electromagnetic shock wave source E to the focal point F.
  • the acoustic waves generated by the electromagnetic shock wave source E reach the focal point F earlier than the waves emitted by the piezoelectric shock wave source.
  • FIG. 2 shows another embodiment with the same components as FIG. 1.
  • the electromagnetic shock wave source is arranged farther away from the focal point F, as a result of which the energy generated by the electromagnetic shock wave source E is generated when energy is applied simultaneously Waves arrive later at the focal point F than the waves generated by the piezoelectric shock wave source P.
  • the time delay can therefore be set both by a time delay in the electrical activation of the two sources (E, P) are also shifted against each other by shifting the sources (E, P), which changes the runtime. 2, both the lens L and the coil S are shifted to the rear. Versions are possible - but not shown - in which only one of the two components is displaced, the other remains stationary relative to the other shock wave source.
  • FIG 3 shows a further embodiment of a shock wave source according to the invention, in which a piezoelectric shock wave source P and an electromagnetic shock wave source E are arranged coaxially on the carrier T such that they radiate onto a common focal point F.
  • the focusing takes place with both shock wave sources (E, P) by the curvature of the carrier T.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Acoustics & Sound (AREA)
  • Multimedia (AREA)
  • Surgical Instruments (AREA)

Description

Die Erfindung betrifft eine Vorrichtung zur Erzeugung von Stosswellen nach dem Oberbegriff des Anspruchs 1. Unter Stosswellen werden hier auch schwächere akustische Druckpulse verstanden, deren Intensität jedoch ausreicht, um in Körpern von Lebewesen Veränderungen zu verursachen, wie z.B. die Bewegung von Steinen oder die Erwärmung des Gewebes.The invention relates to a device for generating shock waves according to the preamble of claim 1. Shock waves are understood here as weaker acoustic pressure pulses, the intensity of which is sufficient to cause changes in the bodies of living beings, e.g. the movement of stones or the warming of the tissue.

Aus der DE-OS 31 19 295 ist ein Lithotripter mit flächenhafter Quelle bekannt. Diese ist entweder als Kugelkalotte selbstfokussierend ausgebildet oder eben. Zur Fokussierung werden dann Abbildungssysteme wie Reflektoren, Linsen oder elektrische Ansteuerungen der unterschiedlichen Zonen der Stosswellenquelle benötigt.From DE-OS 31 19 295 a lithotripter with an area source is known. This is either designed as a self-focusing spherical cap or flat. Imaging systems such as reflectors, lenses or electrical controls of the different zones of the shock wave source are then required for focusing.

Aus dem DE-Gm 88 02 995 ist ein Lithotripter mit zwei Stosswellenquellen bekannt. Zum einen werden Stosswellen extrakorporal erzeugt und durch die Haut zum Stein geleitet, zum anderen werden die Stosswellen am Ende eines Lichtleiters in der Nähe des Steines erzeugt.A lithotripter with two shock wave sources is known from DE-Gm 88 02 995 . On the one hand, shock waves are generated extracorporeally and passed through the skin to the stone, on the other hand, the shock waves are generated at the end of a light guide near the stone.

Aus der EP 277 489 A ist ein Lithotripsie-Arbeitsplatz mit zwei voneinander unabhängigen Stosswellenquellen bekannt, die aus unterschiedlichen Richtungen auf den Stein einwirken. Diese Vorrichtung bildet den Oberbegriff des Anspruchs 1.EP 277 489 A describes a lithotripsy work station with two of them independent shock wave sources known to act on the stone from different directions. This device forms the preamble of claim 1.

Es wurde bereits vorgeschlagen (deutsche Patentanmeldung P 38 33 863), eine punktförmige und eine flächenhafte Stosswellenquelle miteinander zu kombinieren.It has already been proposed (German patent application P 38 33 863 ) to combine a punctiform and a flat shock wave source with one another.

Aufgabe der Erfindung ist es, die Fragmentation von Humankonkrementen, insbesondere von Gallensteinen, zu verbessern.The object of the invention is to improve the fragmentation of human concrements, in particular gallstones.

Diese Aufgabe wird erfindungsgemäß gelöst von einer Vorrichtung mit den Merkmalen des Anspruchs 1. Ausgestaltungen der Erfindung sind Gegenstände von Unteransprüchen.This object is achieved according to the invention by a device having the features of claim 1. Embodiments of the invention are the subject of subclaims.

Die Verwendung zweier unterschiedlicher Typen von Stosswellenquellen bietet die Vorteile beider Typen, so lange beide Quellen unabhängig voneinander betrieben werden - Freiheit in der Wahl der Energie oder der Fokusgröße. Werden beide Quellen kombiniert betrieben, insbesondere von einem Stosskreis mit einstellbarer zeitlicher Verzögerung angesteuert, ergeben sich weitere Vorteile: Durch die variable zeitliche Überlagerung von Stosswellen unterschiedlicher Eigenschaften (unterschiedliche Energiedichten, unterschiedlicher Zugwellenanteil, unterschiedliche Fokusgrößen) können besondere Effekte an dem bereits von der anderen Quelle angeregten Stein auftreten.The use of two different types of shock wave sources offers the advantages of both types, as long as both sources are operated independently of one another - freedom in the choice of energy or the focus size. If both sources are operated in combination, in particular controlled by a shock circuit with an adjustable time delay, there are further advantages: The variable temporal superimposition of shock waves of different properties (different energy densities, different tension wave components, different focus sizes) can have special effects on that from the other source excited stone occur.

Bevorzugt wird ein Piezosystem und ein elektromagnetisches Stosswellensystem benutzt, wobei beide Systeme selbstfokussierend sein können - z.B. auf einem gekrümmten Träger angeordnet - oder eben, wobei die Fokussierung dann durch Hilfsmittel, wie Linsen, Reflektoren oder auf elektronischem Weg durch unterschiedliche Ansteuerung der einzelnen Zonen der Stosswellenquellen erfolgt. Gerade die beiden genannten Quellen lassen sich zeitlich gut synchronisieren.A piezo system and an electromagnetic shock wave system are preferably used, both systems being self-focusing - for example arranged on a curved support - or even, the focusing then being carried out by means of aids such as lenses, reflectors or electronically by differently controlling the individual zones of the shock wave sources. The two sources mentioned can be synchronized well in time.

Die bevorzugte koaxiale Anordnung lässt den Aufwand bei Ortung und Positionierung gegenüber einer einfachen Quelle ungeändert. Möglich - aber nicht gezeigt - ist auch eine Anordnung der Quellen nebeneinander.The preferred coaxial arrangement leaves the effort involved in location and positioning unchanged compared to a simple source. It is also possible - but not shown - to arrange the sources side by side.

Günstig ist die koaxiale Anordnung einer elektromagnetischen Quelle (EMSE) innen und einer piezoelektrischen aussen, da dann der Quelle mit der kleineren Energiedichte die größere Fläche zur Verfügung steht. Die elektromagnetische Quelle kann selbstfokussierend sein oder mit einer Linse fokussiert werden. Die Piezoelemente werden bevorzugt selbstfokussierend auf einem sphärischen Träger angeordnet.The coaxial arrangement of an electromagnetic source (EMSE) on the inside and a piezoelectric one on the outside is favorable, since the larger area is then available to the source with the lower energy density. The electromagnetic source can be self-focusing or can be focused with a lens. The piezo elements are preferably arranged self-focusing on a spherical carrier.

Eine definierte zeitliche Verzögerung zwischen beiden Stosswellenquellen ist bei Verwendung eines Stosskreises für beide Quellen elektrisch einstellbar oder durch eine mechanische Verstellung der Quellen gegeneinander über die dann unterschiedliche Laufzeit.A defined time delay between the two shock wave sources can be set electrically for both sources when using a shock circuit or by mechanically adjusting the sources against each other over the then different transit times.

Ist eines der Systeme ein Piezosystem, so kann mit dem Kombisystem auch eine Trefferkontrolle durchgeführt werden. Dabei werden Reflexe des Stosswellenpulses der einen Teilstossquelle am Stein von der anderen Teilstossquelle detektiert.If one of the systems is a piezo system, a hit control can also be carried out with the combination system. Reflections of the shock wave pulse of one partial shock source on the stone are detected by the other partial shock source.

Die Erfindung wird anhand dreier Figuren näher erläutert.The invention is illustrated by three figures.

Es zeigen:Show it:

Fig. 1 bis 3 schematisch erfindungsgemäße Stosswellenquellen.1 to 3 schematically shock wave sources according to the invention.

Fig. 1 zeigt eine erfindungsgemäße Stosswellenquelle, bei der auf dem Träger T eine piezoelektrische Stosswellenquelle P und eine elektromagnetische Stosswellenquelle E koaxial angeordnet sind. Die elektromagnetische Stosswellenquelle E enthält im wesentlichen die Spule S, eine davorliegende Membran und die zur Fokussierung notwendige Linse L. Beide Stosswellensysteme (E, P) geben Wellen ab, die auf einen Punkt (Brennpunkt F) fokussiert sind. In dieser und den anderen Figuren sind weitere Bauteile wie die Wasservorlaufstrecke, eine Ankoppeleinrichtung oder Systeme zum Orten des Konkrements und zum Positionieren der Stosswellenquelle gegenüber dem Konkrement nicht gezeigt. Gezeigt sind die Randstrahlen der Stosswellenfelder, die von der piezoelektrischen Stosswellenquelle P und von der elektromagnetischen Stosswellenquelle E zum Brennpunkt F führen. In der in Fig. 1 gezeigten Ausführung gelangen die von der elektromagnetischen Stosswellenquelle E erzeugten akustischen Wellen früher auf den Brennpunkt F als die von der piezoelektrischen Stosswellenquelle ausgesandten Wellen.1 shows a shock wave source according to the invention, in which a piezoelectric shock wave source P and an electromagnetic shock wave source E are arranged coaxially on the carrier T. The electromagnetic shock wave source E essentially contains the coil S, a membrane in front of it and the lens L necessary for focusing. Both shock wave systems (E, P) emit waves that are focused on one point (focal point F). In this and the other figures, other components such as the water flow path, a coupling device or systems for locating the calculus and for positioning the shock wave source with respect to the calculus are not shown. The marginal rays of the shock wave fields are shown, which lead from the piezoelectric shock wave source P and from the electromagnetic shock wave source E to the focal point F. In the embodiment shown in FIG. 1, the acoustic waves generated by the electromagnetic shock wave source E reach the focal point F earlier than the waves emitted by the piezoelectric shock wave source.

Fig. 2 zeigt eine andere Ausführung mit den gleichen Bauelementen wie die Fig. 1. Bei der in Fig. 2 gezeigten Ausführung ist die elektromagnetische Stosswellenquelle jedoch weiter vom Brennpunkt F entfernt angeordnet, wodurch bei gleichzeitiger Beaufschlagung mit Energie die von der elektromagnetischen Stosswellenquelle E erzeugten Wellen später bei dem Brennpunkt F eintreffen als die von der piezoelektrischen Stosswellenquelle P erzeugten Wellen. Die zeitliche Verzögerung kann also sowohl durch zeitliche Verzögerung der elektrischen Ansteuerung der beiden Quellen (E, P) eingestellt werden also auch durch Verschieben der Quellen (E, P) gegeneinander, wodurch sich die Laufzeit ändert. In Fig. 2 sind sowohl die Linse L als auch die Spule S nach hinten verschoben. Möglich - aber nicht gezeigt - sind Ausführungen, bei denen nur eines der beiden Bauteile verschoben wird, das andere ortsfest gegenüber der anderen Stosswellenquelle bleibt. Ein Belassen der Linse L und ein alleiniges Verschieben der erzeugenden Spule S (mit Membran) läßt den Fokus ungeändert und variiert nur die Zeit. Eine Verschiebung der Linse L verändert die Lage des Brennpunkts F der entsprechenden Teilquelle E. In Fig. 2 ist ebenfalls eine etwas längere Vorlaufstrecke der elektromagnetischen Stosswellenquelle E gezeigt. Durch die mechanische Verschiebung eines oder mehrerer Bauteile kann die zeitliche Verzögerung des zweiten Stosswellenfeldes in weitem Rahmen eingestellt werden.FIG. 2 shows another embodiment with the same components as FIG. 1. In the embodiment shown in FIG. 2, however, the electromagnetic shock wave source is arranged farther away from the focal point F, as a result of which the energy generated by the electromagnetic shock wave source E is generated when energy is applied simultaneously Waves arrive later at the focal point F than the waves generated by the piezoelectric shock wave source P. The time delay can therefore be set both by a time delay in the electrical activation of the two sources (E, P) are also shifted against each other by shifting the sources (E, P), which changes the runtime. 2, both the lens L and the coil S are shifted to the rear. Versions are possible - but not shown - in which only one of the two components is displaced, the other remains stationary relative to the other shock wave source. Leaving the lens L and only moving the generating coil S (with membrane) leaves the focus unchanged and only varies the time. A shift of the lens L changes the position of the focal point F of the corresponding partial source E. A somewhat longer lead distance of the electromagnetic shock wave source E is also shown in FIG. 2. Due to the mechanical displacement of one or more components, the time delay of the second shock wave field can be set within a wide range.

Fig. 3 zeigt eine weitere Ausführung einer erfindungsgemäßen Stosswellenquelle, bei der auf dem Träger T wiederum eine piezoelektrische Stosswellenquelle P und eine elektromagnetische Stosswellenquelle E koaxial so angeordnet sind, daß sie auf einen gemeinsamen Brennpunkt F abstrahlen. Die Fokussierung erfolgt in dieser Ausführung bei beiden Stosswellenquellen (E, P) durch die Krümmung des Trägers T.3 shows a further embodiment of a shock wave source according to the invention, in which a piezoelectric shock wave source P and an electromagnetic shock wave source E are arranged coaxially on the carrier T such that they radiate onto a common focal point F. In this embodiment, the focusing takes place with both shock wave sources (E, P) by the curvature of the carrier T.

Möglich - aber nicht gezeigt - ist auch die Kombination einer ebenen oder einer selbstfokussierenden elektromagnetischen Stosswellenquelle E mit einer ebenen piezoelektrischen Stosswellenquelle P, die durch elektrische Ansteuerung unterschiedlicher Felder selbstfokussierend ausgebildet ist.It is also possible - but not shown - to combine a flat or a self-focusing electromagnetic shock wave source E with a flat piezoelectric shock wave source P, which is designed to be self-focusing due to the electrical actuation of different fields.

Claims (6)

  1. Device for producing shock-waves having two flat shock-wave sources (E, P) which focus at a point (F) or on an overlapping region, characterized in that the shock-wave sources (E, P) are of different types.
  2. Device according to Claim 1, characterized in that one of the shock-wave sources is an electromagnetic shock-wave source (E), and the other is a piezoelectric shock-wave source (P).
  3. Device according to one of the preceding claims, characterized in that the shock-wave sources (E, P) are arranged coaxially, in particular in that the electromagnetic shock-wave source (E) is arranged on the inside and the piezoelectric shock-wave source (P) on the outside, surrounding the first shock-wave source (E).
  4. Device according to one of the preceding claims, characterized by a shock circuit for supplying the two sources (E, P).
  5. Device according to Claim 1, characterized by an adjustable time delay between the sources (E, P).
  6. Device according to one of the preceding claims, characterized in that mechanical mutual adjustment of the sources (E, P) is provided in order to set the time delay.
EP91103996A 1990-04-05 1991-03-15 Combination shock wave generator Expired - Lifetime EP0450364B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4011017 1990-04-05
DE4011017A DE4011017C1 (en) 1990-04-05 1990-04-05

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EP0450364A2 EP0450364A2 (en) 1991-10-09
EP0450364A3 EP0450364A3 (en) 1992-06-24
EP0450364B1 true EP0450364B1 (en) 1996-01-10

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US (1) US5224468A (en)
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JP (1) JP2501673B2 (en)
DE (2) DE4011017C1 (en)

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JPH04227246A (en) 1992-08-17
EP0450364A3 (en) 1992-06-24
US5224468A (en) 1993-07-06
EP0450364A2 (en) 1991-10-09
DE4011017C1 (en) 1991-10-02
JP2501673B2 (en) 1996-05-29
DE59107218D1 (en) 1996-02-22

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