EP0430081B1 - Schnelle Atomstrahlquelle - Google Patents

Schnelle Atomstrahlquelle Download PDF

Info

Publication number
EP0430081B1
EP0430081B1 EP90122336A EP90122336A EP0430081B1 EP 0430081 B1 EP0430081 B1 EP 0430081B1 EP 90122336 A EP90122336 A EP 90122336A EP 90122336 A EP90122336 A EP 90122336A EP 0430081 B1 EP0430081 B1 EP 0430081B1
Authority
EP
European Patent Office
Prior art keywords
cylinder
fast atom
atom beam
beam source
oil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP90122336A
Other languages
English (en)
French (fr)
Other versions
EP0430081A2 (de
EP0430081A3 (en
Inventor
Kazutoshi Nagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of EP0430081A2 publication Critical patent/EP0430081A2/de
Publication of EP0430081A3 publication Critical patent/EP0430081A3/en
Application granted granted Critical
Publication of EP0430081B1 publication Critical patent/EP0430081B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
    • H05H3/02—Molecular or atomic beam generation

Definitions

  • the present invention relates to a fast atom beam source used for sputtering and the like.
  • Atoms or molecules subject to thermal kinetics in a normal atmosphere have kinetic energy of approximately 0.05 eV.
  • Molecules or atoms moving with kinetic energy remarkably higher than that level are generally known as "fast atoms" and if they flow in one direction as a beam, the beam is called as "a fast atom beam”.
  • Sputtering technology by energetic beam bombardment has been used in sputter etching or material composition analysis.
  • an energetic ion beam or a fast atom beam is used as the energetic beam for bombardment.
  • some apparatuses convert ions emitted from an ion source into fast atoms by neutralization with ion-electron recombination and the other apparatuses emit a fast atom beam directly as shown in Fig. 4.
  • a doughnut-shaped anode 2 is set at the center of a cylindrical cathode 1.
  • the cathode 1 and the anode 2 are connected to a DC high voltage power supply 3 arranged outside a vacuum vessel.
  • Oxygen gas for example, is let in through a gas nozzle 4 opening into the inside of the cylindrical cathode 1 and plasma 6 due to gas discharge is generated in the cylindrical cathode 1 by impressing supplying of DC high voltage through the DC high voltage power supply 3, thereby oxygen ions and electrons are produced.
  • the electrons emitted from the cathode 1 are forced to oscillate in high frequency across the anode 2 and produce many oxygen ions by collision with the oxygen gas.
  • oxygen ions produced in plasma are accelerated towards the bottom of the cylindrical cathode 1. Then, oxygen ions return to oxygen atoms by neutralization through contact with oxygen gas molecules and by recombination with electrons remaining near the cathode 1.
  • the kinetic energy of the oxygen ions is directly received to the oxygen atoms.
  • the fast atoms are born.
  • the fast atoms are emitted as a fast atom beam 8 from the emission orifices 7 provided on the bottom of the cylindrical cathode 1.
  • a fast atom beam without electric charges may be used for processing or analysis not only for metals and semiconductors but also for plastics and ceramics, etc. to which the workability for an ion beam is poor.
  • the gas should always be supplied to the apparatus in order to make up the material emitted as a fast atom beam.
  • the object of the present invention to solve the above problems by providing a fast atom beam source which is of a small size and is capable of fast atom beam emission without vacuum deterioration by using easily liquefied gas.
  • a fast atom beam source comprising:
  • the reservoir is connected to the slit.
  • An oil or a low melting point metal in the reservoir is vaporized by a heater, and the vapor of the oil or the low-melting point metal fills the cylinder.
  • a gas discharge is generated in the cylinder and the vapor is ionized in the plasma.
  • ions are accelerated towards the cathode. They are neutralized through contact with the vapor molecules remaining near the cathode and resultingly being emitted as a fast atom beam. While the vapor molecule density is reduced by emission of the fast atom beam, the apparatus operates such that the vapor is supplied from the reservoir.
  • the reduction in vacuum level of some equipments for sputter technology with the fast atom beam source can be minimized, as the vapor in the source circulates between the reservoir and the cylinder through evaporating by heating and liquefaction by cooling with little loss of the vapor to the outside of the cylinder.
  • Fig. 1 is a schematic perspective view showing an embodiment of the fast atom beam source of the present invention
  • Fig. 2 is a vertical cross-sectional view of the apparatus shown in Fig. 1.
  • a slit 25 is opened along the total periphery of the cylinder and a doughnut-shaped reservoir 22 totally surrounding the lower part of the vertically positioned cylinder 21 is connected to the slit 25 by means of the inclined wall 22a.
  • An oil or a low-melting point metal 23 is accumulated in the reservoir 22 and, furthermore, a heater 24 is provided on the bottom of the reservoir 22 and a cooling tube 27 surrounds the wall of the cylinder 21 above the slit 25.
  • a cathode 29 with fast atom emission orifices is set and a plate-shaped anode 28 is set at the upper end of the cylinder 21.
  • a DC high voltage power supply 32 is connected to the anode 28 and the cathode 29. The parts except the DC high voltage power supply 32 are located in a vacuum vessel. It is not always necessary for the anode 28 to be closely attached to the cylinder 21.
  • the oil or the low-melting point metal 23 in the reservoir 22 is hardly vaporized at a cold state before the operation of the apparatus.
  • the reservoir 22 is heated to a predetermined temperature by operation of the heater 24, the oil or the low-melting point metal 23 vaporizes into the cylinder 21.
  • the vapor of the oil or the low-melting point metal returns to liquid on the wall of the cylinder 21, which is cooled by the cooling tube 27.
  • the liquid oil or the liquid low melting point metal 23 turns back to the reservoir 22 through the slit 25.
  • the vapor in the source circulates between the reservoir 22 and the cylinder 21.
  • Fig. 3 is a schematic cross-sectional view showing another embodiment of the invention.
  • the same elements as Fig. 1 and Fig. 2 are given the same symbol.
  • the cylinder 21 and the reservoir 22 work as an anode made of metals (only the cylinder 21 may be made of metals) and a plate-shaped cathode 41 is set away from the upper end of the cylinder 21 with insulator spacers 26. Furthermore, the cathode 29 is arranged in the same way as in Fig. 1 and Fig. 2 and the DC high voltage power supply 42 is connected between the cylinder 21 and the cathodes 29, 41.

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Stabilization Of Oscillater, Synchronisation, Frequency Synthesizers (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Particle Accelerators (AREA)

Claims (12)

  1. Schnelle Atomstrahlquelle, die folgendens aufweist: einen evakuierten Zylinder (21) auf dessen Innenseitenwand ein Schlitz (25) geöffnet ist;
    ein Reservoir (22) für Öl oder ein, einen niedrigen Schmelzpunkt besitzendes Metall verbunden mit dem Schlitz;
    eine Heizvorrichtung (24) angeordnet an dem Reservoir zur Verdampfung des Öls oder des einen niedrigen Schmelzpunkt besitzenden Metalls;
    ein Kühlglied (27) angeordnet außerhalb des Zylinders, um den Dampf des Öls oder des einen niedrigen Schmelzpunkt besitzenden Metalls zur Flüssigkeit zurückzuführen; und
    eine Leistungsversorgung (32) mit hoher Gleichspannung zur Erzeugung einer Gasentladung durch Anlegen einer Hochspannung zwischen einer Anode (28) angeordnet an einem Ende oder an einem Zwischenteil des Zylinders und einer Kathode (29) mit Emissionszumeßöffnungen für schnelle Atome daran und angeordnet am anderen Ende des Zylinder.
  2. Schnelle Atomstrahlquelle nach Anspruch 1, wobei der erwähnte Schlitz entlang des gesamten Umfangs der Innenoberfläche der Wand des Zylinders vorgesehen ist.
  3. Schnelle Atomstrahlquelle nach Anspruch 1, wobei die Anode plattenförmig ist und an einem geöffneten Ende des erwähnten Zylinders angeordnet ist.
  4. Schnelle Atomstrahlquelle nach Anspruch 3, wobei die plattenförmige Anode eng am erwähnten geöffneten Ende des Zylinders angebracht ist.
  5. Schnelle Atomstrahlquelle nach Anspruch 1, wobei der Zylinder aus Metall oder Keramikmaterialien besteht.
  6. Schnelle Atomstrahlquelle nach Anspruch 1, wobei der Zylinder als eine Anode ausgebildet ist, eine plattenförmige Kathode mit Emissionszumeßöffnung für schnelle Atome am geöffneten Ende des Zylinders vorgesehen ist, und die Leistungsversorgung für hohe Gleichspannung verbunden ist zwischen der plattenförmigen Kathode und der durch den Zylinder gebildeten Anode.
  7. Schnelle Atomstrahlquelle nach Anspruch 6, wobei der Zylinder und das Reservoir aus Metallen hergestellt sind.
  8. Schnelle Atomstrahlquelle nach Anspruch 6, wobei die plattenförmige Kathode vom geöffneten Ende des Zylinders weg angeordnet ist, und zwar mit Isolationsabstandselementen.
  9. Schnelle Atomstrahlquelle nach Anspruch 2, wobei der erwähnte Schlitz am Mittelteil in Längsrichtung des Zylinders vorgesehen ist.
  10. Schnelle Atomstrahlquelle nach Anspruch 9, wobei das Reservoir ringförmig ist und den unteren Teil des Zylinders vollständig umgibt und verbunden ist mit dem Schlitz durch eine geneigte Wand.
  11. Schnelle Atomstrahlquelle nach Anspruch 10, wobei die Heizvorrichtung am Boden des Reservoirs vorgesehen ist.
  12. Schnelle Atomstrahlquelle nach einem der Ansprüche 1 bis 11, wobei jedes Element mit Ausnahme der Leistungsversorgung für die hohe Gleichspannung geeignet ist im Vakuum angeordnet zu werden.
EP90122336A 1989-11-22 1990-11-22 Schnelle Atomstrahlquelle Expired - Lifetime EP0430081B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP301832/89 1989-11-22
JP1301832A JPH0715839B2 (ja) 1989-11-22 1989-11-22 高速原子線放射装置

Publications (3)

Publication Number Publication Date
EP0430081A2 EP0430081A2 (de) 1991-06-05
EP0430081A3 EP0430081A3 (en) 1991-10-30
EP0430081B1 true EP0430081B1 (de) 1996-03-20

Family

ID=17901697

Family Applications (1)

Application Number Title Priority Date Filing Date
EP90122336A Expired - Lifetime EP0430081B1 (de) 1989-11-22 1990-11-22 Schnelle Atomstrahlquelle

Country Status (4)

Country Link
EP (1) EP0430081B1 (de)
JP (1) JPH0715839B2 (de)
AT (1) ATE135875T1 (de)
DE (1) DE69026037T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5326227A (en) * 1990-08-03 1994-07-05 Ebara Corporation Exhaust apparatus with vacuum pump
US5240381A (en) * 1990-08-03 1993-08-31 Ebara Corporation Exhaust apparatus and vacuum pumping unit including the exhaust apparatus
JP2509488B2 (ja) * 1991-09-12 1996-06-19 株式会社荏原製作所 高速原子線源
US5814819A (en) * 1997-07-11 1998-09-29 Eaton Corporation System and method for neutralizing an ion beam using water vapor
KR101624219B1 (ko) * 2015-04-06 2016-05-26 기초과학연구원 중이온 가속기의 복수개의 싱글 스포크형 가속관 저온 유지 장치

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3005121A (en) * 1959-09-14 1961-10-17 Nat Company Inc Beam intensity control system
US3523210A (en) * 1966-05-20 1970-08-04 Xerox Corp Gas discharge neutralizer including a charged particle source
US4328667A (en) * 1979-03-30 1982-05-11 The European Space Research Organisation Field-emission ion source and ion thruster apparatus comprising such sources
DE3270076D1 (en) * 1981-06-02 1986-04-30 Ibt Dubilier Ltd Dispenser for ion source

Also Published As

Publication number Publication date
JPH03163733A (ja) 1991-07-15
DE69026037T2 (de) 1996-10-31
JPH0715839B2 (ja) 1995-02-22
EP0430081A2 (de) 1991-06-05
ATE135875T1 (de) 1996-04-15
DE69026037D1 (de) 1996-04-25
EP0430081A3 (en) 1991-10-30

Similar Documents

Publication Publication Date Title
EP1093149B1 (de) Ionisator, Ionenquelle mit einem solchen Ionisator und Verfahren zur Kühlung eines Ionisators
US3562141A (en) Vacuum vapor deposition utilizing low voltage electron beam
US6107634A (en) Decaborane vaporizer
EP0200035B1 (de) Elektronenstrahlquelle
JPH05171423A (ja) 真空蒸着用偏向電子銃装置
US5055672A (en) Fast atom beam source
US5354445A (en) Thin film-forming apparatus
US5099791A (en) Cluster beam thin film deposition apparatus with thermionic electron control
EP0430081B1 (de) Schnelle Atomstrahlquelle
US5662741A (en) Process for the ionization of thermally generated material vapors and a device for conducting the process
US5180477A (en) Thin film deposition apparatus
JP3717655B2 (ja) プラズマ発生装置及び薄膜形成装置
JP3140636B2 (ja) プラズマ発生装置
US5256930A (en) Cooled plasma source
USH1868H (en) Method of and apparatus for controlling plasma potential and eliminating unipolar arcs in plasma chambers
WO1993023869A1 (en) Apparatus for and method of producing ions
JPH0542603Y2 (de)
JP2620474B2 (ja) イオンプレーティング装置
KR960004963B1 (ko) 이온 유도 스퍼터링(Ion Induced Sputtering)을 이용한 고밀도 플라즈마 생성법과 그 장치
JPH0735569B2 (ja) 薄膜形成装置
JPH0830265B2 (ja) 薄膜形成装置
Wolf High current metal ion production
KR100271126B1 (ko) 진공증착기
JPS6468470A (en) Plasma electron beam heating source
JP2593292Y2 (ja) 金属イオン源輻射リフレクタ構造

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE CH DE DK ES FR GB GR IT LI LU NL SE

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): AT BE CH DE DK ES FR GB GR IT LI LU NL SE

17P Request for examination filed

Effective date: 19920331

17Q First examination report despatched

Effective date: 19950307

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE CH DE DK ES FR GB GR IT LI LU NL SE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRE;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.SCRIBED TIME-LIMIT

Effective date: 19960320

Ref country code: ES

Free format text: THE PATENT HAS BEEN ANNULLED BY A DECISION OF A NATIONAL AUTHORITY

Effective date: 19960320

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 19960320

Ref country code: LI

Effective date: 19960320

Ref country code: BE

Effective date: 19960320

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 19960320

Ref country code: DK

Effective date: 19960320

Ref country code: CH

Effective date: 19960320

Ref country code: AT

Effective date: 19960320

REF Corresponds to:

Ref document number: 135875

Country of ref document: AT

Date of ref document: 19960415

Kind code of ref document: T

REF Corresponds to:

Ref document number: 69026037

Country of ref document: DE

Date of ref document: 19960425

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Effective date: 19960620

ET Fr: translation filed
NLV1 Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act
REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19961130

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20051108

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20051116

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20051117

Year of fee payment: 16

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20070601

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20061122

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20070731

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20061122

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20061130