EP0427612A1 - Burnishing head for hard-discs and method for manufacturing the same - Google Patents

Burnishing head for hard-discs and method for manufacturing the same Download PDF

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Publication number
EP0427612A1
EP0427612A1 EP90403137A EP90403137A EP0427612A1 EP 0427612 A1 EP0427612 A1 EP 0427612A1 EP 90403137 A EP90403137 A EP 90403137A EP 90403137 A EP90403137 A EP 90403137A EP 0427612 A1 EP0427612 A1 EP 0427612A1
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EP
European Patent Office
Prior art keywords
skis
burnishing
micro
head
face
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EP90403137A
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German (de)
French (fr)
Inventor
Patrice Deroux-Dauphin
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Compagnie Europeenne de Composants Electroniques LCC CICE
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Compagnie Europeenne de Composants Electroniques LCC CICE
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B39/00—Burnishing machines or devices, i.e. requiring pressure members for compacting the surface zone; Accessories therefor
    • B24B39/06—Burnishing machines or devices, i.e. requiring pressure members for compacting the surface zone; Accessories therefor designed for working plane surfaces

Definitions

  • the invention relates to a burnishing head for hard disks used in disk drives, in particular for those used in computers. It also relates to its manufacturing process.
  • read / write heads are used which fly, during operation, above the hard disks, at a height of about 0.1 to 0.4 ⁇ m.
  • the hardening of the hard disk surface is generally carried out at a height below the flight height of the recording and reading devices.
  • burnishing heads Two types are known. According to a first type, the burnishing head is equipped with a catamaran similar to them read / write heads. These burnishing heads have the advantage of having good flight stability, but their design is not suitable for current precision burnishing and the speed of burnishing is slow.
  • the burnishing head does not have a catamaran.
  • These heads are well equipped for the actual burnishing operation, but they have the following drawbacks: unstable flight due to the absence of catamaran skis, slow recovery from flight stabilization during the attachment of a large protuberance from the disc, possibility of scratching discs to be browned, use of micromechanics to produce these heads (polishing and ripping with a grinding wheel), use of an expensive substrate in alumina and titanium carbide (which leads to a high cost price for these heads).
  • the present invention has been designed. It allows, by the use of microelectronics techniques and from a silicon substrate to design a burnishing head at low cost and having a configuration perfectly suited to its function.
  • the subject of the invention is therefore a burnishing head for hard disks, one face of which is called the active face is intended to brown the surface of the discs, characterized in that the said active face comprises a series of micro-skis, preferably arranged in one direction. parallel to the movement of the disc relative to the burnishing head, the micro-skis being separated from each other by grooves, the micro-skis also being equipped with knives on their face intended to be located opposite the surface of the discs to be browned.
  • the burnishing head can advantageously be provided with a chamfer located on the side of the active face.
  • the knives can have the shape of chevrons or have the shape of blades inclined with respect to the direction of the micro-skis.
  • micro-skis can also be equipped with burnishing pads.
  • the active face of the head may have at least one recess.
  • the subject of the invention is also a method of manufacturing a burnishing head as defined above, characterized in that it comprises the following steps: - formation of a surface oxide layer on one face of a silicon substrate, - etching of said face of the substrate to form the micro-skis, the grooves and the chamfer, - removal of the surface oxide layer, - engraving of knives and possibly burnishing pads on micro-skis, - formation of a hard surface layer on the active face.
  • FIGS 1 to 4 show different versions of a burnishing head according to the invention. Different views have been shown each time, referenced a, b and c, of each head.
  • FIGS 1-a, 1-b and 1-c represent a burnishing head with micro-skis adapted for average flight heights (0.1 to 0.3 ⁇ m).
  • This burnishing head is formed from a substrate 10 and has a chamfer 11 to allow it to take off.
  • the face intended for browning the hard disks comprise skis 12 (or micro-skis) of small width, separated from each other by grooves 13.
  • the upper face of the skis 12 comprises knives which constitute the active elements of the head. We only represented a part of it. They can have different shapes. Thus there are shown knives 14 in the form of a chevron and knives 15 which are blades inclined relative to the direction of the skis. The inclination of the blades can be alternated from one ski to the next.
  • This head also has at its rear part burnishing pads 16 which are not all shown. They are intended to better polish the surface of the disc. They can have between 2 and 500 ⁇ m2 of surface and be rounded in shape.
  • the substrate can have a thickness of 300 ⁇ m to 1 mm for a width and a length of between 2 and 5 mm.
  • the number of micro-skis can advantageously be between 1 and 1000 and their width can range from 1 ⁇ m to 500 ⁇ m.
  • the width of the grooves can be between 1 and 1000 ⁇ m.
  • the depth of the grooves can be between 1 and 100 ⁇ m and the depth of the knives between 0.1 and 50 ⁇ m.
  • Figures 2 to 4 show different variants of a burnishing head with a smaller bearing surface (due to the presence of recesses) to reduce the flight height. These recesses also make it possible to maintain a constant flight surface on the disc.
  • the figures 2-a, 2b and 2-c represent a burnishing head formed from a substrate 20. It ensures a very good stability between internal radius and external ray and can allow a browning with a rotary arm.
  • recesses 27 have been made in the central part of the active face of the head in order to better stabilize the flight height and also to reduce the bearing surface.
  • Figures 3-a, 3-b and 3-c represent a burnishing head formed from a substrate 30.
  • the chamfer 31 placed at the front of the head and the skis 32 separated by grooves 33 and supporting knives (rafters 34 or blades 35).
  • recesses 37 have been made in different zones of the active face of the head.
  • Figures 4-a, 4-b and 4-c represent a head of burnishing formed from a substrate 40.
  • the chamfer 41 placed at the front of the head and the skis 42 separated by grooves 43 and supporting knives (rafters 44 or blades 45).
  • recesses 47 have been made in the central part of the active face of the head, excluding the edges of this face.
  • FIG. 5 represents a silicon substrate 50 covered with a layer of silicon oxide 58.
  • This oxide layer 58 can be obtained by thermal oxidation or by plasma decomposition (PECVD deposition).
  • FIG. 6 represents one of the steps of the lithography process used to define the skis 52 and the grooves 53, the grooves being obtained by etching of the silicon to a depth of approximately 40 to 100 ⁇ m.
  • the reference 59 represents insolated resin.
  • the silicon oxide is then removed by a method well known to those skilled in the art and the substrate etched in FIG. 7 is obtained.
  • the knives hereringbone or blades
  • the possible polishing pads and the chamfer are defined.
  • FIG. 8 illustrates a step of the second masking level.
  • a fragment of the substrate 50 with its skis 52 and its grooves 53 as well as its chamfer 51.
  • the blades 55 still covered with a layer 60 of exposed masking resin.
  • the etching of the knives can be done by reactive ion etching to a depth of 0.5 to 50 ⁇ m. For depths greater than 1 ⁇ m, an oxide mask is again used.
  • an operation consists in hardening the surface layer of the active face.
  • the thickness of this surface layer can be between 0.1 and 3 ⁇ m.
  • a layer of silicon oxide can be developed by thermal oxidation or deposited by a vapor deposition (CVD) method. It is possible, instead of an oxide layer, to deposit silicon nitride, diamond, carbon, silicon carbide, etc., by methods known to those skilled in the art.
  • Figure 9 illustrates this final stage of the process.
  • micro-skis 72 On the silicon substrate 70, micro-skis 72 have been produced separated by grooves 73, as well as a chamfer 71.
  • Herringbones 74 have been formed on the skis.
  • the hard surface layer is shown under the reference 79.
  • skis are aligned in a direction parallel to the movement of the disc relative to the head, but it can also be envisaged that the skis are inclined relative to this direction.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

The invention relates to a burnishing head for hard disks, one face of which, called the active face, is intended to burnish the surface of the disks, the said active face comprising a series of micro-skis (12) preferably disposed in a direction parallel to the displacement of the disk with respect to the burnishing head, the skis being separated from each other by grooves (13), the skis also being equipped with cutters (14, 15) on their faces intended to be opposite the surface of the disks to be burnished. <IMAGE>

Description

L'invention concerne, une tête de brunissage pour les disques durs utilisés dans des lecteurs de disques, en particulier pour ceux utilisés dans les ordinateurs. Elle concerne également son procédé de fabrication.The invention relates to a burnishing head for hard disks used in disk drives, in particular for those used in computers. It also relates to its manufacturing process.

Actuellement, dans l'enregistrement magnétique sont utilisées des têtes de lecture/écriture qui volent, en cours de fonctionnement, au-dessus des disques durs, à une hauteur d'environ 0,1 à 0,4 µm. Pour éviter que la tête de lecture/écriture ne subisse un accident de vol en cours d'utilisation, il est nécessaire lors de la fabrication du disque de brunir sa surface. Ainsi on élimine les aspérités ou les particules provenant des étapes de fabrication, que ce soit au cours du polissage, au cours de l'étape dite de "texturing" (configuration des motifs) ou au cours du dépôt des couches minces réalisé par exemple par pulvérisation cathodique. Le brunissage de la surface du disque dur est généralement effectué à une hauteur inférieure à la hauteur de vol des dispositifs d'enregistrement et de lecture.Currently, in magnetic recording, read / write heads are used which fly, during operation, above the hard disks, at a height of about 0.1 to 0.4 μm. To prevent the read / write head from suffering a flight accident during use, it is necessary during the manufacture of the disc to brown its surface. Thus the roughness or the particles originating from the manufacturing stages are eliminated, whether during polishing, during the so-called "texturing" stage (configuration of the patterns) or during the deposition of the thin layers produced for example by cathode sputtering. The hardening of the hard disk surface is generally carried out at a height below the flight height of the recording and reading devices.

On connaît deux types de têtes de brunissage. Selon un premier type, la tête de brunissage est équipée d'un catamaran semblable à eux des têtes de lecture/écriture. Ces têtes de brunissage ont l'avantage d'avoir une bonne stabilité en vol mais leur conception n'est pas adaptée aux brunissages de précision actuels et la vitesse de brunissage est lente.Two types of burnishing heads are known. According to a first type, the burnishing head is equipped with a catamaran similar to them read / write heads. These burnishing heads have the advantage of having good flight stability, but their design is not suitable for current precision burnishing and the speed of burnishing is slow.

Selon un deuxième type, la tête de brunissage ne possède pas de catamaran. Ces têtes sont bien équipées pour l'opération de brunissage proprement dite mais elles présentent les inconvénients suivants : vol instable dû à l'absence des skis de catamaran, récupération lente de la stabilisation en vol lors de l'accrochage d'une grosse protubérance du disque, possibilité de rayer les disques à brunir, utilisation de techniques de micromécanique pour réaliser ces têtes (polissage et défonçage à la meule), utilisation d'un substrat coûteux en alumine et carbure de titane (ce qui conduit à un prix de revient élevé pour ces têtes).According to a second type, the burnishing head does not have a catamaran. These heads are well equipped for the actual burnishing operation, but they have the following drawbacks: unstable flight due to the absence of catamaran skis, slow recovery from flight stabilization during the attachment of a large protuberance from the disc, possibility of scratching discs to be browned, use of micromechanics to produce these heads (polishing and ripping with a grinding wheel), use of an expensive substrate in alumina and titanium carbide (which leads to a high cost price for these heads).

C'est afin de pallier ces inconvénients que la présente invention a été conçue. Elle permet, par l'utilisation des techniques de la microélectronique et à partir d'un substrat en silicium de concevoir une tête de brunissage à faible coût et ayant une configuration parfaitement adaptée à sa fonction.It is in order to overcome these drawbacks that the present invention has been designed. It allows, by the use of microelectronics techniques and from a silicon substrate to design a burnishing head at low cost and having a configuration perfectly suited to its function.

L'invention a donc pour objet une tête de brunissage pour disques durs dont une face dite face active est destinée à brunir la surface des disques, caractérisée en ce que ladite face active comporte une série de micro-skis, disposés de préférence dans une direction parallèle au déplacement du disque par rapport à la tête de brunissage, les micro-skis étant séparés les uns des autres par des rainures, les micro-skis étant également équipés de couteaux sur leur face destinée à se trouver en vis-à-vis de la surface des disques à brunir.The subject of the invention is therefore a burnishing head for hard disks, one face of which is called the active face is intended to brown the surface of the discs, characterized in that the said active face comprises a series of micro-skis, preferably arranged in one direction. parallel to the movement of the disc relative to the burnishing head, the micro-skis being separated from each other by grooves, the micro-skis also being equipped with knives on their face intended to be located opposite the surface of the discs to be browned.

La tête de brunissage peut avantageusement être pourvue d'un chanfrein situé du côté de la face active.The burnishing head can advantageously be provided with a chamfer located on the side of the active face.

Les couteaux peuvent avoir la forme de chevrons ou avoir la forme de lames inclinées par rapport à la direction des micro-skis.The knives can have the shape of chevrons or have the shape of blades inclined with respect to the direction of the micro-skis.

Les micro-skis peuvent également être équipés de plots de brunissage.The micro-skis can also be equipped with burnishing pads.

Le face active de la tête peut posséder au moins un évidement.The active face of the head may have at least one recess.

L'invention a aussi pour objet un procédé de fabrication d'une tête de brunissage telle que définie ci-dessus, caractérisé en ce qu'il comprend les étapes suivantes :
- formation d'une couche superficielle d'oxyde sur une face d'un substrat en silicium,
- gravure de ladite face du substrat pour former les micro-skis, les rainures et le chanfrein,
- retrait de la couche d'oxyde superficielle,
- gravure des couteaux et éventuellement de plots de brunissage sur les micro-skis,
- formation d'une couche dure superficielle sur la face active.The subject of the invention is also a method of manufacturing a burnishing head as defined above, characterized in that it comprises the following steps:
- formation of a surface oxide layer on one face of a silicon substrate,
- etching of said face of the substrate to form the micro-skis, the grooves and the chamfer,
- removal of the surface oxide layer,
- engraving of knives and possibly burnishing pads on micro-skis,
- formation of a hard surface layer on the active face.

L'invention sera mieux comprise et d'autres avantages apparaîtront à la lecture de la description qui va suivre, donnée à titre non limitatif, accompagnée des dessins annexés parmi lesquels :

  • - les figures 1-a, 1-b et 1-c représentent une première variante de tête de brunissage selon l'invention,
  • - les figures 2-a, 2-b et 2-c représentent une seconde variante de tête de brunissage selon l'invention,
  • - les figures 3-a, 3-b et 3-c représentent une troisième variante de tête de brunissage selon l'invention,
  • - les figures 4-a, 4-b et 4-c représentent une quatrième variante de tête de brunissage selon l'invention,
  • - les figures 5 à 9 représentent différentes étapes du procédé de fabrication des têtes de brunissage selon l'invention.
The invention will be better understood and other advantages will appear on reading the description which follows, given without limitation, accompanied by the appended drawings among which:
  • FIGS. 1-a, 1-b and 1-c show a first variant of the burnishing head according to the invention,
  • FIGS. 2-a, 2-b and 2-c show a second variant of the burnishing head according to the invention,
  • FIGS. 3-a, 3-b and 3-c show a third variant of the burnishing head according to the invention,
  • FIGS. 4-a, 4-b and 4-c show a fourth variant of the burnishing head according to the invention,
  • - Figures 5 to 9 show different stages of the manufacturing process of the burnishing heads according to the invention.

les figures 1 à 4 représentent différentes versions d'une tête de brunissage selon l'invention. On a représenté à chaque fois différentes vues, référencées a, b et c, de chaque tête.Figures 1 to 4 show different versions of a burnishing head according to the invention. Different views have been shown each time, referenced a, b and c, of each head.

Les figures 1-a, 1-b et 1-c représentent une tête de brunissage à micro-skis adaptée pour des hauteurs de vol moyennes (0,1 à 0,3 µm). Cette tête de brunissage est formée à partir d'un substrat 10 et comporte un chanfrein 11 pour permettre son décollage. La face destinée à brunir les disques durs comportent des skis 12 (ou micro-skis) de faible largeur, séparés les uns des autres par des rainures 13. La face supérieure des skis 12 comporte des couteaux qui constituent les éléments actifs de la tête. On n'en a représenté qu'une partie. Ils peuvent avoir différentes formes. Ainsi on a représenté des couteaux 14 en forme de chevron et des couteaux 15 qui sont des lames inclinées par rapport à la direction des skis. L'inclinaison des lames peut être alternée d'un ski au suivant. Cette tête comporte aussi à sa partie arrière des plots de brunissage 16 qui ne sont pas tous représentés. Ils sont destinés à mieux polir la surface du disque. Ils peuvent avoir entre 2 et 500 µm² de surface et être de forme arrondie.Figures 1-a, 1-b and 1-c represent a burnishing head with micro-skis adapted for average flight heights (0.1 to 0.3 µm). This burnishing head is formed from a substrate 10 and has a chamfer 11 to allow it to take off. The face intended for browning the hard disks comprise skis 12 (or micro-skis) of small width, separated from each other by grooves 13. The upper face of the skis 12 comprises knives which constitute the active elements of the head. We only represented a part of it. They can have different shapes. Thus there are shown knives 14 in the form of a chevron and knives 15 which are blades inclined relative to the direction of the skis. The inclination of the blades can be alternated from one ski to the next. This head also has at its rear part burnishing pads 16 which are not all shown. They are intended to better polish the surface of the disc. They can have between 2 and 500 µm² of surface and be rounded in shape.

A titre d'exemple, le substrat peut avoir une épaisseur de 300 µm à 1 mm pour une largeur et une longueur comprise entre 2 et 5 mm. Le nombre de micro-skis peut être avantageusement compris entre 1 et 1000 et leur largeur peut aller de 1 µm à 500 µm. Le largeur des rainures peut être comprise entre 1 et 1000 µm. La profondeur des rainures peut être comprise entre 1 et 100 µm et la profondeur des couteaux entre 0,1 et 50 µm.For example, the substrate can have a thickness of 300 μm to 1 mm for a width and a length of between 2 and 5 mm. The number of micro-skis can advantageously be between 1 and 1000 and their width can range from 1 μm to 500 μm. The width of the grooves can be between 1 and 1000 μm. The depth of the grooves can be between 1 and 100 µm and the depth of the knives between 0.1 and 50 µm.

Les figures 2 à 4 représentent différentes variantes d'une tête de brunissage à surface portante plus faible (à cause de la présence d'évidements) pour diminuer la hauteur de vol. Ces évidements permettent également de maintenir une surface de vol constante sur le disque.Figures 2 to 4 show different variants of a burnishing head with a smaller bearing surface (due to the presence of recesses) to reduce the flight height. These recesses also make it possible to maintain a constant flight surface on the disc.

Les figures 2-a, 2b et 2-c représentent une tête de brunissage formée à partir d'un substrat 20. Elle assure une très bonne stabilité entre rayon intérieur et rayon extérieur et peut permettre un brunissage avec un bras rotatif. On reconnaît le chanfrein 21 placé à l'avant de la tête et les skis 22 séparés par des rainures 23 et supportant des couteaux (chevrons 24 ou lames 25). Sur cette tête, des évidements 27 ont été réalisés dans la partie centrale de la face active de la tête afin de mieux stabiliser la hauteur de vol et également de diminuer la surface portante.The figures 2-a, 2b and 2-c represent a burnishing head formed from a substrate 20. It ensures a very good stability between internal radius and external ray and can allow a browning with a rotary arm. We recognize the chamfer 21 placed at the front of the head and the skis 22 separated by grooves 23 and supporting knives (rafters 24 or blades 25). On this head, recesses 27 have been made in the central part of the active face of the head in order to better stabilize the flight height and also to reduce the bearing surface.

Les figures 3-a, 3-b et 3-c représentent une tête de brunissage formée à partir d'un substrat 30. On reconnaît le chanfrein 31 placé à l'avant de la tête et les skis 32 séparés par des rainures 33 et supportant des couteaux (chevrons 34 ou lames 35). Sur cette tête, des évidements 37 ont été réalisés dans différentes zones de la face active de la tête.Figures 3-a, 3-b and 3-c represent a burnishing head formed from a substrate 30. We recognize the chamfer 31 placed at the front of the head and the skis 32 separated by grooves 33 and supporting knives (rafters 34 or blades 35). On this head, recesses 37 have been made in different zones of the active face of the head.

Les figures 4-a, 4-b et 4-c représentent une tête de brunissage formée à partir d'un substrat 40. On reconnaît le chanfrein 41 placé à l'avant de la tête et les skis 42 séparés par des rainures 43 et supportant des couteaux (chevrons 44 ou lames 45). Sur cette tête, des évidements 47 ont été réalisés dans la partie centrale de la face active de la tête, à l'exclusion des bords de cette face.Figures 4-a, 4-b and 4-c represent a head of burnishing formed from a substrate 40. We recognize the chamfer 41 placed at the front of the head and the skis 42 separated by grooves 43 and supporting knives (rafters 44 or blades 45). On this head, recesses 47 have been made in the central part of the active face of the head, excluding the edges of this face.

Pour réaliser les têtes de brunissage selon l'invention, il est avantageux de partir d'un substrat en silicium.To make the burnishing heads according to the invention, it is advantageous to start from a silicon substrate.

La figure 5 représente un substrat en silicium 50 recouvert d'une couche d'oxyde de silicium 58. Cette couche d'oxyde 58 peut être obtenue par oxydation thermique ou par décomposition plasma (dépôt PECVD).FIG. 5 represents a silicon substrate 50 covered with a layer of silicon oxide 58. This oxide layer 58 can be obtained by thermal oxidation or by plasma decomposition (PECVD deposition).

La figure 6 représente l'une des étapes du procédé de lithographie mis en oeuvre pour définir les skis 52 et les rainures 53, les rainures étant obtenues par gravure du silicium sur une profondeur d'environ 40 à 100 µm. La référence 59 représente de la résine insolée.FIG. 6 represents one of the steps of the lithography process used to define the skis 52 and the grooves 53, the grooves being obtained by etching of the silicon to a depth of approximately 40 to 100 μm. The reference 59 represents insolated resin.

L'oxyde de silicium est ensuite retiré par une méthode bien connue de l'homme de l'art et l'on obtient le substrat gravé de la figure 7.The silicon oxide is then removed by a method well known to those skilled in the art and the substrate etched in FIG. 7 is obtained.

Par un deuxième niveau de masquage on définit les couteaux (chevrons ou lames), les plots de polissage éventuels et le chanfrein.By a second level of masking, the knives (herringbone or blades), the possible polishing pads and the chamfer are defined.

Ainsi la figure 8 illustre une étape du deuxième niveau de masquage. On à représenté un fragment du substrat 50 avec ses skis 52 et ses rainures 53 ainsi que son chanfrein 51. On distingue aussi sur cette figure les lames 55 encore recouvertes d'une couche 60 de résine de masquage insolée. La gravure des couteaux peut se faire par une gravure ionique réactive sur une profondeur de 0,5 à 50 µm. Pour des profondeurs supérieures à 1 µm on utilise à nouveau un masque d'oxyde.Thus, FIG. 8 illustrates a step of the second masking level. There is shown a fragment of the substrate 50 with its skis 52 and its grooves 53 as well as its chamfer 51. Also shown in this figure are the blades 55 still covered with a layer 60 of exposed masking resin. The etching of the knives can be done by reactive ion etching to a depth of 0.5 to 50 µm. For depths greater than 1 µm, an oxide mask is again used.

Après avoir enlevé la résine de masquage, on procède à une opération consistant à durcir la couche superficielle de la face active.After removing the masking resin, an operation consists in hardening the surface layer of the active face.

L'épaisseur de cette couche superficielle peut être comprise entre 0,1 et 3 µm. On peut développer une couche d'oxyde de silicium par oxydation thermique ou la déposer par une méthode de dépôt en phase vapeur (CVD). On peut, à la place d'une couche d'oxyde, déposer du nitrure de silicium, du diamant, du carbone, du carbure de silicium, etc., par des méthodes connues de l'homme de l'art. La figure 9 illustre ce stade final du procédé. Sur le substrat en silicium 70, on à réalisé des micro-skis 72 séparés par des rainures 73, ainsi qu'un chanfrein 71. Sur les skis ont été formés des chevrons 74. La couche dure superficielle est représentée sous la référence 79.The thickness of this surface layer can be between 0.1 and 3 µm. A layer of silicon oxide can be developed by thermal oxidation or deposited by a vapor deposition (CVD) method. It is possible, instead of an oxide layer, to deposit silicon nitride, diamond, carbon, silicon carbide, etc., by methods known to those skilled in the art. Figure 9 illustrates this final stage of the process. On the silicon substrate 70, micro-skis 72 have been produced separated by grooves 73, as well as a chamfer 71. Herringbones 74 have been formed on the skis. The hard surface layer is shown under the reference 79.

Il est préférable que les skis soient alignés dans une direction parallèle au déplacement du disque par rapport à la tête mais on peut aussi envisager que les skis soient inclinés par rapport à cette direction.It is preferable that the skis are aligned in a direction parallel to the movement of the disc relative to the head, but it can also be envisaged that the skis are inclined relative to this direction.

Claims (7)

1 - Tête de brunissage pour disques durs dont une face dite face active est destinée à brunir la surface des disques, caractérisée en ce que ladite face active comporte une série de micro-skis (12, 22, 32, 42, 52, 72), disposés de préférence dans une direction parallèle au déplacement du disque par rapport à la tête de brunissage, les micro-skis étant séparés les uns des autres par des rainures (13, 23, 33, 43, 53, 73), les micro-skis étant également équipés de couteaux sur leur face destinée à se trouver en vis-à-vis de la surface des disques à brunir.1 - Burnishing head for hard disks, one face of which is known as the active face, is intended to brown the surface of the discs, characterized in that the said active face comprises a series of micro-skis (12, 22, 32, 42, 52, 72) , preferably arranged in a direction parallel to the movement of the disc relative to the burnishing head, the micro-skis being separated from each other by grooves (13, 23, 33, 43, 53, 73), the micro- skis also being equipped with knives on their face intended to be opposite the surface of the discs to be browned. 2 - Tête de brunissage selon la revendication 1, caractérisée en ce que l'avant de la tête est pourvu d'un chanfrein (11, 21, 31, 41, 51, 71) situé du côté de la face active.2 - burnishing head according to claim 1, characterized in that the front of the head is provided with a chamfer (11, 21, 31, 41, 51, 71) located on the side of the active face. 3 - Tête de brunissage selon l'une des revendications 1 ou 2, caractérisée en ce que les couteaux ont la forme de chevrons (14, 24, 34, 44, 74).3 - burnishing head according to one of claims 1 or 2, characterized in that the knives have the shape of chevrons (14, 24, 34, 44, 74). 4 - Tête de brunissage selon l'une des revendications 1 ou 2, caractérisée en ce que les couteaux ont la forme de lames (15, 25, 35, 45, 55) inclinées par rapport à la direction des micro-skis.4 - Burnishing head according to one of claims 1 or 2, characterized in that the knives have the form of blades (15, 25, 35, 45, 55) inclined relative to the direction of the micro-skis. 5 - Tête de brunissage selon l'une quelconque des revendications 1 à 4, caractérisée en ce que les micro-skis sont également équipés de plots de brunissage (16).5 - Burnishing head according to any one of claims 1 to 4, characterized in that the micro-skis are also equipped with burnishing pads (16). 6 - Tête de brunissage selon l'une quelconque des revendications 1 à 5, caractérisée en ce que la face active de la tête possède au moins un évidement (27, 37, 47).6 - burnishing head according to any one of claims 1 to 5, characterized in that the active face of the head has at least one recess (27, 37, 47). 7 - Procédé de fabrication d'une tête de brunissage selon l'une quelconque des revendications précédentes, caractérisé en ce qu'il comprend les étapes suivantes :
- formation d'une couche superficielle d'oxyde (58) sur une face d'un substrat en silicium (50, 70),
- gravure de ladite face du substrat pour former les micro-skis (52, 72), les rainures (53, 73) et le chanfrein (51, 71),
- retrait de la couche d'oxyde superficielle (58),
- gravure des couteaux (55, 74) et éventuellement de plots de brunissage sur les micro-skis,
- formation d'une couche dure superficielle (79) sur la face active.7 - A method of manufacturing a burnishing head according to any one of the preceding claims, characterized in that it comprises the following steps:
- formation of a surface oxide layer (58) on one face of a silicon substrate (50, 70),
- etching of said face of the substrate to form the micro-skis (52, 72), the grooves (53, 73) and the chamfer (51, 71),
- removal of the surface oxide layer (58),
- engraving of the knives (55, 74) and possibly of burnishing pads on the micro-skis,
- Formation of a hard surface layer (79) on the active face.
EP90403137A 1989-11-10 1990-11-06 Burnishing head for hard-discs and method for manufacturing the same Withdrawn EP0427612A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8914775A FR2654543A1 (en) 1989-11-10 1989-11-10 BROWNING HEAD FOR HARD DISK AND MANUFACTURING METHOD THEREOF.
FR8914775 1989-11-10

Publications (1)

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EP0427612A1 true EP0427612A1 (en) 1991-05-15

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EP (1) EP0427612A1 (en)
JP (1) JPH03165318A (en)
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6497021B2 (en) 1999-01-14 2002-12-24 International Business Machines Corporation Method and apparatus for providing a low cost contact burnish slider
US7164557B2 (en) 2004-02-23 2007-01-16 Hitachi Global Storage Technologies Netherlands Bv Apparatus for burnishing small asperities and cleaning loose particles from magnetic recording media

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2464797A1 (en) * 1979-09-14 1981-03-20 Siemens Ag DEVICE FOR POLISHING DISK SURFACES FOR DISK MEMORIES
EP0083753A2 (en) * 1982-01-11 1983-07-20 International Business Machines Corporation Apparatus and method for burnishing magnetic disks
US4711115A (en) * 1985-12-30 1987-12-08 Aluminum Company Of America Method for forming memory discs by forging
US4845816A (en) * 1986-07-18 1989-07-11 Xebec Corporation Burnishing head for memory disk drive

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2464797A1 (en) * 1979-09-14 1981-03-20 Siemens Ag DEVICE FOR POLISHING DISK SURFACES FOR DISK MEMORIES
EP0083753A2 (en) * 1982-01-11 1983-07-20 International Business Machines Corporation Apparatus and method for burnishing magnetic disks
US4711115A (en) * 1985-12-30 1987-12-08 Aluminum Company Of America Method for forming memory discs by forging
US4845816A (en) * 1986-07-18 1989-07-11 Xebec Corporation Burnishing head for memory disk drive

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IBM TECHNICAL DISCLOSURE BULLETIN. vol. 17, no. 10, 01 mars 1975, NEW YORK US page 3010 W.G. HOPKINS ET AL.: "SLIDER MOUNTED BURNISHING TOOL" *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6497021B2 (en) 1999-01-14 2002-12-24 International Business Machines Corporation Method and apparatus for providing a low cost contact burnish slider
US7164557B2 (en) 2004-02-23 2007-01-16 Hitachi Global Storage Technologies Netherlands Bv Apparatus for burnishing small asperities and cleaning loose particles from magnetic recording media

Also Published As

Publication number Publication date
FR2654543A1 (en) 1991-05-17
JPH03165318A (en) 1991-07-17

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