EP0365988B1 - Developing solvent for layers which are crosslinkable by photopolymerization, and process for the production of relief printing forms - Google Patents
Developing solvent for layers which are crosslinkable by photopolymerization, and process for the production of relief printing forms Download PDFInfo
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- EP0365988B1 EP0365988B1 EP89119314A EP89119314A EP0365988B1 EP 0365988 B1 EP0365988 B1 EP 0365988B1 EP 89119314 A EP89119314 A EP 89119314A EP 89119314 A EP89119314 A EP 89119314A EP 0365988 B1 EP0365988 B1 EP 0365988B1
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- EP
- European Patent Office
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- layers
- photopolymerization
- layer
- development
- relief printing
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Definitions
- the invention relates to a process for the production of relief printing plates crosslinked by photopolymerization, in which the layers that can be crosslinked by photopolymerization are exposed imagewise and the uncrosslinked portions of the layers are washed out with the developing solvent.
- the photopolymer layer is exposed imagewise with actinic light; the formation of the relief is then made possible by washing out the unexposed and thus non-crosslinked portions of the layer with the development solvent.
- the task of the development solvent is to dissolve the non-crosslinked portions of the layer as quickly as possible, but on the other hand the solvent must be as easy to remove from the crosslinked portions of the plate so that the plate is quickly dry.
- DE-A 36 00 116 describes higher-boiling development solvents which contain, as essential constituents, branched, mono- or tri-olefinically unsaturated cyclic or saturated or mono- to tri-olefinically unsaturated cyclic aliphatic hydrocarbons, alcohols or ketones.
- Monoterpenes are mentioned in particular.
- the limonene used in the example has good development properties, but is sensitive to oxygen and irritating to the skin, properties that a development solvent should not have. Another disadvantage is that limonene only allows a very slow development and is difficult to remove from the layer.
- the development of plates containing nitrile rubbers is not possible within a reasonable time.
- aromatic compounds of the general formula I in which the sum of the carbon atoms of the substituents is 3 to 5, provided that R 1 and R 2 are not closed to form a cycloaliphatic or cycloaromatic ring. In this case the sum of the carbon atoms of the remaining R is zero, i. H. R3 and R4 mean H.
- Ring systems which can be formed by bridging the radicals R 1 and R 2 include indane, indene, naphthalene and tetralin. However, the C-9 ring systems indane and indene are preferred.
- this number is preferably generated by three methyl groups, a methyl group and an ethyl group or a propyl group.
- this number is replaced by four methyl groups, a methyl group and a propyl group, two ethyl groups, two methyl groups and an ethyl group or a butyl group.
- aromatic compounds are particularly preferred: Iso-propylbenzene, n-propylbenzene, 1-methyl-3-ethylbenzene, 1,3,5-trimethylbenzene, 1-methyl-2-ethylbenzene, 1,2,4-trimethylbenzene, isobutylbenzene, sec-butylbenzene, 1,2, 3-trimethylbenzene, 1-methyl-4-isopropylbenzene, indane, indene, 1,3-diethylbenzene, 1-methyl-4-propylbenzene, n-butylbenzene; 1-methyl-3-propylbenzene, 1,2,4,5-tetramethylbenzene, dimethylethylbenzene, methylindane, n-pentylbenzene.
- the developing solvent can contain aromatic compounds of the general formula I both individually and as a mixture of various aromatic compounds which come under the general formula I.
- the developing solvent used in the process according to the invention contains 55 to 100% by weight, in particular 55 to 90% by weight, of aromatic compounds of the general formula I.
- the developing solvent can contain other solvents as additives, especially if the polymer layer still contains a polyamide Contains protective layer.
- alcohols in particular higher-boiling alcohols, are preferred as additional solvents.
- the main constituents of the layers which can be crosslinked by means of photopolymerization and are to be developed with the development solvent essentially comprise a binder based on an elastomeric polymer, a photopolymerizable monomer which is compatible with the binder and a photoinitiator.
- the layers can also contain several different other binders, monomers or photoinitiators.
- the layers can contain dyes, pigments, antihalation agents, antioxidants, plasticizers, antiozonants, crosslinking agents, regulators, fillers, fluxes and other agents which improve the effectiveness of the layer.
- Those layers which can be crosslinked by photopolymerization and which contain polymers of conjugated aliphatic dienes, their binders, are particularly preferred Have monomer units containing 4 to 5 carbon atoms.
- nitrile rubbers according to EP-A 064 564, random styrene / butadiene, - / isoprene, and - / isoprene / butadiene copolymers or block polymers of styrene monomers and butadiene and / or isoprene with a styrene content of 10 to 50% by weight %.
- Elastomers of this type are described in DE-B 22 15 090, DE-A 24 56 439, DE-A 29 42 183 and DE-A 21 38 582.
- the layers which can be crosslinked by photopolymerization generally contain 20 to 95, preferably 30 to 95% by weight of binder.
- Suitable monomers with one or more polymerizable olefinic double bonds are in particular esters and amides of acrylic and methacrylic acid.
- Examples are the compatible mono- and diacrylates and methacrylates of mono- or polyhydric alcohols, such as ethylene glycol, di-, tri-, tetra- or polyethylene glycols, the latter preferably with 10 to 15 ethylene glycol units, 1,3-propanediol, 1,6- Hexanediol, dodecanediol, glycerin, 1,1,1-trimethylolpropane, 1,2,4-butanetriol or pentaerythritol, e.g. B.
- the amount of monomers in the layer is generally from 1 to 70, preferably from 2 to 50,% by weight of the nonvolatile constituents of the mixture.
- Suitable photoinitiators are the known compounds, which have sufficient thermal stability when processing the recording materials and sufficient radical formation when exposed to initiate the polymerization of the monomers. They are said to absorb light in the wavelength range from approx. 250 to 500 nm with the formation of radicals.
- suitable photoinitiators are acyloins and their derivatives such as benzoin, benzoin alkyl ethers, e.g. B. benzoin isopropyl ether, vicinal diketones and their derivatives, e.g. B.
- benzil benzil acetals such as benzil dimethyl ketal, fluorenones, thioxanthones, polynuclear quinones, acridines and quinoxalines; further trichloromethyl-s-triazines, 2-halomethyl-4-vinyl-1,3,4-oxadiazole derivatives, halogen oxazoles substituted with trichloromethyl groups, carbonylmethylene heterocycles containing trihalomethyl groups according to DE-A 33 33 450, acylphosphine oxide compounds as described, for. B.
- the photoinitiators can also be used in combination with one another or with coinitiators or activators, e.g. B. with Michler's ketone and its derivatives or 2-alkyl-anthraquinones.
- the amount of photoinitiator is generally 0.01 to 10, preferably 0.5 to 5% by weight of the layer.
- the mixtures which can be crosslinked by photopolymerization can be formed into layers with a thickness of 0.02 to 10, preferably 0.2 to 6 mm, by casting from solution or extrusion and calendering.
- the layer can be laminated to the surface of a suitable carrier or a solution of the mixture can be applied to a layer carrier.
- Suitable carriers are depending on the intended use, e.g. B. polyester films, steel or aluminum sheets, copper cylinders, screen printing stencil supports, foam layers, rubber-elastic supports or printed circuit boards. It may also be advantageous to have a cover or protective layer, e.g. B. a thin layer of polyvinyl alcohol or polyamide, or a peelable cover sheet, e.g. B. from polyethylene terephthalate. A pre-coating can also be used of the carrier may be advantageous.
- the additional layer between the support and the photosensitive layer may e.g. B. be effective as an antihalation layer or as an adhesive layer.
- the layers which can be crosslinked by photopolymerization are exposed imagewise with actinic light from light sources such as mercury vapor lamps or fluorescent tubes, the emitted wavelength being 230 to 450 nm, preferably between 300 and 420 nm.
- the unexposed and uncrosslinked layer portions are removed by spraying, washing or brushing with the development solvent according to the invention.
- the developed relief molds are expediently dried at temperatures of up to 120 ° C. and, if necessary, post-exposed to actinic light simultaneously or thereafter.
- the relief forms cross-linked by photopolymerization are particularly suitable for the production of printing forms, in particular letterpress and relief printing forms, which are particularly suitable for flexographic printing.
- a commercially available flexographic printing plate based on a three-block polymer made of styrene-isoprene-styrene as an elastomer (®Cyrel HL) with a layer thickness of 2.8 mm was first exposed over the entire surface for 76 s using a commercially available tube exposer and then imagewise through an applied negative original Exposed for 12 min from the front.
- the plate exposed in this way was then developed in a commercial, brushed processor with a mixture of aromatic hydrocarbons according to the general formula I of the composition listed below and a proportion of 15% by weight of butanol.
- the time to develop for optimal results was 5 min.
- the flexographic printing plate was then dried at 60 ° C. for 2 hours and stored at room temperature for 15 hours. After the usual aftertreatment with an aqueous bromine solution, a flexographic printing plate of excellent quality was obtained.
- Composition of the mixture of aromatic hydrocarbons 2.7% mixture of n-propyl and iso-propylbenzene, 21.5% mixture of various isomeric methylethylbenzenes, 50.6% mixture of various isomeric trimethylbenzenes, 2.6% indan, 4.1% mixture of various isomeric dimethyl ethylbenzenes, 2.5% butylbenzene and 17% mixture of different alkylbenzenes with 9 to 11 carbon atoms.
- Example 1 a commercially available flexographic printing plate was exposed. The exposed plate was then developed in a commercial processor with the mixture of aromatic hydrocarbons from Example 1, but together with 15% by weight of 2-ethyl-butanol- (1). The time to develop for best results was 5 minutes. The flexographic printing plate was then post-treated as in Example 1. The result was a flexographic printing plate of excellent quality.
- Example 2 A commercially available flexographic printing plate as in Example 1 was rubbed evenly into 50 ml of 1,3,5-trimethyltoluene for 5 minutes after removing the cover layer (plate size 18 ⁇ 3 cm). After drying and storage according to Example 1, a residual layer thickness of 1.28 mm was obtained.
- the remaining layer thickness - in combination with the time available for development - is a measure of the development speed.
- Example 3 The procedure was the same as in Example 3, with the exception that 4-isopropyltoluene was used as the developing solvent. The remaining layer thickness was 1.27 mm.
- Example 3 The procedure of Example 3 was repeated, with the exception that a mixture of aliphatic-substituted aromatics, as described in Example 1, was used as the developing solvent. The residual layer thickness determined was 0.88 mm.
- Example 5 The procedure was as in Example 5, with the exception that the solvent mixture from Example 2 was used. The remaining layer thickness was 0.4 mm.
- Example 3 a flexographic printing plate was exposed and developed, this time using limonene as the developing solvent. A residual layer thickness of 1.53 mm could be determined.
- a flexographic printing plate according to Example 1 was exposed over the full area from the rear for 76 s and then exposed for 8 min using a negative original from the front. After removing the cover layer, the plate (30 mm in diameter) was placed in 50 ml of mesitylene (1,3,5-trimethyltoluene) for 5 minutes. The plate was then wiped off, dried at 60 ° C. for 2 hours and stored for 17 hours. A weight gain of the layer of 1.97% could be determined.
- Table 1 shows viscosity values, which were determined in the Ubbelohde viscometer at 25 ° C., for solids contents of 5, 7.5 and 10% by weight. While the development solvents according to the invention have a viscosity at a solids content of 7.5% by weight, which enables a very rapid development speed, the viscosity of perchlorethylene becomes so high even at a solids content of 5% by weight in the development solvent that a rapid development is no longer guaranteed.
- a commercially available flexographic printing plate (®Cyrel LP) was treated as indicated in Example 13. However, limonene was used as the developing solvent. The plate could not be developed.
- a commercially available flexographic printing plate was treated as in Example 13. However, perchlorethylene was used as the developing solvent together with 15% by weight of n-butanol. The residual layer thickness was 1.21 mm after a development time of 15 minutes.
Description
Die Erfindung betrifft ein Verfahren zur Herstellung von durch Photopolymerisation vernetzten Reliefdruckplatten, bei dem man die durch Photopolymerisation vernetzbaren Schichten bildmäßig belichtet und die unvernetzten Anteile der Schichten mit dem Entwicklungslösemittel auswäscht.The invention relates to a process for the production of relief printing plates crosslinked by photopolymerization, in which the layers that can be crosslinked by photopolymerization are exposed imagewise and the uncrosslinked portions of the layers are washed out with the developing solvent.
Die Herstellung von Reliefformen, insbesondere von Flexodruckplatten, durch bildmäßiges Belichten und anschließendes Entwickeln und Auswaschen von durch Photopolymerisation vernetzbaren Schichten ist seit langem bekannt.The production of relief shapes, in particular flexographic printing plates, by imagewise exposure and subsequent development and washing out of layers which can be crosslinked by photopolymerization has been known for a long time.
Zur Herstellung solcher Formen wird die Photopolymerschicht bildmäßig mit aktinischem Licht belichtet; die Ausbildung des Reliefs wird anschließend durch Auswaschen der nicht belichteten und damit nicht vernetzten Anteile der Schicht mit dem Entwicklungslösemittel ermöglicht. Aufgabe des Entwicklungslösemittels ist es, die nicht vernetzten Anteile der Schicht möglichst schnell zu lösen, wobei das Lösemittel andererseits aber von den vernetzten Anteilen der Platte möglichst leicht zu entfernen sein muß, damit die Platte schnell trocken ist.To produce such shapes, the photopolymer layer is exposed imagewise with actinic light; the formation of the relief is then made possible by washing out the unexposed and thus non-crosslinked portions of the layer with the development solvent. The task of the development solvent is to dissolve the non-crosslinked portions of the layer as quickly as possible, but on the other hand the solvent must be as easy to remove from the crosslinked portions of the plate so that the plate is quickly dry.
Eingesetzt werden daher heute zumeist Entwicklungslösemittel mit niedrigem Siedepunkt.Therefore, development solvents with a low boiling point are mostly used today.
In der DE-A 22 15 090 werden z. B. Methylethylketon, Benzol, Toluol, Xylol, Tetrachlorkohlenstoff, Trichlorethan, Trichlorethylen, Methylchloroform und Tetrachlorethan sowie deren Gemische als geeignete Lösemittel beschrieben. Nachteilig bei den genannten chlorierten Kohlenwasserstoffen sind Toxizität und Entsorgungsprobleme. Werden chlorierte Kohlenwasserstoffe als Entwicklungslösemittel verwendet, quellen die zu entfernenden Bereiche schon auf der Platte sehr stark, und die steigende Konzentration der im Entwicklungslösemittel gelösten Bestandteile der nicht vernetzten Anteile der Schicht führt zu einer starken Viskositätszunahme des Lösemittels. Dies hat zur Folge, daß die Kapazität des Entwicklungslösemittels sehr beschränkt ist und schon bei einer 5%igen Beladung das Lösemittel unbrauchbar wird. Eine weitere Folge der starken Viskositätszunahme ist, daß die Platten auch schon bei einer Beladung von weniger als 5 % sehr langsam zu entwickeln sind. Außerdem ist die Entwicklung von Platten, die Nitrilkautschuke als Elastomere enthalten, sehr langsam.In DE-A 22 15 090 z. As methyl ethyl ketone, benzene, toluene, xylene, carbon tetrachloride, trichloroethane, trichlorethylene, methyl chloroform and tetrachloroethane and mixtures thereof are described as suitable solvents. A disadvantage of the chlorinated hydrocarbons mentioned is toxicity and disposal problems. If chlorinated hydrocarbons are used as development solvents, the areas to be removed swell very strongly on the plate, and the increasing concentration of the components of the non-crosslinked portions of the layer dissolved in the development solvent leads to a strong increase in the viscosity of the solvent. As a result, the capacity of the developing solvent is very limited and the solvent becomes unusable even with a 5% load. Another consequence of the strong increase in viscosity is that the plates can be developed very slowly even with a load of less than 5%. In addition, the development of plates containing nitrile rubbers as elastomers is very slow.
Von den in der DE-A 22 15 090 genannten nicht chlorierten Kohlenwasserstoffen sind Benzol, Toluol und Xylol zu nennen. Diese Lösemittel weisen als nachteilig auf, daß sie leicht brennbar sind und außerdem zu einer starken Quellung der Schicht und folglich nur zu einer langsamen Entwicklung und Trocknung der Platte führen.Of the non-chlorinated hydrocarbons mentioned in DE-A 22 15 090, benzene, toluene and xylene may be mentioned. These solvents have the disadvantage that they are easily flammable and also lead to a strong swelling of the layer and consequently only to a slow development and drying of the plate.
Wegen ihres niedrigen Flammpunktes ist zudem ihr Einsatz in nicht explosionsgeschützten Entwicklungsgeräten nicht möglich.Because of their low flash point, they cannot be used in non-explosion-proof development devices.
In der DE-A 36 00 116 werden höhersiedende Entwicklungslösemittel beschrieben, die als wesentliche Bestandteile verzweigte, einfach oder dreifach olefinisch ungesättigte cyclische oder gesättigte oder einfach bis dreifach olefinisch ungesättigte cyclische aliphatische Kohlenwasserstoffe, Alkohole oder Ketone enthalten. Insbesondere werden Monoterpene genannt. Das im Beispiel verwendete Limonen besitzt zwar gute Entwicklungseigenschaften, ist aber sauerstoffempfindlich und hautreizend, Eigenschaften, die ein Entwicklungslösemittel nicht aufweisen sollte. Ein weiterer Nachteil ist, daß Limonen nur eine sehr langsame Entwicklung erlaubt und schwer aus der Schicht zu entfernen ist. Außerdem ist eine Entwicklung von Platten, die Nitrilkautschuke enthalten, nicht innerhalb vernünftiger Zeit möglich.DE-A 36 00 116 describes higher-boiling development solvents which contain, as essential constituents, branched, mono- or tri-olefinically unsaturated cyclic or saturated or mono- to tri-olefinically unsaturated cyclic aliphatic hydrocarbons, alcohols or ketones. Monoterpenes are mentioned in particular. The limonene used in the example has good development properties, but is sensitive to oxygen and irritating to the skin, properties that a development solvent should not have. Another disadvantage is that limonene only allows a very slow development and is difficult to remove from the layer. In addition, the development of plates containing nitrile rubbers is not possible within a reasonable time.
Aufgabe war es daher, ein Verfahren zum Entwickeln von Photopolymerschichten mit einem Entwicklungslösemittel bereitzustellen, bei dem das Lösemittel
- nicht toxisch ist,
- einen hohen Flammpunkt besitzt,
- möglichst vollständig und schnell aus der Schicht entfernbar ist, ohne die Schicht zu quellen,
- sowie eine möglichst geringe Viskositätszunahme bei Aufnahme von Bestandteilen der Schicht aufweist, die es ermöglicht, trotz geforderter hoher Kapazität, schnell und einwandfrei entwickeln zu können,
- Platten, die Nitrilkautschuke als Elastomere enthalten, schnell entwickelt.
- is not toxic,
- has a high flash point,
- can be removed from the layer as completely and quickly as possible without swelling the layer,
- and has the lowest possible increase in viscosity when absorbing components of the layer, which enables development to be carried out quickly and flawlessly despite the high capacity required,
- Sheets that contain nitrile rubbers as elastomers are quickly developed.
Die Lösung der Aufgabe wird durch ein Verfahren der eingangs beschriebenen Gattung erreicht das dadurch gekennzeichnet ist, daß das Entwicklungslösemittel als wesentlichen Bestandteil eine aromatische Verbindung der allgemeinen Formel I
enthält, worin
- R¹ bis R⁴
- gleich oder verschieden sein können und H, (C₁-C₅)n- oder iso-Alkyl bedeuten, wobei R¹ und R², sofern sie direkt benachbart sind, auch einen cycloaliphatischen oder aromatischen Ring mit 5 oder 6 Ring-C-Atomen ausbilden können, die bevorzugt nicht substituiert sind,
contains what
- R¹ to R⁴
- may be the same or different and denote H, (C₁-C₅) n- or iso-alkyl, where R¹ and R², if they are directly adjacent, can also form a cycloaliphatic or aromatic ring with 5 or 6 ring C atoms, which are preferably not substituted,
Besonders bevorzugt sind aromatische Verbindungen der allgemeinen Formel I, in denen die Zahl der Kohlenstoffatome 9 bis 11 (insbesondere 9 oder 10) beträgt.Aromatic compounds of the general formula I in which the number of carbon atoms is 9 to 11 (in particular 9 or 10) are particularly preferred.
Ebenso bevorzugt sind diejenigen aromatischen Verbindungen der allgemeinen Formel I, in denen die Summe der Kohlenstoffatome der Substituenten 3 bis 5 beträgt, sofern R¹ und R² nicht zu einem cycloaliphatischen oder cycloaromatischen Ring geschlossen sind. In diesem Fall ist die Summe der Kohlenstoffatome der übrigen Reste R gleich Null, d. h. R³ und R⁴ bedeuten H.Also preferred are those aromatic compounds of the general formula I in which the sum of the carbon atoms of the substituents is 3 to 5, provided that R 1 and R 2 are not closed to form a cycloaliphatic or cycloaromatic ring. In this case the sum of the carbon atoms of the remaining R is zero, i. H. R³ and R⁴ mean H.
Als Ringsysteme, die durch Verbrückung der Reste R¹ und R² gebildet werden können, sind Indan, Inden, Naphthalin und Tetralin zu nennen. Bevorzugt sind aber die C-9-Ringsysteme Indan und Inden.Ring systems which can be formed by bridging the radicals R 1 and R 2 include indane, indene, naphthalene and tetralin. However, the C-9 ring systems indane and indene are preferred.
Ist die Summe der Kohlenstoffatome in den Substituenten gleich 5, so wird diese Zahl 5 bevorzugt durch einen einzigen Pentylrest erreicht (z. B. R¹ = Pentyl), während R² bis R⁴ H bedeuten.If the sum of the carbon atoms in the substituents is 5, this number 5 is preferably achieved by a single pentyl radical (for example R¹ = pentyl), while R² to R⁴ are H.
Ist die Summe der Kohlenstoffatome in den Substituenten gleich 3, so wird diese Zahl bevorzugt durch drei Methylgruppen, eine Methylgruppe und eine Ethylgruppe oder eine Propylgruppe erzeugt.If the sum of the carbon atoms in the substituents is 3, this number is preferably generated by three methyl groups, a methyl group and an ethyl group or a propyl group.
Ist die Summe der Kohlenstoffatome in den Substituenten gleich 4, so wird diese Zahl durch vier Methylgruppen, eine Methylgruppe und eine Propylgruppe, zwei Ethylgruppen, zwei Methylgruppen und eine Ethylgruppe oder eine Butylgruppe gebildet.If the sum of the carbon atoms in the substituents is 4, this number is replaced by four methyl groups, a methyl group and a propyl group, two ethyl groups, two methyl groups and an ethyl group or a butyl group.
Insbesondere bevorzugt sind folgende aromatische Verbindungen:
Iso-propylbenzol, n-Propylbenzol, 1-Methyl-3-ethylbenzol, 1,3,5-Trimethylbenzol, 1-Methyl-2-ethylbenzol, 1,2,4-Trimethylbenzol, Isobutylbenzol, sec-Butylbenzol, 1,2,3-Trimethylbenzol, 1-Methyl-4-isopropylbenzol, Indan, Inden, 1,3-Diethylbenzol, 1-Methyl-4-propylbenzol, n-Butylbenzol; 1-Methyl-3-propylbenzol, 1,2,4,5-Tetramethylbenzol, Dimethylethylbenzol, Methylindan, n-Pentylbenzol.The following aromatic compounds are particularly preferred:
Iso-propylbenzene, n-propylbenzene, 1-methyl-3-ethylbenzene, 1,3,5-trimethylbenzene, 1-methyl-2-ethylbenzene, 1,2,4-trimethylbenzene, isobutylbenzene, sec-butylbenzene, 1,2, 3-trimethylbenzene, 1-methyl-4-isopropylbenzene, indane, indene, 1,3-diethylbenzene, 1-methyl-4-propylbenzene, n-butylbenzene; 1-methyl-3-propylbenzene, 1,2,4,5-tetramethylbenzene, dimethylethylbenzene, methylindane, n-pentylbenzene.
Das Entwicklungslösemittel kann aromatische Verbindungen der allgemeinen Formel I sowohl einzeln als auch als Gemisch verschiedener aromatischer Verbindungen, die unter die allgemeine Formel I fallen, enthalten.The developing solvent can contain aromatic compounds of the general formula I both individually and as a mixture of various aromatic compounds which come under the general formula I.
Das in dem erfindungsgemäßen Verfahren verwendete Entwicklungslösemittel enthält 55 bis 100 % Gew.-%, insbesondere 55 bis 90 Gew.-%., aromatische Verbindungen der allgemeinen Formel I.The developing solvent used in the process according to the invention contains 55 to 100% by weight, in particular 55 to 90% by weight, of aromatic compounds of the general formula I.
Neben den Verbindungen der allgemeinen Formel I kann das Entwicklungslösemittel andere Losemittel als Zusätze enthalten, insbesondere dann, wenn die Polymerschicht noch eine polyamidhaltige Schutzschicht enthält. In diesem Fall werden als zusätzliche Lösemittel Alkohole, insbesondere höhersiedende Alkohole, bevorzugt.In addition to the compounds of the general formula I, the developing solvent can contain other solvents as additives, especially if the polymer layer still contains a polyamide Contains protective layer. In this case, alcohols, in particular higher-boiling alcohols, are preferred as additional solvents.
Die mit dem Entwicklungslösemittel zu entwickelnden, durch Photopolymerisation vernetzbaren Schichten enthalten als Hauptbestandteile im wesentlichen ein Bindemittel auf der Basis eines elastomeren Polymeren, ein mit dem Bindemittel verträgliches photopolymerisierbares Monomeres und einen Photoinitiator. Die Schichten können auch mehrere verschiedene andere Bindemittel, Monomere oder Photoinitiatoren enthalten.The main constituents of the layers which can be crosslinked by means of photopolymerization and are to be developed with the development solvent essentially comprise a binder based on an elastomeric polymer, a photopolymerizable monomer which is compatible with the binder and a photoinitiator. The layers can also contain several different other binders, monomers or photoinitiators.
Als Zusätze können die Schichten Farbstoffe, Pigmente, Lichthofschutzmittel, Antioxidantien, Weichmacher, Antiozonantien, Vernetzungsmittel, Regler, Füllmittel, Flußmittel und andere Mittel, die die Schicht in ihrer Wirkungsweise verbessern, enthalten.As additives, the layers can contain dyes, pigments, antihalation agents, antioxidants, plasticizers, antiozonants, crosslinking agents, regulators, fillers, fluxes and other agents which improve the effectiveness of the layer.
Weitere Hilfsmittel, die der beschriebenen Schicht zugesetzt werden können, sind z. B. Inhibitoren der thermischen Polymerisation wie Hydrochinon und seine Derivate, 2,6-Di-tert.-butyl-p-kresol, Nitrophenole, Nitrosamine wie N-Nitrosodiphenylamin oder Salze des N-Nitrosocyclohexylhydroxylamins, z. B. dessen Alkali- oder Aluminiumsalze.Other tools that can be added to the layer described are e.g. B. Thermal polymerization inhibitors such as hydroquinone and its derivatives, 2,6-di-tert-butyl-p-cresol, nitrophenols, nitrosamines such as N-nitrosodiphenylamine or salts of N-nitrosocyclohexylhydroxylamine, e.g. B. its alkali or aluminum salts.
Besonders bevorzugt sind solche durch Photopolymerisation vernetzbare Schichten, die als Bindemittel Polymerisate von konjugierten aliphatischen Dienen, deren Monomerbausteine 4 bis 5 Kohlenstoffatome aufweisen, enthalten. Insbesondere sind hierbei zu nennen Naturkautschuk, Homopolymerisate von Butadien und Isopren, Copolymerisate von Butadien und Isopren, Copolymerisate von Butadien und/oder Isopren mit anderen Monomeren, wie Styrol, Vinyltoluol, Acrylnitril oder (Meth)Acrylsäurealkylester, z. B. Nitrilkautschuke nach der EP-A 064 564, statistische Styrol/Butadien-, -/Isopren-, und -/Isopren/Butadien-Copolymerisate oder Blockpolymerisate aus Styrolmonomeren und Butadien und/oder Isopren mit einem Styrolgehalt von 10 bis 50 Gew.-%. Elastomere dieser Art werden in den DE-B 22 15 090, DE-A 24 56 439, DE-A 29 42 183 und DE-A 21 38 582 beschrieben.Those layers which can be crosslinked by photopolymerization and which contain polymers of conjugated aliphatic dienes, their binders, are particularly preferred Have monomer units containing 4 to 5 carbon atoms. In particular, natural rubber, homopolymers of butadiene and isoprene, copolymers of butadiene and isoprene, copolymers of butadiene and / or isoprene with other monomers, such as styrene, vinyltoluene, acrylonitrile or (meth) acrylic acid alkyl esters, for. B. nitrile rubbers according to EP-A 064 564, random styrene / butadiene, - / isoprene, and - / isoprene / butadiene copolymers or block polymers of styrene monomers and butadiene and / or isoprene with a styrene content of 10 to 50% by weight %. Elastomers of this type are described in DE-B 22 15 090, DE-A 24 56 439, DE-A 29 42 183 and DE-A 21 38 582.
Die durch Photopolymerisation vernetzbaren Schichten enthalten im allgemeinen 20 bis 95, vorzugsweise 30 bis 95 Gew.-% Bindemittel.The layers which can be crosslinked by photopolymerization generally contain 20 to 95, preferably 30 to 95% by weight of binder.
Geeignete Monomere mit einer oder mehreren polymerisierbaren olefinischen Doppelbindungen sind insbesondere Ester und Amide von Acryl- und Methacrylsäure. Beispiele sind die verträglichen Mono- und Diacrylate sowie -methacrylate von ein- oder mehrwertigen Alkoholen, wie Ethylenglykol, Di-, Tri-, Tetra- oder Polyethylenglykolen, letztere bevorzugt mit 10 bis 15 Ethylenglykoleinheiten, 1,3-Propandiol, 1,6-Hexandiol, Dodecandiol, Glycerin, 1,1,1-Trimethylolpropan, 1,2,4-Butantriol oder Pentaerythrit, z. B. Ethylenglykol-monomethacrylat, 1,3-Propandiol-monomethacrylat, Hexandioldiacrylat, Hexandioldimethacrylat, 2-Ethylhexylacrylat, Laurylmethacrylat, Stearylmethacrylat, Glycerinmono- oder -diacrylat, 1,2,4-Butantriolmonomethacrylat, Pentaerythrittriacrylat, Polyethylenglykolmethyletheracrylat, Tetradecaethylenglykoldimethacrylat oder der Triether aus Glycerin und 3 mol N-Methylolacrylamid oder -methacrylamid. Die Menge an Monomeren in der Schicht liegt im allgemeinen bei 1 bis 70, bevorzugt bei 2 bis 50 Gew.-% der nichtflüchtigen Bestandteile des Gemisches.Suitable monomers with one or more polymerizable olefinic double bonds are in particular esters and amides of acrylic and methacrylic acid. Examples are the compatible mono- and diacrylates and methacrylates of mono- or polyhydric alcohols, such as ethylene glycol, di-, tri-, tetra- or polyethylene glycols, the latter preferably with 10 to 15 ethylene glycol units, 1,3-propanediol, 1,6- Hexanediol, dodecanediol, glycerin, 1,1,1-trimethylolpropane, 1,2,4-butanetriol or pentaerythritol, e.g. B. ethylene glycol monomethacrylate, 1,3-propanediol monomethacrylate, hexanediol diacrylate, hexanediol dimethacrylate, 2-ethylhexyl acrylate, lauryl methacrylate, stearyl methacrylate, glycerol mono- or diacrylate, 1,2,4-butanetriol monomethacrylate, Pentaerythritol triacrylate, polyethylene glycol methyl ether acrylate, tetradecaethylene glycol dimethacrylate or the triether of glycerol and 3 mol N-methylolacrylamide or methacrylamide. The amount of monomers in the layer is generally from 1 to 70, preferably from 2 to 50,% by weight of the nonvolatile constituents of the mixture.
Als Photoinitiatoren kommen die bekannten Verbindungen in Frage, die eine hinreichende thermische Stabilität bei der Verarbeitung der Aufzeichnungsmaterialien sowie eine hinreichende Radikalbildung bei Belichtung unter Initiierung der Polymerisation der Monomeren aufweisen. Sie sollen Licht im Wellenlängenbereich von ca. 250 bis 500 nm unter Bildung von Radikalen absorbieren. Beispiele geeigneter Photoinitiatoren sind Acyloine und deren Derivate wie Benzoin, Benzoinalkylether, z. B. Benzoinisopropylether, vicinale Diketone und deren Derivative, z. B. Benzil, Benzilacetale wie Benzildimethylketal, Fluorenone, Thioxanthone, Mehrkernchinone, Acridine und Chinoxaline; ferner Trichlormethyl-s-triazine, 2-Halogenmethyl-4-vinyl-1,3,4-oxadiazolderivate, mit Trichlormethylgruppen substituierte Halogenoxazole, Trihalogenmethylgruppen enthaltende Carbonylmethylenheterocyclen gemäß DE-A 33 33 450, Acylphosphinoxidverbindungen, wie sie z. B. in der DE-A 31 33 419 beschrieben sind, und andere phosphorhaltige Photoinitiatoren, z.B. die in der deutschen Patentanmeldung P 38 27 735.2 beschriebenen 6-Acyl-(6H)-dibenz-[c,e][1,2]-oxaphosphorin-6-oxide, insbesondere das 6-(2,4,6-Trimethylbenzoyl)-(6H)dibenz-[c,e][1,2]-oxaphosphorin-6-oxid.Suitable photoinitiators are the known compounds, which have sufficient thermal stability when processing the recording materials and sufficient radical formation when exposed to initiate the polymerization of the monomers. They are said to absorb light in the wavelength range from approx. 250 to 500 nm with the formation of radicals. Examples of suitable photoinitiators are acyloins and their derivatives such as benzoin, benzoin alkyl ethers, e.g. B. benzoin isopropyl ether, vicinal diketones and their derivatives, e.g. B. benzil, benzil acetals such as benzil dimethyl ketal, fluorenones, thioxanthones, polynuclear quinones, acridines and quinoxalines; further trichloromethyl-s-triazines, 2-halomethyl-4-vinyl-1,3,4-oxadiazole derivatives, halogen oxazoles substituted with trichloromethyl groups, carbonylmethylene heterocycles containing trihalomethyl groups according to DE-A 33 33 450, acylphosphine oxide compounds as described, for. B. are described in DE-A 31 33 419, and other phosphorus-containing photoinitiators, for example the 6-acyl- (6H) -dibenz- [c, e] [1,2] - described in German patent application P 38 27 735.2 oxaphosphorin-6-oxide, especially the 6- (2,4,6-trimethylbenzoyl) - (6H) dibenz- [c, e] [1,2] -oxaphosphorin-6-oxide.
Die Photoinitiatoren lassen sich auch in Kombination miteinander oder mit Coinitiatoren bzw. Aktivatoren verwenden, z. B. mit Michlers Keton und seinen Derivaten oder 2-Alkyl-anthrachinonen. Die Menge an Photoinitiator beträgt im allgemeinen 0,01 bis 10, bevorzugt 0,5 bis 5 Gew.-% der Schicht.The photoinitiators can also be used in combination with one another or with coinitiators or activators, e.g. B. with Michler's ketone and its derivatives or 2-alkyl-anthraquinones. The amount of photoinitiator is generally 0.01 to 10, preferably 0.5 to 5% by weight of the layer.
Die durch Photopolymerisation vernetzbaren Gemische lassen sich für die Herstellung von Relief- und Flexodruckplatten durch Gießen aus Lösung oder Extrudieren und Kalandrieren zu Schichten einer Dicke von 0,02 bis 10, vorzugsweise von 0,2 bis 6 mm, ausformen. Die Schicht kann auf die Oberfläche eines geeigneten Trägers laminiert oder es kann eine Lösung des Gemisches auf einen Schichtträger aufgebracht werden.For the production of relief and flexographic printing plates, the mixtures which can be crosslinked by photopolymerization can be formed into layers with a thickness of 0.02 to 10, preferably 0.2 to 6 mm, by casting from solution or extrusion and calendering. The layer can be laminated to the surface of a suitable carrier or a solution of the mixture can be applied to a layer carrier.
Außer für die Herstellung von Reliefdruckplatten werden die genannten Schichten auch z. B. zur Herstellung von Flachdruckplatten, Tiefdruckzylindern, Siebdruckschablonen und Photoresists verwendet.In addition to the production of relief printing plates, the layers mentioned are also used for. B. used for the production of planographic printing plates, gravure cylinders, screen printing stencils and photoresists.
Geeignete Träger sind je nach Verwendungszweck, z. B. Polyesterfolien, Stahl- oder Aluminiumbleche, Kupferzylinder, Siebdruckschablonenträger, Schaumstofflagen, gummielastische Träger oder Leiterplatten. Es kann auch vorteilhaft sein, auf die lichtempfindliche Aufzeichnungsschicht eine Deck- bzw. Schutzschicht, z. B. eine dünne Schicht aus Polyvinylalkohol oder Polyamid, oder eine abziehbare Deckfolie, z. B. aus Polyethylenterephthalat, aufzubringen. Weiterhin kann eine Vorbeschichtung des Trägers vorteilhaft sein. Die zusätzliche Schicht zwischen dem Träger und der lichtempfindlichen Schicht kann z. B. als Lichthofschutzschicht oder als Haftschicht wirksam sein.Suitable carriers are depending on the intended use, e.g. B. polyester films, steel or aluminum sheets, copper cylinders, screen printing stencil supports, foam layers, rubber-elastic supports or printed circuit boards. It may also be advantageous to have a cover or protective layer, e.g. B. a thin layer of polyvinyl alcohol or polyamide, or a peelable cover sheet, e.g. B. from polyethylene terephthalate. A pre-coating can also be used of the carrier may be advantageous. The additional layer between the support and the photosensitive layer may e.g. B. be effective as an antihalation layer or as an adhesive layer.
Die durch Photopolymerisation vernetzbaren Schichten werden bildmäßig mit aktinischem Licht aus Lichtquellen wie Quecksilberdampflampen oder Leuchtstoffröhren belichtet, wobei die emittierte Wellenlänge bei 230 bis 450 nm, bevorzugt zwischen 300 und 420 nm liegt. Das Entfernen der unbelichteten und unvernetzten Schichtanteile erfolgt mit dem erfindungsgemäßen Entwicklungslösemittel durch Sprühen, Waschen oder Bürsten. Zweckmäßig werden die entwickelten Reliefformen bei Temperaturen bis 120 °C getrocknet und gegebenenfalls gleichzeitig oder danach mit aktinischem Licht nachbelichtet.The layers which can be crosslinked by photopolymerization are exposed imagewise with actinic light from light sources such as mercury vapor lamps or fluorescent tubes, the emitted wavelength being 230 to 450 nm, preferably between 300 and 420 nm. The unexposed and uncrosslinked layer portions are removed by spraying, washing or brushing with the development solvent according to the invention. The developed relief molds are expediently dried at temperatures of up to 120 ° C. and, if necessary, post-exposed to actinic light simultaneously or thereafter.
Die durch Photopolymerisation vernetzten Reliefformen eignen sich besonders zur Herstellung von Druckformen, vor allem Hoch- und Reliefdruckformen, die besonders für den Flexodruck geeignet sind.The relief forms cross-linked by photopolymerization are particularly suitable for the production of printing forms, in particular letterpress and relief printing forms, which are particularly suitable for flexographic printing.
Die Erfindung wird durch die nachstehenden Beispiele erläutert.The invention is illustrated by the examples below.
Eine handelsübliche Flexodruckplatte auf der Basis eines Dreiblockpolymerisats aus Styrol-Isopren-Styrol als Elastomeres (®Cyrel HL) mit einer Schichtdicke von 2,8 mm wurde zunächst von der Rückseite her mit einem handelsüblichen Röhrenbelichter vollflächig 76 s belichtet und anschließend durch eine aufgelegte Negativvorlage bildmäßig 12 min von der Vorderseite belichtet. Die in dieser Weise belichtete Platte wurde dann in einem handelsüblichen, mit Bürsten versehenen Entwicklungsgerät mit einem Gemisch aus aromatischen Kohlenwasserstoffen nach der allgemeinen Formel I der unten aufgeführten Zusammensetzung und einem Anteil von 15 Gew.-% Butanol entwickelt. Die Zeit, in der entwickelt wurde, um optimale Ergebnisse zu erreichen, betrug 5 min.A commercially available flexographic printing plate based on a three-block polymer made of styrene-isoprene-styrene as an elastomer (®Cyrel HL) with a layer thickness of 2.8 mm was first exposed over the entire surface for 76 s using a commercially available tube exposer and then imagewise through an applied negative original Exposed for 12 min from the front. The plate exposed in this way was then developed in a commercial, brushed processor with a mixture of aromatic hydrocarbons according to the general formula I of the composition listed below and a proportion of 15% by weight of butanol. The time to develop for optimal results was 5 min.
Anschließend wurde die Flexodruckform 2 h bei 60 °C getrocknet und 15 h bei Raumtemperatur gelagert. Nach üblicher Nachbehandlung mit einer wäßrigen Bromlösung ergab sich eine Flexodruckplatte von ausgezeichneter Qualität.The flexographic printing plate was then dried at 60 ° C. for 2 hours and stored at room temperature for 15 hours. After the usual aftertreatment with an aqueous bromine solution, a flexographic printing plate of excellent quality was obtained.
Zusammensetzung des Gemisches aromatischer Kohlenwasserstoffe:
2,7 % Gemisch von n-Propyl- und iso-Propylbenzol,
21,5 % Gemisch von verschiedenen isomeren Methylethylbenzolen,
50,6 % Gemisch von verschiedenen isomeren Trimethylbenzolen,
2,6 % Indan,
4,1 % Gemisch von verschiedenen isomeren Dimethyl-ethylbenzolen,
2,5 % Butylbenzol und
17 % Gemisch verschiedener Alkylbenzole mit 9 bis 11 Kohlenstoffatomen.Composition of the mixture of aromatic hydrocarbons:
2.7% mixture of n-propyl and iso-propylbenzene,
21.5% mixture of various isomeric methylethylbenzenes,
50.6% mixture of various isomeric trimethylbenzenes,
2.6% indan,
4.1% mixture of various isomeric dimethyl ethylbenzenes,
2.5% butylbenzene and
17% mixture of different alkylbenzenes with 9 to 11 carbon atoms.
Gemäß Beispiel 1 wurde eine handelsübliche Flexodruckplatte belichtet. Die belichtete Platte wurde dann in einem handelsüblichen Entwicklungsgerät mit dem Gemisch aus aromatischen Kohlenwasserstoffen aus Beispiel 1, allerdings zusammen mit 15 Gew.-% 2-Ethyl-butanol-(1) entwickelt. Die Zeit, in der entwickelt wurde, um optimale Ergebnisse zu erzielen, betrug 5 min. Anschließend wurde die Flexodruckform wie in Beispiel 1 nachbehandelt. Es ergab sich eine Flexodruckplatte von ausgezeichneter Qualität.According to Example 1, a commercially available flexographic printing plate was exposed. The exposed plate was then developed in a commercial processor with the mixture of aromatic hydrocarbons from Example 1, but together with 15% by weight of 2-ethyl-butanol- (1). The time to develop for best results was 5 minutes. The flexographic printing plate was then post-treated as in Example 1. The result was a flexographic printing plate of excellent quality.
Eine handelsübliche Flexodruckplatte wie aus Beispiel 1 wurde nach Abziehen der Deckschicht (Plattengröße 18x3 cm) 5 min mit einer Bürste gleichmäßig in 50 ml 1,3,5-Trimethyltoluol gerieben. Nach dem Trocknen und der Lagerung gemäß Beispiel 1 wurde eine Restschichtdicke von 1,28 mm erhalten.A commercially available flexographic printing plate as in Example 1 was rubbed evenly into 50 ml of 1,3,5-trimethyltoluene for 5 minutes after removing the cover layer (plate size 18 × 3 cm). After drying and storage according to Example 1, a residual layer thickness of 1.28 mm was obtained.
Die Restschichtdicke ist - in Kombination mit der Zeit, die für die Entwicklung zur Verfügung stand - ein Maß für die Entwicklungsgeschwindigkeit. Je geringer die Restschichtdicke der ursprünglich 2,8 mm dicken Schicht ist, um so größer ist die Entwicklungsgeschwindigkeit des angewendeten Lösemittels.The remaining layer thickness - in combination with the time available for development - is a measure of the development speed. The lower the The remaining layer thickness of the originally 2.8 mm thick layer is, the greater the development speed of the solvent used.
Es wurde entsprechend Beispiel 3 vorgegangen, mit der Ausnahme, daß als Entwicklungslösemittel 4-Isopropyltoluol benutzt wurde. Die Restschichtdicke betrug 1,27 mm.The procedure was the same as in Example 3, with the exception that 4-isopropyltoluene was used as the developing solvent. The remaining layer thickness was 1.27 mm.
Entsprechend Beispiel 3 wurde verfahren, mit der Ausnahme, daß als Entwicklungslösemittel ein Gemisch aus aliphatisch-substituierten Aromaten, wie in Beispiel 1 beschrieben, verwendet wurde. Die ermittelte Restschichtdicke betrug 0,88 mm.The procedure of Example 3 was repeated, with the exception that a mixture of aliphatic-substituted aromatics, as described in Example 1, was used as the developing solvent. The residual layer thickness determined was 0.88 mm.
Es wurde wie in Beispiel 5 verfahren, mit der Ausnahme, daß das Lösemittelgemisch aus Beispiel 2 benutzt wurde. Die Restschichtdicke betrug 0,4 mm.The procedure was as in Example 5, with the exception that the solvent mixture from Example 2 was used. The remaining layer thickness was 0.4 mm.
Entsprechend Beispiel 3 wurde eine Flexodruckplatte belichtet und entwickelt, diesmal mit Limonen als Entwicklungslösemittel. Es konnte eine Restschichtdicke von 1,53 mm ermittelt werden.In accordance with Example 3, a flexographic printing plate was exposed and developed, this time using limonene as the developing solvent. A residual layer thickness of 1.53 mm could be determined.
Eine Flexodruckplatte gemäß Beispiel 1 wurde 76 s von der Rückseite vollflächig belichtet und anschließend durch Verwendung einer Negativvorlage von der Vorderseite 8 min belichtet. Nach Entfernen der Deckschicht wurde die Platte (30 mm Durchmesser) 5 min in 50 ml Mesitylen (1,3,5-Trimethyltoluol) gelegt. Anschließend wurde die Platte abgewischt, 2 h bei 60 °C getrocknet und 17 h gelagert. Es konnte eine Gewichtszunahme der Schicht von 1,97 % bestimmt werden.A flexographic printing plate according to Example 1 was exposed over the full area from the rear for 76 s and then exposed for 8 min using a negative original from the front. After removing the cover layer, the plate (30 mm in diameter) was placed in 50 ml of mesitylene (1,3,5-trimethyltoluene) for 5 minutes. The plate was then wiped off, dried at 60 ° C. for 2 hours and stored for 17 hours. A weight gain of the layer of 1.97% could be determined.
Es wurde wie in Beispiel 8 angegeben vorgegangen, mit der Ausnahme, daß als Entwicklungslösemittel Tetralin verwendet wurde. Die Gewichtszunahme betrug in diesem Fall 3,59 %.The procedure was as in Example 8, except that tetralin was used as the developing solvent. The weight gain in this case was 3.59%.
Es wurde wie in Beispiel 8 beschrieben vorgegangen, mit der Ausnahme, daß als Entwicklungslösemittel das Lösemittelgemisch aus Beispiel 1 benutzt wurde. Die Gewichtszunahme betrug 2,7 %.The procedure was as described in Example 8, with the exception that the solvent mixture from Example 1 was used as the developing solvent. The weight gain was 2.7%.
Es wurde wie in Beispiel 8 beschrieben vorgegangen, mit der Maßgabe, daß als Entwicklungslösemittel Perchlorethylen eingesetzt wurde. Die Gewichtszunahme der Schicht nach Entwicklung und Trocknung betrug 4,3 %.The procedure was as described in Example 8, with the proviso that perchlorethylene was used as the developing solvent. The weight gain of the layer after development and drying was 4.3%.
Zur Ermittlung des Aufnahmevermögens (Kapazität) von Entwicklungslösemitteln an den Bestandteilen aus nicht vernetzten Bereichen einer Flexodruckplatte (®Cyrel HL) wurde die Viskosität verschiedener Entwicklungslösemittel bei unterschiedlichen Festostoffgehalten von Bestandteilen aus der Schicht nach der Entwicklung einer Platte, enthaltend als Elastomer ein Dreiblockcopolymer aus Styrol-Isopren-Styrol, bestimmt.To determine the absorption capacity (capacity) of developing solvents on the components from non-crosslinked areas of a flexographic printing plate (®Cyrel HL), the viscosity of various developing solvents was used in the case of different solids contents of constituents from the layer after the development of a plate containing a three-block copolymer of styrene-isoprene-styrene as the elastomer.
Tabelle 1 zeigt Viskositätswerte, die in dem Ubbelohde-Viskosimeter bei 25 °C bestimmt wurden, für Feststoffgehalte von 5, 7,5 und 10 Gew.-%. Während die erfindungsgemäßen Entwicklungslösemittel bei einem Fest-stoffgehalt von 7,5 Gew.-% eine viskosität aufweisen, die eine sehr rasche Entwicklungsgeschwindigkeit ermöglicht, wird die Viskosität von Perchlorethylen schon bei einem Feststoffgehalt im Entwicklungslösemittel von 5 Gew.-% derart hoch, daß eine rasche Entwicklung nicht mehr gewährleistet ist.
Eine handelsübliche Flexodruckplatte (®Cyrel LP) auf der Basis von Nitrilkautschuk, die für den Druck mit Benzinfarben geeignet ist, wurde wie in Beispiel 6 angegeben 15 min behandelt. Die Restschichtdicke betrug 0,6 mm.A commercially available flexographic printing plate (®Cyrel LP) based on nitrile rubber, which is suitable for printing with petrol inks, was treated as indicated in Example 6 for 15 minutes. The remaining layer thickness was 0.6 mm.
Eine handelsübliche Flexodruckplatte (®Cyrel LP) wurde wie in Beispiel 13 angegeben behandelt. Als Entwicklungslösemittel wurde jedoch Limonen verwendet. Die Platte konnte nicht entwickelt werden.A commercially available flexographic printing plate (®Cyrel LP) was treated as indicated in Example 13. However, limonene was used as the developing solvent. The plate could not be developed.
Eine handelsübliche Flexodruckplatte wurde wie in Beispiel 13 behandelt. Als Entwicklungslösemittel wurde jedoch Perchlorethylen zusammen mit 15 Gew.-% n-Butanol benutzt. Die Restschichtdicke betrug nach 15 min Entwicklungszeit 1,21 mm.A commercially available flexographic printing plate was treated as in Example 13. However, perchlorethylene was used as the developing solvent together with 15% by weight of n-butanol. The residual layer thickness was 1.21 mm after a development time of 15 minutes.
Claims (4)
- Process for preparation of relief printing plates crosslinked by photopolymerization, wherein the layers crosslinkable by photopolymerization are exposed imagewise and the parts of the layers which are not crosslinked are washed out with the developer solvent, characterized in that the developer solvent contains as essential part an aromatic compound of the general formula IR1 through R4 are equal or different and mean H, (C1-C5)n- or iso-alkyl, and wherein R1 and R2, when being immediate neighbors, can also form a cycloaliphatic or aromatic ring having 5 or 6 carbon atoms, which are preferentially unsubstituted,
with the proviso that the sum of the carbon atoms of the substituents and of the members of the ring is 9 to 13. - Process according to claim 1, characterized in that the developer solvent contains 55 to 100 percent by weight, preferentially 55 to 90 percent by weight, of an aromatic compound of the general formula I.
- Process according to claim 1 or 2, characterized in that the developer solvent contains in addition a higher boiling alcohol.
- Process according to claim 1, 2 or 3, characterized in that the relief printing plate after wash-out is dried at temperatures up to 120 °C and is optionally exposed to actinic light either simultaneously or thereafter.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE3836403A DE3836403A1 (en) | 1988-10-26 | 1988-10-26 | DEVELOPMENT SOLVENT FOR PHOTOPOLYMERIZATION-CROSSLINKABLE LAYERS AND METHOD FOR THE PRODUCTION OF RELIEF FORMS |
DE3836403 | 1988-10-26 |
Publications (3)
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EP0365988A2 EP0365988A2 (en) | 1990-05-02 |
EP0365988A3 EP0365988A3 (en) | 1990-12-12 |
EP0365988B1 true EP0365988B1 (en) | 1994-06-15 |
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EP89119314A Expired - Lifetime EP0365988B1 (en) | 1988-10-26 | 1989-10-18 | Developing solvent for layers which are crosslinkable by photopolymerization, and process for the production of relief printing forms |
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US (1) | US5516623A (en) |
EP (1) | EP0365988B1 (en) |
JP (1) | JP2929546B2 (en) |
AU (1) | AU614674B2 (en) |
CA (1) | CA2001490C (en) |
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US5252432A (en) * | 1990-06-27 | 1993-10-12 | Basf Aktiengesellschaft | Production of photopolymeric flexographic relief printing plates |
DE4020374A1 (en) * | 1990-06-27 | 1992-01-02 | Basf Ag | METHOD FOR PRODUCING PHOTOPOLYMER FLEXOGRAPHIC RELIEF PRINTING PLATES |
DE4022221A1 (en) * | 1990-07-12 | 1992-01-23 | Basf Magnetics Gmbh | MAGNETIC BAND WITH ABRASIVES |
JP3095273B2 (en) * | 1991-11-12 | 2000-10-03 | 東京応化工業株式会社 | Developer for flexographic printing plates |
DE69704969T2 (en) * | 1996-02-20 | 2002-04-04 | Asahi Chemical Ind | Process for the production of a photosensitive plastic printing plate |
US6280519B1 (en) | 1998-05-05 | 2001-08-28 | Exxon Chemical Patents Inc. | Environmentally preferred fluids and fluid blends |
US6818049B1 (en) | 1998-05-05 | 2004-11-16 | Exxonmobil Chemical Patents Inc. | Environmentally preferred fluids and fluid blends |
US8349185B2 (en) | 2010-10-20 | 2013-01-08 | E I Du Pont De Nemours And Company | Method for rebalancing a multicomponent solvent solution |
US8530142B2 (en) | 2011-03-15 | 2013-09-10 | Eastman Kodak Company | Flexographic printing plate precursor, imaging assembly, and use |
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US3656951A (en) * | 1970-03-02 | 1972-04-18 | Monsanto Co | Photoresist compositions |
FR2163896A5 (en) * | 1971-12-06 | 1973-07-27 | Eastman Kodak Co | Stripping non hardened zones - of exposed photopolymerised layer using high bp solvents eg ethyl adipate |
DE2454399C2 (en) * | 1974-11-16 | 1981-09-24 | Merck Patent Gmbh, 6100 Darmstadt | Release agents for photoresists |
FR2455076A1 (en) * | 1979-04-24 | 1980-11-21 | Rhone Poulenc Ind | Photoresist removing compsn. - comprises tetra:hydro:naphthalene and/or cyclohexanone, and organic acid |
SU866793A1 (en) * | 1979-12-21 | 1981-09-23 | Проектно-Технологический И Научно-Исследовательский Институт | Composition for removal of photoresist on the rubber base |
US4423135A (en) * | 1981-01-28 | 1983-12-27 | E. I. Du Pont De Nemours & Co. | Preparation of photosensitive block copolymer elements |
US4400460A (en) * | 1981-05-07 | 1983-08-23 | E. I. Du Pont De Nemours And Compamy | Process for surface treatment of flexographic printing plates containing butadiene/acrylonitrile copolymers |
US4400459A (en) * | 1981-05-07 | 1983-08-23 | E. I. Du Pont De Nemours And Company | Process for bromine surface treatment of photosensitive elastomeric flexographic printing plates |
JPS58137836A (en) * | 1982-02-10 | 1983-08-16 | Toshiba Corp | Processing agent for rubber resist |
JPS59137950A (en) * | 1983-01-27 | 1984-08-08 | Japan Synthetic Rubber Co Ltd | Formation of resist pattern |
DE3600116A1 (en) * | 1986-01-04 | 1987-07-09 | Basf Ag | METHOD FOR PRODUCING RELIEF FORMS NETWORKED BY PHOTOPOLYMERISATION |
JPH0717737B2 (en) * | 1987-11-30 | 1995-03-01 | 太陽インキ製造株式会社 | Photosensitive thermosetting resin composition and method for forming solder resist pattern |
US5312719A (en) * | 1988-10-26 | 1994-05-17 | E. I. Du Pont De Nemours And Company | Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms |
DE3908764C2 (en) * | 1989-03-17 | 1994-08-11 | Basf Ag | Developer for the production of photopolymerized flexographic relief printing plates |
DE3908763A1 (en) * | 1989-03-17 | 1990-09-27 | Basf Ag | LIGHT-SENSITIVE RECORDING ELEMENT WITH A RECORDING LAYER AND A COATING LAYER OF DIFFERENT SOLUBILITY PROPERTIES, AND METHOD FOR ITS DEVELOPMENT IN ONE WORKPROCESS |
-
1988
- 1988-10-26 DE DE3836403A patent/DE3836403A1/en not_active Withdrawn
-
1989
- 1989-10-18 EP EP89119314A patent/EP0365988B1/en not_active Expired - Lifetime
- 1989-10-18 DE DE58907886T patent/DE58907886D1/en not_active Expired - Lifetime
- 1989-10-18 ES ES89119314T patent/ES2056176T3/en not_active Expired - Lifetime
- 1989-10-25 CA CA002001490A patent/CA2001490C/en not_active Expired - Lifetime
- 1989-10-25 AU AU43749/89A patent/AU614674B2/en not_active Expired
- 1989-10-26 JP JP1279618A patent/JP2929546B2/en not_active Expired - Lifetime
-
1995
- 1995-02-23 US US08/392,673 patent/US5516623A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE58907886D1 (en) | 1994-07-21 |
JP2929546B2 (en) | 1999-08-03 |
AU614674B2 (en) | 1991-09-05 |
EP0365988A2 (en) | 1990-05-02 |
US5516623A (en) | 1996-05-14 |
ES2056176T3 (en) | 1994-10-01 |
DE3836403A1 (en) | 1990-05-03 |
JPH02179645A (en) | 1990-07-12 |
CA2001490A1 (en) | 1990-04-26 |
CA2001490C (en) | 2001-07-17 |
AU4374989A (en) | 1990-05-03 |
EP0365988A3 (en) | 1990-12-12 |
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