EP0273884A2 - Device and composition for liberating nitrogen gas during the manufacture of a cathode ray tube - Google Patents
Device and composition for liberating nitrogen gas during the manufacture of a cathode ray tube Download PDFInfo
- Publication number
- EP0273884A2 EP0273884A2 EP87830454A EP87830454A EP0273884A2 EP 0273884 A2 EP0273884 A2 EP 0273884A2 EP 87830454 A EP87830454 A EP 87830454A EP 87830454 A EP87830454 A EP 87830454A EP 0273884 A2 EP0273884 A2 EP 0273884A2
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title claims abstract description 70
- 239000000203 mixture Substances 0.000 title claims abstract description 36
- 229910001873 dinitrogen Inorganic materials 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title abstract description 6
- 239000002245 particle Substances 0.000 claims abstract description 29
- 238000009826 distribution Methods 0.000 claims abstract description 23
- 229910000727 Fe4N Inorganic materials 0.000 claims abstract description 19
- 239000002775 capsule Substances 0.000 claims abstract description 19
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 10
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 9
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 26
- 238000013270 controlled release Methods 0.000 claims description 7
- 230000003111 delayed effect Effects 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000011872 intimate mixture Substances 0.000 claims 2
- 239000000843 powder Substances 0.000 abstract description 5
- 239000007789 gas Substances 0.000 abstract description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 21
- 238000000034 method Methods 0.000 description 15
- 239000000463 material Substances 0.000 description 12
- 238000007789 sealing Methods 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 7
- 229910052788 barium Inorganic materials 0.000 description 5
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910016015 BaAl4 Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 230000036647 reaction Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000002311 subsequent effect Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
- H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
- H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
- H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
- H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
- H01J7/183—Composition or manufacture of getters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/94—Selection of substances for gas fillings; Means for obtaining or maintaining the desired pressure within the tube, e.g. by gettering
Definitions
- This invention relates to a device and composition of matter for the release of nitrogen during the manufacture of a cathode ray tube.
- a first disadvantage is that the nitrogen is released at an undesirable period of time relative to the evaporation of the barium.
- Another disadvantage is that the nitrogen is released exceedingly quickly and a nitrogen pressure is created within the CRT outside the range of pressures desired to effectively control the distribution and subsequent sorption capabilities of the barium film.
- Yet another disadvantage is the fact that the extremely rapid production of nitrogen creates a miniature explosion of the nitrogen releasing material thus producing large quantities of loose particles. These loose particles may enter the gun region of the cathode ray tube causing short circuits of the electrodes or the particles may find their way to the shadow mask and block passage of the image producing electron beams thus degrading picture quality.
- particulate Fe4N can have any particle size distribution which is capable of withstanding the frit process when in admixture with nickel powder and aluminium powder.
- the particulate Fe4N has a particle size distribution of: 10-50 percent by weight smaller than 5 ⁇ m 60-90 percent by weight smaller than 10 ⁇ m 83-98 percent by weight smaller than 15 ⁇ m 92-100 percent by weight smaller than 20 ⁇ m 97-100 percent by weight smaller than 30 ⁇ m
- the particulate Ni may have any particle size distribution which is capable of withstanding a frit seal process and preferably has a particle size distribution of: 0- 9 percent by weight smaller than 5 ⁇ m 7-28 percent by weight smaller than 10 ⁇ m 21-46 percent by weight smaller than 15 ⁇ m 35-56 percent by weight smaller than 20 ⁇ m 49-65 percent by weight smaller than 30 ⁇ m 58-75 percent by weight smaller than 40 ⁇ m 69-86 percent by weight smaller than 60 ⁇ m 78-93 percent by weight smaller than 80 ⁇ m at least 92 percent by weight smaller than 100 ⁇ m
- the particulate Al may have any particle size distribution which is capable of withstanding a frit seal process and preferably has a particle size distribution of: 4.5- 9 percent by weight smaller than 40 ⁇ m 7-16 percent by weight smaller than 60 ⁇ m 15-25 percent by weight smaller than 80 ⁇ m 20-45 percent by weight smaller than 100 ⁇ m 30-60 percent by weight smaller than 150 ⁇ m at least 95 percent by weight smaller than 250 ⁇ m
- the weight percentage of the components Fe4N, Ni and Al can vary over a wide range. It is preferable that the particulate Fe4N is present at a percentage of from 40 to 80%. At percentage compositions less than 40% there is insufficient Fe4N to create a suitable pressure within CRT whereas if the percentage is greater than 80% there is an insufficient Ni and Al to cause a sufficiently exothermic reaction to aid the release of N2.
- the Ni should be present in a weight percentage of from 20 to 40%. At a percentage weight less than 20% there is insufficient Ni for the exothermic reaction to aid release of N2 whereas if the percentage Ni is higher than 40% there is a risk of too much heat being produced with an excessive speed in the release of N2.
- the Al should be present in a weight percentage of from 5 to 20%. If the percentage weight of Al is less than 5% there is insufficient Al present to produce sufficient heat in the exothermic reaction to cause release of N2 from the Fe4N, whereas if more than 20% of Al is present then the exothermic reaction may take place too violently causing excessive speed in the release of N2.
- the nitrogen releasing composition comprises 60% Fe4N, 30% Ni and 10% Al.
- the ratio of Ni to Al can vary widely but general ly is chosen to produce the maximum amount of heat when the Ni is combined with the Al.
- the maximum amount of heat is generally produced within weight ratios of Ni to Al of 1 : 10 to 10 : 1.
- An ideal ratio of Ni to Al is about 3: 1.
- the ratio of Fe4N to the combined weight of Ni and Al is chosen to release substantially all the nitrogen from the Fe4N within a very short period of time generally less than five and preferably less than three seconds.
- the Fe4N is generally present in the composition within a weight ratio of 1 : 5 to 5 : 1 and preferably 1 : 2 to 2 :1 compared to the combined weight of Ni and Al.
- the composition is preferably adopted as a second source of nitrogen in a N2 doped getter, and is preferably contained within a holder such as a capsule.
- the capsule may be of any suitable material for holding the mixture for instance ceramic. Preferably it is of metal. Even more preferably it is of nichrome or stainless steel. Any suitably shaped holder may be used but it is preferably in the form of a hollow cylinder closed at one end.
- N2 releasing capsule for use in a so called “delayed nitrogen doped getter" will now be described with reference to Fig. 1 and Fig. 2 wherein 102 is a nitrogen gas releasing capsule comprising a holder 104 in the form of a cylinder 106 integrally closed at one end by means 108.
- the open end 110 is horizontally flared in the form of a flange 112.
- Flange 112 has present a series of pips for subsequent projection welding for support purposes 114, 114 ⁇ , 114 ⁇ .
- Fig. 2 illustrates the use of a nitrogen gas releasing capsule as a delayed nitrogen doped gas source or second gas source in a nitrogen doped getter.
- the evaporable getter device 202 comprises a ring shaped holder 204 supporting an evaporable getter metal vapour releasing material 206.
- Evaporable getter material generally comprises a barium aluminium alloy of composition approximately BaAl4 in admixture with approximately an equal weight of Ni powder.
- Fe4N as a first source of N2.
- This mixture is any mixture known in the art, see for example USA Patent No. 4.077.899 which is capable of withstanding the frit process.
- the evaporable getter device 202 further comprises a reflecting shield 208 which serves to hold a ceramic disk 210 to prevent a heated getter device from cracking the nearby glass wall of a cathode ray tube.
- a nitrogen gas releasing capsule 212 identical in all respects to capsule 102 shown in Fig. 1 is projection welded to the centre portion of reflecting shield 208.
- composition of matter for the release of nitrogen gas is meant to include both the composition prior to and after nitrogen gas release. This term embraces both the material in the solid form sold with the getter device and in the form in which it is found in an operating tube wherein the major part of the nitrogen has been evaporated from the composition and is chemically combined with the getter film on the inside surfaces of the tube.
- getter metal vapor releasing material as used in the specification and claims herein is meant to include both the material prior to and after getter metal vapor release. This term embraces both the material in the form sold with the getter device and in the form in which it is found in an operating tube wherein the bulk of the getter metal has been evaporated from the material and is in the form of a film on the inside surfaces of the tube.
- compositions of the present invention have the property od not releasing particles even after being heated in air at temperatures of 100 to 450°C for a period of two hours.
- a powder mixture is prepared comprising 60% by weight of Fe4N having a preferred particle size distribution as described above.
- the mixture further comprises 30% of powdered titanium having a particle size distribution of 2-20 percent by weight smaller than 10 ⁇ m 15-40,2 percent by weight smaller than 20 ⁇ m 30-70 percent by weight smaller than 30 ⁇ m 50-90 percent by weight smaller than 40 ⁇ m 80-92 percent by weight smaller than 50 ⁇ m at least 90% percent by weight smaller than 60 ⁇ m and 10% of particulate Al having a particle size distribution as described above.
- Example 2 This example was carried out under the same conditions as Example 1 with the sole exception that in the composition for release of nitrogen gas the titanium was substituted with nickel having the particle size distribution described in US Patent No. 4.077.899 where its use is disclosed to avoid excessive exothermic reactions.
- This distribution was as follow: 0% by weight smaller than 15 ⁇ m 0.1-0.2% by weight smaller than 20 ⁇ m 3-10% by weight smaller than 30 ⁇ m 22-60% by weight smaller than 40 ⁇ m 70-96% by weight smaller than 50 ⁇ m 86-99% by weight smaller than 55 ⁇ m 97-100% by weight smaller than 65 ⁇ m
- This Example is designed to show the behaviour of a composition of matter for the release of nitrogen gas of the present invention held in a capsule after having been subjected to a frit sealing process.
- a powder mixture is prepared having exactly the same weight composition and particle size ranges except that the Ni is replaced by Ni having a particle size distribution according to the preferred Ni distribution as described above.
- Getter capsules are exposed to air at exactly the same temperature and for exactly the same time as in Example 1. When the capsules are caused to release N2 in an evacuated system the N2 is found to be released in a controlled manner without the expulsion of any loose particles from the capsules.
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Battery Electrode And Active Subsutance (AREA)
Abstract
Description
- This invention relates to a device and composition of matter for the release of nitrogen during the manufacture of a cathode ray tube.
- The release of nitrogen during the manufacture of a cathode ray tube is well known in the art. See for example US Patent No. 3.973.816. It is often preferable to release the nitrogen in two stages. For instance US Patent No. 3.669.567 describes a getter device in which there is first a release of nitrogen before evaporation of barium based getter material and there is a second release of nitrogen during the latter part of barium evaporation.
- During the manufacture of a cathode ray tube it is customary to perform a sealing process in which a soft glass "frit" is used to join the face plane portion of tube to the conical portion. US Patent No. 4.052.641 describes a heating schedule in performing the frit seal process as follows:
- 25° to 100°C at 3.5°C per minute
- hold 100°C for 30 minutes
- 100°C to 410°C at 8°C per minute
- hold 410°C for 15 minutes
- cool to 25°C at 4°C per minute - It will be realized that different cathode ray tube manufactures use different frit sealing cycles but it will be realized from the aforesaid that temperatures of more than 400°C such as those up to 450°C may be involved for times of the order of 3 to 4 hours. Before the frit sealing process takes place there is very frequently positioned within the cathode ray tube a color selection mask or shadow mask. The shadow mask is often also used as a location for lthe getter device. However whatever the position of the getter device it will be appreciated that if the getter device is present during the frit sealing process it will also reach temperatures of more than about 400°C and be exposed to these temperatures for several hours. Unfortunately it has been found that with getter devices having a second source of nitrogen and subjected to the above conditions then, on subsequent flashing of the getter device the second source of nitrogen presents certain disadvantages. A first disadvantage is that the nitrogen is released at an undesirable period of time relative to the evaporation of the barium. Another disadvantage is that the nitrogen is released exceedingly quickly and a nitrogen pressure is created within the CRT outside the range of pressures desired to effectively control the distribution and subsequent sorption capabilities of the barium film. Yet another disadvantage is the fact that the extremely rapid production of nitrogen creates a miniature explosion of the nitrogen releasing material thus producing large quantities of loose particles. These loose particles may enter the gun region of the cathode ray tube causing short circuits of the electrodes or the particles may find their way to the shadow mask and block passage of the image producing electron beams thus degrading picture quality.
- It is therefore an object of the present invention to provide a means for the controlled release of nitrogen gas after having been subject to a frit sealing process conditions.
- It is another object of the present invention to provide a means for the controlled release of nitrogen without the creation of loose particles after having been subject to a frit sealing process.
- It is yet a further object of the present invention to provide a composition for the controlled release of nitrogen after having been subject to the conditions of a frit sealing process.
- It is another object of the present invention to provide a capsule containing a composition for the controlled release of nitrogen after having been subject to the conditions of a frit seal process.
- These and other objects and advantages of the present invention will become clear to those skilled in the art of reference to the following description and drawings wherein:
- Fig. 1 is a cross sectional view of a capsule containing nitrogen releasing material of the present invention; and
- Fig. 2 is a cross sectional view of a getter device utilizing a capsule containing nitrogen releasing material of the present invention.
- It has surprisingly been found that a mixture of particulate Fe₄N, particulate Ni and particulate Al are capable of providing the controlled release of nitrogen gas after having been subject to a frit sealing process consisting of heating in air at a temperature of up to about 400°C for a period of up to about 4 hours. The particulate Fe₄N can have any particle size distribution which is capable of withstanding the frit process when in admixture with nickel powder and aluminium powder. Preferably however the particulate Fe₄N has a particle size distribution of:
10-50 percent by weight smaller than 5µm
60-90 percent by weight smaller than 10µm
83-98 percent by weight smaller than 15µm
92-100 percent by weight smaller than 20µm
97-100 percent by weight smaller than 30µm - The particulate Ni may have any particle size distribution which is capable of withstanding a frit seal process and preferably has a particle size distribution of:
0- 9 percent by weight smaller than 5 µm
7-28 percent by weight smaller than 10µm
21-46 percent by weight smaller than 15µm
35-56 percent by weight smaller than 20µm
49-65 percent by weight smaller than 30µm
58-75 percent by weight smaller than 40µm
69-86 percent by weight smaller than 60 µm
78-93 percent by weight smaller than 80 µm
at least 92 percent by weight smaller than 100µm - The particulate Al may have any particle size distribution which is capable of withstanding a frit seal process and preferably has a particle size distribution of:
4.5- 9 percent by weight smaller than 40µm
7-16 percent by weight smaller than 60µm
15-25 percent by weight smaller than 80µm
20-45 percent by weight smaller than 100µm
30-60 percent by weight smaller than 150µm
at least 95 percent by weight smaller than 250µm - The weight percentage of the components Fe₄N, Ni and Al can vary over a wide range. It is preferable that the particulate Fe₄N is present at a percentage of from 40 to 80%. At percentage compositions less than 40% there is insufficient Fe₄N to create a suitable pressure within CRT whereas if the percentage is greater than 80% there is an insufficient Ni and Al to cause a sufficiently exothermic reaction to aid the release of N₂. The Ni should be present in a weight percentage of from 20 to 40%. At a percentage weight less than 20% there is insufficient Ni for the exothermic reaction to aid release of N₂ whereas if the percentage Ni is higher than 40% there is a risk of too much heat being produced with an excessive speed in the release of N₂. The Al should be present in a weight percentage of from 5 to 20%. If the percentage weight of Al is less than 5% there is insufficient Al present to produce sufficient heat in the exothermic reaction to cause release of N₂ from the Fe₄N, whereas if more than 20% of Al is present then the exothermic reaction may take place too violently causing excessive speed in the release of N₂. Preferably the nitrogen releasing composition comprises 60% Fe₄N, 30% Ni and 10% Al.
- In the broadest aspects of the present invention the ratio of Ni to Al can vary widely but general ly is chosen to produce the maximum amount of heat when the Ni is combined with the Al. The maximum amount of heat is generally produced within weight ratios of Ni to Al of 1 : 10 to 10 : 1. An ideal ratio of Ni to Al is about 3: 1.
- In the broadest aspects of the present invention the ratio of Fe₄N to the combined weight of Ni and Al is chosen to release substantially all the nitrogen from the Fe₄N within a very short period of time generally less than five and preferably less than three seconds. The Fe₄N is generally present in the composition within a weight ratio of 1 : 5 to 5 : 1 and preferably 1 : 2 to 2 :1 compared to the combined weight of Ni and Al.
- In use the composition is preferably adopted as a second source of nitrogen in a N₂ doped getter, and is preferably contained within a holder such as a capsule. The capsule may be of any suitable material for holding the mixture for instance ceramic. Preferably it is of metal. Even more preferably it is of nichrome or stainless steel. Any suitably shaped holder may be used but it is preferably in the form of a hollow cylinder closed at one end.
- Such a N₂ releasing capsule for use in a so called "delayed nitrogen doped getter" will now be described with reference to Fig. 1 and Fig. 2 wherein 102 is a nitrogen gas releasing capsule comprising a
holder 104 in the form of acylinder 106 integrally closed at one end bymeans 108. In this particular case theopen end 110 is horizontally flared in the form of aflange 112.Flange 112 has present a series of pips for subsequent projection welding forsupport purposes 114, 114ʹ, 114ʺ. - Fig. 2 illustrates the use of a nitrogen gas releasing capsule as a delayed nitrogen doped gas source or second gas source in a nitrogen doped getter. The
evaporable getter device 202 comprises a ring shapedholder 204 supporting an evaporable getter metalvapour releasing material 206. Evaporable getter material generally comprises a barium aluminium alloy of composition approximately BaAl₄ in admixture with approximately an equal weight of Ni powder. In addition there is usually incorporated a small amount of Fe₄N as a first source of N₂. This mixture is any mixture known in the art, see for example USA Patent No. 4.077.899 which is capable of withstanding the frit process. In this particular embodiment theevaporable getter device 202 further comprises a reflectingshield 208 which serves to hold aceramic disk 210 to prevent a heated getter device from cracking the nearby glass wall of a cathode ray tube. A nitrogengas releasing capsule 212 identical in all respects tocapsule 102 shown in Fig. 1 is projection welded to the centre portion of reflectingshield 208. - The term "composition of matter for the release of nitrogen gas" as used in the specification and claims herein is meant to include both the composition prior to and after nitrogen gas release. This term embraces both the material in the solid form sold with the getter device and in the form in which it is found in an operating tube wherein the major part of the nitrogen has been evaporated from the composition and is chemically combined with the getter film on the inside surfaces of the tube.
- Furthermore the term "getter metal vapor releasing material" as used in the specification and claims herein is meant to include both the material prior to and after getter metal vapor release. This term embraces both the material in the form sold with the getter device and in the form in which it is found in an operating tube wherein the bulk of the getter metal has been evaporated from the material and is in the form of a film on the inside surfaces of the tube.
- The compositions of the present invention have the property od not releasing particles even after being heated in air at temperatures of 100 to 450°C for a period of two hours.
- This example is designed to show the behaviour of a prior art composition of matter for the release of N₂ gas when held in a hollow cylinder of stainless steel after having been subjected to a frit sealing process in air. A powder mixture is prepared comprising 60% by weight of Fe₄N having a preferred particle size distribution as described above. The mixture further comprises 30% of powdered titanium having a particle size distribution of
2-20 percent by weight smaller than 10µm
15-40,2 percent by weight smaller than 20µm
30-70 percent by weight smaller than 30µm
50-90 percent by weight smaller than 40µm
80-92 percent by weight smaller than 50µm
at least 90% percent by weight smaller than 60µm
and 10% of particulate Al having a particle size distribution as described above. About 43 mg of the mixture is placed in a hollow cylinder and is subjected to 450°C for 2 hours in air. The cylinders are then placed in an evacuated system and heated to produce a release of N₂. A violent reaction occurs in which particles of the composition are ejected into the system. - This example was carried out under the same conditions as Example 1 with the sole exception that in the composition for release of nitrogen gas the titanium was substituted with nickel having the particle size distribution described in US Patent No. 4.077.899 where its use is disclosed to avoid excessive exothermic reactions. This distribution was as follow:
0% by weight smaller than 15µm
0.1-0.2% by weight smaller than 20µm
3-10% by weight smaller than 30µm
22-60% by weight smaller than 40µm
70-96% by weight smaller than 50µm
86-99% by weight smaller than 55µm
97-100% by weight smaller than 65µm - Also in this case a violent reaction takes place in which particles of the composition are ejected into the system.
- This Example is designed to show the behaviour of a composition of matter for the release of nitrogen gas of the present invention held in a capsule after having been subjected to a frit sealing process. A powder mixture is prepared having exactly the same weight composition and particle size ranges except that the Ni is replaced by Ni having a particle size distribution according to the preferred Ni distribution as described above. Getter capsules are exposed to air at exactly the same temperature and for exactly the same time as in Example 1. When the capsules are caused to release N₂ in an evacuated system the N₂ is found to be released in a controlled manner without the expulsion of any loose particles from the capsules.
- Although the invention has been described in considerable detail with reference to certain preferred embodiments and applications it is intended that variations and modifications can be made within the spirit and scope of the invention itself.
Claims (9)
0- 9 percent by weight smaller than 5µm
7-28 percent by weight smaller than 10µm
21-46 percent by weight smaller than 15µm
35-56 percent by weight smaller than 20µm
49-65 percent by weight smaller than 30µm
58-75 percent by weight smaller than 40µm
69-86 percent by weight smaller than 60µm
78-93 percent by weight smaller than 80µm
at least 92 percent by weight smaller than 100µm
10- 50 percent by weight smaller than 5µm
60- 90 percent by weight smaller than 10µm
83- 98 percent by weight smaller than 15µm
92-100 percent by weight smaller than 20µm
97-100 percent by weight smaller than 30µm
0- 9 percent by weight smaller than 5µm
7-28 percent by weight smaller than 10µm
21-46 percent by weight smaller than 15µm
35-56 percent by weight smaller than 20µm
49-65 percent by weight smaller than 30µm
58-75 percent by weight smaller than 40µm
69-86 percent by weight smaller than 60µm
78-93 percent by weight smaller than 80µm
at least 92 percent by weight smaller than 100µm
4,5- 9 percent by weight smaller than 40µm
7-16 percent by weight smaller than 60µm
15-25 percent by weight smaller than 80µm
20-45 percent by weight smaller than 100µm
30-60 percent by weight smaller than 150µm
at least 95 percent by weight smaller than 250µm
I. a holder; and
II. a mixture of
0- 9 percent by weight smaller than 5µm
7-28 percent by weight smaller than 10µm
21-46 percent by weight smaller than 15µm
35-56 percent by weight smaller than 20µm
49-65 percent by weight smaller than 30µm
58-75 percent by weight smaller than 40µm
69-86 percent by weight smaller than 60µm
78-93 percent by weight smaller than 80µm
at least 92 percent by weight smaller than 100µm
I. a hollow cylinder of stainless steel closed at one end; and
II. an intimate mixture of:
A. particulate Fe₄N having a particle size distribution of:
10- 50 percent by weight smaller than 5µm
60- 90 percent by weight smaller than 10µm
83- 98 percent by weight smaller than 15µm
92-100 percent by weight smaller than 20µm
97-100 percent by weight smaller than 30µm
B. particulate Ni having a particle size distribution of:
0- 9 percent by weight smaller than 5µm
7-28 percent by weight smaller than 10µm
21-46 percent by weight smaller than 15µm
35-56 percent by weight smaller than 20µm
49-65 percent by weight smaller than 30µm
58-75 percent by weight smaller than 40µm
69-86 percent by weight smaller than 60µm
78-93 percent by weight smaller than 80µm
at least 92 percent by weight smaller than 100µm
C. particulate Al having a particle size distribution of:
4,5- 9 percent by weight smaller than 40µm
7-16 percent by weight smaller than 60µm
15-25 percent by weight smaller than 80µm
20-45 percent by weight smaller than 100µm
30-60 percent by weight smaller than 150µm
at least 95 percent by weight smaller than 250µm
compressed within said cylinder, wherein
the weight ratio of B : C is 1 : 10 to 10 : 1; and
the weight ratio of A : (B+C) is 1 : 2 to 2 : 1
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT22808/86A IT1198229B (en) | 1986-12-22 | 1986-12-22 | DEVICE AND COMPOSITION FOR THE EMISSION OF NITROGEN GAS DURING THE PREPARATION OF A CATHODE TUBE |
IT2280886 | 1986-12-22 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0273884A2 true EP0273884A2 (en) | 1988-07-06 |
EP0273884A3 EP0273884A3 (en) | 1989-01-25 |
EP0273884B1 EP0273884B1 (en) | 1991-10-16 |
Family
ID=11200667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP87830454A Expired - Lifetime EP0273884B1 (en) | 1986-12-22 | 1987-12-21 | Device and composition for liberating nitrogen gas during the manufacture of a cathode ray tube |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0273884B1 (en) |
JP (1) | JPH0722005B2 (en) |
KR (1) | KR950001489B1 (en) |
DE (1) | DE3773877D1 (en) |
IT (1) | IT1198229B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2471740A (en) * | 2009-07-10 | 2011-01-12 | Beijing Synergy Vacuum Glazing Technology Co Ltd | An encapsulated getter |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3768884A (en) * | 1970-05-04 | 1973-10-30 | Getters Spa | Gettering |
GB2076586A (en) * | 1980-05-16 | 1981-12-02 | Philips Nv | Gas-releasing getter device for television display tubes |
-
1986
- 1986-12-22 IT IT22808/86A patent/IT1198229B/en active
-
1987
- 1987-12-21 JP JP62321624A patent/JPH0722005B2/en not_active Expired - Fee Related
- 1987-12-21 DE DE8787830454T patent/DE3773877D1/en not_active Expired - Fee Related
- 1987-12-21 EP EP87830454A patent/EP0273884B1/en not_active Expired - Lifetime
- 1987-12-22 KR KR1019870014731A patent/KR950001489B1/en not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3768884A (en) * | 1970-05-04 | 1973-10-30 | Getters Spa | Gettering |
GB2076586A (en) * | 1980-05-16 | 1981-12-02 | Philips Nv | Gas-releasing getter device for television display tubes |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2471740A (en) * | 2009-07-10 | 2011-01-12 | Beijing Synergy Vacuum Glazing Technology Co Ltd | An encapsulated getter |
GB2471740B (en) * | 2009-07-10 | 2011-08-17 | Beijing Synergy Vacuum Glazing Technology Co Ltd | An encapsulated getter arranged vacuum glazing |
Also Published As
Publication number | Publication date |
---|---|
KR950001489B1 (en) | 1995-02-25 |
KR880008375A (en) | 1988-08-31 |
IT8622808A0 (en) | 1986-12-22 |
JPH01173551A (en) | 1989-07-10 |
EP0273884A3 (en) | 1989-01-25 |
IT1198229B (en) | 1988-12-21 |
DE3773877D1 (en) | 1991-11-21 |
EP0273884B1 (en) | 1991-10-16 |
JPH0722005B2 (en) | 1995-03-08 |
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