EP0130907B1 - Method of producing multi-charged ions - Google Patents
Method of producing multi-charged ions Download PDFInfo
- Publication number
- EP0130907B1 EP0130907B1 EP19840401359 EP84401359A EP0130907B1 EP 0130907 B1 EP0130907 B1 EP 0130907B1 EP 19840401359 EP19840401359 EP 19840401359 EP 84401359 A EP84401359 A EP 84401359A EP 0130907 B1 EP0130907 B1 EP 0130907B1
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- European Patent Office
- Prior art keywords
- gas
- oxygen
- nitrogen
- enclosure
- neutral atoms
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
Definitions
- the present invention relates to a process for producing multi-charged ions.
- multicharged ions have been produced in ion sources, with electronic cyclotron resonance, of the “Micromafios” type for example, by introducing into the source enclosure only the gas consisting of neutral atoms intended to be ionized.
- the gas formed by neutral atoms is ionized in a microwave cavity, excited by a high frequency electromagnetic field on which is superimposed a magnetic field whose amplitude B satisfies the condition of electronic cyclotronic resonance: in which f is the frequency of the electromagnetic field, m the mass of the electron and e its charge.
- Such an ion source can be used in short pulse mode to in particular equip certain particle accelerators, of the synchrotron type for example, which require only an ion current pulse with a duration of the order of a few tens. of microseconds in an interval of the order of one second.
- the intensity of the multicharged ion currents which can be extracted from these sources is insufficient for certain applications, and in particular in the biomedical field, and for the equipment of particle accelerators.
- the present invention aims to remedy these drawbacks. For this, it provides for the use of a well-defined mixture of gases which is introduced into the cavity of an ion source.
- the present invention specifically relates to a process for producing multicharged ions by ionization of a first gas consisting of the elements chosen from the group comprising carbon, nitrogen, oxygen, neon, argon and krypton , introduced into the enclosure of an ion source operating in pulse mode, consisting in introducing, in addition, into the enclosure of the ion source a second gas, this second gas being helium when the we want to ionize neutral atoms of carbon (obtained from CO 2 ), nitrogen, oxygen or neon, and nitrogen or oxygen when we want to ionize neutral atoms of argon or krypton.
- a second gas to the gas to be ionized makes it possible to increase the current intensity of the ions formed by about a factor of ten compared to the use of the single gas to be ionized.
- the first gas consisting of neutral atoms of carbon, nitrogen, oxygen, neon or argon
- the second gas is introduced into the enclosure in a proportion ranging from 45 to 55% in partial pressure of the gas mixture.
- this proportion is close to 50%.
- the first gas being krypton and the second gas being oxygen
- a gas mixture containing 94.5 to 95.5% in partial pressure of is used. oxygen.
- a gaseous mixture containing 45 to 55% in partial pressure of helium and preferably 50% of helium is advantageously used.
- a gaseous mixture containing 45 to 55% in partial pressure of oxygen or nitrogen and preferably 50% of oxygen or nitrogen is advantageously used.
- the intensity of the electric ion currents is presented in the form of a table below for the elements carbon, nitrogen, oxygen, neon and argon, extracted from an ion source into which we have injected a mixture of gases in a proportion 50-50 in partial pressure.
- a gaseous mixture containing 94.5% to 95.5% oxygen at partial pressure is advantageously used.
- a gas mixture containing 5% krypton and 95% oxygen makes it possible, for example, to obtain a current of 20 ⁇ A of Kr 13+ or a current of 1 VA of Kr 48+ .
- a current of 1 ⁇ A of N +7 is for example necessary for biomedical applications such as cancer treatment and a current of 3 ⁇ A of Ar +12 allows, after additional ionization, the same biomedical applications.
- the 100 ⁇ A current level of 0 +6 is in great demand for certain nuclear physics accelerators.
- the enclosure is connected to two gas inlets 3 and 4, one for the first gas of the mixture or gas to be ionized, another provided with a valve 5 controlled by the measurement of the pressure in the enclosure 1 by means of a control loop comprising a device 6 for measuring the pressure in the enclosure and a signal amplifier 7.
- the slave valve 5 ensures the proportion of the components of the gas mixture introduced into the enclosure.
- a microwave cavity of an ion source with cyclotron resonance of the electrons has been shown, but the ion source may also be of another type.
- the manner in which the plasma is created in the cavity has nothing to do with the effect of increasing the performance in charge and current of an ion source, which is effected by introducing a mixture of gas.
- the shape of the enclosure can be any as long as it is adapted to the operation of the source, the gas inlets can be located for example at the ends or on the wall of the cavity.
- the second gas is helium at 50% at partial pressure
- a cryogenic pump at approximately 20 ° K is necessary to obtain the indicated performance. At this temperature the helium pumping speed is strictly zero.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
Description
La présente invention a pour objet un procédé de production d'ions multichargés.The present invention relates to a process for producing multi-charged ions.
Ce procédé trouve de nombreuses applications dans le domaine biomédical et dans le domaine de la physique nucléaire pour l'équipement d'accélérateurs de particules.This process finds numerous applications in the biomedical field and in the field of nuclear physics for the equipment of particle accelerators.
Jusqu'à présent, on a produit des ions multichargés dans les sources d'ions, à résonance cyclotronique électronique, du type « Micromafios » par exemple, en introduisant dans l'enceinte de la source uniquement le gaz constitué des atomes neutres destinés à être ionisés. Par impact d'électrons, le gaz constitué par les atomes neutres est ionisé dans une cavité hyperfréquence, excitée par un champ électromagnétique de haute fréquence auquel est superposé un champ magnétique dont l'amplitude B satisfait à la condition de résonance cyclotronique électronique :
Pour de plus amples détails sur une source d'ions du type « Micromafios et sur le procédé de production des ions multichargés, on peut se référer au brevet français n° 2475 798 déposé le 13 février 1980 par le Commissariat à l'Energie Atomique. Cette source décrit la production en continu d'ions multichargés de carbone, d'azote, de néon, d'argon et de xénon.For further details on an ion source of the “Micromafios” type and on the process for producing multicharged ions, reference may be made to French patent n ° 2475 798 filed on February 13, 1980 by the French Atomic Energy Commission. This source describes the continuous production of multi-charged ions of carbon, nitrogen, neon, argon and xenon.
Une telle source d'ions peut être utilisée en régime impulsionnel bref pour notamment équiper certains accélérateurs de particules, du type synchrotron par exemple, qui ne demandent qu'une impulsion de courant d'ions d'une durée de l'ordre de quelques dizaines de microsecondes dans un intervalle de l'ordre d'une seconde.Such an ion source can be used in short pulse mode to in particular equip certain particle accelerators, of the synchrotron type for example, which require only an ion current pulse with a duration of the order of a few tens. of microseconds in an interval of the order of one second.
Malheureusement, le gain en courant et en état de charge, c'est-à-dire le degré d'ionisation, qui s'effectue en utilisant une source d'ions du type « Micromafios » classique en régime impulsionnel est à peine de l'ordre d'un facteur deux.Unfortunately, the gain in current and in state of charge, that is to say the degree of ionization, which is carried out using an ion source of the type “Micromafios” conventional in impulse mode is hardly of l by a factor of two.
Or, l'intensité des courants d'ions multichargés que l'on peut extraire de ces sources est insuffisante pour certaines applications, et notamment dans le domaine biomédical, et pour l'équipement des accélérateurs de particules.However, the intensity of the multicharged ion currents which can be extracted from these sources is insufficient for certain applications, and in particular in the biomedical field, and for the equipment of particle accelerators.
La présente invention a pour but de remédier à ces inconvénients. Pour cela, elle prévoit l'utilisation d'un mélange bien déterminé de gaz qui est introduit dans la cavité d'une source d'ions.The present invention aims to remedy these drawbacks. For this, it provides for the use of a well-defined mixture of gases which is introduced into the cavity of an ion source.
La présente invention a précisément pour objet un procédé de production d'ions multichargés par ionisation d'un premier gaz constitué des éléments choisis dans le groupe comprenant le carbone, l'azote, l'oxygène, le néon, l'argon et le krypton, introduit dans l'enceinte d'une source d'ions fonctionnant en régime impulsionnel, consistant à introduire, de plus, dans l'enceinte de la source d'ions un deuxième gaz, ce deuxième gaz étant de l'hélium lorsque l'on désire ioniser des atomes neutres de carbone (obtenu à partir de CO2), d'azote, d'oxygène ou de néon, et de l'azote ou de l'oxygène lorsque l'on désire ioniser des atomes neutres d'argon ou de krypton.The present invention specifically relates to a process for producing multicharged ions by ionization of a first gas consisting of the elements chosen from the group comprising carbon, nitrogen, oxygen, neon, argon and krypton , introduced into the enclosure of an ion source operating in pulse mode, consisting in introducing, in addition, into the enclosure of the ion source a second gas, this second gas being helium when the we want to ionize neutral atoms of carbon (obtained from CO 2 ), nitrogen, oxygen or neon, and nitrogen or oxygen when we want to ionize neutral atoms of argon or krypton.
L'addition d'un deuxième gaz au gaz à ioniser, selon l'invention, permet d'augmenter l'intensité de courant des ions formés d'environ un facteur dix par rapport à l'utilisation du seul gaz à ioniser.The addition of a second gas to the gas to be ionized, according to the invention, makes it possible to increase the current intensity of the ions formed by about a factor of ten compared to the use of the single gas to be ionized.
Selon un mode préféré de mise en ceuvre du procédé de l'invention, le premier gaz étant constitué d'atomes neutres de carbone, d'azote, d'oxygène, de néon ou d'argon, le deuxième gaz est introduit dans l'enceinte dans une proportion allant de 45 à 55 % en pression partielle du mélange gazeux. De façon avantageuse, cette proportion est voisine de 50 %.According to a preferred embodiment of the process of the invention, the first gas consisting of neutral atoms of carbon, nitrogen, oxygen, neon or argon, the second gas is introduced into the enclosure in a proportion ranging from 45 to 55% in partial pressure of the gas mixture. Advantageously, this proportion is close to 50%.
Selon un autre mode préféré de mise en oeuvre du procédé de l'invention, le premier gaz étant du krypton et le deuxième gaz de l'oxygène, on utilise un mélange gazeux contenant 94,5 à 95,5 % en pression partielle d'oxygène.According to another preferred embodiment of the process of the invention, the first gas being krypton and the second gas being oxygen, a gas mixture containing 94.5 to 95.5% in partial pressure of is used. oxygen.
Les caractéristiques et avantages de l'invention ressortiront mieux à l'aide de la description qui va suivre, donnée à titre explicatif et nullement limitatif, en référence à la figure unique annexée, sur laquelle on a représenté, schématiquement, un mode de réalisation d'une enceinte d'une source d'ions multichargés selon l'invention.The characteristics and advantages of the invention will emerge more clearly with the aid of the description which follows, given by way of explanation and in no way limiting, with reference to the single appended figure, in which an embodiment of schematically is shown. 'an enclosure of a source of multicharged ions according to the invention.
Les expériences avec une source d'ions multichargés du type « Micromafios à à résonance cyclotronique électronique ont montré que si on l'utilise en régime impulsionnel bref (de l'ordre de 50 microsecondes toutes les secondes environ), et si on introduit dans sa cavité hyperfréquence de l'hélium pour ioniser des atomes neutres de carbone, d'oxygène, d'azote où de néon et de l'azote ou de l'oxygène pour ioniser des atomes neutres d'argon ou de krypton, on arrive à déculper les performances en état de charge et en courant.Experiments with a multicharged ion source of the type “Micromafios with electronic cyclotron resonance have shown that if it is used in a short pulse regime (of the order of 50 microseconds every second approximately), and if it is introduced into its helium microwave cavity to ionize neutral atoms of carbon, oxygen, nitrogen or neon and nitrogen or oxygen to ionize neutral atoms of argon or krypton performance under load and current.
Pour l'ionisation d'atomes de carbone, d'azote, d'oxygène ou de néon on utilise avantageusement un mélange gazeux contenant de 45 à 55 % en pression partielle d'hélium et de préférence 50 % d'hélium. De même, pour l'ionisation d'atomes neutres d'argon on utilise avantageusement un mélange gazeux contenant 45 à 55 % en pression partielle d'oxygène ou d'azote et de préférence 50 % d'oxygène ou d'azote.For the ionization of carbon, nitrogen, oxygen or neon atoms, a gaseous mixture containing 45 to 55% in partial pressure of helium and preferably 50% of helium is advantageously used. Likewise, for the ionization of neutral atoms of argon, a gaseous mixture containing 45 to 55% in partial pressure of oxygen or nitrogen and preferably 50% of oxygen or nitrogen is advantageously used.
On présente sous forme d'un tableau ci-après l'intensité des courants électriques d'ions pour les éléments carbone, azote, oxygène, néon et argon, extraits d'une source d'ions dans laquelle on a injecté un mélange de gaz dans une proportion 50-50 en pression partielle.
Pour l'ionisation d'atomes de krypton, on utilise avantageusement un mélange gazeux contenant 94,5 % à 95,5 % d'oxygène en pression partielle.For the ionization of krypton atoms, a gaseous mixture containing 94.5% to 95.5% oxygen at partial pressure is advantageously used.
Un mélange gazeux contenant 5 % de krypton et 95 % d'oxygène permet par exemple d'obtenir un courant de 20 µA de Kr13+ ou un courant de 1 VA de Kr48+.A gas mixture containing 5% krypton and 95% oxygen makes it possible, for example, to obtain a current of 20 μA of Kr 13+ or a current of 1 VA of Kr 48+ .
Les valeurs élevées des intensités de courants d'ions extraits permettent des applications qui ne sont pas envisageables avec les courants faibles produits par des sources d'ions selon l'art antérieur.The high values of the intensities of extracted ion currents allow applications which cannot be envisaged with the weak currents produced by ion sources according to the prior art.
Un courant de 1 µA de N+7 est par exemple nécessaire pour les applications biomédicales comme le traitement des cancers et un courant de 3 µA de Ar+12 permet, après ionisation supplémentaire, les mêmes applications biomédicales.A current of 1 µA of N +7 is for example necessary for biomedical applications such as cancer treatment and a current of 3 µA of Ar +12 allows, after additional ionization, the same biomedical applications.
Le niveau de courant de 100 µA de 0+6 est très demandé pour certains accélérateurs de physique nucléaire.The 100 µA current level of 0 +6 is in great demand for certain nuclear physics accelerators.
Sur la figure unique, est représenté en détail, un mode de réalisation d'une source d'ions lourds multichargés à résonance cyclotronique des électrons permettant la mise en oeuvre du procédé selon l'invention.In the single figure, there is shown in detail an embodiment of a source of multicharged heavy ions with cyclotron resonance of the electrons allowing the implementation of the method according to the invention.
On voit une enceinte d'une source d'ions 1 où des impulsions d'une puissance hyperfréquence sont introduites au moyen d'un injecteur 2.We see an enclosure of an
L'enceinte est reliée à deux entrées de gaz 3 et 4, une pour le premier gaz du mélange ou gaz à ioniser, une autre munie d'une vanne 5 asservie à la mesure de la pression dans l'enceinte 1 au moyen d'une boucle d'asservissement comprenant un dispositif de mesure 6 de la pression dans l'enceinte et un amplificateur du signal 7.The enclosure is connected to two gas inlets 3 and 4, one for the first gas of the mixture or gas to be ionized, another provided with a
La vanne asservie 5 assure la proportion des composants du mélange de gaz introduit dans l'enceinte. On a représenté une cavité hyperfréquence d'une source d'ions à résonance cyclotronique des électrons mais la source d'ions peut être aussi bien d'un autre type.The
La manière selon laquelle le plasma est créé dans la cavité n'a aucun rapport avec l'effet d'augmentation de la performance en état de charge et en courant d'une source d'ions, qui s'effectue en introduisant un mélange de gaz.The manner in which the plasma is created in the cavity has nothing to do with the effect of increasing the performance in charge and current of an ion source, which is effected by introducing a mixture of gas.
La forme de l'enceinte peut être quelconque pourvu qu'elle soit adaptée au fonctionnement de la source, les entrées de gaz peuvent se trouver par exemple aux extrémités ou sur la paroi de la cavité.The shape of the enclosure can be any as long as it is adapted to the operation of the source, the gas inlets can be located for example at the ends or on the wall of the cavity.
Dans le cas où le deuxième gaz est de l'hélium à 50 % en pression partielle, une pompe cryogénique à 20 °K environ est nécessaire pour obtenir les performances indiquées. A cette température la vitesse de pompage de l'hélium est rigoureusement nulle.In the case where the second gas is helium at 50% at partial pressure, a cryogenic pump at approximately 20 ° K is necessary to obtain the indicated performance. At this temperature the helium pumping speed is strictly zero.
Claims (4)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8310862A FR2548436B1 (en) | 1983-06-30 | 1983-06-30 | PROCESS FOR PRODUCING MULTI-LOAD HEAVY IONS AND ION SOURCES IN PULSE RATE, ALLOWING THE IMPLEMENTATION OF THE PROCESS |
| FR8310862 | 1983-06-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0130907A1 EP0130907A1 (en) | 1985-01-09 |
| EP0130907B1 true EP0130907B1 (en) | 1988-09-07 |
Family
ID=9290347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP19840401359 Expired EP0130907B1 (en) | 1983-06-30 | 1984-06-26 | Method of producing multi-charged ions |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0130907B1 (en) |
| JP (1) | JPS6037638A (en) |
| DE (1) | DE3473966D1 (en) |
| FR (1) | FR2548436B1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2601498B1 (en) * | 1986-07-10 | 1988-10-07 | Commissariat Energie Atomique | ION SOURCE WITH ELECTRONIC CYCLOTRONIC RESONANCE |
| FR2679066B1 (en) * | 1991-07-08 | 1993-09-24 | Commissariat Energie Atomique | PROCESS FOR PRODUCING MULTICHARGE IONS. |
| DE19933762C2 (en) * | 1999-07-19 | 2002-10-17 | Juergen Andrae | Pulsed magnetic opening of electron cyclotron resonance ion sources to generate short, powerful pulses of highly charged ions or electrons |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3476968A (en) * | 1966-12-19 | 1969-11-04 | Hitachi Ltd | Microwave ion source |
| FR2475798A1 (en) * | 1980-02-13 | 1981-08-14 | Commissariat Energie Atomique | METHOD AND DEVICE FOR PRODUCING HIGHLY CHARGED HEAVY IONS AND AN APPLICATION USING THE METHOD |
-
1983
- 1983-06-30 FR FR8310862A patent/FR2548436B1/en not_active Expired
-
1984
- 1984-06-26 EP EP19840401359 patent/EP0130907B1/en not_active Expired
- 1984-06-26 DE DE8484401359T patent/DE3473966D1/en not_active Expired
- 1984-06-29 JP JP13503184A patent/JPS6037638A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2548436A1 (en) | 1985-01-04 |
| FR2548436B1 (en) | 1986-01-10 |
| DE3473966D1 (en) | 1988-10-13 |
| EP0130907A1 (en) | 1985-01-09 |
| JPS6037638A (en) | 1985-02-27 |
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