EA200500665A1 - SEMICONDUCTOR DEVICE, SYSTEM AND METHOD OF CORROSION AND POLLUTION MANAGEMENT - Google Patents

SEMICONDUCTOR DEVICE, SYSTEM AND METHOD OF CORROSION AND POLLUTION MANAGEMENT

Info

Publication number
EA200500665A1
EA200500665A1 EA200500665A EA200500665A EA200500665A1 EA 200500665 A1 EA200500665 A1 EA 200500665A1 EA 200500665 A EA200500665 A EA 200500665A EA 200500665 A EA200500665 A EA 200500665A EA 200500665 A1 EA200500665 A1 EA 200500665A1
Authority
EA
Eurasian Patent Office
Prior art keywords
corrosion
semiconductor device
pollution management
controlled
saved
Prior art date
Application number
EA200500665A
Other languages
Russian (ru)
Other versions
EA007147B1 (en
Inventor
Дэвид Б. Даулинг
Фаршад Кхоррами
Original Assignee
Эпплайд Семикондактор Интернэшнл, Лтд.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/291,770 external-priority patent/US6811681B2/en
Application filed by Эпплайд Семикондактор Интернэшнл, Лтд. filed Critical Эпплайд Семикондактор Интернэшнл, Лтд.
Publication of EA200500665A1 publication Critical patent/EA200500665A1/en
Publication of EA007147B1 publication Critical patent/EA007147B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F13/00—Inhibiting corrosion of metals by anodic or cathodic protection
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F13/00—Inhibiting corrosion of metals by anodic or cathodic protection
    • C23F13/02—Inhibiting corrosion of metals by anodic or cathodic protection cathodic; Selection of conditions, parameters or procedures for cathodic protection, e.g. of electrical conditions
    • C23F13/04—Controlling or regulating desired parameters

Abstract

Описаны устройство, система, способ и компьютерный программный продукт, предназначенные для управления коррозией проводящей конструкции, находящейся в контакте с коррозионной средой и имеющей полупроводниковое покрытие, причем коррозией управляют при помощи управляемого фильтра (898) и соответствующего электронного блока управления (899), выполненного с возможностью обработки по меньшей мере одного сохраненного или измеренного параметра.Международная заявка была опубликована вместе с отчетом о международном поиске.A device, system, method and computer program product are described for controlling the corrosion of a conductive structure in contact with a corrosive environment and having a semiconductor coating, and the corrosion is controlled using a controlled filter (898) and a corresponding electronic control unit (899) made with the ability to process at least one saved or measured parameter. The international application was published along with an international search report.

EA200500665A 2002-10-17 2003-10-17 Semiconductive corrosion and fouling control apparatus, system and method EA007147B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US27173402A 2002-10-17 2002-10-17
US10/291,770 US6811681B2 (en) 2002-11-12 2002-11-12 Semiconductive corrosion and fouling control apparatus, system, and method
PCT/US2003/029133 WO2004035865A1 (en) 2002-10-17 2003-10-17 Semiconductive corrosion and fouling control apparatus, system, and method

Publications (2)

Publication Number Publication Date
EA200500665A1 true EA200500665A1 (en) 2005-10-27
EA007147B1 EA007147B1 (en) 2006-08-25

Family

ID=32109814

Family Applications (1)

Application Number Title Priority Date Filing Date
EA200500665A EA007147B1 (en) 2002-10-17 2003-10-17 Semiconductive corrosion and fouling control apparatus, system and method

Country Status (6)

Country Link
EP (1) EP1579034A4 (en)
JP (1) JP5009502B2 (en)
AU (1) AU2003276888B2 (en)
CA (1) CA2502465C (en)
EA (1) EA007147B1 (en)
WO (1) WO2004035865A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7318889B2 (en) * 2005-06-02 2008-01-15 Applied Semiconductor International, Ltd. Apparatus, system and method for extending the life of sacrificial anodes on cathodic protection systems
WO2007120087A1 (en) * 2006-04-19 2007-10-25 Volvo Technology Corporation Method for predicting an impact of an aging behaviour of an electrical element and simulation model for simulating such behaviour
RU2486288C2 (en) * 2011-08-11 2013-06-27 Анатолий Александрович Анашкин Device for pulsed cathodic protection
ES2910413T3 (en) 2012-10-11 2022-05-12 Sembcorp Marine Repairs & Upgrades Pte Ltd System and method for providing protection against corrosion of metallic structures using electromagnetic waves that vary with time
RU2618968C1 (en) * 2015-10-13 2017-05-11 Александр Петрович Молодцов Device for power and automatic control of output current system of cathodic protection system from corrosion of metal constructions
RU170510U1 (en) * 2016-07-28 2017-04-26 Федеральное государственное бюджетное образовательное учреждение высшего образования "Омский государственный университет путей сообщения" AUTOMATIC DRAINAGE INSTALLATION
RU2735162C1 (en) * 2020-03-25 2020-10-28 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт автоматики им. Н.Л.Духова"(ФГУП "ВНИИА") Device for protection of object against action of space
RU2735223C1 (en) * 2020-03-25 2020-10-28 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт автоматики им. Н.Л.Духова"(ФГУП "ВНИИА") Device for protection of object against action of space

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6551491B2 (en) * 2000-06-02 2003-04-22 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures
US6524466B1 (en) * 2000-07-18 2003-02-25 Applied Semiconductor, Inc. Method and system of preventing fouling and corrosion of biomedical devices and structures
US6562201B2 (en) * 2001-06-08 2003-05-13 Applied Semiconductor, Inc. Semiconductive polymeric system, devices incorporating the same, and its use in controlling corrosion
US6402933B1 (en) * 2001-06-08 2002-06-11 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures

Also Published As

Publication number Publication date
JP5009502B2 (en) 2012-08-22
WO2004035865A1 (en) 2004-04-29
AU2003276888A1 (en) 2004-05-04
EA007147B1 (en) 2006-08-25
JP2006503184A (en) 2006-01-26
EP1579034A1 (en) 2005-09-28
WO2004035865A9 (en) 2004-06-17
CA2502465A1 (en) 2004-04-29
CA2502465C (en) 2011-09-27
AU2003276888B2 (en) 2008-04-17
EP1579034A4 (en) 2008-07-02

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Legal Events

Date Code Title Description
MM4A Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s)

Designated state(s): AM AZ BY KZ KG MD TJ TM RU