DK55788A - PROCEDURE FOR COPPER REPLACEMENT OF DEEP PRESSURE ROLLERS - Google Patents

PROCEDURE FOR COPPER REPLACEMENT OF DEEP PRESSURE ROLLERS

Info

Publication number
DK55788A
DK55788A DK055788A DK55788A DK55788A DK 55788 A DK55788 A DK 55788A DK 055788 A DK055788 A DK 055788A DK 55788 A DK55788 A DK 55788A DK 55788 A DK55788 A DK 55788A
Authority
DK
Denmark
Prior art keywords
procedure
pressure rollers
deep pressure
copper replacement
replacement
Prior art date
Application number
DK055788A
Other languages
Danish (da)
Other versions
DK55788D0 (en
Inventor
C Richard Frisby
Original Assignee
Rohco Inc Mcgean
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohco Inc Mcgean filed Critical Rohco Inc Mcgean
Publication of DK55788D0 publication Critical patent/DK55788D0/en
Publication of DK55788A publication Critical patent/DK55788A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Printing Plates And Materials Therefor (AREA)
DK055788A 1987-02-03 1988-02-03 PROCEDURE FOR COPPER REPLACEMENT OF DEEP PRESSURE ROLLERS DK55788A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/010,212 US4781801A (en) 1987-02-03 1987-02-03 Method of copper plating gravure rolls

Publications (2)

Publication Number Publication Date
DK55788D0 DK55788D0 (en) 1988-02-03
DK55788A true DK55788A (en) 1988-08-04

Family

ID=21744544

Family Applications (1)

Application Number Title Priority Date Filing Date
DK055788A DK55788A (en) 1987-02-03 1988-02-03 PROCEDURE FOR COPPER REPLACEMENT OF DEEP PRESSURE ROLLERS

Country Status (4)

Country Link
US (1) US4781801A (en)
EP (1) EP0280408A1 (en)
JP (1) JPS63270491A (en)
DK (1) DK55788A (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3836521C2 (en) * 1988-10-24 1995-04-13 Atotech Deutschland Gmbh Aqueous acidic bath for the galvanic deposition of shiny and crack-free copper coatings and use of the bath
DE3939676C2 (en) * 1989-11-28 1994-01-27 Schering Ag Metallization of non-conductors
ATE188516T1 (en) * 1990-03-19 2000-01-15 Atotech Deutschland Gmbh AQUEOUS, ACIDIC BATH FOR THE GALVANIC DEPOSITION OF SHINY AND CRACK-FREE COPPER COATINGS AND USE OF THIS BATH
EP0485588B1 (en) * 1990-05-30 1997-04-09 Gould Electronics Inc. Electrodeposited copper foil and process for making same using electrolyte solutions having low chloride ion concentrations
DE69110208T2 (en) * 1990-08-03 1995-10-19 Rohco Inc Mcgean Copper plating of gravure cylinders.
US5997709A (en) * 1996-05-28 1999-12-07 Minnesota Mining And Manufacturing Co. Method of providing diffuse risers on a fresnel lens die
JPH10330983A (en) * 1997-05-30 1998-12-15 Fukuda Metal Foil & Powder Co Ltd Electrolytic copper foil and its production
US7244677B2 (en) 1998-02-04 2007-07-17 Semitool. Inc. Method for filling recessed micro-structures with metallization in the production of a microelectronic device
EP1019954B1 (en) * 1998-02-04 2013-05-15 Applied Materials, Inc. Method and apparatus for low-temperature annealing of electroplated copper micro-structures in the production of a microelectronic device
US6632292B1 (en) 1998-03-13 2003-10-14 Semitool, Inc. Selective treatment of microelectronic workpiece surfaces
KR100659544B1 (en) * 1999-11-12 2006-12-19 에바라 유지라이토 코포레이션 리미티드 Via-filling process
US6406609B1 (en) 2000-02-25 2002-06-18 Agere Systems Guardian Corp. Method of fabricating an integrated circuit
DE10058896C1 (en) * 2000-10-19 2002-06-13 Atotech Deutschland Gmbh Electrolytic copper bath, its use and method for depositing a matt copper layer
JP3899313B2 (en) * 2000-10-19 2007-03-28 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング Electrodeposition method for copper bath and matte copper coating
US6851200B2 (en) * 2003-03-14 2005-02-08 Hopkins Manufacturing Corporation Reflecting lighted level
US20050284766A1 (en) * 2004-06-25 2005-12-29 Herdman Roderick D Pulse reverse electrolysis of acidic copper electroplating solutions
US7153408B1 (en) 2006-04-13 2006-12-26 Herdman Roderick D Copper electroplating of printing cylinders
GR1007354B (en) 2009-12-15 2011-07-20 Icr Ιωαννου Αβεε, Manufacture of an aluminium deep-printing cylinder
EP2719544B1 (en) 2012-10-10 2015-12-16 Artio Sarl Method of manufacturing rotogravure cylinders
WO2014108172A1 (en) 2013-01-08 2014-07-17 Icr Ioannou Abee Method of refurbishing rotogravure cylinders, rotogravure cylinders and their use
US9731496B2 (en) * 2013-08-29 2017-08-15 Paramount International Services Ltd. Method of manufacturing rotogravure cylinders
KR20210094558A (en) 2018-11-07 2021-07-29 코벤트야 인크. Satin Copper Bath and Satin Copper Layer Deposition Method

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1150748A (en) * 1965-07-02 1969-04-30 Barnet David Ostrow Improvements in Electrodeposition of Copper
US3542655A (en) * 1968-04-29 1970-11-24 M & T Chemicals Inc Electrodeposition of copper
US3732151A (en) * 1970-04-27 1973-05-08 Dayton Bright Copper Co Copper plating
US3682788A (en) * 1970-07-28 1972-08-08 M & T Chemicals Inc Copper electroplating
US3798138A (en) * 1971-07-21 1974-03-19 Lea Ronal Inc Electrodeposition of copper
US4014760A (en) * 1974-11-21 1977-03-29 M & T Chemicals Inc. Electrodeposition of copper
DE3114131A1 (en) * 1981-04-08 1982-11-04 Teldec Telefunken-Decca-Schallplatten Gmbh, 2000 Hamburg METHOD FOR PRODUCING A CUTTING CARRIER
US4334966A (en) * 1981-05-19 1982-06-15 Mcgean Chemical Company, Inc. Method of copper plating gravure cylinders
US4376685A (en) * 1981-06-24 1983-03-15 M&T Chemicals Inc. Acid copper electroplating baths containing brightening and leveling additives

Also Published As

Publication number Publication date
EP0280408A1 (en) 1988-08-31
DK55788D0 (en) 1988-02-03
JPS63270491A (en) 1988-11-08
US4781801A (en) 1988-11-01

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment