DK471787D0 - STABILIZED SOLUTIONS OF PHOTOPOLYMERS - Google Patents

STABILIZED SOLUTIONS OF PHOTOPOLYMERS

Info

Publication number
DK471787D0
DK471787D0 DK471787A DK471787A DK471787D0 DK 471787 D0 DK471787 D0 DK 471787D0 DK 471787 A DK471787 A DK 471787A DK 471787 A DK471787 A DK 471787A DK 471787 D0 DK471787 D0 DK 471787D0
Authority
DK
Denmark
Prior art keywords
photopolymers
stabilized solutions
stabilized
solutions
Prior art date
Application number
DK471787A
Other languages
Danish (da)
Other versions
DK471787A (en
Inventor
Hellmut Ahne
Winfried Plundrich
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of DK471787D0 publication Critical patent/DK471787D0/en
Publication of DK471787A publication Critical patent/DK471787A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/32—Compounds containing nitrogen bound to oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
DK471787A 1986-09-11 1987-09-10 STABILIZED SOLUTIONS OF PHOTOPOLYMERS DK471787A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19863630993 DE3630993A1 (en) 1986-09-11 1986-09-11 STABILIZED SOLUTIONS OF PHOTOPOLYMERS

Publications (2)

Publication Number Publication Date
DK471787D0 true DK471787D0 (en) 1987-09-10
DK471787A DK471787A (en) 1988-03-12

Family

ID=6309394

Family Applications (1)

Application Number Title Priority Date Filing Date
DK471787A DK471787A (en) 1986-09-11 1987-09-10 STABILIZED SOLUTIONS OF PHOTOPOLYMERS

Country Status (6)

Country Link
EP (1) EP0259728A3 (en)
JP (1) JPS6370843A (en)
KR (1) KR880004016A (en)
DE (1) DE3630993A1 (en)
DK (1) DK471787A (en)
FI (1) FI873942A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5729692B2 (en) * 1974-09-17 1982-06-24

Also Published As

Publication number Publication date
EP0259728A3 (en) 1990-01-17
KR880004016A (en) 1988-06-01
DK471787A (en) 1988-03-12
JPS6370843A (en) 1988-03-31
DE3630993A1 (en) 1988-03-17
FI873942A0 (en) 1987-09-11
FI873942A (en) 1988-03-12
EP0259728A2 (en) 1988-03-16

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment