DK199901642A - Method of depositing layers on a substrate - Google Patents

Method of depositing layers on a substrate

Info

Publication number
DK199901642A
DK199901642A DK199901642A DKPA199901642A DK199901642A DK 199901642 A DK199901642 A DK 199901642A DK 199901642 A DK199901642 A DK 199901642A DK PA199901642 A DKPA199901642 A DK PA199901642A DK 199901642 A DK199901642 A DK 199901642A
Authority
DK
Denmark
Prior art keywords
substrate
depositing layers
depositing
layers
Prior art date
Application number
DK199901642A
Other languages
Danish (da)
Inventor
Lars-Ulrik Aaen Andersen
Paul Nicolas Egginton
Original Assignee
Ionas As
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ionas As filed Critical Ionas As
Priority to DK199901642A priority Critical patent/DK173655B1/en
Priority to AU13822/01A priority patent/AU1382201A/en
Priority to PCT/DK2000/000634 priority patent/WO2001036708A1/en
Priority to EP00975836A priority patent/EP1248866A1/en
Publication of DK199901642A publication Critical patent/DK199901642A/en
Application granted granted Critical
Publication of DK173655B1 publication Critical patent/DK173655B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Optical Integrated Circuits (AREA)
DK199901642A 1999-11-15 1999-11-15 Method of depositing layers on a substrate DK173655B1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DK199901642A DK173655B1 (en) 1999-11-15 1999-11-15 Method of depositing layers on a substrate
AU13822/01A AU1382201A (en) 1999-11-15 2000-11-15 A method for depositing layers on a substrate
PCT/DK2000/000634 WO2001036708A1 (en) 1999-11-15 2000-11-15 A method for depositing layers on a substrate
EP00975836A EP1248866A1 (en) 1999-11-15 2000-11-15 A method for depositing layers on a substrate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DK199901642A DK173655B1 (en) 1999-11-15 1999-11-15 Method of depositing layers on a substrate
DK164299 1999-11-15

Publications (2)

Publication Number Publication Date
DK199901642A true DK199901642A (en) 2001-05-16
DK173655B1 DK173655B1 (en) 2001-05-28

Family

ID=8106816

Family Applications (1)

Application Number Title Priority Date Filing Date
DK199901642A DK173655B1 (en) 1999-11-15 1999-11-15 Method of depositing layers on a substrate

Country Status (4)

Country Link
EP (1) EP1248866A1 (en)
AU (1) AU1382201A (en)
DK (1) DK173655B1 (en)
WO (1) WO2001036708A1 (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4060660A (en) * 1976-01-15 1977-11-29 Rca Corporation Deposition of transparent amorphous carbon films
JPS6092477A (en) * 1983-10-27 1985-05-24 Matsushita Electric Ind Co Ltd Chemical treatment device using plasma
US4681653A (en) * 1984-06-01 1987-07-21 Texas Instruments Incorporated Planarized dielectric deposited using plasma enhanced chemical vapor deposition
FR2584101B1 (en) * 1985-06-26 1987-08-07 Comp Generale Electricite DEVICE FOR MANUFACTURING AN OPTICAL COMPONENT WITH A REFRACTION INDEX GRADIENT
FR2653633B1 (en) * 1989-10-19 1991-12-20 Commissariat Energie Atomique CHEMICAL TREATMENT DEVICE ASSISTED BY A DIFFUSION PLASMA.
JPH0710689A (en) * 1993-06-17 1995-01-13 Furukawa Electric Co Ltd:The Device for growth of semiconductor in gaseous phase
US5763020A (en) * 1994-10-17 1998-06-09 United Microelectronics Corporation Process for evenly depositing ions using a tilting and rotating platform

Also Published As

Publication number Publication date
AU1382201A (en) 2001-05-30
EP1248866A1 (en) 2002-10-16
WO2001036708A1 (en) 2001-05-25
DK173655B1 (en) 2001-05-28

Similar Documents

Publication Publication Date Title
DK1436605T3 (en) Process for preparing a substrate
FI20000900A0 (en) Method of constructing a thin film on a substrate
DE60007753D1 (en) METHOD FOR CONNECTING A PHOTOCHROME COATING TO A POLYMERIC SUBSTRATE
DE69835659D1 (en) Multilayer ceramic substrate with a passive component, and manufacturing method
FR2816445B1 (en) METHOD FOR MANUFACTURING A STACKED STRUCTURE COMPRISING A THIN LAYER ADHERING TO A TARGET SUBSTRATE
FR2838735B1 (en) SELF-CLEANING COATING SUBSTRATE
ID24258A (en) COMPOSITION TO PRODUCE A RESISTANT-ABRATION LAYER ON THE SUBSTRATE
NO951871D0 (en) Method of forming a silver coating on a vitreous substrate
DE60031627D1 (en) Adaptation of compounds in a multilayer substrate
FR2779751B1 (en) SUBSTRATE WITH PHOTOCATALYTIC COATING
ID22434A (en) THE ESTABLISHMENT OF A CRYSTALLIN SEMICONDUCTOR FILM ON THE GLASS SUBSTRATE
FR2800998B1 (en) TRANSPARENT SUBSTRATE HAVING AN ANTI-REFLECTIVE COATING
FI981262A0 (en) A method for growing thin film electroluminescent structures
DE60037996D1 (en) Manufacturing method for a III-V nitride layer and for a substrate
DK1430108T3 (en) Process for forming a cell growth surface on a polymer substrate
FR2851372B1 (en) METHOD FOR MANUFACTURING INSULATED INSULATING LAYER SUBSTRATE
FI19992234A (en) A method for depositing transition metal nitride thin films
DE60320717D1 (en) Layer forming method and substrate with a layer obtained thereby
HK1060158A1 (en) A method of depositing a thin film on a substrate,a substrate and a diamond film produced by the me thod
DE60205204D1 (en) Barrier layer for silicon-containing substrate
FR2837620B1 (en) METHOD FOR TRANSFERRING SUBSTRATE SUBSTRATE ELEMENTS
ID19642A (en) SUBSTRATE PROVIDED WITH A POLYCHRISTALIN INTAN LAYER
NO20022268D0 (en) Coating agent and method for coating the surface of a substrate
NO20041978L (en) Coating process and method of coating a substrate with a resistant layer
DK0794266T3 (en) Device for coating a substrate surface

Legal Events

Date Code Title Description
B1 Patent granted (law 1993)
PBP Patent lapsed

Ref document number: DK