DK140869C - - Google Patents

Info

Publication number
DK140869C
DK140869C DK568970A DK568970A DK140869C DK 140869 C DK140869 C DK 140869C DK 568970 A DK568970 A DK 568970A DK 568970 A DK568970 A DK 568970A DK 140869 C DK140869 C DK 140869C
Authority
DK
Denmark
Application number
DK568970A
Other languages
Danish (da)
Other versions
DK140869B (en
Inventor
D D Witt
Original Assignee
International Business Machines Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corporation filed Critical International Business Machines Corporation
Publication of DK140869B publication Critical patent/DK140869B/en
Application granted granted Critical
Publication of DK140869C publication Critical patent/DK140869C/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
    • H01L21/743—Making of internal connections, substrate contacts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Bipolar Transistors (AREA)
DK568970AA 1969-11-10 1970-11-09 Method for producing an integrated monolith circuit. DK140869B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US87501369A 1969-11-10 1969-11-10

Publications (2)

Publication Number Publication Date
DK140869B DK140869B (en) 1979-11-26
DK140869C true DK140869C (en) 1980-04-28

Family

ID=25365050

Family Applications (1)

Application Number Title Priority Date Filing Date
DK568970AA DK140869B (en) 1969-11-10 1970-11-09 Method for producing an integrated monolith circuit.

Country Status (13)

Country Link
US (1) US3709746A (en)
JP (1) JPS4926752B1 (en)
AT (1) AT324425B (en)
BE (1) BE758682A (en)
CA (1) CA924823A (en)
CH (1) CH506890A (en)
DE (1) DE2047241C3 (en)
DK (1) DK140869B (en)
ES (1) ES384679A1 (en)
FR (1) FR2067056B1 (en)
GB (1) GB1304246A (en)
NL (1) NL7016393A (en)
SE (1) SE352783B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3940783A (en) * 1974-02-11 1976-02-24 Signetics Corporation Majority carriers-variable threshold rectifier and/or voltage reference semiconductor structure
US4193080A (en) * 1975-02-20 1980-03-11 Matsushita Electronics Corporation Non-volatile memory device
US4258379A (en) * 1978-09-25 1981-03-24 Hitachi, Ltd. IIL With in and outdiffused emitter pocket
US4252581A (en) * 1979-10-01 1981-02-24 International Business Machines Corporation Selective epitaxy method for making filamentary pedestal transistor
US4644383A (en) * 1985-04-08 1987-02-17 Harris Corporation Subcollector for oxide and junction isolated IC's
EP0214802B1 (en) * 1985-08-26 1991-06-05 Matsushita Electric Industrial Co., Ltd. Semiconductor device having an abrupt junction and method of manufacturing same using epitaxy
GB9013926D0 (en) * 1990-06-22 1990-08-15 Gen Electric Co Plc A vertical pnp transistor
JPH05109753A (en) * 1991-08-16 1993-04-30 Toshiba Corp Bipolar transistor
KR100595899B1 (en) * 2003-12-31 2006-06-30 동부일렉트로닉스 주식회사 Image sensor and method for fabricating the same
US20080087978A1 (en) * 2006-10-11 2008-04-17 Coolbaugh Douglas D Semiconductor structure and method of manufacture
JP6487386B2 (en) 2016-07-22 2019-03-20 ファナック株式会社 Server, method, program, recording medium, and system for maintaining time accuracy

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL297821A (en) * 1962-10-08
FR1559608A (en) * 1967-06-30 1969-03-14

Also Published As

Publication number Publication date
CH506890A (en) 1971-04-30
BE758682A (en) 1971-05-10
DE2047241A1 (en) 1971-05-19
GB1304246A (en) 1973-01-24
US3709746A (en) 1973-01-09
DE2047241C3 (en) 1979-03-08
JPS4926752B1 (en) 1974-07-11
FR2067056B1 (en) 1974-08-23
DK140869B (en) 1979-11-26
SE352783B (en) 1973-01-08
FR2067056A1 (en) 1971-08-13
CA924823A (en) 1973-04-17
NL7016393A (en) 1971-05-12
AT324425B (en) 1975-08-25
DE2047241B2 (en) 1978-06-22
ES384679A1 (en) 1973-03-16

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Legal Events

Date Code Title Description
PBP Patent lapsed