DE862992C - Process for the production of tantalum-containing coatings - Google Patents

Process for the production of tantalum-containing coatings

Info

Publication number
DE862992C
DE862992C DEB6948D DEB0006948D DE862992C DE 862992 C DE862992 C DE 862992C DE B6948 D DEB6948 D DE B6948D DE B0006948 D DEB0006948 D DE B0006948D DE 862992 C DE862992 C DE 862992C
Authority
DE
Germany
Prior art keywords
tantalum
production
containing coatings
coatings
metal objects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DEB6948D
Other languages
German (de)
Inventor
Paul Friedmann
Adolf Dr Hrubesch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Priority to DEB6948D priority Critical patent/DE862992C/en
Application granted granted Critical
Publication of DE862992C publication Critical patent/DE862992C/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/28Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
    • C23C10/34Embedding in a powder mixture, i.e. pack cementation
    • C23C10/36Embedding in a powder mixture, i.e. pack cementation only one element being diffused

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Powder Metallurgy (AREA)

Description

Verfahren zur Herstellung von tantalhaltigen Uberzügen Um Gegenstände aus Eisen, Nickel oder auch anderen Metallen gegen Korrosion zu schützen, hat man vorgeschlagen, auf der Metalloberfläche Tantalverbindungen elektrolytisch niederzuschlagen. Die so erzeugten Tantalüberzüge ' sind jedoch meist nicht hinreichend porenfrei, so daß der gewünschte Schutz nur unvollkommen erreicht wird. Durch Erhitzen der Gegenstände in Tantalpulver auf so hohe Temperaturen, daß das Tantal in die Oberfläche diffundiert, erhält man meist nicht genügend tantalreiche, daher auch nicht genügend korrosionsfeste Oberflächen. Es wurde nun gefunden, daß man besonders dauerhafte, korrosionsbeständige Tantalüberzüge auf Metallgegenständen erhält, wenn man Tantalpulver . oder mit Tantal beladene fein zerteilte Trägerstoffe in zerstäubtem Zustand bei hohen Temperaturen, vorzugsweise nicht unter 700', auf die Metallgegenstände einwirken läßt. Man kann beispielsweise einen Edelgasstrom, in dem feinstes Tantalpulver verteilt ist, bei Temperaturen um ioooo gegen die mit einem Überzug zu versehende Metallfläche richten. Bei hinreichend langer Einwirkung entsteht hierbei ein lückenloser Diffusionsüberzug aus Tantal. Die Bildung des Überzugs kann durch kleine Beigaben von Halogen zu dem Edelgasstrom beschleunigt werden.Process for the production of tantalum-containing coatings In order to protect objects made of iron, nickel or other metals against corrosion, it has been proposed that tantalum compounds be deposited electrolytically on the metal surface. The tantalum coatings produced in this way ', however, are usually not sufficiently porous, so that the desired protection is only partially achieved. By heating the objects in tantalum powder to such high temperatures that the tantalum diffuses into the surface, surfaces that are not sufficiently rich in tantalum and therefore not sufficiently corrosion-resistant are usually obtained. It has now been found that particularly durable, corrosion-resistant tantalum coatings are obtained on metal objects if tantalum powder is used . or finely divided carrier materials loaded with tantalum in an atomized state at high temperatures, preferably not below 700 ', to act on the metal objects. For example, a stream of noble gas, in which the finest tantalum powder is distributed, can be directed at temperatures of around 10000 against the metal surface to be provided with a coating. With a sufficiently long exposure, a complete diffusion coating of tantalum is created. The formation of the coating can be accelerated by adding small amounts of halogen to the noble gas stream.

Beispiel Ein Strom von Argon, in- dem Tantalstaub suspendiert ist, wird mittels einer Quarzdüse gegen eine Platte aus Nickel. oder Carbonyleisen geblasen, die sich in einem auf 950' geheizten Raum befindet. Nach 4stündigem Blasen läßt man den mit Argon gefüllten Raum unter Luftabschluß erkalten. Das metallographische Schliffbild zeigt auf den Platten eine etwa o,i8 mm dicke Diffusionsschicht, die aus einer etwa 400/0igen Tantallegierung besteht.Example A stream of argon in which tantalum dust is suspended is directed against a plate made of nickel by means of a quartz nozzle. or blown carbonyl iron, which is in a room heated to 950 '. After blowing for 4 hours, the space filled with argon is allowed to cool in the absence of air. The metallographic micrograph shows an approximately 0.18 mm thick diffusion layer on the plates, which consists of an approximately 400/0 tantalum alloy.

Einen für das Verfahren geeigneten tantalhaltigen Staub erhält man, wenn man ein Gemisch von Wasserstoff und Tantalpentachloriddampf bei iooo bis 1500' über sehr fein geriebenen Ton leitet. Dabei schlägt sich Tantalmetall in feinster Verteilung auf den Tonteilchen nieder. Oder man verreibt Tantalpentoxyd oder Tantalsäure mit der zehnfachen Menge Aluminiumoxydpulver und läßt auf das Gemisch bei iooo bis 15oo' einen Argonstrom einwirken, dem Tetrachlorkohlenstoffdämpfe beigemischt sind. Es empfiehlt sich unter Umständen eine anschließende Behandlung mit Wasserstoff in der Hitze. Die erhaltenen Pulver werden fein verrieben und gesichtet und die Anteile mit einer Korngröße bis zu iu verwendet.A dust containing tantalum which is suitable for the process is obtained if a mixture of hydrogen and tantalum pentachloride vapor is passed over very finely ground clay at 10,000 to 1,500 minutes. Tantalum metal is deposited in the finest distribution on the clay particles. Or tantalum pentoxide or tantalic acid is triturated with ten times the amount of aluminum oxide powder and a stream of argon mixed with carbon tetrachloride vapors is allowed to act on the mixture at 10,000 to 1,500 '. Under certain circumstances, a subsequent treatment with hydrogen in the heat is recommended. The powders obtained are finely ground and sifted and the fractions with a grain size of up to iu are used.

Claims (1)

PATENTANSPRUCII-Verfahren zur Herstellung tantalhaltiger überzüge auf Metallgegenständen, dadurch gekennzeichnet, daß man Tantalpulver oder mit Tantal beladene fein zerteilte Trägerstoffe in zerstäubtem Zustand bei hohen Temperaturen, vorzugsweise nicht unterhalb 700', auf die Metallgegenstände einwirken läßt.A method for producing tantalum-containing coatings on metal objects, characterized in that tantalum powder or finely divided carrier materials loaded with tantalum are allowed to act on the metal objects in the atomized state at high temperatures, preferably not below 700 ' .
DEB6948D 1942-08-08 1942-08-08 Process for the production of tantalum-containing coatings Expired DE862992C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DEB6948D DE862992C (en) 1942-08-08 1942-08-08 Process for the production of tantalum-containing coatings

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEB6948D DE862992C (en) 1942-08-08 1942-08-08 Process for the production of tantalum-containing coatings

Publications (1)

Publication Number Publication Date
DE862992C true DE862992C (en) 1953-01-15

Family

ID=6954993

Family Applications (1)

Application Number Title Priority Date Filing Date
DEB6948D Expired DE862992C (en) 1942-08-08 1942-08-08 Process for the production of tantalum-containing coatings

Country Status (1)

Country Link
DE (1) DE862992C (en)

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