DE69902967D1 - Präzisionsreplikation mittels chemischer Dampfphasenabscheidung - Google Patents
Präzisionsreplikation mittels chemischer DampfphasenabscheidungInfo
- Publication number
- DE69902967D1 DE69902967D1 DE69902967T DE69902967T DE69902967D1 DE 69902967 D1 DE69902967 D1 DE 69902967D1 DE 69902967 T DE69902967 T DE 69902967T DE 69902967 T DE69902967 T DE 69902967T DE 69902967 D1 DE69902967 D1 DE 69902967D1
- Authority
- DE
- Germany
- Prior art keywords
- vapor deposition
- chemical vapor
- precision replication
- replication
- precision
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/072,957 US6042758A (en) | 1998-05-05 | 1998-05-05 | Precision replication by chemical vapor deposition |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69902967D1 true DE69902967D1 (de) | 2002-10-24 |
DE69902967T2 DE69902967T2 (de) | 2003-05-28 |
Family
ID=22110809
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69902967T Expired - Lifetime DE69902967T2 (de) | 1998-05-05 | 1999-04-29 | Präzisionsreplikation mittels chemischer Dampfphasenabscheidung |
Country Status (5)
Country | Link |
---|---|
US (1) | US6042758A (de) |
EP (1) | EP0955392B1 (de) |
JP (1) | JP4615644B2 (de) |
DE (1) | DE69902967T2 (de) |
IL (1) | IL129750A (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6641767B2 (en) * | 2000-03-10 | 2003-11-04 | 3M Innovative Properties Company | Methods for replication, replicated articles, and replication tools |
US6616870B1 (en) | 2000-08-07 | 2003-09-09 | Shipley Company, L.L.C. | Method of producing high aspect ratio domes by vapor deposition |
US8114505B2 (en) * | 2003-12-05 | 2012-02-14 | Morgan Advanced Ceramics, Inc. | Free-standing silicon carbide articles formed by chemical vapor deposition and methods for their manufacture |
US20050123713A1 (en) * | 2003-12-05 | 2005-06-09 | Forrest David T. | Articles formed by chemical vapor deposition and methods for their manufacture |
US20060250672A1 (en) * | 2005-05-06 | 2006-11-09 | Ealey Mark A | Agile mandrel apparatus and method |
IL220677A (en) | 2011-06-30 | 2017-02-28 | Rohm & Haas Elect Mat | Transparent conductive items |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54113610A (en) * | 1978-02-25 | 1979-09-05 | Nippon Carbon Co Ltd | Production of heat decomposed metal carbide formed body |
US4332751A (en) * | 1980-03-13 | 1982-06-01 | The United States Of America As Represented By The United States Department Of Energy | Method for fabricating thin films of pyrolytic carbon |
US4978577A (en) * | 1989-04-12 | 1990-12-18 | Cvd Incorporated | Method for preparing laminates of ZnSe and ZnS |
US4963393A (en) * | 1989-09-07 | 1990-10-16 | Cvd Incorporated | Method to prevent backside growth on substrates in a vapor deposition system |
US5071596A (en) * | 1989-10-23 | 1991-12-10 | Cvd Incorporated | Fabrication of lightweight ceramic mirrors by means of a chemical vapor deposition process |
US4997678A (en) * | 1989-10-23 | 1991-03-05 | Cvd Incorporated | Chemical vapor deposition process to replicate the finish and figure of preshaped structures |
US4990374A (en) * | 1989-11-28 | 1991-02-05 | Cvd Incorporated | Selective area chemical vapor deposition |
US5264071A (en) * | 1990-06-13 | 1993-11-23 | General Electric Company | Free standing diamond sheet and method and apparatus for making same |
GB2250029A (en) * | 1990-11-23 | 1992-05-27 | Marconi Gec Ltd | Perovskite lead scandium tantalate film |
US5183689A (en) * | 1991-07-15 | 1993-02-02 | Cvd, Inc. | Process for an improved laminated of znse and zns |
US5175929A (en) * | 1992-03-04 | 1993-01-05 | General Electric Company | Method for producing articles by chemical vapor deposition |
US5314652A (en) * | 1992-11-10 | 1994-05-24 | Norton Company | Method for making free-standing diamond film |
US5453233A (en) * | 1993-04-05 | 1995-09-26 | Cvd, Inc. | Method of producing domes of ZNS and ZNSE via a chemical vapor deposition technique |
CA2120175A1 (en) * | 1993-04-29 | 1994-10-30 | Louis K. Bigelow | Method for making a diamond coated structure |
AU699028B2 (en) * | 1995-10-05 | 1998-11-19 | Raytheon Company | Durable visible/laser/medium wave infrared composite window |
-
1998
- 1998-05-05 US US09/072,957 patent/US6042758A/en not_active Expired - Lifetime
-
1999
- 1999-04-29 DE DE69902967T patent/DE69902967T2/de not_active Expired - Lifetime
- 1999-04-29 EP EP99303378A patent/EP0955392B1/de not_active Expired - Lifetime
- 1999-04-30 JP JP12433999A patent/JP4615644B2/ja not_active Expired - Lifetime
- 1999-05-03 IL IL12975099A patent/IL129750A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0955392A1 (de) | 1999-11-10 |
JPH11335840A (ja) | 1999-12-07 |
DE69902967T2 (de) | 2003-05-28 |
EP0955392B1 (de) | 2002-09-18 |
US6042758A (en) | 2000-03-28 |
IL129750A (en) | 2003-06-24 |
IL129750A0 (en) | 2000-02-29 |
JP4615644B2 (ja) | 2011-01-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8328 | Change in the person/name/address of the agent |
Representative=s name: MUELLER-BORE & PARTNER, PATENTANWAELTE, EUROPEAN PAT |