DE69737211D1 - Integrierte mikrowellenschaltungen und verfahren zur herstellung derselben - Google Patents

Integrierte mikrowellenschaltungen und verfahren zur herstellung derselben

Info

Publication number
DE69737211D1
DE69737211D1 DE69737211T DE69737211T DE69737211D1 DE 69737211 D1 DE69737211 D1 DE 69737211D1 DE 69737211 T DE69737211 T DE 69737211T DE 69737211 T DE69737211 T DE 69737211T DE 69737211 D1 DE69737211 D1 DE 69737211D1
Authority
DE
Germany
Prior art keywords
manufacturing
same
microwave circuits
integrated microwave
integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69737211T
Other languages
English (en)
Other versions
DE69737211T2 (de
Inventor
Edward Boles
Lee Goodrich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MACOM Technology Solutions Holdings Inc
Original Assignee
Whitaker LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Whitaker LLC filed Critical Whitaker LLC
Publication of DE69737211D1 publication Critical patent/DE69737211D1/de
Application granted granted Critical
Publication of DE69737211T2 publication Critical patent/DE69737211T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814—Conductive parts
    • H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/486—Via connections through the substrate with or without pins
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64—Impedance arrangements
    • H01L23/66—High-frequency adaptations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0605—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits made of compound material, e.g. AIIIBV
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30—Technical effects
    • H01L2924/301—Electrical effects
    • H01L2924/3011—Impedance

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
DE69737211T 1996-03-22 1997-03-17 Integrierte mikrowellenschaltungen und verfahren zur herstellung derselben Expired - Lifetime DE69737211T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US1712096P 1996-03-22 1996-03-22
US1398296P 1996-03-22 1996-03-22
US17120P 1996-03-22
US13982P 1996-03-22
PCT/US1997/003468 WO1997035340A1 (en) 1996-03-22 1997-03-17 Heterolithic microwave integrated circuits and process of making hmic circuits

Publications (2)

Publication Number Publication Date
DE69737211D1 true DE69737211D1 (de) 2007-02-15
DE69737211T2 DE69737211T2 (de) 2007-11-08

Family

ID=26685506

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69737211T Expired - Lifetime DE69737211T2 (de) 1996-03-22 1997-03-17 Integrierte mikrowellenschaltungen und verfahren zur herstellung derselben

Country Status (3)

Country Link
EP (1) EP0963602B1 (de)
DE (1) DE69737211T2 (de)
WO (1) WO1997035340A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6114716A (en) * 1996-03-22 2000-09-05 The Whitaker Corporation Heterolithic microwave integrated circuits
US6014064A (en) * 1996-07-28 2000-01-11 The Whitaker Corporation Heterolithic voltage controlled oscillator
US6150197A (en) * 1997-04-25 2000-11-21 The Whitaker Corp. Method of fabricating heterolithic microwave integrated circuits
US5841184A (en) * 1997-09-19 1998-11-24 The Whitaker Corporation Integrated emitter drain bypass capacitor for microwave/RF power device applications
US6379785B1 (en) 1997-12-31 2002-04-30 Tyco Electronic Corp Glass-coated substrates for high frequency applications
US6191048B1 (en) 1997-12-31 2001-02-20 The Whitaker Corporation Process for manufacturing composite glass/Si substrates for microwave integrated circuit fabrication
US6329702B1 (en) * 2000-07-06 2001-12-11 Tyco Electronics Corporation High frequency carrier

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2631488B1 (fr) * 1988-05-10 1990-07-27 Thomson Hybrides Microondes Circuit integre hyperfrequence de type planar, comportant au moins un composant mesa, et son procede de fabrication
US5254491A (en) * 1991-09-23 1993-10-19 Motorola, Inc. Method of making a semiconductor device having improved frequency response
JPH06125208A (ja) * 1992-10-09 1994-05-06 Mitsubishi Electric Corp マイクロ波集積回路およびその製造方法
US5268310A (en) * 1992-11-25 1993-12-07 M/A-Com, Inc. Method for making a mesa type PIN diode

Also Published As

Publication number Publication date
DE69737211T2 (de) 2007-11-08
EP0963602B1 (de) 2007-01-03
EP0963602A1 (de) 1999-12-15
WO1997035340A1 (en) 1997-09-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: M/A-COM TECHNOLOGY SOLUTIONS HOLDINGS, INC., L, US

8328 Change in the person/name/address of the agent

Representative=s name: WAGNER & GEYER PARTNERSCHAFT PATENT- UND RECHTSANW