DE69707162D1 - Verfahren zur herstellung von oberflächenwellenanordnungen - Google Patents

Verfahren zur herstellung von oberflächenwellenanordnungen

Info

Publication number
DE69707162D1
DE69707162D1 DE69707162T DE69707162T DE69707162D1 DE 69707162 D1 DE69707162 D1 DE 69707162D1 DE 69707162 T DE69707162 T DE 69707162T DE 69707162 T DE69707162 T DE 69707162T DE 69707162 D1 DE69707162 D1 DE 69707162D1
Authority
DE
Germany
Prior art keywords
surface wave
producing surface
wave arrangements
arrangements
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69707162T
Other languages
English (en)
Other versions
DE69707162T2 (de
Inventor
R Seniuk
Ji-Dong Dai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nortel Networks Ltd
Original Assignee
Nortel Networks Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nortel Networks Ltd filed Critical Nortel Networks Ltd
Publication of DE69707162D1 publication Critical patent/DE69707162D1/de
Application granted granted Critical
Publication of DE69707162T2 publication Critical patent/DE69707162T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
DE69707162T 1997-04-24 1997-07-16 Verfahren zur herstellung von oberflächenwellenanordnungen Expired - Fee Related DE69707162T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/847,528 US5972568A (en) 1997-04-24 1997-04-24 Method of making surface wave devices
PCT/CA1997/000510 WO1998049772A1 (en) 1997-04-24 1997-07-16 Method of making surface wave devices

Publications (2)

Publication Number Publication Date
DE69707162D1 true DE69707162D1 (de) 2001-11-08
DE69707162T2 DE69707162T2 (de) 2002-07-04

Family

ID=25300855

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69707162T Expired - Fee Related DE69707162T2 (de) 1997-04-24 1997-07-16 Verfahren zur herstellung von oberflächenwellenanordnungen

Country Status (6)

Country Link
US (1) US5972568A (de)
EP (1) EP0985267B1 (de)
JP (1) JP2000510611A (de)
DE (1) DE69707162T2 (de)
HK (1) HK1026527A1 (de)
WO (1) WO1998049772A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6605412B2 (en) * 2000-02-18 2003-08-12 Murata Manufacturing Co., Ltd. Resist pattern and method for forming wiring pattern
US6528238B1 (en) 2000-09-22 2003-03-04 David Seniuk Methods for making patterns in radiation sensitive polymers
US6635405B1 (en) 2000-09-22 2003-10-21 Bookham Technology, Plc Print quality test structure for lithographic device manufacturing
US6924083B2 (en) * 2002-10-18 2005-08-02 Tai-Saw Technology Co., Ltd. Mask layout and exposing method for reducing diffraction effects by using a single mask in the process of semiconductor production
US7256873B2 (en) * 2004-01-28 2007-08-14 Asml Netherlands B.V. Enhanced lithographic resolution through double exposure
DE102006018928A1 (de) * 2006-04-24 2007-11-08 Carl Zeiss Smt Ag Projektionsbelichtungssystem und Verwendung desselben
CN101587099B (zh) * 2008-05-21 2012-03-28 鸿富锦精密工业（深圳）有限公司 表面声波感测器的制作方法
US9960038B2 (en) * 2010-12-27 2018-05-01 Brewer Science, Inc. Processes to pattern small features for advanced patterning needs

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4690880A (en) * 1984-07-20 1987-09-01 Canon Kabushiki Kaisha Pattern forming method
US5344745A (en) * 1988-10-16 1994-09-06 Yamanochi Kazuhiko Method for the manufacture of surface acoustic wave transducer
JP2892765B2 (ja) * 1990-04-27 1999-05-17 株式会社日立製作所 パターン構造を有する素子の製造方法
US5563012A (en) * 1994-06-30 1996-10-08 International Business Machines Corporation Multi mask method for selective mask feature enhancement

Also Published As

Publication number Publication date
JP2000510611A (ja) 2000-08-15
EP0985267B1 (de) 2001-10-04
WO1998049772A1 (en) 1998-11-05
EP0985267A1 (de) 2000-03-15
HK1026527A1 (en) 2000-12-15
DE69707162T2 (de) 2002-07-04
US5972568A (en) 1999-10-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee