DE69326928D1 - Verfahren zur Messung des Brechungsindexes einer dünnen Schicht - Google Patents

Verfahren zur Messung des Brechungsindexes einer dünnen Schicht

Info

Publication number
DE69326928D1
DE69326928D1 DE69326928T DE69326928T DE69326928D1 DE 69326928 D1 DE69326928 D1 DE 69326928D1 DE 69326928 T DE69326928 T DE 69326928T DE 69326928 T DE69326928 T DE 69326928T DE 69326928 D1 DE69326928 D1 DE 69326928D1
Authority
DE
Germany
Prior art keywords
measuring
refractive index
thin layer
thin
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69326928T
Other languages
English (en)
Other versions
DE69326928T2 (de
Inventor
Shinichiro Saisho
Toshinobu Ikeda
Akira Odagiri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shincron Co Ltd
Original Assignee
Shincron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shincron Co Ltd filed Critical Shincron Co Ltd
Publication of DE69326928D1 publication Critical patent/DE69326928D1/de
Application granted granted Critical
Publication of DE69326928T2 publication Critical patent/DE69326928T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
DE69326928T 1992-08-31 1993-08-31 Verfahren zur Messung des Brechungsindexes einer dünnen Schicht Expired - Lifetime DE69326928T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25746392A JP3309101B2 (ja) 1992-08-31 1992-08-31 薄膜の屈折率測定方法および装置

Publications (2)

Publication Number Publication Date
DE69326928D1 true DE69326928D1 (de) 1999-12-09
DE69326928T2 DE69326928T2 (de) 2000-02-17

Family

ID=17306670

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69326928T Expired - Lifetime DE69326928T2 (de) 1992-08-31 1993-08-31 Verfahren zur Messung des Brechungsindexes einer dünnen Schicht

Country Status (4)

Country Link
US (1) US5414506A (de)
EP (1) EP0585883B1 (de)
JP (1) JP3309101B2 (de)
DE (1) DE69326928T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH074922A (ja) * 1993-06-21 1995-01-10 Jasco Corp 半導体多層薄膜膜厚測定装置およびその測定方法
US5980975A (en) * 1994-05-31 1999-11-09 Toray Industries, Inc. Thin-film-coated substrate manufacturing methods having improved film formation monitoring and manufacturing apparatus
US5870185A (en) * 1996-10-21 1999-02-09 C.F.C. Technology, Inc. Apparatus and method for fluid analysis
US6020957A (en) * 1998-04-30 2000-02-01 Kla-Tencor Corporation System and method for inspecting semiconductor wafers
US6649208B2 (en) * 2001-04-17 2003-11-18 Wayne E. Rodgers Apparatus and method for thin film deposition onto substrates
JP3723845B2 (ja) * 2002-03-26 2005-12-07 国立大学法人富山大学 有機エレクトロルミネッセンス素子に使用される有機薄膜の膜厚測定法および測定装置
US6985222B2 (en) * 2003-04-25 2006-01-10 Taiwan Semiconductor Manufacturing Company, Ltd. Chamber leakage detection by measurement of reflectivity of oxidized thin film
US6972136B2 (en) * 2003-05-23 2005-12-06 Optima, Inc. Ultra low residual reflection, low stress lens coating and vacuum deposition method for making the same
US7248350B2 (en) * 2004-04-27 2007-07-24 E. I. Du Pont De Nemours And Company Non-destructive method of determining the refractive index of clear coats
CN1320352C (zh) * 2004-11-18 2007-06-06 上海交通大学 用精密反射仪同时测量聚合物薄膜折射率和厚度的方法
EA008187B1 (ru) * 2005-06-07 2007-04-27 Владимир Яковлевич ШИРИПОВ Способ очистки теневых масок в производстве дисплеев (варианты) и устройство для его реализации
CN105738379B (zh) * 2014-12-12 2018-10-19 上海和辉光电有限公司 一种多晶硅薄膜的检测装置及检测方法
US10916462B2 (en) * 2017-10-25 2021-02-09 Kla-Tencor Corporation Laser marking focus feedback system having an intensity indication of reflected radiation passed through an objective lens, a beam splitter and a pinhole
US10475710B1 (en) 2018-07-13 2019-11-12 Uchicago Argonne, Llc Method of characterizing the anisotropic, complex dielectric constant for materials with small dimensions
US11154828B2 (en) 2018-09-14 2021-10-26 Uchicago Argonne, Llc Turbulent mixing by microscopic self-assembled spinners
DE102018124175A1 (de) * 2018-10-01 2020-04-02 Sikora Ag Verfahren und Vorrichtung zum Steuern einer Produktionsanlage für plattenförmige oder strangförmige Körper
CN111239498B (zh) * 2020-03-18 2022-05-31 山东国瓷功能材料股份有限公司 材料介电性能的测试装置和测试方法
CN111487470B (zh) * 2020-03-18 2022-05-31 山东国瓷功能材料股份有限公司 材料介电性能的测试装置和方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1555706A (de) * 1967-11-15 1969-01-31
US3744916A (en) * 1971-06-08 1973-07-10 Us Navy Optical film thickness monitor
JPS57158373A (en) * 1981-03-26 1982-09-30 Canon Inc Method and device for controlling film thickness of vacuum deposited film
US4707611A (en) * 1986-12-08 1987-11-17 Rockwell International Corporation Incremental monitoring of thin films

Also Published As

Publication number Publication date
JP3309101B2 (ja) 2002-07-29
US5414506A (en) 1995-05-09
EP0585883A1 (de) 1994-03-09
EP0585883B1 (de) 1999-11-03
JPH0682369A (ja) 1994-03-22
DE69326928T2 (de) 2000-02-17

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