DE69026339D1 - Josephson-Übergang-Apparat - Google Patents

Josephson-Übergang-Apparat

Info

Publication number
DE69026339D1
DE69026339D1 DE69026339T DE69026339T DE69026339D1 DE 69026339 D1 DE69026339 D1 DE 69026339D1 DE 69026339 T DE69026339 T DE 69026339T DE 69026339 T DE69026339 T DE 69026339T DE 69026339 D1 DE69026339 D1 DE 69026339D1
Authority
DE
Germany
Prior art keywords
transition apparatus
josephson
josephson transition
transition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69026339T
Other languages
English (en)
Other versions
DE69026339T2 (de
Inventor
Hiromasa Hoko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1294541A external-priority patent/JPH03154386A/ja
Priority claimed from JP2014694A external-priority patent/JPH03219680A/ja
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE69026339D1 publication Critical patent/DE69026339D1/de
Application granted granted Critical
Publication of DE69026339T2 publication Critical patent/DE69026339T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/10—Junction-based devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N69/00—Integrated devices, or assemblies of multiple devices, comprising at least one superconducting element covered by group H10N60/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0912—Manufacture or treatment of Josephson-effect devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/728—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/80—Material per se process of making same
    • Y10S505/815—Process of making per se
    • Y10S505/816—Sputtering, including coating, forming, or etching
    • Y10S505/817—Sputtering, including coating, forming, or etching forming josephson element
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/80—Material per se process of making same
    • Y10S505/815—Process of making per se
    • Y10S505/818—Coating
    • Y10S505/82—And etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/825—Apparatus per se, device per se, or process of making or operating same
    • Y10S505/842—Measuring and testing
    • Y10S505/843—Electrical
    • Y10S505/845—Magnetometer

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Laminated Bodies (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)
DE69026339T 1989-11-13 1990-11-12 Josephson-Übergang-Apparat Expired - Fee Related DE69026339T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1294541A JPH03154386A (ja) 1989-11-13 1989-11-13 ジョセフソン接合装置およびその製造方法
JP2014694A JPH03219680A (ja) 1990-01-24 1990-01-24 ジョセフソン接合の作製方法

Publications (2)

Publication Number Publication Date
DE69026339D1 true DE69026339D1 (de) 1996-05-09
DE69026339T2 DE69026339T2 (de) 1996-08-14

Family

ID=26350708

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69026339T Expired - Fee Related DE69026339T2 (de) 1989-11-13 1990-11-12 Josephson-Übergang-Apparat

Country Status (4)

Country Link
US (2) US5131976A (de)
EP (1) EP0428357B1 (de)
KR (1) KR940006778B1 (de)
DE (1) DE69026339T2 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5506200A (en) * 1992-02-06 1996-04-09 Biomagnetic Technologies, Inc. Compact superconducting magnetometer having no vacuum insulation
JPH06196764A (ja) * 1990-10-29 1994-07-15 Biomagnetic Technol Inc ポリマー絶縁材料を用いるスクイッド
US5269882A (en) * 1991-01-28 1993-12-14 Sarcos Group Method and apparatus for fabrication of thin film semiconductor devices using non-planar, exposure beam lithography
US5955776A (en) * 1996-12-04 1999-09-21 Ball Semiconductor, Inc. Spherical shaped semiconductor integrated circuit
JPH10321883A (ja) * 1997-05-16 1998-12-04 Semiconductor Energy Lab Co Ltd 太陽電池およびその作製方法
US6063200A (en) * 1998-02-10 2000-05-16 Sarcos L.C. Three-dimensional micro fabrication device for filamentary substrates
US6251550B1 (en) 1998-07-10 2001-06-26 Ball Semiconductor, Inc. Maskless photolithography system that digitally shifts mask data responsive to alignment data
US6529262B1 (en) 1999-04-14 2003-03-04 Ball Semiconductor, Inc. System and method for performing lithography on a substrate
US6379867B1 (en) 2000-01-10 2002-04-30 Ball Semiconductor, Inc. Moving exposure system and method for maskless lithography system
US6425669B1 (en) 2000-05-24 2002-07-30 Ball Semiconductor, Inc. Maskless exposure system
US6509955B2 (en) 2000-05-25 2003-01-21 Ball Semiconductor, Inc. Lens system for maskless photolithography
JP3846221B2 (ja) * 2000-07-14 2006-11-15 株式会社村田製作所 弾性表面波素子
US6493867B1 (en) 2000-08-08 2002-12-10 Ball Semiconductor, Inc. Digital photolithography system for making smooth diagonal components
US6537738B1 (en) 2000-08-08 2003-03-25 Ball Semiconductor, Inc. System and method for making smooth diagonal components with a digital photolithography system
JP2002141253A (ja) * 2000-10-31 2002-05-17 Disco Abrasive Syst Ltd 半導体装置
US6498643B1 (en) 2000-11-13 2002-12-24 Ball Semiconductor, Inc. Spherical surface inspection system
US6512625B2 (en) 2000-11-22 2003-01-28 Ball Semiconductor, Inc. Light modulation device and system
US6473237B2 (en) 2000-11-14 2002-10-29 Ball Semiconductor, Inc. Point array maskless lithography
US6433917B1 (en) 2000-11-22 2002-08-13 Ball Semiconductor, Inc. Light modulation device and system
US20030025979A1 (en) * 2001-07-31 2003-02-06 Ball Semiconductor, Inc. Surface distortion compensated photolithography
US6965387B2 (en) * 2001-08-03 2005-11-15 Ball Semiconductor, Inc. Real time data conversion for a digital display
AU2002322943A1 (en) * 2001-08-29 2003-03-10 D-Wave Systems, Inc. Submicron closed-form josephson junctions
US6870604B2 (en) * 2002-04-23 2005-03-22 Ball Semiconductor, Inc. High resolution point array
US7164961B2 (en) * 2002-06-14 2007-01-16 Disco Corporation Modified photolithography movement system
US7327022B2 (en) * 2002-12-30 2008-02-05 General Electric Company Assembly, contact and coupling interconnection for optoelectronics
US6926921B2 (en) 2003-05-05 2005-08-09 Hewlett-Packard Development Company, L.P. Imprint lithography for superconductor devices
US7615385B2 (en) 2006-09-20 2009-11-10 Hypres, Inc Double-masking technique for increasing fabrication yield in superconducting electronics
US9768371B2 (en) 2012-03-08 2017-09-19 D-Wave Systems Inc. Systems and methods for fabrication of superconducting integrated circuits
GB201515620D0 (en) * 2015-09-03 2015-10-21 New Royal Holloway & Bedford Superconducting device and method of manufacturing a superconducting device
KR102651056B1 (ko) 2016-08-18 2024-03-26 삼성디스플레이 주식회사 디스플레이 장치
WO2018144601A1 (en) 2017-02-01 2018-08-09 D-Wave Systems Inc. Systems and methods for fabrication of superconducting integrated circuits
US20200152851A1 (en) 2018-11-13 2020-05-14 D-Wave Systems Inc. Systems and methods for fabricating superconducting integrated circuits

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3409466A (en) * 1965-01-06 1968-11-05 Texas Instruments Inc Process for electrolessly plating lead on copper
DE2856885C2 (de) * 1978-12-30 1981-02-12 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe Verfahren zur Herstellung eines flexiblen Supraleiters, bestehend aus einer C-Faser mit einer dünnen Schicht einer Niobverbindung der allgemeinen Formel NbC χ Ny und einer äußeren hochleitfähigen Metallschicht
CA1168762A (en) * 1981-06-22 1984-06-05 Osamu Michikami Method of fabrication for josephson tunnel junction
US4759986A (en) * 1986-10-23 1988-07-26 Hoechst Celanese Corporation Electrically conductive polybenzimidazole fibrous material
US4868008A (en) * 1986-10-23 1989-09-19 Hoechst Celanese Corp. Process for preparing electrically conductive shaped articles from polybenzimidazoles
US5017420A (en) * 1986-10-23 1991-05-21 Hoechst Celanese Corp. Process for preparing electrically conductive shaped articles from polybenzimidazoles
JPS63266889A (ja) * 1987-04-24 1988-11-02 Hitachi Ltd ジヨセフソン接合装置
US5017551A (en) * 1987-05-04 1991-05-21 Eastman Kodak Company Barrier layer containing conductive articles
US4950643A (en) * 1988-03-25 1990-08-21 Eastman Kodak Company Metalorganic deposition process for preparing heavy pnictide superconducting oxide films
US4939308A (en) * 1988-04-29 1990-07-03 Allied-Signal Inc. Method of forming crystallite-oriented superconducting ceramics by electrodeposition and thin film superconducting ceramic made thereby
US5034374A (en) * 1988-06-13 1991-07-23 Fujitsu Limited Method of producing high temperature superconductor Josephson element
US4956335A (en) * 1988-06-20 1990-09-11 Eastman Kodak Company Conductive articles and processes for their preparation
JPH02177381A (ja) * 1988-09-22 1990-07-10 Semiconductor Energy Lab Co Ltd 超伝導体のトンネル接合素子
JP2796099B2 (ja) * 1988-10-03 1998-09-10 松下電器産業株式会社 超電導素子
US4964945A (en) * 1988-12-09 1990-10-23 Minnesota Mining And Manufacturing Company Lift off patterning process on a flexible substrate
US4988674A (en) * 1989-02-09 1991-01-29 Eastman Kodak Company Electrically conductive articles and processes for their fabrication
US5073537A (en) * 1990-02-06 1991-12-17 Eastman Kodak Company Electrically conductive article

Also Published As

Publication number Publication date
KR940006778B1 (ko) 1994-07-27
KR910010762A (ko) 1991-06-29
US5436471A (en) 1995-07-25
US5131976A (en) 1992-07-21
EP0428357A2 (de) 1991-05-22
EP0428357B1 (de) 1996-04-03
DE69026339T2 (de) 1996-08-14
EP0428357A3 (en) 1991-08-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee