DE69015820D1 - Process for producing a copper thin layer by chemical vapor deposition at low temperature. - Google Patents

Process for producing a copper thin layer by chemical vapor deposition at low temperature.

Info

Publication number
DE69015820D1
DE69015820D1 DE69015820T DE69015820T DE69015820D1 DE 69015820 D1 DE69015820 D1 DE 69015820D1 DE 69015820 T DE69015820 T DE 69015820T DE 69015820 T DE69015820 T DE 69015820T DE 69015820 D1 DE69015820 D1 DE 69015820D1
Authority
DE
Germany
Prior art keywords
producing
low temperature
vapor deposition
chemical vapor
thin layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69015820T
Other languages
German (de)
Other versions
DE69015820T2 (en
Inventor
Pierre Claverie
Masao Kimura
Juichi Arai
Pierre Jalby
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Priority claimed from EP90402924A external-priority patent/EP0482265B1/en
Publication of DE69015820D1 publication Critical patent/DE69015820D1/en
Application granted granted Critical
Publication of DE69015820T2 publication Critical patent/DE69015820T2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

DE1990615820 1990-10-18 1990-10-18 Process for producing a copper thin layer by chemical vapor deposition at low temperature. Expired - Fee Related DE69015820T2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP90402924A EP0482265B1 (en) 1989-10-12 1990-10-18 Method of forming a thin copper film by low temperature CVD

Publications (2)

Publication Number Publication Date
DE69015820D1 true DE69015820D1 (en) 1995-02-16
DE69015820T2 DE69015820T2 (en) 1995-05-11

Family

ID=8205765

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1990615820 Expired - Fee Related DE69015820T2 (en) 1990-10-18 1990-10-18 Process for producing a copper thin layer by chemical vapor deposition at low temperature.

Country Status (2)

Country Link
AT (1) ATE116691T1 (en)
DE (1) DE69015820T2 (en)

Also Published As

Publication number Publication date
ATE116691T1 (en) 1995-01-15
DE69015820T2 (en) 1995-05-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee