Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges ClaudefiledCriticalAir Liquide SA
Priority claimed from EP90402924Aexternal-prioritypatent/EP0482265B1/en
Publication of DE69015820D1publicationCriticalpatent/DE69015820D1/en
Application grantedgrantedCritical
Publication of DE69015820T2publicationCriticalpatent/DE69015820T2/en
DE19906158201990-10-181990-10-18
Process for producing a copper thin layer by chemical vapor deposition at low temperature.
Expired - Fee RelatedDE69015820T2
(en)