DE68914421T2 - Method and device using an ECR source for the production of uploaded heavy ions. - Google Patents

Method and device using an ECR source for the production of uploaded heavy ions.

Info

Publication number
DE68914421T2
DE68914421T2 DE1989614421 DE68914421T DE68914421T2 DE 68914421 T2 DE68914421 T2 DE 68914421T2 DE 1989614421 DE1989614421 DE 1989614421 DE 68914421 T DE68914421 T DE 68914421T DE 68914421 T2 DE68914421 T2 DE 68914421T2
Authority
DE
Germany
Prior art keywords
uploaded
production
heavy ions
ecr source
ecr
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1989614421
Other languages
German (de)
Other versions
DE68914421D1 (en
Inventor
Bernard Jacquot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Application granted granted Critical
Publication of DE68914421D1 publication Critical patent/DE68914421D1/en
Publication of DE68914421T2 publication Critical patent/DE68914421T2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
    • H05H1/18—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields wherein the fields oscillate at very high frequency, e.g. in the microwave range, e.g. using cyclotron resonance

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Particle Accelerators (AREA)
DE1989614421 1988-12-08 1989-12-06 Method and device using an ECR source for the production of uploaded heavy ions. Expired - Fee Related DE68914421T2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8816141A FR2640411B1 (en) 1988-12-08 1988-12-08 METHOD AND DEVICE USING AN RCE SOURCE FOR THE PRODUCTION OF HIGHLY CHARGED HEAVY IONS

Publications (2)

Publication Number Publication Date
DE68914421D1 DE68914421D1 (en) 1994-05-11
DE68914421T2 true DE68914421T2 (en) 1994-11-10

Family

ID=9372718

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1989614421 Expired - Fee Related DE68914421T2 (en) 1988-12-08 1989-12-06 Method and device using an ECR source for the production of uploaded heavy ions.

Country Status (3)

Country Link
EP (1) EP0374011B1 (en)
DE (1) DE68914421T2 (en)
FR (1) FR2640411B1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1994003919A1 (en) * 1992-08-08 1994-02-17 Andrae Juergen Process and device for generating beams of any highly charged ions having low kinetic energy
ATA4694A (en) * 1994-01-13 1994-11-15 Ims Ionen Mikrofab Syst PROJECTION SYSTEM FOR CHARGED PARTICLES

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3634704A (en) * 1970-09-02 1972-01-11 Atomic Energy Commission Apparatus for the production of highly stripped ions
FR2475798A1 (en) * 1980-02-13 1981-08-14 Commissariat Energie Atomique METHOD AND DEVICE FOR PRODUCING HIGHLY CHARGED HEAVY IONS AND AN APPLICATION USING THE METHOD
FR2595868B1 (en) * 1986-03-13 1988-05-13 Commissariat Energie Atomique ION SOURCE WITH ELECTRONIC CYCLOTRON RESONANCE WITH COAXIAL INJECTION OF ELECTROMAGNETIC WAVES

Also Published As

Publication number Publication date
EP0374011A1 (en) 1990-06-20
FR2640411B1 (en) 1994-04-29
FR2640411A1 (en) 1990-06-15
DE68914421D1 (en) 1994-05-11
EP0374011B1 (en) 1994-04-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee