DE609659C - Process for the production of high colloid reliefs for relief printing purposes - Google Patents

Process for the production of high colloid reliefs for relief printing purposes

Info

Publication number
DE609659C
DE609659C DEI46504D DEI0046504D DE609659C DE 609659 C DE609659 C DE 609659C DE I46504 D DEI46504 D DE I46504D DE I0046504 D DEI0046504 D DE I0046504D DE 609659 C DE609659 C DE 609659C
Authority
DE
Germany
Prior art keywords
reliefs
layers
colloid
production
relief printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DEI46504D
Other languages
German (de)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IG Farbenindustrie AG
Original Assignee
IG Farbenindustrie AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IG Farbenindustrie AG filed Critical IG Farbenindustrie AG
Priority to DEI46504D priority Critical patent/DE609659C/en
Application granted granted Critical
Publication of DE609659C publication Critical patent/DE609659C/en
Expired legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/04Chromates
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Description

Verfahren zum Herstellen hoher Kolloidreliefs für Hochdruckzwecke Zur photomechanischen Herstellung hoher Kolloidreliefs, die direkt oder indirekt, z. B. durch Abprägung, für Hochdruckzwecke Verwendung finden sollen, sind erfahrungsgemäß sehr lange Belichtungszeiten erforderlich, da das wirksame ultraviolette und blaue Licht fast vollständig von den obersten Schichten des sensibilisierten Kolloids adsorbiert wird und in die tieferen Schichten des sensibilisierten Kolloids nur Spuren des wirksamen Lichtes eindringen. Außerdem macht sich bei der Verwendung der für die Erzeugung hoher Reliefs erforderlichen dicken Kolloidschichten die Lichtstreuung in der lichtempfindlichen Schicht störend bemerkbar, die die Wiedergabe von unmittelbar nebeneinanderstehenden Schwarz- und Weißwerten mit gestochener Schärfe stark beeinträchtigt.Process for producing high colloid reliefs for relief printing purposes For the photomechanical production of high colloid reliefs, which are directly or indirectly, z. B. by imprinting, should be used for high pressure purposes, experience has shown very long exposure times are required because the effective ultraviolet and blue Light almost entirely from the top layers of the sensitized colloid is adsorbed and into the deeper layers of the sensitized colloid only Traces of the effective light penetrate. It also makes itself felt in use of the thick colloid layers required for the creation of high reliefs, the light scattering disturbing noticeable in the light-sensitive layer, which immediately affects the reproduction Side by side black and white values with razor sharp sharpness are severely impaired.

Es ist bekannt, bei Stein- und Offsetdruck den Bildträger der Druckform aus zwei Schichten herzustellen, um eine gute Abstufung von den- höchsten Lichtern über die Halb- und Mitteltöne bis zu den Tiefen zu erhalten, wobei beide Schichten nach der jeweiligen Belichtung einzeln entwickelt werden. Nach dem Verfahren der. vorliegenden Erfindung handelt es sich um die Herstellung hoher Auswaschreliefs für den Hochdruck, die man dadurch erzeugt, daß man das Relief aus mehreren verhältnismäßig dünnen, lichtempfindlichen Schichten aufbaut, indem man diese Schichten nacheinander auf den Schichtträger aufbringt, sie nacheinander registerhältig unter dem Negativ belichtet und das Auswaschen des fertig belichteten endgaltigen Reliefs erst nach Erreichung der erforderlichen Schichthöhe vornimmt. Auf diese Weise hat bei jeder kurzen Einzelbelichtung das Licht immer nur eine ganz geringe Schicht des sensibilisierten Kolloids zu durchdringen. Bei der Belichtung der dünnen Schichten kann ein merklicher Diffusionslichthof nicht entstehen, so daß die Wiedergabeschärfe erheblich verbessert wird. Außerdem geht in den dünnen Schichten fast kein wirksames Licht durch Absorption in bereits gehärtetem Kolloid ungenützt verloren, so daß die Summe der Einzelbelichtungen wesentlich geringer ist' als die Zeit der Dürchbelichtung einer einzigen lichtempfindlichen Schicht von der Dicke der aufeinandergelegten dünneren Schichten.It is known to use the image carrier of the printing form in stone and offset printing made of two layers to provide a good gradation from the highest lights get over the half and mid tones down to the lows, with both layers individually developed after each exposure. According to the procedure of. The present invention concerns the production of high washout reliefs for the letterpress, which is produced by making the relief from several proportionally Thin, photosensitive layers are built up by placing these layers one at a time applies to the substrate, one after the other in register under the negative exposed and the washing out of the finished exposed final relief only after Reaching the required layer height. This way everyone has short single exposure the light always only a very small layer of the sensitized Colloid to penetrate. When the thin layers are exposed, a noticeable Diffusion halo does not arise, so that the reproduction sharpness is considerably improved will. In addition, almost no effective light passes through absorption in the thin layers lost unused in already hardened colloid, so that the sum of the individual exposures is much less than the time of through-exposure of a single light-sensitive Layer of the thickness of the stacked thinner layers.

Das Verfahren wird z. B. in der Weise ausgeübt, daß auf einer vorläufigen oder endgültigen Unterlage zunächst eine relativ dünne Chromatkolloidschicht unter einem Negativ oder Positiv belichtet wird, und zwar so kurz, wie es zur Härtung der dünnen Schicht gerade genügt.The method is e.g. B. exercised in such a way that on a provisional or final support, first apply a relatively thin layer of chromate colloid underneath a negative or positive is exposed for as short a time as it takes to cure the thin layer is just enough.

Die sensibilisierende Substanz kann nun aus der belichteten Schicht ausgewaschen werden. Es kann aber auch auf die nicht ausgewaschene belichtete Schicht eine sensibilisierte Folie des gleichen oder eines anderen geeigneten Chromatkolloids aufgebracht werden, beispielsweise dadurch, daß .die belichtete Schicht mit einer Bichroinat-Dextrin-Lösung bestrichen und hiernach die Folie aufgequetscht wird. Nunmehr wird das gleiche Negativ genau registerecht nochmals darauf kopiert, so daß jetzt zwei Schichten eines belichteten Chromatkolloids im Passer übereinanderliegen. Dieses Verfahren wiederholt man so oft, bis die gewünschte Schichtdicke erreicht ist, und nimmt hiernach das Auswaschen oder Quellen des Reliefs zur Fertigstellung vor.The sensitizing substance can now come out of the exposed layer be washed out. However, it can also be applied to the exposed layer that has not been washed out a sensitized sheet of the same or another suitable chromate colloid be applied, for example by the fact that .the exposed layer with a The bichroinate dextrin solution was coated and the film was then squeezed on will. Now the same negative is copied onto it again in the exact register, see above that now two layers of an exposed chromate colloid are superimposed in the register. This process is repeated until the desired layer thickness is achieved and then wash or swell the relief to finish before.

Natürlich kann jede neu zu belichtende dünne Kolloidscbicht auch auf die vorher belichteten Schichten in gelöstem Zustande zusammen mit dem Sensibilisierungsmittel aufgegossen werden. Da jede einzelne Scl-icht nur etwa 2o #t dick ist, kann sie sehr schnell getrocknet werden. Bequemer und schneller ist aber das beschriebene Verfahren, bei dem die einzelnen Schichten aus vorher -fertigen, lichtempfindlich gemachten Folien bestehen, die in sehr zweckmäßiger Weise auch mit Hilfe eines geeigneten Trockenklebemittels durch Aufeinanderpressen unter Erwärmung miteinander verbunden werden können.Of course, each thin colloidal layer to be newly exposed can also be applied the previously exposed layers in a dissolved state together with the sensitizer to be infused. Since each and every one of them is only about 20 t thick, it can can be dried very quickly. But what is described is more convenient and faster Process in which the individual layers of previously -prepared, light-sensitive made foils exist, which in a very useful manner with the help of a suitable Dry adhesive bonded to one another by pressing together while heating can be.

Das Klebemittel kann in bekannter Weise selbst lichtempfindlich sein, wodurch das Haften der Schichten beim Auswaschen und Quellen wesentlich verbessert wird. Um die Folien bei der Sensibilisierung, die gegebenenfalls erst kurze Zeit vor der Verarbeitung erfolgt, bequem handhaben zu können, können sie in Form von Abziehschichten auf einem Schichtträger angebracht sein, von dem sie nach dem Sensibilisieren abgezogen werden. Als Sensibilisierungsmittel kommen außer Chromaten in bekannter Weise z. B. Eisensalze, organisch gerbende Stoffe, wie Antrachinondisulfosäure, Eosin usw., ir nage.The adhesive can itself be photosensitive in a known manner, whereby the adhesion of the layers during washing out and swelling significantly improves will. To the slides during the sensitization, possibly only a short time done before processing, convenient to handle, they can be in the form of Peel-off layers may be attached to a support from which they will be sensitized after they have been sensitized subtracted from. In addition to chromates, there are well-known sensitizers Way z. B. iron salts, organically tanning substances such as anthraquinone disulfonic acid, Eosin, etc., ir nage.

Claims (1)

PATENTANSPRUCH: Verfahren zum Herstellen hoher Kolloidreliefs für Hochdruckzwecke, dadurch gekennzeichnet, daß die Reliefs aus mehreren lichtempfindlichen Schichten, jede von nicht größerer Dicke als 2011, aufgebaut werden, die auf den Schichtträger nacheinander in Form von Lösungen aufgebracht oder in Form von Folien übereinandergeklebt und einzeln registerhaltend unter dem Negativ @ belichtet werden, worauf das Auswaschen .oder Quellen erst nach Erreichen der erforderlichen Schichthöhe erfolgt.PATENT CLAIM: Process for producing high colloid reliefs for Letterpress purposes, characterized in that the reliefs consist of several light-sensitive Layers, each not thicker than 2011, are built up on the Layers applied one after the other in the form of solutions or in the form of films glued on top of each other and exposed individually in register under the negative @, whereupon washing out or swelling only after reaching the required layer height he follows.
DEI46504D 1933-02-01 1933-02-02 Process for the production of high colloid reliefs for relief printing purposes Expired DE609659C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DEI46504D DE609659C (en) 1933-02-01 1933-02-02 Process for the production of high colloid reliefs for relief printing purposes

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEI0046504 1933-02-01
DEI46504D DE609659C (en) 1933-02-01 1933-02-02 Process for the production of high colloid reliefs for relief printing purposes

Publications (1)

Publication Number Publication Date
DE609659C true DE609659C (en) 1935-02-19

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1095665B (en) * 1959-01-12 1960-12-22 Hans Hoerner Process for the photomechanical production of letterpress forms from several plastic layers
US3851581A (en) * 1969-03-07 1974-12-03 Saint Gobain Manufacture of electrically heated windows
DE2413723A1 (en) * 1974-03-21 1975-09-25 Nat Printing Plate Co Photographic process for production of printing block - uses photolithographic layers which are built up to required thickness
FR2375629A1 (en) * 1976-12-27 1978-07-21 Ibm MULTI-LAYER CHARGING PLATE IN CERAMIC AND PHOTOSENSITIVE GLASS
EP0281770A1 (en) * 1987-02-14 1988-09-14 BASF Aktiengesellschaft Process for coating printing cylinders or cores with a continuous photosensitive registration layer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1095665B (en) * 1959-01-12 1960-12-22 Hans Hoerner Process for the photomechanical production of letterpress forms from several plastic layers
US3851581A (en) * 1969-03-07 1974-12-03 Saint Gobain Manufacture of electrically heated windows
DE2413723A1 (en) * 1974-03-21 1975-09-25 Nat Printing Plate Co Photographic process for production of printing block - uses photolithographic layers which are built up to required thickness
FR2375629A1 (en) * 1976-12-27 1978-07-21 Ibm MULTI-LAYER CHARGING PLATE IN CERAMIC AND PHOTOSENSITIVE GLASS
EP0281770A1 (en) * 1987-02-14 1988-09-14 BASF Aktiengesellschaft Process for coating printing cylinders or cores with a continuous photosensitive registration layer

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