DE602009001168D1 - Chemical-mechanical polishing pad with window with integrated identification function - Google Patents

Chemical-mechanical polishing pad with window with integrated identification function

Info

Publication number
DE602009001168D1
DE602009001168D1 DE602009001168T DE602009001168T DE602009001168D1 DE 602009001168 D1 DE602009001168 D1 DE 602009001168D1 DE 602009001168 T DE602009001168 T DE 602009001168T DE 602009001168 T DE602009001168 T DE 602009001168T DE 602009001168 D1 DE602009001168 D1 DE 602009001168D1
Authority
DE
Germany
Prior art keywords
window
chemical
polishing pad
mechanical polishing
identification function
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602009001168T
Other languages
German (de)
Inventor
Mary Jo Kulp
Ethan Scott Simon
Darrell String
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Electronic Materials CMP Holdings Inc
Rohm and Haas Electronic Materials LLC
Original Assignee
Rohm and Haas Electronic Materials CMP Holdings Inc
Rohm and Haas Electronic Materials LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/252,820 external-priority patent/US8118644B2/en
Priority claimed from US12/397,535 external-priority patent/US8118641B2/en
Application filed by Rohm and Haas Electronic Materials CMP Holdings Inc, Rohm and Haas Electronic Materials LLC filed Critical Rohm and Haas Electronic Materials CMP Holdings Inc
Publication of DE602009001168D1 publication Critical patent/DE602009001168D1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • B24D13/14Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
DE602009001168T 2008-10-16 2009-03-13 Chemical-mechanical polishing pad with window with integrated identification function Active DE602009001168D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/252,820 US8118644B2 (en) 2008-10-16 2008-10-16 Chemical mechanical polishing pad having integral identification feature
US12/397,535 US8118641B2 (en) 2009-03-04 2009-03-04 Chemical mechanical polishing pad having window with integral identification feature

Publications (1)

Publication Number Publication Date
DE602009001168D1 true DE602009001168D1 (en) 2011-06-09

Family

ID=41539963

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602009001168T Active DE602009001168D1 (en) 2008-10-16 2009-03-13 Chemical-mechanical polishing pad with window with integrated identification function

Country Status (2)

Country Link
EP (1) EP2177312B1 (en)
DE (1) DE602009001168D1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9238295B2 (en) * 2013-05-31 2016-01-19 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Soft and conditionable chemical mechanical window polishing pad
KR102624629B1 (en) * 2021-11-19 2024-01-15 에스케이하이닉스 주식회사 Window insert type polishing pad and method for manufacturing the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5533923A (en) 1995-04-10 1996-07-09 Applied Materials, Inc. Chemical-mechanical polishing pad providing polishing unformity
US20070010169A1 (en) * 2002-09-25 2007-01-11 Ppg Industries Ohio, Inc. Polishing pad with window for planarization

Also Published As

Publication number Publication date
EP2177312A1 (en) 2010-04-21
EP2177312B1 (en) 2011-04-27

Similar Documents

Publication Publication Date Title
DE602009000201D1 (en) Chemical-mechanical polishing pad
DE602008001138D1 (en) polishing pad
TWI347873B (en) Polishing pad with reduced stress window
TWI370039B (en) Polishing pad with window having multiple portions
DE602006004624D1 (en) Chemical-mechanical polishing process
DE602005004220D1 (en) polishing pad
TWI372093B (en) Radial-biased polishing pad
HK1154828A1 (en) Polishing pad and method for manufacturing the polishing pad
EP2193010A4 (en) Polishing pad
FR2901498B1 (en) MECANO-CHEMICAL POLISHING FELT
EP2040878A4 (en) Polishing pad having micro-grooves on the pad surface
DE602008002615D1 (en) Double surface polishing apparatus
DK2300199T3 (en) Improved grinding / polishing machine
BRPI0814774A2 (en) ABRASIVE ARTICLE WITH ADHESIVE PROMOTING LAYER
DK2353313T3 (en) Embedded RFID recorder in short-range wireless devices
BRPI0916455A2 (en) shaving or shaving cord
EP2370231A4 (en) Bonded abrasive article
BRPI0905714A2 (en) "scouring pad"
EP2242615A4 (en) Chemical-mechanical planarization pad
EP2199018A4 (en) Polishing device
EP2242614A4 (en) Chemical-mechanical planarization pad
DE502007001490D1 (en) Motor-driven grinding device
EP2271463A4 (en) Polishing pad with controlled void formation
DE602009001168D1 (en) Chemical-mechanical polishing pad with window with integrated identification function
EP2227350A4 (en) Chemical-mechanical planarization pad having end point detection window