DE602009001168D1 - Chemical-mechanical polishing pad with window with integrated identification function - Google Patents
Chemical-mechanical polishing pad with window with integrated identification functionInfo
- Publication number
- DE602009001168D1 DE602009001168D1 DE602009001168T DE602009001168T DE602009001168D1 DE 602009001168 D1 DE602009001168 D1 DE 602009001168D1 DE 602009001168 T DE602009001168 T DE 602009001168T DE 602009001168 T DE602009001168 T DE 602009001168T DE 602009001168 D1 DE602009001168 D1 DE 602009001168D1
- Authority
- DE
- Germany
- Prior art keywords
- window
- chemical
- polishing pad
- mechanical polishing
- identification function
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
- B24D13/14—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/252,820 US8118644B2 (en) | 2008-10-16 | 2008-10-16 | Chemical mechanical polishing pad having integral identification feature |
US12/397,535 US8118641B2 (en) | 2009-03-04 | 2009-03-04 | Chemical mechanical polishing pad having window with integral identification feature |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602009001168D1 true DE602009001168D1 (en) | 2011-06-09 |
Family
ID=41539963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602009001168T Active DE602009001168D1 (en) | 2008-10-16 | 2009-03-13 | Chemical-mechanical polishing pad with window with integrated identification function |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP2177312B1 (en) |
DE (1) | DE602009001168D1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9238295B2 (en) * | 2013-05-31 | 2016-01-19 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Soft and conditionable chemical mechanical window polishing pad |
KR102624629B1 (en) * | 2021-11-19 | 2024-01-15 | 에스케이하이닉스 주식회사 | Window insert type polishing pad and method for manufacturing the same |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5533923A (en) | 1995-04-10 | 1996-07-09 | Applied Materials, Inc. | Chemical-mechanical polishing pad providing polishing unformity |
US20070010169A1 (en) * | 2002-09-25 | 2007-01-11 | Ppg Industries Ohio, Inc. | Polishing pad with window for planarization |
-
2009
- 2009-03-13 DE DE602009001168T patent/DE602009001168D1/en active Active
- 2009-03-13 EP EP09155069A patent/EP2177312B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP2177312A1 (en) | 2010-04-21 |
EP2177312B1 (en) | 2011-04-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE602009000201D1 (en) | Chemical-mechanical polishing pad | |
DE602008001138D1 (en) | polishing pad | |
TWI347873B (en) | Polishing pad with reduced stress window | |
TWI370039B (en) | Polishing pad with window having multiple portions | |
DE602006004624D1 (en) | Chemical-mechanical polishing process | |
DE602005004220D1 (en) | polishing pad | |
TWI372093B (en) | Radial-biased polishing pad | |
HK1154828A1 (en) | Polishing pad and method for manufacturing the polishing pad | |
EP2193010A4 (en) | Polishing pad | |
FR2901498B1 (en) | MECANO-CHEMICAL POLISHING FELT | |
EP2040878A4 (en) | Polishing pad having micro-grooves on the pad surface | |
DE602008002615D1 (en) | Double surface polishing apparatus | |
DK2300199T3 (en) | Improved grinding / polishing machine | |
BRPI0814774A2 (en) | ABRASIVE ARTICLE WITH ADHESIVE PROMOTING LAYER | |
DK2353313T3 (en) | Embedded RFID recorder in short-range wireless devices | |
BRPI0916455A2 (en) | shaving or shaving cord | |
EP2370231A4 (en) | Bonded abrasive article | |
BRPI0905714A2 (en) | "scouring pad" | |
EP2242615A4 (en) | Chemical-mechanical planarization pad | |
EP2199018A4 (en) | Polishing device | |
EP2242614A4 (en) | Chemical-mechanical planarization pad | |
DE502007001490D1 (en) | Motor-driven grinding device | |
EP2271463A4 (en) | Polishing pad with controlled void formation | |
DE602009001168D1 (en) | Chemical-mechanical polishing pad with window with integrated identification function | |
EP2227350A4 (en) | Chemical-mechanical planarization pad having end point detection window |