DE602007001807D1 - Rückseitenimmersionslithographie - Google Patents
RückseitenimmersionslithographieInfo
- Publication number
- DE602007001807D1 DE602007001807D1 DE602007001807T DE602007001807T DE602007001807D1 DE 602007001807 D1 DE602007001807 D1 DE 602007001807D1 DE 602007001807 T DE602007001807 T DE 602007001807T DE 602007001807 T DE602007001807 T DE 602007001807T DE 602007001807 D1 DE602007001807 D1 DE 602007001807D1
- Authority
- DE
- Germany
- Prior art keywords
- radiation
- masks
- semiconductor devices
- sensitive layer
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0332—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their composition, e.g. multilayer masks, materials
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Materials For Photolithography (AREA)
- Steroid Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US80032806P | 2006-05-15 | 2006-05-15 | |
PCT/EP2007/004304 WO2007131769A1 (en) | 2006-05-15 | 2007-05-15 | Backside immersion lithography |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602007001807D1 true DE602007001807D1 (de) | 2009-09-10 |
Family
ID=38372435
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602007001807T Active DE602007001807D1 (de) | 2006-05-15 | 2007-05-15 | Rückseitenimmersionslithographie |
Country Status (8)
Country | Link |
---|---|
US (1) | US7705965B2 (de) |
EP (1) | EP2018598B1 (de) |
JP (1) | JP2009537851A (de) |
KR (1) | KR20090028525A (de) |
CN (1) | CN101490623A (de) |
AT (1) | ATE438122T1 (de) |
DE (1) | DE602007001807D1 (de) |
WO (1) | WO2007131769A1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100291489A1 (en) * | 2009-05-15 | 2010-11-18 | Api Nanofabrication And Research Corp. | Exposure methods for forming patterned layers and apparatus for performing the same |
DE102016203442A1 (de) | 2016-03-02 | 2017-09-07 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage und Verfahren zum Vermessen eines Projektionsobjektives |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4952026A (en) * | 1988-10-14 | 1990-08-28 | Corning Incorporated | Integral optical element and method |
US20040003638A1 (en) * | 1997-12-12 | 2004-01-08 | Schaefer Mark W. | Transfer of holographic images into metal sporting and fitness products |
US6809794B1 (en) * | 2003-06-27 | 2004-10-26 | Asml Holding N.V. | Immersion photolithography system and method using inverted wafer-projection optics interface |
US7924397B2 (en) * | 2003-11-06 | 2011-04-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Anti-corrosion layer on objective lens for liquid immersion lithography applications |
JP2005191381A (ja) * | 2003-12-26 | 2005-07-14 | Canon Inc | 露光方法及び装置 |
US7365014B2 (en) * | 2004-01-30 | 2008-04-29 | Applied Materials, Inc. | Reticle fabrication using a removable hard mask |
-
2007
- 2007-05-15 CN CNA2007800263607A patent/CN101490623A/zh active Pending
- 2007-05-15 EP EP07725222A patent/EP2018598B1/de not_active Not-in-force
- 2007-05-15 US US11/748,667 patent/US7705965B2/en not_active Expired - Fee Related
- 2007-05-15 KR KR1020087030494A patent/KR20090028525A/ko not_active Application Discontinuation
- 2007-05-15 DE DE602007001807T patent/DE602007001807D1/de active Active
- 2007-05-15 AT AT07725222T patent/ATE438122T1/de not_active IP Right Cessation
- 2007-05-15 JP JP2009510342A patent/JP2009537851A/ja active Pending
- 2007-05-15 WO PCT/EP2007/004304 patent/WO2007131769A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
US7705965B2 (en) | 2010-04-27 |
ATE438122T1 (de) | 2009-08-15 |
JP2009537851A (ja) | 2009-10-29 |
WO2007131769A1 (en) | 2007-11-22 |
KR20090028525A (ko) | 2009-03-18 |
CN101490623A (zh) | 2009-07-22 |
EP2018598B1 (de) | 2009-07-29 |
EP2018598A1 (de) | 2009-01-28 |
US20070263187A1 (en) | 2007-11-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |