DE602006021613D1 - Entwicklerlösung und verwendungsprozess - Google Patents

Entwicklerlösung und verwendungsprozess

Info

Publication number
DE602006021613D1
DE602006021613D1 DE602006021613T DE602006021613T DE602006021613D1 DE 602006021613 D1 DE602006021613 D1 DE 602006021613D1 DE 602006021613 T DE602006021613 T DE 602006021613T DE 602006021613 T DE602006021613 T DE 602006021613T DE 602006021613 D1 DE602006021613 D1 DE 602006021613D1
Authority
DE
Germany
Prior art keywords
use process
developer solution
developer
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006021613T
Other languages
English (en)
Inventor
Kesheng Feng
Daniel J Hart
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Inc
Original Assignee
MacDermid Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MacDermid Inc filed Critical MacDermid Inc
Publication of DE602006021613D1 publication Critical patent/DE602006021613D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE602006021613T 2005-11-30 2006-08-28 Entwicklerlösung und verwendungsprozess Active DE602006021613D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/290,118 US7094523B1 (en) 2005-11-30 2005-11-30 Developer solution and process for use
PCT/US2006/033417 WO2007064377A1 (en) 2005-11-30 2006-08-28 Developer solution and process for use

Publications (1)

Publication Number Publication Date
DE602006021613D1 true DE602006021613D1 (de) 2011-06-09

Family

ID=36821675

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006021613T Active DE602006021613D1 (de) 2005-11-30 2006-08-28 Entwicklerlösung und verwendungsprozess

Country Status (8)

Country Link
US (1) US7094523B1 (de)
EP (1) EP1958028B1 (de)
JP (1) JP2009517718A (de)
CN (1) CN101313252B (de)
DE (1) DE602006021613D1 (de)
ES (1) ES2364578T3 (de)
TW (1) TW200720859A (de)
WO (1) WO2007064377A1 (de)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4528023A (en) * 1983-07-25 1985-07-09 Stauffer Chemical Company Enhancement of herbicidal activity of tetraaluminum salts of N-phosphonomethylglycine
DE3738864A1 (de) * 1987-11-16 1989-05-24 Hoechst Ag Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch
US5998102A (en) * 1997-10-06 1999-12-07 Agfa Corporation Etch inhibitors in developer for lithographic printing plates
US6063550A (en) 1998-04-29 2000-05-16 Morton International, Inc. Aqueous developing solutions for reduced developer residue
US5922522A (en) 1998-04-29 1999-07-13 Morton International, Inc. Aqueous developing solutions for reduced developer residue
US6296694B1 (en) * 1998-06-25 2001-10-02 Roger Machson Transparent anti-fog anti-splash coating compositions
US6248506B1 (en) 1998-12-04 2001-06-19 Nichigo-Morton Aqueous developing solutions for reduced developer residue
AU2495400A (en) * 1999-01-11 2000-08-01 Huntsman Petrochemical Corporation Surfactant compositions containing alkoxylated amines
US7517636B2 (en) * 2000-05-29 2009-04-14 Hitachi Chemical Co., Ltd. Photosensitive resin composition, photosensitive element, production method of resist pattern and production method for printed circuit board
JP2003195518A (ja) * 2001-12-14 2003-07-09 Shipley Co Llc フォトレジスト用現像液
US6900003B2 (en) 2002-04-12 2005-05-31 Shipley Company, L.L.C. Photoresist processing aid and method

Also Published As

Publication number Publication date
EP1958028A1 (de) 2008-08-20
EP1958028B1 (de) 2011-04-27
TW200720859A (en) 2007-06-01
US7094523B1 (en) 2006-08-22
CN101313252B (zh) 2011-07-20
CN101313252A (zh) 2008-11-26
EP1958028A4 (de) 2009-04-08
JP2009517718A (ja) 2009-04-30
ES2364578T3 (es) 2011-09-07
WO2007064377A1 (en) 2007-06-07

Similar Documents

Publication Publication Date Title
DE602005017080D1 (de) Toner und tonerherstellungsprozess
DE602006008521D1 (de) Toner und Entwickler
DK3295967T3 (da) Sårplejeindretning
DK1812895T3 (da) Stofkilde
DE602005006428D1 (de) Wäschebehandlungsmittel
DE602005005702D1 (de) Wäschebehandlungsmittel
DE602005024709D1 (de) Wäschebehandlungsmittel
DK1838736T3 (da) Cripto-bindende molekyler
DK2079485T3 (da) Phenylpropionamidforbindelser og anvendelsen deraf
DE602006018166D1 (de) Polyrotaxanhaltige lösung und verwendung davon
DE602005006185D1 (de) Entwicklungsverfahren
DK1863899T3 (da) Hudbehandlingspræparater
DK1855633T3 (da) Tampon
DE602005008046D1 (de) Wäschebehandlungsmittel
DK1885716T3 (da) Thiazolderivater og anvendelse deraf
DE602006001386D1 (de) Faserbehandlungsmittel
DE602006004713D1 (de) Trifluormethylbenzamidderivate und therapeutische verwendungen dafür
DE602006016542D1 (de) Entwicklerrolle und Entwicklungsverfahren dafür
FI20050284A (fi) Sekoitin
DE602006013639D1 (de) Waschvorrichtung und waschverfahren
DE602006007850D1 (de) Wäschebehandlungsmittel
DE602006005502D1 (de) Entwickler-regulierungsglied und entwicklungsvorrichtung
DK1943240T3 (da) Kemisk fremgangsmåde
DE602006001677D1 (de) Tonerverfahren
FI20055133A0 (fi) Iskulaite