DE59604463D1 - METHOD FOR IMPROVING CONTRAST IN STRUCTURING 3-DIMENSIONAL SURFACES - Google Patents
METHOD FOR IMPROVING CONTRAST IN STRUCTURING 3-DIMENSIONAL SURFACESInfo
- Publication number
- DE59604463D1 DE59604463D1 DE59604463T DE59604463T DE59604463D1 DE 59604463 D1 DE59604463 D1 DE 59604463D1 DE 59604463 T DE59604463 T DE 59604463T DE 59604463 T DE59604463 T DE 59604463T DE 59604463 D1 DE59604463 D1 DE 59604463D1
- Authority
- DE
- Germany
- Prior art keywords
- structuring
- dimensional surfaces
- improving contrast
- contrast
- improving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19531859 | 1995-08-30 | ||
DE19628353A DE19628353A1 (en) | 1995-08-30 | 1996-07-13 | Process to improve the contrast when structuring 3-dimensional surfaces |
PCT/DE1996/001580 WO1997010088A2 (en) | 1995-08-30 | 1996-08-24 | Process for improving the contrast in the structuring of 3-dimensional surfaces |
Publications (1)
Publication Number | Publication Date |
---|---|
DE59604463D1 true DE59604463D1 (en) | 2000-03-23 |
Family
ID=7770732
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19628353A Withdrawn DE19628353A1 (en) | 1995-08-30 | 1996-07-13 | Process to improve the contrast when structuring 3-dimensional surfaces |
DE59604463T Expired - Lifetime DE59604463D1 (en) | 1995-08-30 | 1996-08-24 | METHOD FOR IMPROVING CONTRAST IN STRUCTURING 3-DIMENSIONAL SURFACES |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19628353A Withdrawn DE19628353A1 (en) | 1995-08-30 | 1996-07-13 | Process to improve the contrast when structuring 3-dimensional surfaces |
Country Status (1)
Country | Link |
---|---|
DE (2) | DE19628353A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0847545B1 (en) | 1995-08-30 | 2000-02-16 | Deutsche Telekom AG | Process for improving the contrast in the structuring of 3-dimensional surfaces |
DE19630705A1 (en) | 1995-08-30 | 1997-03-20 | Deutsche Telekom Ag | Process for the production of 3-dimensional structured polymer layers for integrated optics |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4202651A1 (en) * | 1992-01-30 | 1993-08-05 | Fraunhofer Ges Forschung | METHOD FOR DRY DEVELOPMENT OF A SILICON-CONTAINING ULTRAVIOLET AND / OR ELECTRON BEAM-SENSITIVE PAINT LAYER |
-
1996
- 1996-07-13 DE DE19628353A patent/DE19628353A1/en not_active Withdrawn
- 1996-08-24 DE DE59604463T patent/DE59604463D1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE19628353A1 (en) | 1997-03-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: NAWOTEC GMBH, 64380 ROSSDORF, DE |