DE3788897T2 - Härtbare Polymere. - Google Patents

Härtbare Polymere.

Info

Publication number
DE3788897T2
DE3788897T2 DE87304584T DE3788897T DE3788897T2 DE 3788897 T2 DE3788897 T2 DE 3788897T2 DE 87304584 T DE87304584 T DE 87304584T DE 3788897 T DE3788897 T DE 3788897T DE 3788897 T2 DE3788897 T2 DE 3788897T2
Authority
DE
Germany
Prior art keywords
thermal
prepolymer
curable polymers
utilisable
maleated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE87304584T
Other languages
English (en)
Other versions
DE3788897D1 (de
Inventor
Lori Jane Klingler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
P T Sub Inc
Original Assignee
WR Grace and Co Conn
WR Grace and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace and Co Conn, WR Grace and Co filed Critical WR Grace and Co Conn
Publication of DE3788897D1 publication Critical patent/DE3788897D1/de
Application granted granted Critical
Publication of DE3788897T2 publication Critical patent/DE3788897T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
    • C08C19/00—Chemical modification of rubber
    • C08C19/30—Addition of a reagent which reacts with a hetero atom or a group containing hetero atoms of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • C08F290/048—Polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Sealing Material Composition (AREA)
  • Polymerisation Methods In General (AREA)
DE87304584T 1986-05-23 1987-05-22 Härtbare Polymere. Expired - Fee Related DE3788897T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US86651586A 1986-05-23 1986-05-23

Publications (2)

Publication Number Publication Date
DE3788897D1 DE3788897D1 (de) 1994-03-10
DE3788897T2 true DE3788897T2 (de) 1994-05-05

Family

ID=25347773

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87304584T Expired - Fee Related DE3788897T2 (de) 1986-05-23 1987-05-22 Härtbare Polymere.

Country Status (8)

Country Link
EP (1) EP0246918B1 (de)
JP (1) JPS62280204A (de)
AT (1) ATE100827T1 (de)
AU (1) AU7310587A (de)
BR (1) BR8702475A (de)
DE (1) DE3788897T2 (de)
NZ (1) NZ219854A (de)
ZA (1) ZA872282B (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4857434A (en) * 1986-09-23 1989-08-15 W. R. Grace & Co. Radiation curable liquid (meth) acrylated polymeric hydrocarbon maleate prepolymers and formulations containing same
DE3710343A1 (de) * 1987-03-28 1988-10-06 Basf Lacke & Farben Verzweigtes acrylatcopolymerisat mit polisierbaren doppelbindungen und verfahren zur herstellung des acrylatcopolymerisats
ES2051985T3 (es) * 1988-06-15 1994-07-01 Akzo Nv Composicion de revestimiento liquida curable a temperatura ambiente.
KR0183393B1 (ko) * 1989-05-09 1999-05-15 오노 알버어스 관능화된 탄성 중합체 및 이를 제조하기 위한 방법
EP0796873A4 (de) * 1995-10-06 1999-11-03 Nippon Catalytic Chem Ind (meth)acrylsirup, verfahren zu seiner herstellung und verfahren zur herstellung eines selbigen enthaltenden formmaterials
EP1059308B1 (de) * 1998-02-27 2006-10-11 Kaneka Corporation Polymer und härtbare zusammensetzung
US7241540B2 (en) * 2004-04-27 2007-07-10 Kraton Polymers U.S. Llc Photocurable compositions and flexographic printing plates comprising the same
KR101664765B1 (ko) * 2013-12-04 2016-10-12 주식회사 쿠라레 변성 액상 디엔계 고무 및 그 제조 방법
ES2775586T3 (es) 2014-12-25 2020-07-27 Kuraray Co Caucho de dieno líquido modificado, y composición de resina que contiene dicho caucho de dieno líquido modificado

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51116893A (en) * 1975-04-08 1976-10-14 Ube Ind Ltd Photo-setting compositions
AU507014B2 (en) * 1975-11-05 1980-01-31 Hercules Inc. Photopolymer compositions

Also Published As

Publication number Publication date
JPS62280204A (ja) 1987-12-05
NZ219854A (en) 1990-07-26
EP0246918A1 (de) 1987-11-25
ZA872282B (en) 1987-11-25
DE3788897D1 (de) 1994-03-10
EP0246918B1 (de) 1994-01-26
BR8702475A (pt) 1988-02-23
AU7310587A (en) 1987-11-26
ATE100827T1 (de) 1994-02-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PT SUB, INC., WILMINGTON, DEL., US

8339 Ceased/non-payment of the annual fee