DE3783226T2 - METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE. - Google Patents

METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE.

Info

Publication number
DE3783226T2
DE3783226T2 DE8787311426T DE3783226T DE3783226T2 DE 3783226 T2 DE3783226 T2 DE 3783226T2 DE 8787311426 T DE8787311426 T DE 8787311426T DE 3783226 T DE3783226 T DE 3783226T DE 3783226 T2 DE3783226 T2 DE 3783226T2
Authority
DE
Germany
Prior art keywords
producing
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787311426T
Other languages
German (de)
Other versions
DE3783226D1 (en
Inventor
Tomoaki Uno
Hiroyuki Serizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP61312015A external-priority patent/JPH0738486B2/en
Priority claimed from JP62183986A external-priority patent/JPS6428883A/en
Priority claimed from JP62277625A external-priority patent/JPH01120086A/en
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE3783226D1 publication Critical patent/DE3783226D1/en
Publication of DE3783226T2 publication Critical patent/DE3783226T2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227—Buried mesa structure ; Striped active layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223—Buried stripe structure
    • H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227—Buried mesa structure ; Striped active layer
    • H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
DE8787311426T 1986-12-26 1987-12-23 METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE. Expired - Fee Related DE3783226T2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP61312015A JPH0738486B2 (en) 1986-12-26 1986-12-26 Method for manufacturing semiconductor laser device
JP62183986A JPS6428883A (en) 1987-07-23 1987-07-23 Manufacture of semiconductor laser device
JP62277625A JPH01120086A (en) 1987-11-02 1987-11-02 Manufacture of semiconductor laser device

Publications (2)

Publication Number Publication Date
DE3783226D1 DE3783226D1 (en) 1993-02-04
DE3783226T2 true DE3783226T2 (en) 1993-04-29

Family

ID=27325357

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787311426T Expired - Fee Related DE3783226T2 (en) 1986-12-26 1987-12-23 METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE.

Country Status (2)

Country Link
EP (1) EP0273730B1 (en)
DE (1) DE3783226T2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2636176B1 (en) * 1988-09-08 1990-12-07 France Etat PROCESS FOR PRODUCING A SEMICONDUCTOR LASER WITH HIGH TRANSMISSION POWER AND A LARGE BANDWIDTH FROM A BURIED RIBBON STRUCTURE OF THE BRS TYPE, AND LASER THUS OBTAINED
FR2637743B1 (en) * 1988-10-06 1994-07-29 France Etat SEMICONDUCTOR LASER HAVING A BURIED TAPE AND A LOCKING LAYER AND METHOD FOR THE PRODUCTION THEREOF
FR2647966B1 (en) * 1989-06-02 1991-08-16 Thomson Hybrides SEMICONDUCTOR LASER WITH CURRENT LOCATION
TW388144B (en) 1997-09-30 2000-04-21 Mitsui Chemicals Inc Semiconductor laser device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4213805A (en) * 1973-05-28 1980-07-22 Hitachi, Ltd. Liquid phase epitaxy method of forming a filimentary laser device
JPS59126693A (en) * 1983-01-10 1984-07-21 Fujikura Ltd Distributed feedback type semiconductor laser and manufacture thereof
JPS6037793A (en) * 1983-08-10 1985-02-27 Nec Corp Single axial mode semiconductor laser
JPS60247985A (en) * 1984-05-23 1985-12-07 Nec Corp Distributed feedback type semiconductor laser

Also Published As

Publication number Publication date
EP0273730A3 (en) 1989-02-15
EP0273730B1 (en) 1992-12-23
DE3783226D1 (en) 1993-02-04
EP0273730A2 (en) 1988-07-06

Similar Documents

Publication Publication Date Title
DE3485924D1 (en) METHOD FOR PRODUCING A SEMICONDUCTOR LASER DEVICE.
DE3686315D1 (en) METHOD FOR PRODUCING A SEMICONDUCTOR STRUCTURE.
DE68907507D1 (en) METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE.
DE69015216D1 (en) Method of manufacturing a semiconductor device.
DE3788486T2 (en) Method for producing a monolithic high-voltage semiconductor circuit.
DE68924366T2 (en) Method of manufacturing a semiconductor device.
DE69023558T2 (en) Method of manufacturing a semiconductor device.
DE69016955T2 (en) Method of manufacturing a semiconductor device.
DE3582143D1 (en) METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE.
DE69028397T2 (en) METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE
DE3779802D1 (en) METHOD FOR PRODUCING A SEMICONDUCTOR ARRANGEMENT.
DE3580559D1 (en) DEVICE FOR PRODUCING A SINGLE-CRYSTALLINE SEMICONDUCTOR CONNECTION.
DE69024731D1 (en) Method for producing a plastic-coated semiconductor arrangement
DE3789372T2 (en) Method of manufacturing a semiconductor device.
DE3484526D1 (en) METHOD FOR PRODUCING A SEMICONDUCTOR ARRANGEMENT.
DE3580350D1 (en) METHOD FOR PRODUCING A FRUKTO OLIGOSACCHAROSE.
DE3486144T2 (en) METHOD FOR PRODUCING A SEMICONDUCTOR ARRANGEMENT.
DE3578263D1 (en) METHOD FOR PRODUCING A SEMICONDUCTOR ARRANGEMENT.
DE3783799T2 (en) METHOD FOR PRODUCING A SEMICONDUCTOR ARRANGEMENT.
DE58903776D1 (en) METHOD FOR PRODUCING A PULLEY.
DE3783226D1 (en) METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE.
DE3785287D1 (en) METHOD FOR PRODUCING A THIN-LAYER SEMICONDUCTOR DIODE ARRANGEMENT.
DE3678191D1 (en) METHOD FOR PRODUCING A HEAT-TREATED PROSTHETIC DEVICE.
DE69023718T2 (en) Method for producing a compound semiconductor layer.
DE3784961D1 (en) METHOD FOR PRODUCING A CONNECTION LINE.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee