DE3676715D1 - Photolackentfern-verfahren. - Google Patents
Photolackentfern-verfahren.Info
- Publication number
- DE3676715D1 DE3676715D1 DE8686100219T DE3676715T DE3676715D1 DE 3676715 D1 DE3676715 D1 DE 3676715D1 DE 8686100219 T DE8686100219 T DE 8686100219T DE 3676715 T DE3676715 T DE 3676715T DE 3676715 D1 DE3676715 D1 DE 3676715D1
- Authority
- DE
- Germany
- Prior art keywords
- photocolor
- removal process
- removal
- photocolor removal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F5/00—Screening processes; Screens therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/691,829 US4623611A (en) | 1985-01-16 | 1985-01-16 | Photolithographic stripping method for removing contrast enhancement layer |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3676715D1 true DE3676715D1 (de) | 1991-02-14 |
Family
ID=24778149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8686100219T Expired - Fee Related DE3676715D1 (de) | 1985-01-16 | 1986-01-09 | Photolackentfern-verfahren. |
Country Status (7)
Country | Link |
---|---|
US (1) | US4623611A (de) |
EP (1) | EP0188230B1 (de) |
JP (1) | JPS61198237A (de) |
KR (1) | KR940001554B1 (de) |
DE (1) | DE3676715D1 (de) |
IE (1) | IE56848B1 (de) |
MX (1) | MX165044B (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2060579T3 (es) * | 1985-12-09 | 1994-12-01 | Nippon Paint Co Ltd | Material de impresion a base de resina fotosensible. |
US4714670A (en) * | 1986-06-09 | 1987-12-22 | Imperial Metal & Chemical Company | Developer including an aliphatic cyclic carbonate in the oil phase emulsion |
EP0273026B2 (de) * | 1986-12-23 | 2003-08-20 | Shipley Company Inc. | Lösungsmittel für Photolack-Zusammensetzungen |
US5196295A (en) * | 1987-07-31 | 1993-03-23 | Microsi, Inc. | Spin castable mixtures useful for making deep-UV contrast enhancement layers |
JPH0727222B2 (ja) * | 1987-10-28 | 1995-03-29 | 日本合成ゴム株式会社 | ホトレジスト用剥離液 |
DE3836404A1 (de) * | 1988-10-26 | 1990-05-03 | Hoechst Ag | Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen |
JPH0683596U (ja) * | 1993-04-30 | 1994-11-29 | 立仁 馮 | スノーケル |
EP0810272B1 (de) * | 1996-05-31 | 2001-03-21 | Atofina | Abbeizmittelzusammensetzung auf Basis von einem polaren, aprotischen Lösungsmittel, einem Ether und Wasser |
FR2749315B1 (fr) * | 1996-05-31 | 1998-08-14 | Atochem Elf Sa | Composition decapante a base d'eau et d'anisole |
US7897296B2 (en) | 2004-09-30 | 2011-03-01 | General Electric Company | Method for holographic storage |
US20060078802A1 (en) * | 2004-10-13 | 2006-04-13 | Chan Kwok P | Holographic storage medium |
JP6109896B2 (ja) * | 2015-09-03 | 2017-04-05 | 日新製鋼株式会社 | 金属板からレジスト膜を除去する方法およびエッチングされた金属板の製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3725069A (en) * | 1971-09-13 | 1973-04-03 | Scott Paper Co | Diazo lithographic composition and article |
GB1588417A (en) * | 1977-03-15 | 1981-04-23 | Agfa Gevaert | Photoresist materials |
US4395348A (en) * | 1981-11-23 | 1983-07-26 | Ekc Technology, Inc. | Photoresist stripping composition and method |
IE56082B1 (en) * | 1982-11-01 | 1991-04-10 | Microsi Inc | Photobleachable compositions |
US4578344A (en) * | 1984-12-20 | 1986-03-25 | General Electric Company | Photolithographic method using a two-layer photoresist and photobleachable film |
-
1985
- 1985-01-16 US US06/691,829 patent/US4623611A/en not_active Expired - Lifetime
- 1985-07-22 IE IE1836/85A patent/IE56848B1/en not_active IP Right Cessation
-
1986
- 1986-01-09 DE DE8686100219T patent/DE3676715D1/de not_active Expired - Fee Related
- 1986-01-09 EP EP86100219A patent/EP0188230B1/de not_active Expired - Lifetime
- 1986-01-15 KR KR1019860000193A patent/KR940001554B1/ko not_active IP Right Cessation
- 1986-01-16 JP JP61005144A patent/JPS61198237A/ja active Granted
- 1986-01-16 MX MX1248A patent/MX165044B/es unknown
Also Published As
Publication number | Publication date |
---|---|
US4623611A (en) | 1986-11-18 |
JPH0524497B2 (de) | 1993-04-08 |
KR940001554B1 (ko) | 1994-02-24 |
EP0188230A3 (en) | 1987-01-07 |
EP0188230B1 (de) | 1991-01-09 |
MX165044B (es) | 1992-10-20 |
IE851836L (en) | 1986-07-16 |
KR860006051A (ko) | 1986-08-16 |
EP0188230A2 (de) | 1986-07-23 |
IE56848B1 (en) | 1992-01-01 |
JPS61198237A (ja) | 1986-09-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |