DE3676715D1 - Photolackentfern-verfahren. - Google Patents

Photolackentfern-verfahren.

Info

Publication number
DE3676715D1
DE3676715D1 DE8686100219T DE3676715T DE3676715D1 DE 3676715 D1 DE3676715 D1 DE 3676715D1 DE 8686100219 T DE8686100219 T DE 8686100219T DE 3676715 T DE3676715 T DE 3676715T DE 3676715 D1 DE3676715 D1 DE 3676715D1
Authority
DE
Germany
Prior art keywords
photocolor
removal process
removal
photocolor removal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686100219T
Other languages
English (en)
Inventor
Paul Richard West
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu MicroSi Inc
Original Assignee
MicroSi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MicroSi Inc filed Critical MicroSi Inc
Application granted granted Critical
Publication of DE3676715D1 publication Critical patent/DE3676715D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F5/00—Screening processes; Screens therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE8686100219T 1985-01-16 1986-01-09 Photolackentfern-verfahren. Expired - Fee Related DE3676715D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/691,829 US4623611A (en) 1985-01-16 1985-01-16 Photolithographic stripping method for removing contrast enhancement layer

Publications (1)

Publication Number Publication Date
DE3676715D1 true DE3676715D1 (de) 1991-02-14

Family

ID=24778149

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686100219T Expired - Fee Related DE3676715D1 (de) 1985-01-16 1986-01-09 Photolackentfern-verfahren.

Country Status (7)

Country Link
US (1) US4623611A (de)
EP (1) EP0188230B1 (de)
JP (1) JPS61198237A (de)
KR (1) KR940001554B1 (de)
DE (1) DE3676715D1 (de)
IE (1) IE56848B1 (de)
MX (1) MX165044B (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1325354C (en) * 1985-12-09 1993-12-21 Yasushi Umeda Photosensitive resin base printing material
US4714670A (en) * 1986-06-09 1987-12-22 Imperial Metal & Chemical Company Developer including an aliphatic cyclic carbonate in the oil phase emulsion
EP0273026B2 (de) * 1986-12-23 2003-08-20 Shipley Company Inc. Lösungsmittel für Photolack-Zusammensetzungen
US5196295A (en) * 1987-07-31 1993-03-23 Microsi, Inc. Spin castable mixtures useful for making deep-UV contrast enhancement layers
JPH0727222B2 (ja) * 1987-10-28 1995-03-29 日本合成ゴム株式会社 ホトレジスト用剥離液
DE3836404A1 (de) * 1988-10-26 1990-05-03 Hoechst Ag Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen
JPH0683596U (ja) * 1993-04-30 1994-11-29 立仁 馮 スノーケル
FR2749315B1 (fr) * 1996-05-31 1998-08-14 Atochem Elf Sa Composition decapante a base d'eau et d'anisole
DE69704298T2 (de) * 1996-05-31 2001-09-27 Atofina, Puteaux Abbeizmittelzusammensetzung auf Basis von einem polaren, aprotischen Lösungsmittel, einem Ether und Wasser
US7897296B2 (en) 2004-09-30 2011-03-01 General Electric Company Method for holographic storage
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
JP6109896B2 (ja) * 2015-09-03 2017-04-05 日新製鋼株式会社 金属板からレジスト膜を除去する方法およびエッチングされた金属板の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3725069A (en) * 1971-09-13 1973-04-03 Scott Paper Co Diazo lithographic composition and article
GB1588417A (en) * 1977-03-15 1981-04-23 Agfa Gevaert Photoresist materials
US4395348A (en) * 1981-11-23 1983-07-26 Ekc Technology, Inc. Photoresist stripping composition and method
IE56082B1 (en) * 1982-11-01 1991-04-10 Microsi Inc Photobleachable compositions
US4578344A (en) * 1984-12-20 1986-03-25 General Electric Company Photolithographic method using a two-layer photoresist and photobleachable film

Also Published As

Publication number Publication date
KR860006051A (ko) 1986-08-16
JPH0524497B2 (de) 1993-04-08
US4623611A (en) 1986-11-18
JPS61198237A (ja) 1986-09-02
EP0188230A3 (en) 1987-01-07
MX165044B (es) 1992-10-20
IE851836L (en) 1986-07-16
EP0188230B1 (de) 1991-01-09
EP0188230A2 (de) 1986-07-23
IE56848B1 (en) 1992-01-01
KR940001554B1 (ko) 1994-02-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee