DE3518774C2 - - Google Patents
Info
- Publication number
- DE3518774C2 DE3518774C2 DE19853518774 DE3518774A DE3518774C2 DE 3518774 C2 DE3518774 C2 DE 3518774C2 DE 19853518774 DE19853518774 DE 19853518774 DE 3518774 A DE3518774 A DE 3518774A DE 3518774 C2 DE3518774 C2 DE 3518774C2
- Authority
- DE
- Germany
- Prior art keywords
- refractive index
- layer
- step height
- phase grating
- carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 31
- 238000005259 measurement Methods 0.000 claims description 21
- 239000003792 electrolyte Substances 0.000 claims description 13
- 230000005855 radiation Effects 0.000 claims description 13
- 238000000151 deposition Methods 0.000 claims description 9
- 230000008021 deposition Effects 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 9
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 5
- 229910052753 mercury Inorganic materials 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 claims description 5
- 230000001105 regulatory effect Effects 0.000 claims description 5
- 238000007654 immersion Methods 0.000 claims description 4
- 239000011810 insulating material Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims 2
- 238000005457 optimization Methods 0.000 claims 1
- 230000000737 periodic effect Effects 0.000 claims 1
- 238000009736 wetting Methods 0.000 claims 1
- 125000006850 spacer group Chemical group 0.000 description 13
- 229920002120 photoresistant polymer Polymers 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 10
- 229910000831 Steel Inorganic materials 0.000 description 8
- 239000010959 steel Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 230000010363 phase shift Effects 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 241000446313 Lamella Species 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/30—Testing of optical devices, constituted by fibre optics or optical waveguides
- G01M11/37—Testing of optical devices, constituted by fibre optics or optical waveguides in which light is projected perpendicularly to the axis of the fibre or waveguide for monitoring a section thereof
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19853518774 DE3518774A1 (de) | 1985-05-24 | 1985-05-24 | Verfahren zur ermittlung und optimierung der optischen weglaenge einer durchgehenden transparenten schicht oder einer strukturierten schicht |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19853518774 DE3518774A1 (de) | 1985-05-24 | 1985-05-24 | Verfahren zur ermittlung und optimierung der optischen weglaenge einer durchgehenden transparenten schicht oder einer strukturierten schicht |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3518774A1 DE3518774A1 (de) | 1986-11-27 |
| DE3518774C2 true DE3518774C2 (cs) | 1988-05-05 |
Family
ID=6271597
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19853518774 Granted DE3518774A1 (de) | 1985-05-24 | 1985-05-24 | Verfahren zur ermittlung und optimierung der optischen weglaenge einer durchgehenden transparenten schicht oder einer strukturierten schicht |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE3518774A1 (cs) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4007968A1 (de) * | 1990-03-13 | 1991-09-19 | Heidenhain Gmbh Dr Johannes | Optische vorrichtung |
| DE4338680C1 (de) * | 1993-11-12 | 1995-03-23 | Heidenhain Gmbh Dr Johannes | Längen- oder Winkelmeßeinrichtung |
| DE4424565C1 (de) * | 1994-07-13 | 1995-08-24 | Kurz Leonhard Fa | Verfahren zur Messung der Tiefe einer Mikrostruktur |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102016201068A1 (de) | 2016-01-26 | 2017-07-27 | Dr. Johannes Heidenhain Gmbh | Maßverkörperung und Positionsmesseinrichtung mit dieser Maßverkörperung |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3248091A1 (de) * | 1982-12-24 | 1984-06-28 | Leybold-Heraeus GmbH, 5000 Köln | Messverfahren und fotometeranordnung fuer die herstellung von vielfach-schichtsystemen |
-
1985
- 1985-05-24 DE DE19853518774 patent/DE3518774A1/de active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4007968A1 (de) * | 1990-03-13 | 1991-09-19 | Heidenhain Gmbh Dr Johannes | Optische vorrichtung |
| DE4338680C1 (de) * | 1993-11-12 | 1995-03-23 | Heidenhain Gmbh Dr Johannes | Längen- oder Winkelmeßeinrichtung |
| US5559599A (en) * | 1993-11-12 | 1996-09-24 | Dr. Johannes Heidenhain Gmbh | Graduation scale having a continuous planar surface with a protective diffusion barrier layer thereon |
| DE4424565C1 (de) * | 1994-07-13 | 1995-08-24 | Kurz Leonhard Fa | Verfahren zur Messung der Tiefe einer Mikrostruktur |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3518774A1 (de) | 1986-11-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |