DE3485989T2 - Antireflexionsschicht. - Google Patents

Antireflexionsschicht.

Info

Publication number
DE3485989T2
DE3485989T2 DE8484302692T DE3485989T DE3485989T2 DE 3485989 T2 DE3485989 T2 DE 3485989T2 DE 8484302692 T DE8484302692 T DE 8484302692T DE 3485989 T DE3485989 T DE 3485989T DE 3485989 T2 DE3485989 T2 DE 3485989T2
Authority
DE
Germany
Prior art keywords
reflection layer
reflection
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8484302692T
Other languages
English (en)
Other versions
DE3485989D1 (en
Inventor
John W Arnold
Terry L Brewer
Sumalee Punyakumleard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Brewer Science Inc
Original Assignee
Brewer Science Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brewer Science Inc filed Critical Brewer Science Inc
Priority claimed from EP84302692A external-priority patent/EP0159428B1/de
Publication of DE3485989D1 publication Critical patent/DE3485989D1/de
Application granted granted Critical
Publication of DE3485989T2 publication Critical patent/DE3485989T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0276—Photolithographic processes using an anti-reflective coating

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE8484302692T 1984-04-13 1984-04-13 Antireflexionsschicht. Expired - Lifetime DE3485989T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP84302692A EP0159428B1 (de) 1982-09-30 1984-04-13 Antireflexionsschicht

Publications (2)

Publication Number Publication Date
DE3485989D1 DE3485989D1 (en) 1992-12-24
DE3485989T2 true DE3485989T2 (de) 1993-03-25

Family

ID=8192622

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484302692T Expired - Lifetime DE3485989T2 (de) 1984-04-13 1984-04-13 Antireflexionsschicht.

Country Status (1)

Country Link
DE (1) DE3485989T2 (de)

Also Published As

Publication number Publication date
DE3485989D1 (en) 1992-12-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition