DE3485485D1 - Kontinuierliches ausrichtmuster und signalverarbeitung. - Google Patents

Kontinuierliches ausrichtmuster und signalverarbeitung.

Info

Publication number
DE3485485D1
DE3485485D1 DE8484104118T DE3485485T DE3485485D1 DE 3485485 D1 DE3485485 D1 DE 3485485D1 DE 8484104118 T DE8484104118 T DE 8484104118T DE 3485485 T DE3485485 T DE 3485485T DE 3485485 D1 DE3485485 D1 DE 3485485D1
Authority
DE
Germany
Prior art keywords
signal processing
alignment pattern
continuous alignment
continuous
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8484104118T
Other languages
English (en)
Inventor
Frederick Y Wu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SVG Lithography Systems Inc
Original Assignee
SVG Lithography Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SVG Lithography Systems Inc filed Critical SVG Lithography Systems Inc
Application granted granted Critical
Publication of DE3485485D1 publication Critical patent/DE3485485D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE8484104118T 1983-05-02 1984-04-12 Kontinuierliches ausrichtmuster und signalverarbeitung. Expired - Fee Related DE3485485D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/490,614 US4578590A (en) 1983-05-02 1983-05-02 Continuous alignment target pattern and signal processing

Publications (1)

Publication Number Publication Date
DE3485485D1 true DE3485485D1 (de) 1992-03-12

Family

ID=23948792

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484104118T Expired - Fee Related DE3485485D1 (de) 1983-05-02 1984-04-12 Kontinuierliches ausrichtmuster und signalverarbeitung.

Country Status (5)

Country Link
US (1) US4578590A (de)
EP (1) EP0123982B1 (de)
JP (1) JPS59224127A (de)
CA (1) CA1211869A (de)
DE (1) DE3485485D1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4703434A (en) * 1984-04-24 1987-10-27 The Perkin-Elmer Corporation Apparatus for measuring overlay error
US4669866A (en) * 1985-01-28 1987-06-02 Phillips Edward H Step-and-repeat alignment and exposure system and method therefore
US4654517A (en) * 1985-04-16 1987-03-31 Protocad, Inc. Optical sight for computer controlled plotter with improved locating capability
US4887530A (en) * 1986-04-07 1989-12-19 Quad/Tech, Inc. Web registration control system
EP0311624A1 (de) * 1986-06-24 1989-04-19 Lothian Microfabrication Limited Verfahren zur positionserfassung und justierung in der photolithographie und vorrichtung zur durchführung dieses verfahrens
US5412577A (en) * 1992-10-28 1995-05-02 Quad/Tech International Color registration system for a printing press
US5477057A (en) * 1994-08-17 1995-12-19 Svg Lithography Systems, Inc. Off axis alignment system for scanning photolithography
US5767523A (en) * 1997-04-09 1998-06-16 Svg Lithography Systems, Inc. Multiple detector alignment system for photolithography
US6628406B1 (en) * 2000-04-20 2003-09-30 Justin L. Kreuzer Self referencing mark independent alignment sensor
US7209235B2 (en) * 2002-07-11 2007-04-24 Hymite A/S Accurate positioning of components of a optical assembly
US7459247B2 (en) * 2004-12-27 2008-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7511826B2 (en) * 2006-02-27 2009-03-31 Asml Holding N.V. Symmetrical illumination forming system and method
US20080036984A1 (en) * 2006-08-08 2008-02-14 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4259019A (en) * 1971-03-22 1981-03-31 Kasper Instruments, Inc. Apparatus for the automatic alignment of two superimposed objects, for example a semiconductor wafer and a transparent mask
US4408885A (en) * 1971-03-22 1983-10-11 Kasper Instruments, Inc. Apparatus for the automatic alignment of two superimposed objects, e.g. a semiconductor wafer and mask
CH629000A5 (de) * 1978-05-22 1982-03-31 Bbc Brown Boveri & Cie Verfahren zum optischen justieren von bauelementen.
JPS5534490A (en) * 1978-09-01 1980-03-11 Canon Inc Alignment device
FR2450468A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme
US4353087A (en) * 1979-03-12 1982-10-05 The Perkin-Elmer Corporation Automatic mask alignment

Also Published As

Publication number Publication date
US4578590A (en) 1986-03-25
CA1211869A (en) 1986-09-23
JPS59224127A (ja) 1984-12-17
JPH0434811B2 (de) 1992-06-09
EP0123982B1 (de) 1992-01-29
EP0123982A2 (de) 1984-11-07
EP0123982A3 (en) 1987-10-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee