DE3403765C2 - - Google Patents

Info

Publication number
DE3403765C2
DE3403765C2 DE19843403765 DE3403765A DE3403765C2 DE 3403765 C2 DE3403765 C2 DE 3403765C2 DE 19843403765 DE19843403765 DE 19843403765 DE 3403765 A DE3403765 A DE 3403765A DE 3403765 C2 DE3403765 C2 DE 3403765C2
Authority
DE
Germany
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19843403765
Other languages
German (de)
Other versions
DE3403765A1 (de
Inventor
Werner 8225 Traunreut De Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dr Johannes Heidenhain GmbH
Original Assignee
Dr Johannes Heidenhain GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dr Johannes Heidenhain GmbH filed Critical Dr Johannes Heidenhain GmbH
Priority to DE19843403765 priority Critical patent/DE3403765A1/de
Publication of DE3403765A1 publication Critical patent/DE3403765A1/de
Application granted granted Critical
Publication of DE3403765C2 publication Critical patent/DE3403765C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE19843403765 1984-02-03 1984-02-03 Abstandkopiereinrichtung Granted DE3403765A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19843403765 DE3403765A1 (de) 1984-02-03 1984-02-03 Abstandkopiereinrichtung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843403765 DE3403765A1 (de) 1984-02-03 1984-02-03 Abstandkopiereinrichtung

Publications (2)

Publication Number Publication Date
DE3403765A1 DE3403765A1 (de) 1985-08-08
DE3403765C2 true DE3403765C2 (zh) 1987-01-15

Family

ID=6226680

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19843403765 Granted DE3403765A1 (de) 1984-02-03 1984-02-03 Abstandkopiereinrichtung

Country Status (1)

Country Link
DE (1) DE3403765A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4993696A (en) * 1986-12-01 1991-02-19 Canon Kabushiki Kaisha Movable stage mechanism
US4801352A (en) * 1986-12-30 1989-01-31 Image Micro Systems, Inc. Flowing gas seal enclosure for processing workpiece surface with controlled gas environment and intense laser irradiation

Also Published As

Publication number Publication date
DE3403765A1 (de) 1985-08-08

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee