DE3278148D1 - Process and device for heating a dielectric or nearly dielectric liquid, and use of this device for heating, in particular of a calorific fluid - Google Patents

Process and device for heating a dielectric or nearly dielectric liquid, and use of this device for heating, in particular of a calorific fluid

Info

Publication number
DE3278148D1
DE3278148D1 DE8282420166T DE3278148T DE3278148D1 DE 3278148 D1 DE3278148 D1 DE 3278148D1 DE 8282420166 T DE8282420166 T DE 8282420166T DE 3278148 T DE3278148 T DE 3278148T DE 3278148 D1 DE3278148 D1 DE 3278148D1
Authority
DE
Germany
Prior art keywords
heating
liquid
dielectric
nearly
resistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8282420166T
Other languages
German (de)
Inventor
Francois Giolito
Francois Vachet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhodia Chimie SAS
Original Assignee
Rhone Poulenc Chimie SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rhone Poulenc Chimie SA filed Critical Rhone Poulenc Chimie SA
Application granted granted Critical
Publication of DE3278148D1 publication Critical patent/DE3278148D1/en
Expired legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24HFLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
    • F24H1/00Water heaters, e.g. boilers, continuous-flow heaters or water-storage heaters
    • F24H1/10Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium
    • F24H1/101Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium using electric energy supply
    • F24H1/102Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium using electric energy supply with resistance
    • F24H1/103Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium using electric energy supply with resistance with bare resistances in direct contact with the fluid
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/78Heating arrangements specially adapted for immersion heating
    • H05B3/82Fixedly-mounted immersion heaters

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Thermal Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Resistance Heating (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Extrusion Moulding Of Plastics Or The Like (AREA)
  • Forging (AREA)
  • Mounting, Exchange, And Manufacturing Of Dies (AREA)
  • Heat-Pump Type And Storage Water Heaters (AREA)
  • Instantaneous Water Boilers, Portable Hot-Water Supply Apparatuses, And Control Of Portable Hot-Water Supply Apparatuses (AREA)

Abstract

1. Process for heating a dielectric liquid consisting in immersing at least one bare resistor, to the terminals of which a potential difference is applied, directly in the said liquid contained in an enclosure, characterized in that for heating a liquid with a resistivity higher than 10**8 OMEGA /cm the liquid is conducted along plate-shaped resistors so that the velocity vectors of the general motion of the liquid under natural or forced flow, in the vicinity of the resistor or resistors are tangent or parallel to the faces of the said plates.
DE8282420166T 1981-12-16 1982-11-26 Process and device for heating a dielectric or nearly dielectric liquid, and use of this device for heating, in particular of a calorific fluid Expired DE3278148D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8123790A FR2518351B1 (en) 1981-12-16 1981-12-16 METHOD AND APPARATUS FOR HEATING DIELECTRIC OR SUBSTANTIALLY DIELECTRIC LIQUID AND USE OF SAID APPARATUS, IN PARTICULAR FOR HEAT FLUID

Publications (1)

Publication Number Publication Date
DE3278148D1 true DE3278148D1 (en) 1988-03-31

Family

ID=9265213

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8282420166T Expired DE3278148D1 (en) 1981-12-16 1982-11-26 Process and device for heating a dielectric or nearly dielectric liquid, and use of this device for heating, in particular of a calorific fluid

Country Status (6)

Country Link
EP (1) EP0082092B1 (en)
AT (1) ATE32643T1 (en)
BR (1) BR8207165A (en)
CA (1) CA1195719A (en)
DE (1) DE3278148D1 (en)
FR (1) FR2518351B1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5044314A (en) * 1986-10-15 1991-09-03 Advantage Production Technology, Inc. Semiconductor wafer processing apparatus
US4778559A (en) * 1986-10-15 1988-10-18 Advantage Production Technology Semiconductor substrate heater and reactor process and apparatus
US4956046A (en) * 1986-10-15 1990-09-11 Advantage Production Technology, Inc. Semiconductor substrate treating method
US4891335A (en) * 1986-10-15 1990-01-02 Advantage Production Technology Inc. Semiconductor substrate heater and reactor process and apparatus
US4938815A (en) * 1986-10-15 1990-07-03 Advantage Production Technology, Inc. Semiconductor substrate heater and reactor process and apparatus
US8166879B2 (en) 2007-03-12 2012-05-01 Dyno Nobel Inc. Detonator ignition protection circuit

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR351449A (en) * 1905-02-11 1905-07-17 Shoenberg Electric Appliance C Electric heater of a liquid
CH145649A (en) * 1930-02-24 1931-03-15 Georg Leffer Louis Method and device for uniform heating of fluids of all kinds by means of electrically heated resistors.
CH451351A (en) * 1967-05-30 1968-05-15 Balzers Patent Beteilig Ag Electric radiator
FR1600146A (en) * 1968-12-31 1970-07-20
DE2400478A1 (en) * 1974-01-05 1975-07-17 Eckerfeld Geb Reip Elisabeth Continuous water flow heater - has at least one bare heating coil in flow channel for direct heat transfer
DE2532377A1 (en) * 1975-07-19 1977-02-03 Licentia Gmbh Water heater with bottom heating element in tank - heats static water and additional top element is switched ON for flowing water
CH613329A5 (en) * 1977-01-05 1979-09-14 Petz Elektro Waerme Techn Resistance heating element for a heating device
US4292504A (en) * 1979-10-02 1981-09-29 Tutco, Inc. Expanded metal electric heating element with edge support

Also Published As

Publication number Publication date
EP0082092A1 (en) 1983-06-22
EP0082092B1 (en) 1988-02-24
BR8207165A (en) 1983-10-11
FR2518351B1 (en) 1985-06-21
ATE32643T1 (en) 1988-03-15
FR2518351A1 (en) 1983-06-17
CA1195719A (en) 1985-10-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee