DE3071851D1 - Improved shock and vibration isolation system - Google Patents

Improved shock and vibration isolation system

Info

Publication number
DE3071851D1
DE3071851D1 DE8383108003T DE3071851T DE3071851D1 DE 3071851 D1 DE3071851 D1 DE 3071851D1 DE 8383108003 T DE8383108003 T DE 8383108003T DE 3071851 T DE3071851 T DE 3071851T DE 3071851 D1 DE3071851 D1 DE 3071851D1
Authority
DE
Germany
Prior art keywords
vibration isolation
isolation system
improved shock
shock
improved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383108003T
Other languages
German (de)
Inventor
Edward H Phillips
Lawrence A Wise
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eaton Optimetrix Inc
Original Assignee
Eaton Optimetrix Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/083,770 external-priority patent/US4328941A/en
Priority claimed from US06/083,769 external-priority patent/US4336917A/en
Application filed by Eaton Optimetrix Inc filed Critical Eaton Optimetrix Inc
Priority claimed from EP19800105865 external-priority patent/EP0027195B1/en
Application granted granted Critical
Publication of DE3071851D1 publication Critical patent/DE3071851D1/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
DE8383108003T 1979-10-11 1980-09-26 Improved shock and vibration isolation system Expired DE3071851D1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US06/083,770 US4328941A (en) 1979-10-11 1979-10-11 Shock and vibration isolation system
US06/083,769 US4336917A (en) 1979-10-11 1979-10-11 Shock and vibration isolation system
EP19800105865 EP0027195B1 (en) 1979-10-11 1980-09-26 Improved shock and vibration isolation system

Publications (1)

Publication Number Publication Date
DE3071851D1 true DE3071851D1 (en) 1987-01-15

Family

ID=27224701

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383108003T Expired DE3071851D1 (en) 1979-10-11 1980-09-26 Improved shock and vibration isolation system

Country Status (1)

Country Link
DE (1) DE3071851D1 (en)

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee