DE3062794D1 - Optical photorepeating projection device - Google Patents

Optical photorepeating projection device

Info

Publication number
DE3062794D1
DE3062794D1 DE8080400132T DE3062794T DE3062794D1 DE 3062794 D1 DE3062794 D1 DE 3062794D1 DE 8080400132 T DE8080400132 T DE 8080400132T DE 3062794 T DE3062794 T DE 3062794T DE 3062794 D1 DE3062794 D1 DE 3062794D1
Authority
DE
Germany
Prior art keywords
photorepeating
optical
projection device
projection
photorepeating projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080400132T
Other languages
German (de)
Inventor
Michel Lacombat
Andre Gerard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Application granted granted Critical
Publication of DE3062794D1 publication Critical patent/DE3062794D1/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection-Type Copiers In General (AREA)
DE8080400132T 1979-02-27 1980-01-28 Optical photorepeating projection device Expired DE3062794D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7905008A FR2450470A1 (en) 1979-02-27 1979-02-27 OPTICAL PROJECTION SYSTEM IN PHOTOREPETITION

Publications (1)

Publication Number Publication Date
DE3062794D1 true DE3062794D1 (en) 1983-05-26

Family

ID=9222503

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080400132T Expired DE3062794D1 (en) 1979-02-27 1980-01-28 Optical photorepeating projection device

Country Status (5)

Country Link
US (1) US4295735A (en)
EP (1) EP0015789B1 (en)
JP (1) JPS55120139A (en)
DE (1) DE3062794D1 (en)
FR (1) FR2450470A1 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4461567A (en) * 1979-12-20 1984-07-24 Censor Patent- Und Versuchs-Anstalt Method of and apparatus for the positioning of disk-shaped workpieces, particularly semiconductor wafers
US4376581A (en) * 1979-12-20 1983-03-15 Censor Patent- Und Versuchs-Anstalt Method of positioning disk-shaped workpieces, preferably semiconductor wafers
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
DE3249686C2 (en) * 1981-05-15 1986-11-13 General Signal Corp., Stamford, Conn. Achromatic, anastigmatic unitary magnification and projection system
US4391494A (en) * 1981-05-15 1983-07-05 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4425037A (en) 1981-05-15 1984-01-10 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4444492A (en) * 1982-05-15 1984-04-24 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
JPS5979527A (en) * 1982-10-29 1984-05-08 Hitachi Ltd Pattern detector
JPS5990929A (en) * 1982-11-17 1984-05-25 Canon Inc Focusing method of projected exposing apparatus
JPH0616476B2 (en) * 1984-05-11 1994-03-02 株式会社ニコン Pattern exposure method
JPH0722103B2 (en) * 1985-09-20 1995-03-08 株式会社ニコン Projection type exposure system
JP2895703B2 (en) * 1992-07-14 1999-05-24 三菱電機株式会社 Exposure apparatus and exposure method using the exposure apparatus
US8451427B2 (en) * 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
CN111270200A (en) * 2018-12-05 2020-06-12 合肥欣奕华智能机器有限公司 Evaporation equipment and alignment method

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1107981A (en) * 1963-06-06 1968-03-27 Barr & Stroud Ltd Apparatus for automatically drawing lines
US3542469A (en) * 1967-09-30 1970-11-24 Telefunken Patent Photographic production of semiconductor microstructures
DE1597430B2 (en) * 1967-09-30 1971-12-09 Telefunken Patentverwertungsgesell schaft mbH, 7900 Ulm LENS FOR HIGH RESOLUTION MONOCHROMATIC IMAGE
DE2051322A1 (en) * 1969-11-07 1971-05-13 VEB Elektromat, χ 8080 Dresden Optical arrangement for an alignment and exposure device
DE2048630A1 (en) * 1970-10-03 1972-04-06 Fa Carl Zeiss, 7920 Heidenheim Optical system for generating microstructures
US3718396A (en) * 1971-12-28 1973-02-27 Licentia Gmbh System for photographic production of semiconductor micro structures
US3853398A (en) * 1972-07-05 1974-12-10 Canon Kk Mask pattern printing device
US3865483A (en) * 1974-03-21 1975-02-11 Ibm Alignment illumination system
IT1037606B (en) * 1974-06-06 1979-11-20 Ibm PERFECTED OPTICAL EQUIPMENT USEFUL FOR THE MANUFACTURE OF INTEGRATED CIRCUITS
US3917399A (en) * 1974-10-02 1975-11-04 Tropel Catadioptric projection printer
DE2460914C2 (en) * 1974-12-21 1983-08-18 Ibm Deutschland Gmbh, 7000 Stuttgart Photolithographic projection apparatus
US4059355A (en) * 1976-11-08 1977-11-22 Micro-Copy, Inc. Micro-composing reduction printer
JPS5453867A (en) * 1977-10-06 1979-04-27 Canon Inc Printing device
US4185913A (en) * 1977-12-15 1980-01-29 Quantor Corporation Apparatus for recording multiple, superimposed, independent images on microfilm

Also Published As

Publication number Publication date
EP0015789B1 (en) 1983-04-20
US4295735A (en) 1981-10-20
JPS55120139A (en) 1980-09-16
FR2450470A1 (en) 1980-09-26
EP0015789A1 (en) 1980-09-17

Similar Documents

Publication Publication Date Title
JPS55130506A (en) Optical device
GB2065918B (en) Coupling optical device
JPS5693201A (en) Light projector
GB2095500B (en) Optical device
DE3065895D1 (en) Device for optical coupling
JPS54164146A (en) Optical device
JPS55161211A (en) Optical scanning device
JPS54128752A (en) Optical device
JPS5616803A (en) Optical curtain device
JPS568102A (en) Optical device
JPS55162230A (en) Positioning optical projector
DE3062794D1 (en) Optical photorepeating projection device
GB2042759B (en) Projection device
JPS54151856A (en) Optical device
DE3063156D1 (en) Optical scanning device
JPS5637833A (en) Focusing device
JPS5636623A (en) Optical system for projector
JPS55157765A (en) Optical device for copier
JPS5641541A (en) Semiconductorrlaser optical readdhead
JPS54130046A (en) Optical device
JPS5546736A (en) Optical filmmscanning device
JPS5392994A (en) Nonnspheruial lens creating device
AU6307880A (en) Lens securing device
JPS5618486A (en) Optical circuit device
JPS5593132A (en) Photography device

Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee